Center for Quantum Devices - Journal Articles and Conference Proceedings

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26.	Al_xGa_1-xN (0 ≤ x ≤ 1) Ultraviolet Photodetectors Grown on Sapphire by Metal-organic Chemical-vapor Deposition D. Walker, X. Zhang, A. Saxler, P. Kung, J. Xu, and M. Razeghi Applied Physics Letters 70 (8)-- February 24, 1997 Al_xGa_1–xN (0 ≤ x ≤ 1) ultraviolet photoconductors with cutoff wavelengths from 365 to 200 nm have been fabricated and characterized. The maximum detectivity reached 5.5 × 10⁸ cm·Hz^1/2/W at a modulating frequency of 14 Hz. The effective majority carrier lifetime in Al_xGa_1–xN materials, derived from frequency-dependent photoconductivity measurements, has been estimated to be from 6 to 35 ms. The frequency-dependent noise spectrum shows that it is dominated by Johnson noise at high frequencies for low-Al-composition samples. reprint
27.	Intrinsic AlGaN photodetectors for the entire compositional range D. Walker, X. Zhang, A. Saxler, P. Kung, J. Xu, and M. Razeghi SPIE Conference, San Jose, CA, -- February 12, 1997 Al_xGa_1-xN ultraviolet photoconductors with cut- off wavelengths from 365 nm to 200 nm have been fabricated and characterized. Various characteristics of the devices, such as photoresponse, voltage-dependent responsivity, frequency-dependent responsivity and noise spectral density, were measured and cross-referenced with optical, electrical and structural characteristics of the material to provide information about the mechanisms taking place during detection. The maximum detectivity reached 5.5 X 10⁸ cm·Hz^½/W at a modulating frequency of 14 Hz. The effective majority carrier lifetime in Al_xGa_1-xN materials, derived from frequency-dependent photoconductivity measurements, has been estimated to be from 6 to 35 msec. The frequency-dependent noise-spectrum shows that it is dominated by Johnson-noise at high frequencies for low Al-composition samples. reprint
28.	MOCVD Growth of High Quality GaN-AlGaN Based Structures on Al₂O₃ Substrates with Dislocation Density less than 10⁷cm^-2 P. Kung, X. Zhang, A. Saxler, D. Walker, M. Razeghi, W. Qian, and V.P. Dravid Journal of European Ceramics Society 17-- January 1, 1997
29.	High Resolution X-ray Diffraction of GaN Grown on Sapphire Substrates A. Saxler, M.A. Capano, W.C. Mitchel, P. Kung, X. Zhang, D. Walker and M. Razeghi Materials Research Society Symposium, "III-V Nitrides"; Proceedings 449-- December 2, 1996
30.	AlGaN Based Materials and Heterostructures P. Kung, A. Saxler, D. Walker, X. Zhang, R. Lavado, K.S. Kim, and M. Razeghi Materials Research Society Symposium, "III-V Nitrides"; Proceedings 449-- December 2, 1996
31.	Observation of Room Temperature Surface-Emitting Stimulated Emission from GaN:Ge by Optical pumping X. Zhang, P. Kung, A. Saxler, D. Walker, and M. Razeghi Journal of Applied Physics 80 (11)-- December 1, 1996 Optically pumped surface-emitting stimulated emission at room temperature was observed from GaN:Ge grown by metalorganic chemical vapor deposition. The sample was optically pumped perpendicularly on the top surface while the stimulated emission was collected from the back colinearly with the pump beam. The cavity was formed by the GaN/air and GaN/sapphire interfaces without any other structure. The stimulated emission was gain guided by the pump beam. The threshold optical pump density for stimulated emission was approximately 2.8 MW/cm² and the linewidth was 2.5 nm. The emission from GaN:Ge showed a redshift as the pump density increased. The comparison between theoretical calculations and experimental results suggested that many-body interactions can account well for the redshift. reprint
32.	Recent advances in III-Nitride materials, characterization and device applications M. Razeghi, X. Zhang, P. Kung, A. Saxler, D. Walker, K.Y. Lim, and K.S. Kim SPIE Conference: Solid State Crystals in Optoelectronics and Semiconductor Technology; Proceedings 3179-- October 7, 1996 High-quality AlN, GaN, AlGaN have been grown on sapphire substrate by low-pressure metalorganic chemical vapor deposition (LP-MOCVD). The x-ray rocking curve of AlN and GaN were 100 arcsecs and 30 arcsecs respectively with Pendelloesung oscillations, which are the best reported to date. GaN with high crystallinity simultaneously exhibited high optical and electrical quality. Photoluminescence linewidth of GaN at 77K was as low as 17 meV, which is the best reported to date. Si-doped GaN had a mobility higher than 300 cm²/V·s. GaN has been also successfully grown on LiGaO₂ substrate with LP-MOCVD for the first time. AlGaN for the entire composition range has been grown. These layers exhibited the lowest x-ray FWHM reported to date. The excellent optical quality of these layers have been characterized by room temperature UV transmission and photoluminescence. N-type doping of AlGaN with Si has ben achieved up to 60 percent Al with mobility as high as 78 cm²/V·s. Al_xGa_1-xN/Al_yGa_1-yN superlattice with atomically sharp interface have been demonstrated. Optically-pumped stimulated emission in GaN:Ge and GaN:Si has been observed with threshold optical power density as low as 0.4 MW/cm². AlGaN photoconductors with cut-off wavelengths from 200 nm to 365 nm have been achieved for the first time. GaN p-n junction photovoltaic detector with very selective photoresponse have been demonstrated and theoretically modeled. Ti/AlN/Si metal-insulator- semiconductor capacitor with high capacitance-voltage performances at both low and high frequencies and low interface trap level density have been demonstrated for the first time in this material system. reprint
33.	Metalorganic chemical vapor deposition of monocrystalline GaN thin films on β-LiGaO2substrates P. Kung, A. Saxler, X. Zhang, D. Walker, R. Lavado, and M. Razeghi Applied Physics Letters 69 (14)-- September 30, 1996 We report the metalorganic chemical vapor deposition growth and characterization of monocrystalline GaN thin films on β-LiGaO₂ substrates. The influence of the growth temperature on the crystal quality was studied. The structural, electrical, and optical properties of the films were assessed through scanning electron microscopy, x-ray diffraction, Hall measurements, optical transmission, photoluminescence. reprint
34.	Observation of inversion layers at AlN-Si interfaces fabricated by metal organic chemical vapour deposition X. Zhang, D. Walker, A. Saxler, P. Kung, J. Xu, and M. Razeghi IEEE Electronic Letters 32 (17)-- August 15, 1996
35.	Demonstration of an Electronic Grade Ti/AlN/Si Metal-Insulator-Semiconductor Capacitor X. Zhang, D. Walker, A. Saxler, P. Kung, J. Xu, and M. Razeghi International Conference on Solid State Devices and Materials (SSDM '96), Yokohama, Japan; Proceedings-- August 1, 1996
36.	AlGaN ultraviolet photoconductors grown on sapphire D. Walker, X. Zhang, P. Kung, A. Saxler, S. Javadpour, J. Xu, and M. Razeghi Applied Physics Letters 68 (15)-- April 8, 1996 Al_xGa_1−xN (0≤x≤0.50) ultraviolet photoconductors with a minimum cutoff wavelength shorter than 260 nm have been fabricated and characterized. The AlGaN active layers were grown on (00⋅1) sapphire substrates by metalorganic chemical vapor deposition (MOCVD). The spectral responsivity of the GaN detector at 360 nm is about 1 A/W biased at 8 V at room temperature. The carrier lifetime derived from the voltage‐dependent responsivity is 0.13–0.36 ms. reprint
37.	GaN, GaAlN, and AlN for use in UV Detectors for Astrophysics: An Update P. Kung, A. Saxler, X. Zhang, D. Walker, M. Razeghi, and M. Ulmer SPIE Photonics West '96 Photodetectors: Materials and Devices; Proceedings 2685-- January 27, 1996 In SPIE Proceeding 2397 we demonstrated that there is a large payoff still to be gained by further improvements in the performance of solar blind UV detectors for astronomical purposes. We suggested that a particularly promising future technology is one based on the ability of investigators to produce high-quality films made of wide bandgap III-IV semiconductors. Here we report on significant progress we have made over the past year to fabricate and test single-pixel devices. The next step will be to measure and improve detective efficiency, measure the solar blindness over a larger dynamic range, and begin developing multiple-pixel designs. reprint
38.	UV photodetectors based on Al_xGa_1-xN grown by MOCVD A. Saxler, D. Walker, X. Zhang, P. Kung, J. Xu, and M. Razeghi SPIE Photonics West '96 Photodetectors: Materials and Devices; Proceedings 2685-- January 27, 1996 Metalorganic chemical vapor deposition was used to deposit Al_xGa_1-xN active layers with varying aluminum compositions on basal plane sapphire substrate. Al_xGa_1-xN (x < 0.5) ultraviolet photodetectors have been fabricated and characterized with cut-off wavelengths as short as 260 nm. Carrier lifetimes on the order of 10 milliseconds were estimated from frequency dependent measurements of the responsivity. reprint
39.	GaN Based Semiconductors for Future Optoelectronics D. Walker, P. Kung, A. Saxler, X. Zhang, and M. Razeghi International Symposium on Compound Semiconductors (ISCS-22), Cheju Island, Korea; Compound Semiconductors 145 (8)-- January 1, 1996
40.	Kinetics of photoconductivity in n-type GaN photodetector P. Kung, X. Zhang, D. Walker, A. Saxler, J. Piotrowski, A. Rogalski, and M. Razeghi Applied Physics Letters 67 (25)-- December 18, 1995 High-quality ultraviolet photoconductive detectors have been fabricated using GaN layers grown by low-pressure metalorganic chemical vapor deposition on (11⋅0) sapphire substrates. The spectral responsivity remained nearly constant for wavelengths from 200 to 365 nm and dropped sharply by almost three orders of magnitude for wavelengths longer than 365 nm. The kinetics of the photoconductivity have been studied by the measurements of the frequency‐dependent photoresponse and photoconductivity decay. Strongly sublinear response and excitation‐dependent response time have been observed even at relatively low excitation levels. This can be attributed to redistribution of the charge carriers with increased excitation level. reprint
41.	Spectral response on GaN p-n junction photovoltaic structures D. Walker, X. Zhang, P. Kung, A. Saxler, J. Xu and M. Razeghi Proceedings of Materials Research Society, Boston, MA; Gallium Nitride and related Materials; Proceedings 395-- November 27, 1995
42.	Growth of GaN without yellow luminescence X. Zhang, P. Kung, D. Walker, A. Saxler, and M. Razeghi Proceedings of Materials Research Society, Boston, MA; Gallium Nitride and related Materials; Proceedings 395-- November 27, 1995
43.	Photovoltaic effects in GaN structures with p-n junction X. Zhang, P. Kung, D. Walker, J. Piotrowski, A. Rogalski, A. Saxler, and M. Razeghi Applied Physics Letters 67 (14)-- October 2, 1995 Large-area GaN photovoltaic structures with p-n junctions have been fabricated using atmospheric pressure metalorganic chemical vapor deposition. The photovoltaic devices typically exhibit selective spectral characteristics with two narrow peaks of opposite polarity. This can be related to p-n junction connected back‐to‐back with a Schottky barrier. The shape of the spectral characteristic is dependent on the thickness of the n- and p-type regions. The diffusion length of holes in the n-type GaN region, estimated by theoretical modeling of the spectral response shape, was about 0.1 μm. reprint
44.	Growth of Al_xGa_1-xN:Ge on sapphire and silicon substrates X. Zhang, P. Kung, A. Saxler, D. Walker, T.C. Wang, and M. Razeghi Applied Physics Letters 67 (12)-- September 18, 1995 Al_xGa_1–xN were grown on (00.1) sapphire and (111) silicon substrates in the whole composition range (0 <= x <= 1). The high optical quality of the epilayers was assessed by room-temperature optical absorption and photoluminescence measurements. Layers with higher Al composition are more resistive. Resistive Al_xGa_1–xN epilayers were successfully doped with Ge and free-electron concentration as high as 3 × 10¹⁹ cm^–3 was achieved. reprint
45.	High quality AlN and GaN epilayers grown on (00*1) sapphire, (100) and (111) silicon substrates P. Kung, A. Saxler, X. Zhang, D. Walker, T.C. Wang, I. Ferguson, and M. Razeghi Applied Physics Letters 66 (22)-- May 29, 1995 The growth of high quality AlN and GaN thin films on basal plane sapphire, (100), and (111) silicon substrates is reported using low pressure metalorganic chemical vapor deposition. X-ray rocking curve linewidths of about 100 and 30 arcsec were obtained for AlN and GaN on sapphire, respectively. Room‐temperature optical transmission and photoluminescence (of GaN) measurements confirmed the high quality of the films. The luminescence at 300 and 77 K of the GaN films grown on basal plane sapphire, (100), and (111) silicon was compared. reprint
46.	Photoluminescence study of GaN X. Zhang, P. Kung, A. Saxler, D. Walker, T. Wang, and M. Razeghi Acta Physica Polonica A 88 (4)-- May 29, 1995

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