Center for Quantum Devices - Journal Articles and Conference Proceedings

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51.	Development of High-performance III-Nitride-based Semiconductor Devices M. Razeghi, P. Kung, D. Walker, M. Hamilton, and P. Sandvik International Symposium on the Physics of Semiconductors and Applications (ISPSA-98), Seoul, Korea; Proceedings-- November 6, 1998
52.	High quality LEO growth and characterization of GaN films on Al₂O₃ and Si substrates M. Razeghi, P. Kung, D. Walker, M. Hamilton, and J. Diaz SPIE International Conference on Solid State Crystals, Zakopane, Poland; Proceedings 3725-- October 12, 1998 We report the lateral epitaxial overgrowth (LEO) of GaN films on (00.1) Al₂O₃ and (111) Si substrates by metalorganic chemical vapor deposition. The LEO on Si substrates was possible after achieving quasi monocrystalline GaN template films on (111) Si substrates. X-ray diffraction, photoluminescence, scanning electron microscopy and atomic force microscopy were used to assess the quality of the LEO films. Lateral growth rates more than 5 times as high as vertical growth rates were achieved for both LEO growths of GaN on sapphire and silicon substrates. reprint
53.	Solar blind GaN p-i-n photodiodes D. Walker, A. Saxler, P. Kung, X. Zhang, M. Hamilton, J. Diaz and M. Razeghi Applied Physics Letters 72 (25)-- June 22, 1998 We present the growth and characterization of GaN p-i-n photodiodes with a very high degree of visible blindness. The thin films were grown by low-pressure metalorganic chemical vapor deposition. The room-temperature spectral response shows a high responsivity of 0.15 A/W up until 365 nm, above which the response decreases by six orders of magnitude. Current/voltage measurements supply us with a zero bias resistance of 10¹¹ Ω. Lastly, the temporal response shows a rise and fall time of 2.5 μs measured at zero bias. This response time is limited by the measurement circuit. reprint
54.	Continuous-wave room-temperature operation of InGaN/GaN multiquantum well lasers grown by low-pressure metalorganic chemical vapor deposition M. Razeghi, A. Saxler, P. Kung, D. Walker, X. Zhang, A. Rybaltowski, Y. Xiao, H.J. Yi and J. Diaz SPIE Conference, San Jose, CA, Vol. 3284, pp. 113-- January 28, 1998 Continuous-wave (CW) room temperature operation of InGaN/GaN multi-quantum well (MQW) lasers is reported. Far-field beam divergence as narrow as 13 degrees and 20 degrees for parallel and perpendicular directions to epilayer planes were measured, respectively. The MQW lasers showed strong beam polarization anisotropy as consistent with QW laser gain theory. Dependencies of threshold current on cavity-length and temperature are also consistent with conventional laser theory. No significant degradation in laser characteristics was observed during lifetime testing for over 140 hours of CW room temperature operation. reprint
55.	GaN p-i-n photodiodes with high visible-to-ultraviolet rejection ratio P. Kung, X. Zhang, D. Walker, A. Saxler, and M. Razeghi SPIE Conference, San Jose, CA, -- January 28, 1998 UV photodetectors are critical components in many applications, including UV astronomy, flame sensors, early missile threat warning and space-to-space communications. Because of the presence of strong IR radiation in these situations, the photodetectors have to be solar blind, i.e. able to detect UV radiation while not being sensitive to IR. Al_xGa_1-xN is a promising material system for such devices. Al_xGa_1-xN materials are wide bandgap semiconductors, with a direct bandgap whose corresponding wavelength can be continuously tuned from 200 to 365 nm. Al_xGa_1-xN materials are thus insensitive to visible and IR radiation whose wavelengths are higher than 365 nm. We have already reported the fabrication and characterization of Al_xGa_1-xN-based photoconductors with a cut-off wavelength tunable from 200 to 365 nm by adjusting the ternary alloy composition. Here, we present the growth and characterization of GaN p-i- n photodiodes which exhibit a visible-to-UV rejection ratio of 6 orders or magnitude. The thin films were grown by low pressure metalorganic chemical vapor deposition. Square mesa structures were fabricated using dry etching, followed by contact metallization. The spectral response, rejection ratio and transient response of these photodiodes is reported. reprint
56.	New Developments in III-Nitride Material and Device Applications M. Razeghi, A. Saxler, P. Kung, D. Walker, X. Zhang, K.S. Kim, H.R. Vydyanath, J. Solomon, M. Ahoujja, and W.C. Mitchel Physics of Semiconductor Devices, Vol. 1, V. Kumar and S.K. Agarwal eds.,Narosa Publishing House, New Delhi, India,-- January 1, 1998
57.	GaInN/GaN Multi-Quantum Well Laser Diodes Grown by Low-Pressure Metalorganic Chemical Vapor Deposition P. Kung, A. Saxler, D. Walker, A. Rybaltowski, X. Zhang, J. Diaz, and M. Razeghi MRS Internet Journal of Nitride Semiconductor Research 3 (1)-- January 1, 1998 We report the growth, fabrication and characterization of GaInN/GaN multi-quantum well lasers grown on (00·1) sapphire substrates by low pressure metalorganic chemical vapor deposition. The threshold current density of a 1800 µm long cavity length laser was 1.4 kA/cm² with a threshold voltage of 25 V. These lasers exhibited series resistances of 13 and 14 Ω at 300 and 79 K, respectively. reprint
58.	Simultaneous growth of two differently oriented GaN epilayers on (11.0) sapphire (II) a growth model of (00.1) and (10.0) GaN T. Kato, P. Kung, A. Saxler, C.J. Sun, H. Ohsato, M. Razeghi and T. Okuda Journal of Crystal Growth 183-- January 1, 1998
59.	Comparison of Trimethylgallium and Triethylgallium for the Growth of GaN A. Saxler, D. Walker, P. Kung, X. Zhang, M. Razeghi, J. Solomon, W. Mitchel, and H.R. Vydyanath Applied Physics Letters 71 (22)-- December 1, 1997 GaN films grown by low-pressure metalorganic chemical vapor deposition using trimethylgallium and triethylgallium as gallium precursors are compared. The films were characterized by x-ray diffraction, Hall effect, photoluminescence, secondary ion mass spectroscopy, and etch pit density measurements. GaN layers grown using triethylgallium exhibited superior electrical and optical properties and a lower carbon impurity concentration. reprint
60.	Determination of of Band Gap Energy of Al_1-xIn_xN Grown by Metal Organic Chemical Vapor Deposition in the High Al Composition Regime K.S. Kim, A. Saxler, P. Kung, M. Razeghi, and K.Y. Lim Applied Physics Letters 71 (6)-- August 11, 1997 Ternary AlInN was grown by metal–organic chemical-vapor deposition in the high Al composition regime. The band-gap energy of AlInN ternary was measured by optical absorption spectroscopy at room temperature. The band-gap energy of Al_0.92In_0.08N is 5.26 eV. The potential application of AlInN as a barrier material for GaN is also discussed. reprint
61.	GaN Grown Using Trimethylgallium and Triethylgallium A. Saxler, P. Kung, X. Zhang, D. Walker, J. Solomon, W.C. Mitchel and M. Razeghi Defects in Semiconductors, Aveiro, Portugal; Materials Science Forum, 258-263-- July 1, 1997
62.	GaN Doped with Sulfur A. Saxler, P. Kung, X. Zhang, D. Walker, J. Solomon, M. Ahoujja, W.C. Mitchel, H.R. Vydyanath, and M. Razeghi Defects in Semiconductors, Aveiro, Portugal; Materials Science Forum, 258-263-- July 1, 1997
63.	Electroluminescence of III-Nitride Double Heterostructure Light Emitting Diodes with Silicon and Magnesium Doped InGaN A. Saxler, K.S. Kim, D. Walker, P. Kung, X. Zhang, G.J. Brown, W.C. Mitchel and M. Razeghi Defects in Semiconductors, Aveiro, Portugal; Materials Science Forum, 258-263-- July 1, 1997
64.	Structural and Microstructural Characterization of GaN Thin Films and GaN-based Heterostructures Grown on Sapphire Substrates M. Razeghi, P. Kung, X. Zhang, D. Walker, A. Saxler, K.Y. Lim and K.S. Kim Journal of the Korean Physical Society, Proceedings Supplement 30 (S1-S6)-- June 30, 1997
65.	Al_xGa_1-xN (0 ≤ x ≤ 1) Ultraviolet Photodetectors Grown on Sapphire by Metal-organic Chemical-vapor Deposition D. Walker, X. Zhang, A. Saxler, P. Kung, J. Xu, and M. Razeghi Applied Physics Letters 70 (8)-- February 24, 1997 Al_xGa_1–xN (0 ≤ x ≤ 1) ultraviolet photoconductors with cutoff wavelengths from 365 to 200 nm have been fabricated and characterized. The maximum detectivity reached 5.5 × 10⁸ cm·Hz^1/2/W at a modulating frequency of 14 Hz. The effective majority carrier lifetime in Al_xGa_1–xN materials, derived from frequency-dependent photoconductivity measurements, has been estimated to be from 6 to 35 ms. The frequency-dependent noise spectrum shows that it is dominated by Johnson noise at high frequencies for low-Al-composition samples. reprint
66.	Intrinsic AlGaN photodetectors for the entire compositional range D. Walker, X. Zhang, A. Saxler, P. Kung, J. Xu, and M. Razeghi SPIE Conference, San Jose, CA, -- February 12, 1997 Al_xGa_1-xN ultraviolet photoconductors with cut- off wavelengths from 365 nm to 200 nm have been fabricated and characterized. Various characteristics of the devices, such as photoresponse, voltage-dependent responsivity, frequency-dependent responsivity and noise spectral density, were measured and cross-referenced with optical, electrical and structural characteristics of the material to provide information about the mechanisms taking place during detection. The maximum detectivity reached 5.5 X 10⁸ cm·Hz^½/W at a modulating frequency of 14 Hz. The effective majority carrier lifetime in Al_xGa_1-xN materials, derived from frequency-dependent photoconductivity measurements, has been estimated to be from 6 to 35 msec. The frequency-dependent noise-spectrum shows that it is dominated by Johnson-noise at high frequencies for low Al-composition samples. reprint
67.	Morphology of Twinned GaN Grown on (11.0) Sapphire Substrates T. Kato, P. Kung, A. Saxler, C.J. Sun, H. Ohsato, M. Razeghi and T. Okuda Solid-State Electronics 41 (2)-- January 1, 1997
68.	Simultaneous growth of two different oriented GaN epilayers on (11.0) sapphire (I) morphology and orientation T. Kato, H. Ohsato, T. Okuda, P. Kung, A. Saxler, C.J. Sun, and M. Razeghi Journal of Crystal Growth 173-- January 1, 1997
69.	MOCVD Growth of High Quality GaN-AlGaN Based Structures on Al₂O₃ Substrates with Dislocation Density less than 10⁷cm^-2 P. Kung, X. Zhang, A. Saxler, D. Walker, M. Razeghi, W. Qian, and V.P. Dravid Journal of European Ceramics Society 17-- January 1, 1997
70.	High Resolution X-ray Diffraction of GaN Grown on Sapphire Substrates A. Saxler, M.A. Capano, W.C. Mitchel, P. Kung, X. Zhang, D. Walker and M. Razeghi Materials Research Society Symposium, "III-V Nitrides"; Proceedings 449-- December 2, 1996
71.	AlGaN Based Materials and Heterostructures P. Kung, A. Saxler, D. Walker, X. Zhang, R. Lavado, K.S. Kim, and M. Razeghi Materials Research Society Symposium, "III-V Nitrides"; Proceedings 449-- December 2, 1996
72.	Observation of Room Temperature Surface-Emitting Stimulated Emission from GaN:Ge by Optical pumping X. Zhang, P. Kung, A. Saxler, D. Walker, and M. Razeghi Journal of Applied Physics 80 (11)-- December 1, 1996 Optically pumped surface-emitting stimulated emission at room temperature was observed from GaN:Ge grown by metalorganic chemical vapor deposition. The sample was optically pumped perpendicularly on the top surface while the stimulated emission was collected from the back colinearly with the pump beam. The cavity was formed by the GaN/air and GaN/sapphire interfaces without any other structure. The stimulated emission was gain guided by the pump beam. The threshold optical pump density for stimulated emission was approximately 2.8 MW/cm² and the linewidth was 2.5 nm. The emission from GaN:Ge showed a redshift as the pump density increased. The comparison between theoretical calculations and experimental results suggested that many-body interactions can account well for the redshift. reprint
73.	Recent advances in III-Nitride materials, characterization and device applications M. Razeghi, X. Zhang, P. Kung, A. Saxler, D. Walker, K.Y. Lim, and K.S. Kim SPIE Conference: Solid State Crystals in Optoelectronics and Semiconductor Technology; Proceedings 3179-- October 7, 1996 High-quality AlN, GaN, AlGaN have been grown on sapphire substrate by low-pressure metalorganic chemical vapor deposition (LP-MOCVD). The x-ray rocking curve of AlN and GaN were 100 arcsecs and 30 arcsecs respectively with Pendelloesung oscillations, which are the best reported to date. GaN with high crystallinity simultaneously exhibited high optical and electrical quality. Photoluminescence linewidth of GaN at 77K was as low as 17 meV, which is the best reported to date. Si-doped GaN had a mobility higher than 300 cm²/V·s. GaN has been also successfully grown on LiGaO₂ substrate with LP-MOCVD for the first time. AlGaN for the entire composition range has been grown. These layers exhibited the lowest x-ray FWHM reported to date. The excellent optical quality of these layers have been characterized by room temperature UV transmission and photoluminescence. N-type doping of AlGaN with Si has ben achieved up to 60 percent Al with mobility as high as 78 cm²/V·s. Al_xGa_1-xN/Al_yGa_1-yN superlattice with atomically sharp interface have been demonstrated. Optically-pumped stimulated emission in GaN:Ge and GaN:Si has been observed with threshold optical power density as low as 0.4 MW/cm². AlGaN photoconductors with cut-off wavelengths from 200 nm to 365 nm have been achieved for the first time. GaN p-n junction photovoltaic detector with very selective photoresponse have been demonstrated and theoretically modeled. Ti/AlN/Si metal-insulator- semiconductor capacitor with high capacitance-voltage performances at both low and high frequencies and low interface trap level density have been demonstrated for the first time in this material system. reprint
74.	Metalorganic chemical vapor deposition of monocrystalline GaN thin films on β-LiGaO2substrates P. Kung, A. Saxler, X. Zhang, D. Walker, R. Lavado, and M. Razeghi Applied Physics Letters 69 (14)-- September 30, 1996 We report the metalorganic chemical vapor deposition growth and characterization of monocrystalline GaN thin films on β-LiGaO₂ substrates. The influence of the growth temperature on the crystal quality was studied. The structural, electrical, and optical properties of the films were assessed through scanning electron microscopy, x-ray diffraction, Hall measurements, optical transmission, photoluminescence. reprint
75.	Observation of inversion layers at AlN-Si interfaces fabricated by metal organic chemical vapour deposition X. Zhang, D. Walker, A. Saxler, P. Kung, J. Xu, and M. Razeghi IEEE Electronic Letters 32 (17)-- August 15, 1996

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