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101.  ZnO Thin Film Templates for GaN-based Devices
D.J. Rogers, F. Hosseini Teherani, A. Yasan, R. McClintock, K. Mayes, S.R. Darvish, P. Kung, M. Razeghi and G. Garry
SPIE Conference, Jose, CA, Vol. 5732, pp. 412-- January 22, 2005
GaN-based optoelectronic devices are plagued by a tendency to non-radiative transitions linked to defects in the active layers. ZnO is promising as a substrate material for GaN because it has the same wurtzite structure and a relatively small lattice mismatch (~1.8%). In this paper, we discuss use of ZnO thin films as templates for GaN based LED. reprint
 
102.  320x256 Solar-Blind Focal Plane Arrays based on AlxGa1-xN
R. McClintock, K. Mayes, A. Yasan, D. Shiell, P. Kung, and M. Razeghi
Applied Physics Letters, 86 (1)-- January 3, 2005
We report AlGaN-based back-illuminated solar-blind ultraviolet focal plane arrays operating at a wavelength of 280 nm. The electrical characteristics of the individual pixels are discussed, and the uniformity of the array is presented. The p–i–n photodiode array was hybridized to a 320×256 read-out integrated circuit entirely within our university research lab, and a working 320×256 camera was demonstrated. Several example solar-blind images from the camera are also provided. reprint
 
103.  Review of III-Nitride Optoelectronic Materials for light Emission and Detection
M. Razeghi, A. Yasan, R. McClintock, K. Mayes, D. Shiell, S. Darvish, and P. Kung
Physica Status Solidi C S141 - S148-- September 10, 2004
We review the significant achievements relating to optoelectronic devices based on III-nitrides at the center for quantum devices (CQD). Based on GaN/InGaN multiple-quantum well structures, we demonstrated blue laser diodes at a wavelength of 405 nm. This achievement was particularly significant at the time, because while no defect reduction technique was used, a fairly low threshold current density was achieved (3.8 kA/cm²). In the past few years, however, the interest has shifted towards shorter wavelength light emitters, i.e. ultraviolet LEDs and LDs. Lower crystalline quality and unsatisfactory doping levels of AlGaN compound semiconductors posed serious challenges en route to the realization of UV light emitters. However, steady progress in the growth of AlGaN and AlN epilayers made it possible to overcome some of the difficulties. To date, we have been able to demonstrate UV LEDs at wavelengths as short as 265 nm (corresponding to 45% Al in AlxGa1-xN) with optical output powers of over 5 mW. We have addressed the n-type AlGaN doping problem by using a Si-In co-doped scheme. We also employed high-quality AlGaN/AlN superlattice templates for the reduction of defects. We have also demonstrated 280 nm UV LEDs with output powers of over 6 mW and external quantum efficiencies of over 0.25%. Despite all the success in the realization of short-wavelength UV LEDs, UV laser diodes at these short wavelengths are yet to be realized. The main difficulties are the low material quality, high device resistance leading to excessive heating of the device, realization of smooth cavity mirrors, and issues related to the cracking of the material. We have also demonstrated different types of photodetectors in the UV range of the spectrum: photoconductors, MSM photodetector, Schottky barrier photodetectors, and p-i-n photodiodes to name a few. The most promising type of photodetector for realization of UV imaging focal plane arrays is the p-i-n photodiode. Realization of high-efficiency AlGaN-based p-i-n photodiodes becomes more difficult when considering the need for the collection of the light from the backside of the substrate. However, similar to our back-emission UV LED structure, we have demonstrated back-illuminated p-i-n solar-blind photodiodes with external quantum efficiencies as high as 68% under no applied bias and 74% under -5 V of bias. reprint
 
104.  High Quantum Efficiency AlGaN Solar-Blind Photodetectors
R. McClintock, A. Yasan, K. Mayes, D. Shiell, S.R. Darvish, P. Kung and M. Razeghi
Applied Physics Letters, 84 (8)-- February 23, 2004
We report AlGaN-based back-illuminated solar-blind ultraviolet p-i-n photodetectors with a peak responsivity of 136 mA/W at 282 nm without bias. This corresponds to a high external quantum efficiency of 60%, which improves to a value as high as 72% under 5 V reverse bias. We attribute the high performance of these devices to the use of a very-high quality AlN and Al0.87Ga0.13N/AlN superlattice material and a highly conductive Si–In co-doped Al0.5Ga0.5N layer reprint
 
105.  High Power 280 nm AlGaN Light Emitting Diodes Based on an Asymmetric Single Quantum Well
K. Mayes, A. Yasan, R. McClintock, D. Shiell, S.R. Darvish, P. Kung, and M. Razeghi
Applied Physics Letters, 84 (7)-- February 16, 2004
We demonstrate high-power AlGaN-based ultraviolet light-emitting diodes grown on sapphire with an emission wavelength of 280 nm using an asymmetric single-quantum-well active layer configuration on top of a high-quality AlGaN/AlN template layer. An output power of 1.8 mW at a pulsed current of 400 mA was achieved for a single 300 µm×300 µm diode. This device reached a high peak external quantum efficiency of 0.24% at 40 mA. An array of four diodes produced 6.5 mW at 880 mA of pulsed current. reprint
 
106.  High Quantum Efficiency Solar-Blind Photodetectors
R. McClintock, A. Yasan, K. Mayes, D. Shiell, S. Darvish, P. Kung and M. Razeghi
SPIE Conference, Jose, CA, Vol. 5359, pp. 434-- January 25, 2004
We report AlGaN-based back-illuminated solar-blind p-i-n photodetectors with a record peak responsivity of 150 mA/W at 280 nm, corresponding to a high external quantum efficiency of 68%, increasing to 74% under 5 volts reverse bias. Through optimization of the p-AlGaN layer, we were able to remove the out-of-band negative photoresponse originating from the Schottky-like p-type metal contact, and hence significantly improve the degree of solar-blindness reprint
 
107.  Growth of Deep UV Light Emitting Diodes by Metalorganic Chemical Vapor Deposition
A. Yasan, R. McClintock, K. Mayes, D. Shiell, S. Darvish, P. Kung and M. Razeghi
SPIE Conference, Jose, CA, Vol. 5359, pp. 400-- January 25, 2004
We demonstrate high power AlGaN based ultraviolet light-emitting diodes (UV LEDs) with an emission wavelength of 280 nm using an asymmetric single quantum well active layer configuration on top of a high-quality AlGaN/AlN template layer grown by metalorganic chemical vapor deposition (MOCVD). An output power of 1.8 mW at a pulsed current of 400 mA was achieved for a single 300 µm × 300 µm diode. This device reached a high peak external quantum efficiency of 0.24% at 40 mA. An array of four diodes produced 6.5 mW at 880 mA of pulsed current. reprint
 
108.  4.5 mW Operation of AlGaN-based 267 nm Deep-Ultraviolet Light-Emitting Diodes
A. Yasan, R. McClintock, K. Mayes, D. Shiell, L. Gautero, S.R. Darvish, P. Kung and M. Razeghi
Applied Physics Letters, 83 (23)-- December 8, 2003
We demonstrate 4.5 mW output power from AlGaN-based single quantum well ultraviolet light-emitting diodes at a very short wavelength of 267 nm in pulsed operation mode. The output power in continuous-wave mode reaches a value of 165 µW at an injected current of 435 mA. The measurements were done on arrays of four devices flip chip bonded to AlN submounts for thermal management. reprint
 
109.  Photoluminescence Study of AlGaN-based 280 nm Ultraviolet Light-Emitting Diodes
A. Yasan, R. McClintock, K. Mayes, D.H. Kim, P. Kung, and M. Razeghi
Applied Physics Letters, 83 (20)-- November 17, 2003
We investigated optical properties of single quantum well AlGaN-based UV 280 nm light-emitting diodes using temperature-dependent photoluminescence (PL) measurement. We found an "S-shaped" temperature dependence of the peak energy. From the Arrhenius plot of integrated PL intensity, we speculate that dislocations as well as thermal emission of carriers out of the quantum well are responsible for the PL quenching behavior. Also a second nonradiative channel with much lower activation energy was found, the origin of which we believe to be quenching of the bound excitons reprint
 
110.  Demonstration of 256x256 Focal Plane Arrays Based on Al-free GaInAs/InP QWIP
J. Jiang, K. Mi, R. McClintock, M. Razeghi, G.J. Brown, and C. Jelen
IEEE Photonics Technology Letters 15 (9)-- September 1, 2003
We report the first demonstration of an infrared focal plane array based on aluminum-free GaInAs-InP quantum-well infrared photodetectors (QWIPs).A unique positive lithography method was developed to perform indium-bump liftoff. The noise equivalent differential temperature (NEΔT) of 29 mK was achieved at 70 K with f/2 optics. reprint
 
111.  Comparison of ultraviolet light-emitting diodes with peak emission at 340 nm grown on GaN substrate and sapphire
A. Yasan, R. McClintock, K. Mayes, S.R. Darvish, H. Zhang, P. Kung, M. Razeghi, S.K. Lee and J.Y. Han
Applied Physics Letters, 81 (12)-- September 16, 2002
Based on AlInGaN/AlInGaN multiquantum wells, we compare properties of ultraviolet light-emitting diodes (LED) with peak emission at 340 nm grown on free-standing hydride vapor phase epitaxially grown GaN substrate and on sapphire. For the LED grown on GaN substrate, a differential resistance as low as 13 Ω and an output power of more than one order of magnitude higher than that of the same structure grown on sapphire are achieved. Due to higher thermal conductivity of GaN, output power of the LEDs saturates at higher injection currents compared to the devices grown on sapphire. reprint
 
112.  Top-emission ultraviolet light-emitting diodes with peak emission at 280 nm
A. Yasan, R. McClintock, K. Mayes, S.R. Darvish, P. Kung, and M. Razeghi
Virtual Journal of Nanoscale Science & Technology, 5-- August 5, 2002reprint
 
113.  Top-emission ultraviolet light-emitting diodes with peak emission at 280 nm
A. Yasan, R. McClintock, K. Mayes, S.R. Darvish, P. Kung, and M. Razeghi
Applied Physics Letters 81 (5)-- July 29, 2002
We demonstrate light emission at 280 nm from UV light-emitting diodes consisting of AlInGaN/AlInGaN multiple quantum wells. Turn-on voltage of the devices is ~5 V with a differential resistance of ~40 Ω. The peak emission wavelength redshifts ~1 nm at high injection currents. reprint
 
114.  Future of AlxGa1-xN Materials and Device Technology for Ultraviolet Photodetectors
P. Kung, A. Yasan, R. McClintock, S. Darvish, K. Mi, and M. Razeghi
SPIE Conference, San Jose, CA, Vol. 4650, pp. 199-- May 1, 2002
Design of the photodetector structure is one of the key issues in obtaining high performance devices; especially the thickness of the intrinsic region for p-i-n photodiodes is a crucial value and needs to be optimized. We compare the performance of the p-i-n photodiodes with different widths for the depletion region, which shows a trade-off between speed and responsivity of the devices. reprint
 
115.  Characteristics of high quality p-type AlxGa1-xN/GaN superlattices
A. Yasan, R. McClintock, S.R. Darvish, Z. Lin, K. Mi, P. Kung, and M. Razeghi
Applied Physics Letters 80 (12)-- March 18, 2002
Very-high-quality p-type AlxGa1–xN/GaN superlattices have been grown by low-pressure metalorganic vapor-phase epitaxy through optimization of Mg flow and the period of the superlattice. For the superlattice with x = 26%, the hole concentration reaches a high value of 4.2×1018 cm–3 with a resistivity as low as 0.19 Ω · cm by Hall measurement. Measurements confirm that superlattices with a larger period and higher Al composition have higher hole concentration and lower resistivity, as predicted by theory. reprint
 
116.  280 nm UV LEDs Grown on HVPE GaN Substrates
A. Yasan, R. McClintock, K. Mayes, S.R. Darvish, P. Kung, M. Razeghi, and R.J. Molnar
Opto-Electronics Review, 10 (4)-- January 1, 2002
We report on the enhancement of optical and electrical properties of 280 nm UV LEDs using low dislocation density HVPE-grown GaN substrate. Compared with the same structure grown on sapphire, these LEDs show ~30% reduction in current-voltage differential resistance, ~15% reduction in turn-on voltage, more than 200% increase in output power slope efficiency and saturation at higher currents. Lower density of defects due to higher material quality and better heat dissipation are believed to be the reason behind these improvements. reprint
 
117.  AlxGa1-xN Materials and Device Technology for Solar Blind Ultraviolet Photodetector Applications
R. McClintock, P. Sandvik, K. Mi, F. Shahedipour, A. Yasan, C. Jelen, P. Kung, and M. Razeghi
SPIE Conference, San Jose, CA, Vol. 4288, pp. 219-- January 22, 2001
There has been a growing interest for the development of solar blind ultraviolet (UV) photodetectors for use in a variety of applications, including early missile threat warning, flame monitoring, UV radiation monitoring and chemical/biological reagent detection. The AlxGa1-xN material system has emerged as the most promising approach for such devices. However, the control of the material quality and the device technology are still rather immature. We report here the metalorganic chemical vapor deposition, the n-type and the p-type doping of high quality AlxGa1-xN thin films on sapphire substrates over a wide range of Al concentration. reprint
 
118.  AlxGa1-xN for Solar-Blind UV Detectors
P. Sandvik, K. Mi, F. Shahedipour, R. McClintock, A. Yasan, P. Kung, and M. Razeghi
Journal of Crystal Growth 231 (2001)-- January 1, 2001
We report on the metalorganic chemical vapor deposition of high quality AlGaN thin films on sapphire substrates over a wide range of Al concentrations. The quality of these AlGaN materials was verified through a demonstration of high performance visible and solar-blind UV p–i–n photodiodes with peak cutoff wavelengths ranging from 227 to 364 nm. External quantum efficiencies for these devices reached as high as 69% with over five orders rejection ratio from the peak to visible wavelengths. reprint
 

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