Electron Beam Lithography
![Electron Beam Lithography](about/facilities/E-beam.jpg) Lica Lion-LV1 electron beam lithography system capable or producing features smaller than 30 nm. |
Laser Measurement Setup
![Laser Measurement Setup](about/facilities/Lasers_Bruker_FTIR.jpg) Bruker FRIR, laser drivers, thermostatic stage, and data acquisition equipment |
Photodetector Measurment Setup
![Photodetector Measurment Setup](about/facilities/Detector_Bruker_FTIR.jpg) Burker FTIR and Helium cryostat used to characterize Infrared materials and devices. |
Lapping & Polishing
![Lapping & Polishing](about/facilities/Lapping&Polishing.jpg) One of two Logitech lapping and polsihing systems used to mechanically thin laser diodes in preperatiion for cleaving, or to assist in back-thinning of hybridized focal plane arrays for higher performance. |
Laser Bonder
![Laser Bonder](about/facilities/Laser_Bonder(FC150).jpg) SET FC-150 high-precision die-bonder used to bond lasers with excellent placement accuracy and planarity. |
Atomic Force Microscope
![Atomic Force Microscope](about/facilities/afm.jpg) Digital Instruments, Nanoscope D3100 scanning probe microscope in a vibration isolation enclosure, configured for tapping more AFM. |
IR Photoluminescence
![IR Photoluminescence](about/facilities/irpl.jpg) Setup used to characterize IR material using an argon-ion laser, monochromator, lock-in amplifier, and various commercial IR detectors. |
Scanning Electron Microscope
![Scanning Electron Microscope](about/facilities/sem.jpg) Hitachi 4500 cold field emission SEM used in the characterization of epitaxial films and the processing of semiconductor devices. |
High-Resolution X-Ray Diffraction System
![High-Resolution X-Ray Diffraction System](about/facilities/xray.jpg) Philips HR-XRD with a 2 KW copper Kα source, 4-bounce germanium monochromator, precision goniometer, and scintillation detector. |
Chemistry Room
![Chemistry Room](about/facilities/chemistry.jpg) Class 1000 chemistry room with four hoods, mask aligner, and yellow lighting to support lithography and semiconductor device processing. |