The Center for Quantum Devices Facilities by    
Watch a 15-minute video tour of the CQD's facilites.

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ECR Etching System
ECR Etching System
PlasmaLabs Electron Cyclotron Resonance dry etching system used in the processing of semiconductor devices
 
PECVD System
PECVD System
Oxford Instrument Plasma Enhanced Chemical Vapor Deposition system used to deposit dielectrics such as silicon dioxide and silicon nitride used in the passivation of devices.
 
Thermal Evaporator
Thermal Evaporator
This is an extensively modified Veeco thermal evaporator that is used to deposit metals.
 
Electric Capacitance-Voltage Profiler
Electric Capacitance-Voltage Profiler
Accent Optical ECV-Pro Capacitance-Voltage profiling machine (also known as Polaron) used to charicterize the doping profile.
 
Hydrogen Generator
Hydrogen Generator
Electrolysis module used to dynamically generate all of the hydrogen used in the cleanroom facility.
 
UV Photoluminescence
UV Photoluminescence
Three UV lasers (193 nm Excimer, 244 nm Fred Argon-Ion, and 325 nm HeCd), monochromatoer, electronics, and computer system used to charicterize III-Nitride materials.
 
UV Device Charicterization
UV Device Charicterization
Probe-station and electronics used to characterize APDs, LEDs, and other uncooled III-Nitride devices.
 
Dicing System
Dicing System
This K&S 7100 semi-automatic dicing system is used in the partition of wafers into smaller die.
 
Life testing System
Life testing System
Life testing system allows for extended logging and testing of lasers and LEDs at controlled currents, voltages, or output powers, at a constant temperature.
 
Scribing Machine
Scribing Machine
Lomis scribe and break machine used to cleave wafers.
 
Camera System
Camera System
Electronics head and LN2 Dewar of the SE-IR camera system used to operate FPAs and perform array characterization.
 
EDX
EDX
Hitachi S4500 Cold field emission scanning electron microscope (SEM) with an Oxford EDX detector for elemental analysis.
 
SE-IR Camera System
SE-IR Camera System
New SE-IR camera system used to operate large format and two-color FPAs with lower noise and higher frame rates.
 
Wire Bonder
Wire Bonder
SUSS wire bonder used to perform gold wedge and ball bonding in order to make electrical contact to discreet devices.
 
MOCVD Reactor
MOCVD Reactor
This is the MOCVD reactor developed by Professor Razerghi at Thompson and brought with her to northwestern.
 
Toxic Gas Detection System
Toxic Gas Detection System
This is the MDA toxic gas detection system that helps ensure the safety of the labs and surrounding area.
 
SEC Die Bonder
SEC Die Bonder
Die Bonder used to fabricate laser diodes and back emission LEDs.
 
Dielectric Evaporator
Dielectric Evaporator
CHA E-Beam Evaporator designed to evaporate various dielectrics. Has built in optical monitor to assist in fabrication of mirror and AR coatings.
 
FPA Hybridization Bonder
FPA Hybridization Bonder
SET FC-150 high precision high force bonder used to hybridize focal plane arrays.
 
High-Resistance Hall Mesurment System
High-Resistance Hall Mesurment System
Custom high-resistance Hall measurement system based on electronics from Keithely, and a magnet from BioRad.
 
Ion-Beam deposition system
Ion-Beam deposition system
Dual-beam ion-beam deposition system used to deposit high quality dielectric films at low temperatures.
 
Bulk Storage LN2 tank
Bulk Storage LN2 tank
Bulk liquid nitrogen (LN2) storage tank used to supply LN2 for the MBE reactors, cryostats, and various other needs.
 
THz Optical Setup
THz Optical Setup
Black body source, Liquid helium cryostat, optical mounts, optics, and beam purge tubes to allow for measurement of terahertz (THz) devices.
 
Machinging
Machinging
various mechanical support equipment to allow for rapid prototyping and repair. Includes: Drill press, grinder, Sherline CNC mill and lathe, and metal cutting band-saw.
 
Mask Aligner
Mask Aligner
Karl Suss MA-6 high precision mask aligner used to perform photolithography.
 

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