ECR Etching System
PlasmaLabs Electron Cyclotron Resonance dry etching system used in the processing of semiconductor devices |
PECVD System
Oxford Instrument Plasma Enhanced Chemical Vapor Deposition system used to deposit dielectrics such as silicon dioxide and silicon nitride used in the passivation of devices. |
Thermal Evaporator
This is an extensively modified Veeco thermal evaporator that is used to deposit metals. |
Electric Capacitance-Voltage Profiler
Accent Optical ECV-Pro Capacitance-Voltage profiling machine (also known as Polaron) used to charicterize the doping profile. |
Hydrogen Generator
Electrolysis module used to dynamically generate all of the hydrogen used in the cleanroom facility. |
UV Photoluminescence
Three UV lasers (193 nm Excimer, 244 nm Fred Argon-Ion, and 325 nm HeCd), monochromatoer, electronics, and computer system used to charicterize III-Nitride materials. |
UV Device Charicterization
Probe-station and electronics used to characterize APDs, LEDs, and other uncooled III-Nitride devices. |
Dicing System
This K&S 7100 semi-automatic dicing system is used in the partition of wafers into smaller die. |
Life testing System
Life testing system allows for extended logging and testing of lasers and LEDs at controlled currents, voltages, or output powers, at a constant temperature. |
Scribing Machine
Lomis scribe and break machine used to cleave wafers. |
Camera System
Electronics head and LN2 Dewar of the SE-IR camera system used to operate FPAs and perform array characterization. |
EDX
Hitachi S4500 Cold field emission scanning electron microscope (SEM) with an Oxford EDX detector for elemental analysis. |
SE-IR Camera System
New SE-IR camera system used to operate large format and two-color FPAs with lower noise and higher frame rates. |
Wire Bonder
SUSS wire bonder used to perform gold wedge and ball bonding in order to make electrical contact to discreet devices. |
MOCVD Reactor
This is the MOCVD reactor developed by Professor Razerghi at Thompson and brought with her to northwestern. |
Toxic Gas Detection System
This is the MDA toxic gas detection system that helps ensure the safety of the labs and surrounding area. |
SEC Die Bonder
Die Bonder used to fabricate laser diodes and back emission LEDs. |
Dielectric Evaporator
CHA E-Beam Evaporator designed to evaporate various dielectrics. Has built in optical monitor to assist in fabrication of mirror and AR coatings. |
FPA Hybridization Bonder
SET FC-150 high precision high force bonder used to hybridize focal plane arrays. |
High-Resistance Hall Mesurment System
Custom high-resistance Hall measurement system based on electronics from Keithely, and a magnet from BioRad. |
Ion-Beam deposition system
Dual-beam ion-beam deposition system used to deposit high quality dielectric films at low temperatures. |
Bulk Storage LN2 tank
Bulk liquid nitrogen (LN2) storage tank used to supply LN2 for the MBE reactors, cryostats, and various other needs. |
THz Optical Setup
Black body source, Liquid helium cryostat, optical mounts, optics, and beam purge tubes to allow for measurement of terahertz (THz) devices. |
Machinging
various mechanical support equipment to allow for rapid prototyping and repair. Includes: Drill press, grinder, Sherline CNC mill and lathe, and metal cutting band-saw. |
Mask Aligner
Karl Suss MA-6 high precision mask aligner used to perform photolithography. |