| About the CQD | | News | | Conferences | | Publications | | Books | | Research | | People | | History | | Patents | | Contact | Channel | |
Page 11 of 23: Prev << 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 >> Next (551 Items)
| 2. | High Power Quantum Cascade Lasers (QCLs) Grown by GasMBE M. Razeghi and S. Slivken SPIE Proceedings, International Conference on Solid State Crystals (ICSSC), Zakopane, Poland, -- October 14, 2002 ...[Visit Journal] This paper is a brief summary of the technological development and state-of-the-art performance of quantum cascade lasers produced at the Centre for Quantum Devices. Laser design will be discussed, as well as experimental details of device fabrication. Recent work has focused on the development of high peak and average power QCLs emitting at room temperature and above. Scaling of the output is demonstrated by increasing the number of emitting regions in the waveguide core. At λ = 9 µm, over 7 W of peak power has been demonstrated at room temperature for a single diode, with an average power of 300 mW at 6% duty cycle. At shorter wavelengths, laser development includes the use of highly strain-balanced heterostructures in order to maintain a high conduction band offset and minimize leakage current. At λ = 6 µm, utilizing a high reflective coating and epilayer-down mounting of the laser, we have demonstrated 225 mW of average power from a single facet at room temperature. Lastly, these results are put in perspective of other reported results and possible future directions are discussed.
[reprint (PDF)] |
| 2. | GalnAs AND GaInAsP MATERIALS GROWN BY LOW PRESSURE MOCVD FOR MICROWAVE AND OPTOELECTRONIC APPLICATIONS J.P. Duchemin, J.P. Hirtz, M. Razeghi, M. Bonnet , S.D. Hersee J.P. Duchemin, J.P. Hirtz, M. Razeghi, GaInAs and GaInAsP materials grown by low pressure MOCVD for microwave and optoelectronic applications, Journal of Crystal Growth, 55, 1, 1981, Pages 64-73,-- August 1, 1981 ...[Visit Journal] The low pressure MOCVD technique has been successfully used to grow GaInAsP, lattice-matched to InP, for the complete compositional range between InP (λ=0.91 μm) and the ternary compound Ga0.47In0.53As (λ=1.67 μm). By contrast to LPE growth it has been found that during the MOCVD growth of double heterostructures InP can be grown directly onto the ternary or quaternary with no disturbance of the active layer, i.e. there is no effect equivalent to “melt back”. The compositional grading on both sides of the active layer was measured by scanning Auger spectroscopy on bevelled samples. It was found that the graded regions were typically less than 100 Å wide for GaInAsP active layers and less than 50 Å wide for GaInAs active layers. Single layers of undoped GaInAs exhibited a typical mobility of 6700 cm2 V-1s-1 at 1.5×1017 cm-3. The compositional uniformity of the ternary layers was characterised by measurement of the photoluminescence wavelength at various points on a large sample. The wavelength varied by <3 nm over 95% of the area, which was approximately 8 cm2. Our early MOCVD grown GaInAsP/InP DH lasers exhibited high thresholds due to a poor interface between the p-InP and the active layer. However, recently fabricated broad area lasers emitting at 1.27 μm show an average threshold current density of 1.5 kA cm-2 with a T0 of between 70 to 80 K. Stripe geometry lasers have being fabricated from this material and CW operation has been obtained.
[reprint (PDF)] |
| 2. | Growth and characterization of InGaAs/InGaP quantum dots for mid-infrared photoconductive detector S. Kim, H. Mohseni, M. Erdtmann, E. Michel, C. Jelen and M. Razeghi Applied Physics Letters 73 (7)-- August 17, 1998 ...[Visit Journal] We report InGaAs quantum dot intersubband infrared photodetectors grown by low-pressure metalorganic chemical vapor deposition on semi-insulating GaAs substrates. The optimum growth conditions were studied to obtain uniform InGaAs quantum dots constructed in an InGaP matrix. Normal incidence photoconductivity was observed at a peak wavelength of 5.5 μm with a high responsivity of 130 mA/W and a detectivity of 4.74×107 cm· Hz½/W at 77 K. [reprint (PDF)] |
| 2. | Comparison of the Physical Properties of GaN Thin Films Deposited on (0112) and (0001) Sapphire Substrates C.J. Sun and M. Razeghi Applied Physics Letters 63 (7)-- August 16, 1993 ...[Visit Journal] A direct comparison of the physical properties of GaN thin films is made as a function of the choice of substrate orientations. Gallium nitride single crystals were grown on (0001) and (0112) sapphire substrates by metalorganic chemical vapor deposition. Better crystallinity with fine ridgelike facets is obtained on the (0112) sapphire. Also lower carrier concentration and higher mobilities indicate both lower nitrogen vacancies and less oxygen incorporation on the (0112) sapphire. The results of this study show better physical properties of GaN thin films achieved on (0112) sapphire. [reprint (PDF)] |
| 2. | Pressure-induced depopulation of the first excited subband in GaInAs/InP heterojunctions D Gauthier, J C Portal and M Razeghi D Gauthier et al 1989 Semicond. Sci. Technol. 4 218-- December 8, 1988 ...[Visit Journal] Following our previous work on (GalnAs)/(lnP) heterojunctions under
hydrostatic pressure we present recent experimental results where the evidence
for the total depopulation of the first excited electric subband with pressure is
demonstrated. The total electron concentration decreases at a rate of
2.7% kbar”, much higher than in previous experiments. The experimental
situation can be fitted with the triangular-well approximation if we both assume
the change with pressure of the conduction band discontinuity AE, and the
deepening of a deep impurity level with activation energy of the order 160 meV
at zero pressure.
[reprint (PDF)] |
| 2. | Hybrid green LEDs based on n-ZnO/(InGaN/GaN) multi-quantum-wells/p-GaN C. Bayram, F. Hosseini Teherani, D.J. Rogers and M. Razeghi SPIE Proceedings, San Jose, CA Volume 7217-0P-- January 26, 2009 ...[Visit Journal] Hybrid green light-emitting diodes (LEDs) comprised of n-ZnO/(InGaN/GaN) multi-quantum-wells/p-GaN were grown on semi-insulating AlN/sapphire using pulsed laser deposition for the n-ZnO and metal organic chemical vapor deposition for the other layers. X-ray diffraction revealed that high crystallographic quality was preserved after the n- ZnO growth. LEDs showed a turn-on voltage of 2.5 V and a room temperature electroluminescence (EL) centered at 510 nm. A blueshift and narrowing of the EL peak with increasing current was attributed to bandgap renormalization. The results indicate that hybrid LED structures could hold the prospect for the development of green LEDs with superior performance. [reprint (PDF)] |
| 2. | Demonstration of a 256x256 Middle-Wavelength Infrared Focal Plane Array based on InGaAs/InGaP Quantum Dot Infrared Photodetectors (QDIPs) J. Jiang, K. Mi, S. Tsao, W. Zhang, H. Lim, T.O'Sullivan, T. Sills, M. Razeghi, G.J. Brown, and M.Z. Tidrow Virtual Journal of Nanoscale Science and Technology 9 (13)-- April 5, 2004 ...[Visit Journal][reprint (PDF)] |
| 2. | Relaxation kinetics in quantum cascade laser S. Slivken, V. Litvinov, M. Razeghi, and J.R. Meyer Journal of Applied Physics 85 (2)-- January 15, 1999 ...[Visit Journal] Relaxation kinetics in a quantum cascade intersubband laser are investigated. Distribution functions and gain spectra of a three-subband double-quantum-well active region are obtained as a function of temperature and injection current. The potentially important role of the nonequilibrium phonons at lasing threshold is shown and discussed in details. It is shown that the threshold current is strongly dependent of the power dissipated in the active region in steady state. The numerical calculations for an 8.5 μm laser illustrate the general issues of relaxation kinetics in quantum cascade lasers. Temperature dependence of the threshold current is obtained in a good agreement with the experiments. [reprint (PDF)] |
| 2. | Monolithic integration of a short‐length GaInAs photoconductor with a GaAs/GaAlAs optical waveguide on a GaAs semi‐insulating substrate F. Mallecot; J. F. Vinchant; M. Razeghi; D. Vandermoere; J. P. Vilcot; D. Decoster Appl. Phys. Lett. 53, 2522–2524 (1988)-- December 19, 1988 ...[Visit Journal] We report the first fabrication of a GaO.
47 Inn.
53 As planar photoconductive detector, associated
with a GaAs/GaAIAs rib waveguide grown on a semi-insulating GaAs substrate, which needs
a short-length absorbing layer to detect the optical signal. Because of the GaAIAs epilayer, a
GalnAs length of about 100 tl1n only is needed to detect 90% of the opticai signal, accordingly
to results predicted using a four-layer model with complex refractive indices in each layer. [reprint (PDF)] |
| 2. | Bias-selectable three-color short-, extended-short-, and mid-wavelength infrared photodetectors based on type-II InAs/GaSb/AlSb superlattices Abbas Haddadi, and Manijeh Razeghi Optics Letters Vol. 42, Iss. 21, pp. 4275-4278-- October 16, 2017 ...[Visit Journal] A bias-selectable, high operating temperature, three-color short-, extended-short-, and mid-wavelength infrared photodetector based on InAs/GaSb/AlSb type-II superlattices on GaSb substrate has been demonstrated. The short-, extended-short-, and mid-wavelength channels’ 50% cutoff wavelengths were 2.3, 2.9, and 4.4μm, respectively, at 150K. The mid-wavelength channel exhibited a saturated quantum efficiency of 34% at 4μm under +200 mV bias voltage in a front-side illumination configuration and without any antireflection coating. At 200mV, the device exhibited a dark current density of 8.7×10−5 A/cm2 providing a specific detectivity of ∼2×1011 cm·Hz1/2/W at 150K. The short-wavelength channel achieved a saturated quantum efficiency of 20% at 1.8μm. At −10 mV, the device’s dark current density was 5.5×10−8 A/cm2. At zero bias, its specific detectivity was 1×1011 cm·Hz1/2/W at 150K. The extended short-wavelength channel achieved a saturated quantum efficiency of 22% at 2.75 μm. Under −2 V bias voltage, the device exhibited a dark current density of 1.8×10−6 A/cm2 providing a specific detectivity of 6.3×1011 cm·Hz1/2/W at 150K. [reprint (PDF)] |
| 2. | Self-assembled semiconductor quantum dot infrared photodetector operating at room temperature and focal plane array Ho-Chul Lim; Stanley Tsao; Wei Zhang; Manijen Razeghi Proc. SPIE 6542, Infrared Technology and Applications XXXIII, 65420R (May 14, 2007)-- May 14, 2007 ...[Visit Journal] Self-assembled semiconductor quantum dots have attracted much attention because of their novel properties and thus possible practical applications including the lasers, detectors and modulators. Especially the photodetectors which have quantum dots in their active region have been developed and show promising performances such as high operation temperature due to three dimensional confinement of the carriers and normal incidence in contrast to the case of quantum well detectors which require special optical coupling schemes. Here we report our recent results for mid-wavelength infrared quantum dot infrared photodetector grown by low-pressure metalorganic chemical vapor deposition. The material system we have investigated consists of 25 period self-assembled InAs quantum dot layers on InAlAs barriers, which are lattice-matched to InP substrates, covered with InGaAs quantum well layers and InAlAs barriers. This active region was sandwiched by highly doped InP contact layers. The device operates at 4.1 μm with a peak detectivity of 2.8×1011 cm·Hz1/2/W at 120 K and a quantum efficiency of 35 %. The photoresponse can be observed even at room temperature resulting in a peak detectivity of 6×107 cm·Hz1/2/W. A 320×256 focal plane array has been fabricated in this kind of device. Its performance will also be discussed here. [reprint (PDF)] |
| 2. | New frontiers in InP based quantum devices Manijeh Razeghi Indium Phosphide and Related Materials, 2008. IPRM 2008. 20th International Conference on, pp.1,4, (2008)-- May 29, 2008 ...[Visit Journal] Recent research activities taking place at center for quantum devices (CQD) based on InP material system, especially the exploration and demonstration of the state-of-art high performance quantum cascade lasers (QCL), greatly facilitate the understanding of the underlining physical principles governing the device operation. Thanks to the endless effort putting into the semiconductor epitaxy technologies, including the Molecular Beam Epitaxy (MBE) and low pressure metal organic chemical vapor deposition (LP-MOCVD), the world has seen a close approaching to the ultimate band gap engineering. Highly sophisticated man-made heterostructure, which incorporates hundreds of alternating layers of GaInAs/AlInAs with each layer thickness and composition specifically designed, can be created within a single growth. The material quality is evidenced by the atomically abrupt interfaces. The versatility of the band gap engineering is greatly enhanced by the strain-balanced technique, which allows for growing structures with continuously tunable conduction band offset with little defects. As a result, the room temperature continuous wave (CW) wall plug efficiency (WPE) and the maximum achievable output optical power from a single device have been constantly improving. Novel waveguide incorporating the photonic crystal distributed feedback (PCDFB) mechanism is also investigated with satisfactory preliminary results. [reprint (PDF)] |
| 2. | Quantum Sensing Using Type-II InAs/GaSb Superlattice for Infrared Detection M. Razeghi, A. Gin, Y. Wei, J. Bae, and J. Nah Microelectronics Journal, 34 (5-8)-- May 1, 2003 ...[Visit Journal] Large, regular arrays of bulk GaSb and InAs/GaSb Type-II superlattice pillars have been fabricated by electron beam lithography and dry etching. A 2.5 keV electron beam lithography system and metal evaporation are used to form the Au mask on superlattice and bulk substrates. Dry etching of these materials has been developed with BCl3:Ar, CH4:H2:Ar and cyclic CH4:H2:Ar/O2 plasmas. Etch temperatures were varied from 20 to 150 °C. The diameter of the superlattice pillars was below 50 nm with regular 200 nm spacing. Bulk GaSb pillars were etched with diameters below 20 nm. Areas of dense nanopillars as large as 500 μm×500 μm were fabricated. The best height/diameter aspect ratio was approximately 10:1. To date, these are the smallest diameter III–V superlattice pillar structures reported, and the first nanopillars in the InAs/GaSb material system. The basic theory of these devices and surface passivation with SiO2 and Si3N4 thin films has also been discussed. [reprint (PDF)] |
| 2. | First cw operation of a Ga0.25In0.75As0.5P0.5‐InP laser on a silicon substrate M. Razeghi; M. Defour; R. Blondeau; F. Omnes; P. Maurel; O. Acher; F. Brillouet; J. C. C‐Fan; J. Salerno Appl. Phys. Lett. 53, 2389–2390 (1988) -- December 12, 1988 ...[Visit Journal] We report the first successful room-temperature cw operations of a GaO.
25 1110.75 ASo.
5 po.
s -InP
buried ridge structure laser emitting at 1.3 f-tm grown by two-step low-pressure metalorganic
chemical vapor deposition on a silicon substrate. An output power of 20 m W with an external
quantum efficiency of 16% at room temperature has been obtained. A threshold current as low
as 45 rnA under cw operation at room temperature has been measured. The first cw aging test
at room temperature, at 2 mW during 5 h, shows a very low degradation (Ill 11,;;5%).
[reprint (PDF)] |
| 2. | InAs/InAs1-xSbx type-II superlattices for high performance long wavelength infrared detection M. Razeghi, A. Haddadi, A. M. Hoang, R. Chevallier, S. Adhikary, A. Dehzangi Proc. SPIE 9819, Infrared Technology and Applications XLII, 981909-- May 20, 2016 ...[Visit Journal] We report InAs/InAs1-xSbx type-II superlattice base photodetector as high performance long-wavelength infrared nBn device grown on GaSb substrate. The device has 6 μm-thick absorption region, and shows optical performance with a peak responsivity of 4.47 A/W at 7.9 μm, which is corresponding to the quantum efficiency of 54% at a bias voltage of negative 90 mV, where no anti-reflection coating was used for front-side illumination. At 77K, the photodetector’s 50% cut-off wavelength was ~10 μm. The device shows the detectivity of 2.8x1011 cm•Hz½/W at 77 K, where RxA and dark current density were 119 Ω•cm² and 4.4x10-4 A/cm² , respectively, under -90 mV applied bias voltage [reprint (PDF)] |
| 2. | Demonstration of negative differential resistance in GaN/AlN resonant tunneling didoes at room temperature Z. Vashaei, C. Bayram and M. Razeghi Journal of Applied Physics, Vol. 107, No. 8, p. 083505-- April 15, 2010 ...[Visit Journal] GaN/AlN resonant tunneling diodes (RTD) were grown by metal-organic chemical vapor deposition (MOCVD) and negative differential resistance with peak-to-valley ratios as high as 2.15 at room temperature was demonstrated. Effect of material quality on RTDs’ performance was investigated by growing RTD structures on AlN, GaN, and lateral epitaxial overgrowth GaN templates. Our results reveal that negative differential resistance characteristics of RTDs are very sensitive to material quality (such as surface roughness) and MOCVD is a suitable technique for III-nitride-based quantum devices. [reprint (PDF)] |
| 2. | A Crystallographic Model of (00*1) Aluminum Nitride Epitaxial Thin Film Growth on (00*1) Sapphire Substrate C.J. Sun, P. Kung, A. Saxler, H. Ohsato, M. Razeghi, and K. Haritos Journal of Applied Physics 75 (8)-- April 15, 1994 ...[Visit Journal] A direct comparison of the physical properties of GaN thin films is made as a function of the choice of substrate orientations. Gallium nitride single crystals were grown on (0001) and (011-bar 2) sapphire substrates by metalorganic chemical vapor deposition. Better crystallinity with fine ridgelike facets is obtained on the (011-bar 2) sapphire. Also lower carrier concentration and higher mobilities indicate both lower nitrogen vacancies and less oxygen incorporation on the (011-bar 2) sapphire. The results of this study show better physical properties of GaN thin films achieved on (011-bar 2) sapphire. [reprint (PDF)] |
| 2. | Fabrication of 12 µm pixel-pitch 1280 × 1024 extended short wavelength infrared focal plane array using heterojunction type-II superlattice-based photodetector Arash Dehzangi , Abbas Haddadi, Romain Chevallier, Yiyun Zhang and Manijeh Razegh Semicond. Sci. Technol. 34, 03LT01-- February 4, 2019 ...[Visit Journal] We present an initial demonstration of a 1280 × 1024 extended short-wavelength infrared focal plane array (FPA) imager with 12μm pixel-pitch based on type–II InAs/AlSb/GaSb superlattice heterojunction photodetectors, with a novel bandstructure-engineered photo-generated carrier extractor as the window layer in the hetero structure to efficiently extract the photo-generated carriers. This heterostructure with a larger bandgap top window/contact layer leads to the device having lower dark current density compared to conventional pn junction devices. The large format FPA was fabricated with 12 μm pixel-pitch using a developed fabrication process. Test pixels fabricated separately exhibit 100% cut–off wavelengths of ∼2.22, ∼2.34μm, and ∼2.45μm at 150, 200K, and 300K. The test devices achieve saturated quantum efficiency values under zero bias of 54.3% and 68.4% at 150 and 300K, under back-side illumination and without any anti-reflection coating. At 150K, these photodetectors exhibit dark current density of 1.63 × 10−7 A·cm−2 under −20mV applied bias providing a specific detectivity of 1.01 × 1011 cm ·Hz½/W at 1.9μm. [reprint (PDF)] |
| 2. | Extended short-wavelength infrared nBn photodetectors based on type-II InAs/AlSb/GaSb superlattices with an AlAsSb/GaSb superlattice barrier A. Haddadi, R. Chevallier, A. Dehzangi, and M. Razeghi Applied Physics Letters 110, 101104-- March 8, 2017 ...[Visit Journal] Extended short-wavelength infrared nBn photodetectors based on type-II InAs/AlSb/GaSb superlattices on GaSb substrate have been demonstrated. An AlAsSb/GaSb H-structure superlattice design was used as the large-bandgap electron-barrier in these photodetectors. The photodetector is designed to have a 100% cut-off wavelength of ∼2.8 μm at 300 K. The photodetector exhibited a room-temperature (300 K) peak responsivity of 0.65 A/W at 1.9 μm, corresponding to a quantum efficiency of 41% at zero bias under front-side illumination, without any anti-reflection coating. With an R × A of 78 Ω·cm² and a dark current density of 8 × 10−3 A/cm² under −400 mV applied bias at 300 K, the nBn photodetector exhibited a specific detectivity of 1.51 × 1010 Jones. At 150 K, the photodetector exhibited a dark current density of 9.5 × 10−9 A/cm² and a quantum efficiency of 50%, resulting in a detectivity of 1.12 × 1013 Jones. [reprint (PDF)] |
| 2. | Cubic Phase GaN on Nano-grooved Si (100) via Maskless Selective Area Epitaxy Bayram, C., Ott, J. A., Shiu, K.-T., Cheng, C.-W., Zhu, Y., Kim, J., Razeghi, M. and Sadana, D. K. Adv. Funct. Mater. 2014-- April 1, 2014 ...[Visit Journal] A method of forming cubic phase (zinc blende) GaN (referred as c-GaN) on a CMOS-compatible on-axis Si (100) substrate is reported. Conventional GaN materials are hexagonal phase (wurtzite) (referred as h-GaN) and possess very high polarization fields (∼MV/cm) along the common growth direction of <0001>. Such large polarization fields lead to undesired shifts (e.g., wavelength and current) in the performance of photonic and vertical transport electronic devices. The cubic phase of GaN materials is polarization-free along the common growth direction of <001>, however, this phase is thermodynamically unstable, requiring low-temperature deposition conditions and unconventional substrates (e.g., GaAs). Here, novel nano-groove patterning and maskless selective area epitaxy processes are employed to integrate thermodynamically stable, stress-free, and low-defectivity c-GaN on CMOS-compatible on-axis Si. These results suggest that epitaxial growth conditions and nano-groove pattern parameters are critical to obtain such high quality c-GaN. InGaN/GaN multi-quantum-well structures grown on c-GaN/Si (100) show strong room temperature luminescence in the visible spectrum, promising visible emitter applications for this technology. [reprint (PDF)] |
| 2. | Long Wavelength Type-II Photodiodes Operating at Room Temperature H. Mohseni and M. Razeghi IEEE Photonics Technology Letters 13 (5)-- May 1, 2001 ...[Visit Journal] The operation of uncooled InAs-GaSb superlattice photodiodes with a cutoff wavelength of λc=8 μm and a peak detectivity of 1.2 × 108 cm·Hz½/W at zero bias is demonstrated. The detectivity is similar to the best uncooled HgCdTe detectors and microbolometers. However, the R0A product is more than two orders of magnitude higher than HgCdTe and the device is more than four orders of magnitude faster than microbolometers. These features combined with their low 1/f noise and high uniformity make these type-II photodiodes an excellent choice for uncooled high-speed IR imaging arrays [reprint (PDF)] |
| 2. | Photoluminescence study of InAsSb/InAsSbP heterostructures grown by low-pressure metalorganic chemical vapor deposition S. Kim, M. Erdtmann, D. Wu, E. Kaas, H. Yi, J. Diaz, and M. Razeghi Applied Physics Letters 69 (11)-- September 9, 1996 ...[Visit Journal] Photoluminescence has been measured for double‐ and separate‐confinement InAsSb/InAsSbP heterostructures grown by low‐pressure metalorganic vapor deposition. A measurement of the integrated luminescence intensity at the temperature range of 77–300 K shows that over a wide range of excitation level (1–5×10² W/cm²) the radiative transitions are the dominant. mechanism below T∼170 K. Auger recombination coefficient C=C0 exp(−Ea/kT) with C0≊5×10−27 cm6/s and Ea≊40 meV has been estimated. [reprint (PDF)] |
| 2. | An accurate method to check chemical interfaces of epitaxial III‐V compounds R. Bisaro; G. Laurencin; A. Friederich; M. Razeghi R. Bisaro, G. Laurencin, A. Friederich, M. Razeghi; An accurate method to check chemical interfaces of epitaxial III‐V compounds. Appl. Phys. Lett. 1 June 1982; 40 (11): 978–980.-- June 1, 1982 ...[Visit Journal] We have developed a method of chemical beveling coupled with line scan Auger measurements to check abrupt interfaces of epitaxial III‐V compounds. Interface widths between 53 and 89 Å have been measured by this method for an InP/Ga0.47In0.53As/InP double heterostructure grown by low pressure metalorganic chemical vapor deposition. The ultimate width checkable by this method lies between 10 and 15 Å and is of the order of magnitude of the escape depth of the Auger electrons selected. |
| 2. | Polarity inversion of Type-II InAs/GaSb superlattice photodiodes B.M. Nguyen, D. Hoffman, P.Y. Delaunay, M. Razeghi and V. Nathan Applied Physics Letters, Vol. 91, No. 10, p. 103503-1-- September 3, 2007 ...[Visit Journal] The authors demonstrated the realization of p-on-n Type-II InAs/GaSb superlattice photodiodes. Growth condition for high quality InAsSb layer lattice matched to GaSb was established for the use of an effective n-contact layer. By studying the effect of various GaSb capping layer thicknesses on the optical and electrical performances, an optimized thickness of 160 nm was determined. In comparison to as grown n-on-p superlattice photodiodes, this inverted design of p on n has shown similar quality. Finally, by analyzing Fabry-Perot interference fringes in the front side illuminated spectral measurement, the refractive index of the superlattice was determined to be approximately 3.8. [reprint (PDF)] |
| 2. | Growth and characterization of InAs/GaSb photoconductors for long wavelength infrared range H. Mohseni, E. Michel, J. Sandven, M. Razeghi, W. Mitchel, and G. Brown Applied Physics Letters 71 (10)-- September 8, 1997 ...[Visit Journal] In this letter we report the molecular beam epitaxial growth and characterization of InAs/GaSb superlattices grown on semi-insulating GaAs substrates for long wavelength infrared detectors. Photoconductive detectors fabricated from the superlattices showed photoresponse up to 12 µm and peak responsivity of 5.5 V/W with Johnson noise limited detectivity of 1.33 × 109 cm·Hz½/W at 10.3 µm at 78 K. [reprint (PDF)] |
Page 11 of 23: Prev << 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 >> Next (551 Items)
|