Center for Quantum Devices - Most Downloaded Journal Articles

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20.	High power, low divergent, substrate emitting quantum cascade ring laser in continuous wave operation D. H. Wu and M. Razeghi APL Materials 5, 035505-- March 21, 2017 ...[Visit Journal] We demonstrate a surface grating coupled substrate emitting quantum cascade ring laser with high power room temperature continuous wave operation at 4.64 μm μm . A second order surface metal/semiconductor distributed-feedback grating is used for in-plane feedback and vertical out-coupling. A device with 400 μm μm radius ring cavity exhibits an output power of 202 mW in room temperature continuous wave operation. Single mode operation with a side mode suppression ratio of 25 dB is obtained along with a good linear tuning with temperature. The far field measurement exhibits a low divergent concentric ring beam pattern with a lobe separation of ∼0.34°, which indicates that the device operates in fundamental mode (n = 1). [reprint (PDF)]
20.	High Detectivity InGaAs/InGaP Quantum-Dot Infrared Photodetectors Grown by Low Pressure Metalorganic Chemical Vapor Deposition J. Jiang, S. Tsao, T. O'Sullivan, W. Zhang, H. Lim, T. Sills, K. Mi, M. Razeghi, G.J. Brown, and M.Z. Tidrow Virtual Journal of Nanoscale Science and Technology 9 (12)-- March 29, 2004 ...[Visit Journal][reprint (PDF)]
20.	High‐purity GaAs layers grown by low‐pressure metalorganic chemical vapor deposition M. Razeghi; F. Omnes; J. Nagle; M. Defour; O. Acher; P. Bove Appl. Phys. Lett. 55, 1677–1679 (1989)-- October 16, 1989 ...[Visit Journal] We report electrical and optical properties of very high purity GaAs epilayers grown by low‐pressure metalorganic chemical vapor deposition using AsH3 and triethylgallium as As and Ga sources. An electron mobility of 335 000 cm2/V s at 38 K has been measured for a 12‐μ‐thick layer. [reprint (PDF)]
20.	The effect of doping the M-barrier in very long-wave type-II InAs/GaSb heterodiodes D. Hoffman, B.M. Nguyen, E.K. Huang, P.Y. Delaunay, M. Razeghi, M.Z. Tidrow and J. Pellegrino Applied Physics Letters, Vol. 93, No. 3, p. 031107-1-- July 21, 2008 ...[Visit Journal] A variation on the standard homo-diode Type-II superlattice with an M-barrier between the pi-region and the n-region is shown to suppress the dark currents. By determining the optimal doping level of the M-superlattice, dark current densities of 4.95 mA·cm^-2 and quantum efficiencies in excess of 20% have been demonstrated at the moderate reverse bias of 50 mV; allowing for near background-limited performance with a Johnson-noise detectivity of 3.11×10¹⁰ Jones at 77 K for a 14.58 µm cutoff wavelength for large area diodes without passivation. This is comparable to values for the state-of-the-art HgCdTe photodiodes. [reprint (PDF)]
20.	Amorphous ZnO films grown by room temperature pulsed laser deposition on paper and mylar for transparent electronics applications D.J. Rogers, V.E. Sandana, F. Hosseini Teherani, R. McClintock, M. Razeghi, and H.J. Drouhin SPIE Proceedings, San Francisco, CA (January 22-27, 2011), Vol. 7940, p. 79401K-- January 24, 2011 ...[Visit Journal] Recently, there has been a surge of activity in the development of next-generation transparent thin film transistors for use in applications such as electronic paper and flexible organic light emitting diode panels. Amongst the transparent conducting oxides attracting the most interest at present are Amorphous Oxide Semiconductors (AOS) based on ZnO because they exhibit enhanced electron mobility (μ), superior capacity for processability in air and improved thermodynamic stability compared with conventional covalent amorphous semiconductors and existing AOS. Moreover, they give excellent performance when fabricated at relatively low temperature and can readily be made in large area format. Thus, they are projected to resolve the trade-off between processing temperature and device performance and thereby allow fabrication on inexpensive heatsensitive substrates. For the moment, however, an undesireable post-deposition annealing step at a temperature of about 200ºC is necessary in order to obtain suitable electrical and optical properties. This paper demonstrates the possibility of directly engineering amorphous ZnO with relatively high conductiviy at room temperature on paper and mylar substrates using pulsed laser deposition. [reprint (PDF)]
20.	III-Nitride avalanche photodiodes R. McClintock, J.L. Pau, C. Bayram, B. Fain, P. Giedratis, M. Razeghi and M. Ulmer SPIE Proceedings, San Jose, CA Volume 7222-0U-- January 26, 2009 ...[Visit Journal] Research into avalanche photodiodes (APDs) is motivated by the need for high sensitivity ultraviolet (UV) detectors in numerous civilian and military applications. By designing photodetectors to utilize low-noise impact ionization based gain, GaN APDs operating in Geiger mode can deliver gains exceeding 1×10⁷. Thus with careful design, it becomes possible to count photons at the single photon level. In this paper we review the current state of the art in III-Nitride visible-blind APDs, and present our latest results regarding linear and Geiger mode III-Nitride based APDs. This includes novel device designs such as separate absorption and multiplication APDs (SAM-APDs). We also discuss control of the material quality and the critical issue of p-type doping - demonstrating a novel delta-doping technique for improved material quality and enhanced electric field confinement. The spectral response and Geiger-mode photon counting performance of these devices are then analyzed under low photon fluxes, with single photon detection capabilities being demonstrated. Other major technical issues associated with the realization of high-quality visible-blind Geiger mode APDs are also discussed in detail and future prospects for improving upon the performance of these devices are outlined. [reprint (PDF)]
20.	Mid-wavelength infrared high operating temperature pBn photodetectors based on type-II InAs/InAsSb superlattice Donghai Wu, Jiakai Li, Arash Dehzangi, and Manijeh Razeghi AIP Advances 10, 025018-- February 11, 2020 ...[Visit Journal] A high operating temperature mid-wavelength infrared pBn photodetector based on the type-II InAs/InAsSb superlattice on a GaSb substrate has been demonstrated. At 150 K, the photodetector exhibits a peak responsivity of 1.48 A/W, corresponding to a quantum efficiency of 47% at −50 mV applied bias under front-side illumination, with a 50% cutoff wavelength of 4.4 μm. With an R×A of 12,783 Ω·cm² and a dark current density of 1.16×10⁻⁵A/cm² under −50 mV applied bias, the photodetector exhibits a specific detectivity of 7.1×10¹¹ cm·Hz^½/W. At 300 K, the photodetector exhibits a dark current density of 0.44 A/cm²and a quantum efficiency of 39%, resultingin a specific detectivity of 2.5×10⁹ cm·Hz^½/W. [reprint (PDF)]
20.	Growth of AlGaN on silicon substrates: a novel way to make back-illuminated ultraviolet photodetectors Ryan McClintock ; Manijeh Razeghi Proc. SPIE 9555, Optical Sensing, Imaging, and Photon Counting: Nanostructured Devices and Applications, 95550U-- August 28, 2015 ...[Visit Journal] AlGaN, with its tunable wide-bandgap is a good choice for the realization of ultraviolet photodetectors. AlGaN films tend to be grown on foreign substrates such as sapphire, which is the most common choice for back-illuminated devices. However, even ultraviolet opaque substrates like silicon holds promise because, silicon can be removed by chemical treatment to allow back-illumination,1 and it is a very low-cost substrate which is available in large diameters up to 300 mm. However, Implementation of silicon as the solar-blind PD substrates requires overcoming the lattice-mismatch (17%) with the AlxGa1-xN that leads to high density of dislocation and crack-initiating stress. In this talk, we report the growth of thick crack-free AlGaN films on (111) silicon substrates through the use of a substrate patterning and mask-less selective area regrowth. This technique is critical as it decouples the epilayers and the substrate and allows for crack-free growth; however, the masking also helps to reduce the dislocation density by inclining the growth direction and encouraging dislocations to annihilate. A back-illuminated p-i-n PD structure is subsequently grown on this high quality template layer. After processing and hybridizing the device we use a chemical process to selectively remove the silicon substrate. This removal has minimal effect on the device, but it removes the UV-opaque silicon and allows back-illumination of the photodetector. We report our latest results of back-illuminated solar-blind photodetectors growth on silicon. [reprint (PDF)]
20.	Fabrication of nanostructured heterojunction LEDs using self-forming Moth-Eye Arrays of n-ZnO Nanocones Grown on p-Si (111) by PLD D.J. Rogers; V.E. Sandana; F. Hosseini Teherani; M. Razeghi; H.-J. Drouhin Proc. SPIE 7217, Zinc Oxide Materials and Devices IV, 721708 (February 17, 2009)-- February 17, 2009 ...[Visit Journal] ZnO nanostructures were grown on Si (111) substrates using Pulsed Laser Deposition. The impact of growth temperature (T_s) and Ar pressure (P_Ar) on the morphology, crystal structure and photoluminescence was investigated. Various types of ZnO nanostructures were obtained. Self-forming arrays of vertically-aligned nanorods and nanocones with strong c-axis crystallographic orientation and good optical response were obtained at higher T_s. The nanocone, or "moth-eye" type structures were selected for LED development because of their graded effective refractive index, which could facilitate improved light extraction at the LED/air interface. Such moth-eye arrays were grown on p-type Si (111) substrates to form heteroj unction LEDs with the n-type ZnO nanocones acting as an active component of the device. These nanostructured LEDs gave rectifying I/V characteristics with a threshold voltage of about 6V and a blueish-white electroluminescence, which was clearly visible to the naked eye. [reprint (PDF)]
20.	Comparison of PLD-Grown p-NiO/n-Ga2O3 Heterojunctions on Bulk Single Crystal β-Ga2O3 and r-plane Sapphire Substrates D. J. Rogers , V. E. Sandana, F. Hosseini Teherani and M. Razeghi Proc. of SPIE Vol. 12895, Quantum Sensing and Nano Electronics and Photonics XX, 128870J (28 January - 1 February 2024 San Francisco)doi: 10.1117/12.3012511 ...[Visit Journal] p-NiO/n-Ga2O3 heterostructures were formed on single crystal (-201) β (monoclinic) Ga2O3 and r-sapphire substrates by Pulsed Laser Deposition. Ring mesa layer stacks were created using a shadow mask during growth. X-Ray diffraction studies were consistent with the formation of (111) oriented fcc NiO on the bulk Ga2O3 and randomly oriented fcc NiO on (102) oriented β-Ga2O3 /r-sapphire. RT optical transmission studies revealed bandgap energy values of ~3.65 eV and ~5.28 eV for the NiO and Ga2O3 on r-sapphire. p-n junction devices were formed by depositing gold contacts on the layer stacks using shadow masks in a thermal evaporator. Both heterojunctions showed rectifying I/V characteristics. On bulk Ga2O, the junction showed a current density over 16mA/cm2 at +20V forward bias and a reverse bias leakage current over 3 orders of magnitude lower at -20V (1 pA). On Ga2O3/r-sapphire the forward bias current density at +15V was about an order of magnitude lower than for the p-NiO/bulk n-Ga2O3 heterojunction while the reverse bias leakage current at -15V (~ 20 pA) was an order of magnitude higher. Hence the NiO/bulk Ga2O3 junction was more rectifying. Upon illumination with a Xenon lamp a distinct increase in current was observed for the IV curves in both devices (four orders of magnitude for -15V reverse bias in the case of the p-NiO/bulk n-Ga2O3 heterojunction). The p-NiO/n-Ga2O3/rsapphire junction gave a spectral responsivity with a FWHM value of 80nm and two distinct response peaks (with maxima at 230 and 270nm) which were attributed to carriers being photogenerated in the Ga2O3 underlayer. For both devices time response studies showed a 10%/90% rise and fall of the photo generated current upon shutter open and closing which was relatively abrupt (millisecond range), and there was no evidence of significant persistent photoconductivity. [reprint (PDF)]
20.	Nanoselective area growth of defect-free thick indium-rich InGaN nanostructures on sacriﬁcial ZnO templates Renaud Puybaret, David J Rogers, Youssef El Gmili, Suresh Sundaram, Matthew B Jordan, Xin Li, Gilles Patriarche, Ferechteh H Teherani, Eric V Sandana, Philippe Bove, Paul L Voss, Ryan McClintock, Manijeh Razeghi, Ian Ferguson, Jean-Paul Salvestrini, and Abdallah Ougazzade Nanotechnology 28 195304-- April 29, 2017 ...[Visit Journal] Nanoselective area growth (NSAG) by metal organic vapor phase epitaxy of high-quality InGaN nanopyramids on GaN-coated ZnO/c-sapphire is reported. Nanopyramids grown on epitaxial low-temperature GaN-on-ZnO are uniform and appear to be single crystalline, as well as free of dislocations and V-pits. They are also indium-rich (with homogeneous 22% indium incorporation) and relatively thick (100 nm). These properties make them comparable to nanostructures grown on GaN and AlN/Si templates, in terms of crystallinity, quality, morphology, chemical composition and thickness. Moreover, the ability to selectively etch away the ZnO allows for the potential lift-off and transfer of the InGaN/GaN nanopyramids onto alternative substrates, e.g. cheaper and/or ﬂexible. This technology offers an attractive alternative to NSAG on AlN/Si as a platform for the fabrication of high quality, thick and indium-rich InGaN monocrystals suitable for cheap, ﬂexible and tunable light-emitting diodes. [reprint (PDF)]
20.	High Power Electrically Injected Mid-Infrared Interband Lasers Grown by LP-MOCVD B. Lane and M. Razeghi Journal of Crystal Growth 221 (1-4)-- December 1, 2000[reprint (PDF)]
20.	InAs/InAs_1-xSb_x type-II superlattices for high performance long wavelength infrared detection A. Haddadi , G. Chen , R. Chevallier , A. M. Hoang , and M. Razeghi Appl. Phys. Lett. 105, 121104 (2014)-- September 22, 2014 ...[Visit Journal] High performance long-wavelength infrared nBn photodetectors based on InAs/InAs_1−xSb_x type-II superlattices on GaSb substrate have been demonstrated. The photodetector's 50% cut-off wavelength was ∼10 μm at 77 K. The photodetector with a 6 μm-thick absorption region exhibited a peak responsivity of 4.47 A/W at 7.9 μm, corresponding to a quantum efficiency of 54% at −90 mV bias voltage under front-side illumination and without any anti-reflection coating. With an R × A of 119 Ω·cm² and a dark current density of 4.4 × 10⁻⁴ A/cm² under −90 mV applied bias at 77 K, the photodetector exhibited a specific detectivity of 2.8 × 10¹¹ cm·Hz^1/2·W^-1. [reprint (PDF)]
20.	On the interface properties of ZnO/Si electroluminescent diodes J.L. Pau, J. Piqueras, D.J. Rogers, F. Hosseini Teherani, K. Minder, R. McClintock, and M. Razeghi Journal of Applied Physics, Vol. 107, No. 3, p. 033719-1-- February 1, 2010 ...[Visit Journal] ZnO layers grown on n⁻–Si(100), n⁺–Si(100), and n^––Si(111) substrates by pulsed-laser deposition were found to give electroluminescence. Light emission was observed in the form of discrete spots for currents over 1 mA with a white appearance to the naked eye. The intensity of these spots showed an erratic behavior over time, appearing and disappearing at random, while showing an associated random telegraph noise in the current signal. Regardless the substrate used, the electroluminescence spectra had a main broadband emission centered at about 600 nm and a relatively small peak at around 380 nm which corresponds to the energy of ZnO near band edge emission. Furthermore, the devices exhibited rectifying characteristics, whose current blocking direction depended on the substrate orientation. Optimization of ZnO conductivity and performing sample growth in N₂ ambient were found to be critical to enhance the emission intensity. Rutherford backscattering characterization revealed the existence of an intermixed region at the interface between ZnO and Si. To study the electronic properties at the interface, frequency dependent capacitance measurements were carried out. The junction capacitance became frequency dependent at the bias voltages at which light emission occurs due to the relatively slow trapping and generation processes at deep centers. These centers are believed to play an important role in the mechanism of light emission. [reprint (PDF)]
20.	High-performance bias-selectable dual-band Short-/Mid-wavelength infrared photodetectors and focal plane arrays based on InAs/GaSb/AlSb Type-II superlattices M. Razeghi; A.M. Hoang; A. Haddadi; G. Chen; S. Ramezani-Darvish; P. Bijjam; P. Wijewarnasuriy; E. Decuir Proc. SPIE 8704, Infrared Technology and Applications XXXIX, 87041W (June 18, 2013)-- June 18, 2013 ...[Visit Journal] We report a bias selectable dual-band Type-II superlattice-based short-wave infrared (SWIR) and mid-wave infrared (MWIR) co-located photodetector capable of active and passive imaging. A new double-layer etch-stop scheme is introduced for back-side-illuminated photodetectors, which enhanced the external quantum efficiency both in the SWIR and MWIR spectral regions. Temperature-dependent dark current measurements of pixel-sized 27 μm detectors found the dark current density to be ∼1×10-5 A/cm2 for the ∼4.2 μm cut-off MWIR channel at 140 K. This corresponded to a reasonable imager noise equivalent difference in temperature of ∼49 mK using F/2.3 optics and a 10 ms integration time (tint), which lowered to ∼13 mK at 110 K using and integration time of 30 ms, illustrating the potential for high-temperature operation. The SWIR channel was found to be limited by readout noise below 150 K. An excellent imagery from the dual-band imager exemplifying pixel coincidence is shown. [reprint (PDF)]
19.	Growth and characterization of long wavelength infrared Type-II superlattice Photodiodes on a 3 B.M. Nguyen, G. Chen, M.A. Hoang, and M. Razeghi SPIE Proceedings, San Francisco, CA (January 22-27, 2011), Vol. 7945, p. 79451O-- January 23, 2011 ...[Visit Journal] One of the great advantages of Type-II InAs/GaSb superlattice over other competing technologies for the third generation infrared imagers is the potential to have excellent uniformity across a large area as the electronic structure of the material is controlled by the layer thicknesses, not by the composition of the materials. This can economize the material growth, reduce the fabrication cost, and especially allow the realization of large format imagers. In this talk, we report the molecular beam epitaxial growth of Type-II superlattices on a 3-inch GaSb substrate for long wavelength infrared detection. The material exhibits excellent structural, optical and electrical uniformity via AFM, Xray, quantum efficiency and I-V measurements. At 77K, 11μm cutoff photodiodes exhibit more than 45% quantum efficiency, and a dark current density of 1.0x10^-4 A/cm² at 50 mV, resulting in a specific detectivity of 6 x 10¹¹ cm·Hz^1/2/W. [reprint (PDF)]
19.	High-performance, continuous-wave quantum-cascade lasers operating up to 85° C at λ ~ 8.8 μm J.S. Yu, S. Slivken, A. Evans, and M. Razeghi Applied Physics A: Materials Science & Processing, Vo. 93, No. 2, p. 405-408-- November 1, 2008 ...[Visit Journal] High-temperature, high-power, and continuous-wave (CW) operation of quantum-cascade lasers with 35 active/injector stages at λ∼8.85 μm above room temperature is achieved without using a buried heterostructure. At this long wavelength, the use of a wider ridge waveguide in an epilayer-down bonding scheme leads to a superior performance of the laser. For a high-reflectivity-coated 21 μm×3 mm laser, the output power of 237 mW and the threshold current density of 1.44 kA·cm^-2 at 298 K under CW mode are obtained with a maximum wall-plug efficiency of 1.7%. Further improvements were observed by using a 4-mm-long cavity. The device exhibits 294 mW of output power at 298 K and it operates at a high temperature, even up to 358 K (85°C). The full widths at half-maximum of the laser beam in CW operation for the parallel and the perpendicular far-field patterns are 25°and 63°, respectively. [reprint (PDF)]
19.	RT-CW: widely tunable semiconductor THz QCL sources M. Razeghi; Q. Y. Lu Proceedings Volume 9934, Terahertz Emitters, Receivers, and Applications -- September 26, 2016 ...[Visit Journal] Distinctive position of Terahertz (THz) frequencies (ν~0.3 -10 THz) in the electromagnetic spectrum with their lower quantum energy compared to IR and higher frequency compared to microwave range allows for many potential applications unique to them. Especially in the security side of the THz sensing applications, the distinct absorption spectra of explosives and related compounds in the range of 0.1–5 THz makes THz technology a competitive technique for detecting hidden explosives. A compact, high power, room temperature continuous wave terahertz source emitting in a wide frequency range will greatly boost the THz applications for the diagnosis and detection of explosives. Here we present a new strong-coupled strain-balanced quantum cascade laser design for efficient THz generation based intracavity DFG. Room temperature continuous wave operation with electrical frequency tuning range of 2.06-4.35 THz is demonstrated [reprint (PDF)]
19.	Growth of “moth-eye” ZnO nanostructures on Si(111), c-Al2O3, ZnO and steel substrates by pulsed laser deposition Vinod E. Sandana, David J. Rogers, Ferechteh Hosseini Teherani, Philippe Bove, Michael Molinari, Michel Troyon, Alain Largeteau, Gérard Demazeau, Colin Scott, Gaelle Orsal, Henri-Jean Drouhin, Abdallah Ougazzaden, Manijeh Razeghi Phys. Status Solidi C., 1-5 (2013)-- August 6, 2013 ...[Visit Journal] Self-forming, vertically-aligned, arrays of black-body-like ZnO moth-eye nanostructures were grown on Si(111), c-Al₂O₃, ZnO and high manganese austenitic steel substrates using Pulsed Laser Deposition. X-ray diffraction (XRD) revealed the nanostructures to be well-crystallised wurtzite ZnO with strong preferential c-axis crystallographic orientation along the growth direction for all the substrates. Cathodoluminescence (CL) studies revealed emission characteristic of the ZnO near band edge for all substrates. Such moth-eye nanostructures have a graded effective refractive index and exhibit black-body characteristics. Coatings with these features may offer improvements in photovoltaic and LED performance. Moreover, since ZnO nanostructures can be grown readily on a wide range of substrates it is suggested that such an approach could facilitate growth of GaN-based devices on mismatched and/or technologically important substrates, which may have been inaccessible till present. [reprint (PDF)]
19.	A hybrid green light-emitting diode comprised of n-ZnO/(InGaN/GaN) multi-quantum-wells/p-GaN C. Bayram, F. Hosseini Teherani, D.J. Rogers and M. Razeghi Applied Physics Letters, Vol. 93, No. 8, p. 081111-1-- August 25, 2008 ...[Visit Journal] Hybrid green light-emitting diodes (LEDs) comprised of n-ZnO/(InGaN/GaN) multi-quantum-wells/p-GaN were grown on semi-insulating AlN/sapphire using pulsed laser deposition for the n-ZnO and metal organic chemical vapor deposition for the other layers. X-ray diffraction revealed that high crystallographic quality was preserved after the n-ZnO growth. LEDs showed a turn-on voltage of 2.5 V and a room temperature electroluminescence (EL) centered at 510 nm. A blueshift and narrowing of the EL peak with increasing current was attributed to bandgap renormalization. The results indicate that hybrid LED structures could hold the prospect for the development of green LEDs with superior performance. [reprint (PDF)]
19.	Demonstration of shortwavelength infrared photodiodes based on type-II InAs/GaSb/AlSb superlattices A.M. Hoang, G. Chen, A. Haddadi, S. Abdollahi Pour, and M. Razeghi Applied Physics Letters, Vol. 100, No. 21, p. 211101-1-- May 21, 2012 ...[Visit Journal] We demonstrate the feasibility of the InAs/GaSb/AlSb type-II superlattice photodiodes operating at the short wavelength infrared regime below 3 μm. An n-i-p type-II InAs/GaSb/AlSb photodiode was grown with a designed cut-off wavelength of 2 μm on a GaSb substrate. At 150 K, the photodiode exhibited a dark current density of 5.6 × 10⁻⁸ A/cm² and a front-side-illuminated quantum efficiency of 40.3%, providing an associated shot noise detectivity of 1.0 × 10¹³ Jones. The uncooled photodiode showed a dark current density of 2.2 × 10⁻³ A/cm² and a quantum efficiency of 41.5%, resulting in a detectivity of 1.7 × 10¹⁰ Jones [reprint (PDF)]
19.	High operating temperature 320 x 256 middle-wavelength infrared focal plane array imaging based on an InAs/InGaAs/InAlAs/InP quantum dot infrared photodetector S. Tsao, H. Lim, W. Zhang, and M. Razeghi Virtual Journal of Nanoscale Science and Technology-- May 28, 2007 ...[Visit Journal][reprint (PDF)]
19.	Type-II Antimonide-based Superlattices for the Third Generation Infrared Focal Plane Arrays Manijeh Razeghi, Edward Kwei-wei Huang, Binh-Minh Nguyen, Siamak Abdollahi Pour, and Pierre-Yves Delaunay SPIE Proceedings, Infrared Technology and Applications XXXVI, Vol. 7660, pp. 76601F-- May 10, 2010 ...[Visit Journal] In recent years, the Type-II superlattice (T2SL) material platform has seen incredible growth in the understanding of its material properties which has lead to unprecedented development in the arena of device design. Its versatility in band-structure engineering is perhaps one of the greatest hallmarks of the T2SL that other material platforms are lacking. In this paper, we discuss advantages of the T2SL, specifically the M-structure T2SL, which incorporates AlSb in the traditional InAs/GaSb superlattice. Using the M-structure, we present a new unipolar minority electron detector coined as the p-M-p, the letters which describe the composition of the device. Demonstration of this device structure with a 14 μm cutoff attained a detectivity of 4x10¹⁰ Jones (-50 mV) at 77 K. As device performance improves year after year with novel design contributions from the many researchers in this field, the natural progression in further enabling the ubiquitous use of this technology is to reduce cost and support the fabrication of large infrared imagers. In this paper, we also discuss the use of GaAs substrates as an enabling technology for third generation imaging on T2SLs. Despite the 7.8% lattice mismatch between the native GaSb and alternative GaAs substrates, T2SL photodiodes grown on GaAs at the MWIR and LWIR have been demonstrated at an operating temperature of 77 K [reprint (PDF)]
19.	Aluminum nitride films on different orientations of sapphire and silicon K. Dovidenko, S. Oktyabrsky, J. Narayan, and M. Razeghi Journal of Applied Physics79 (5)-- March 1, 1996 ...[Visit Journal] The details of epitaxial growth and microstrictural characteristics of AlN films grown on sapphire (0001), (1012) and Si (100), (111) substrates were investigated using plan‐view and cross‐sectional high‐resolution transmission electron microscopy and x‐ray diffraction techniques. The films were grown by metalorganic chemical vapor deposition using TMA1+NH3+N2 gas mixtures. Different degrees of epitaxy were observed for the films grown on α‐Al₂O₃ and Si substrates in different orientations. The epitaxial relationship for (0001) sapphire was found to be (0001)AlN∥(0001)sap with in‐plane orientation relationship of [0110]AlN∥[1210]sap. This is equivalent to a 30° rotation in the basal (0001) plane. For (1012) sapphire substrates, the epitaxial relationship was determined to be (1120)AlN∥(1012)sap with the in‐plane alignment of [0001]AlN∥[1011]sap. The AlN films on (0001) α‐Al₂O₃ were found to contain inverted domain boundaries and a/3〈1120〉 threading dislocations with the estimated density of 10¹⁰ cm⁻². The density of planar defects (stacking faults) found in AlN films was considerably higher in the case of (1012) compared to (0001) substrates. Films on Si substrates were found to be highly textured c axis oriented when grown on (111) Si, and c axis textured with random in‐plane orientation on (100) Si. The role of thin‐film defects and interfaces on device fabrication is discussed. [reprint (PDF)]
19.	*High quality AlN and GaN epilayers grown on (001) sapphire, (100) and (111) silicon substrates P. Kung, A. Saxler, X. Zhang, D. Walker, T.C. Wang, I. Ferguson, and M. Razeghi Applied Physics Letters 66 (22)-- May 29, 1995** ...[Visit Journal] The growth of high quality AlN and GaN thin films on basal plane sapphire, (100), and (111) silicon substrates is reported using low pressure metalorganic chemical vapor deposition. X-ray rocking curve linewidths of about 100 and 30 arcsec were obtained for AlN and GaN on sapphire, respectively. Room‐temperature optical transmission and photoluminescence (of GaN) measurements confirmed the high quality of the films. The luminescence at 300 and 77 K of the GaN films grown on basal plane sapphire, (100), and (111) silicon was compared. [reprint (PDF)]

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