Center for Quantum Devices - Most Downloaded Journal Articles

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1.	Aluminum gallium nitride short-period superlattices doped with magnesium A. Saxler, W.C. Mitchel, P. Kung and M. Razeghi Applied Physics Letters 74 (14)-- April 9, 1999 ...[Visit Journal] Short-period superlattices consisting of alternating layers of GaN:Mg and AlGaN:Mg were grown by low-pressure organometallic vapor phase epitaxy. The electrical properties of these superlattices were measured as a function of temperature and compared to conventional AlGaN:Mg layers. It is shown that the optical absorption edge can be shifted to shorter wavelengths while lowering the acceptor ionization energy by using short-period superlattice structures instead of bulk-like AlGaN:Mg. [reprint (PDF)]
1.	Temperature insensitivity of the Al-free InGaAsP/GaAs lasers for λ = 808 and 908 nm M. Razeghi, H. Yi, J. Diaz, S. Kim, and M. Erdtmann SPIE Conference, San Jose, CA; Proceedings 3001-- February 12, 1997 ...[Visit Journal] n this work, we present our recent achievements for the reliability of the Al-free lasers at high temperatures and high powers. Laser operations up to 30,000 hours were achieved without any degradation in the lasers characteristics from 7 randomly selected InGaAsP/GaAs diodes for λ = 808 nm. The test were performed for lasers without mirror-coating for optical power of 0.5 to 1 W CW at 50 approximately 60 °C. To the best of our knowledge, this is the first direct demonstration of the extremely high reliability of Al-free diodes operations at high powers and temperatures for periods of time much longer than practical need (approximately 3 years). The characteristics during the tests are discussed in detail. [reprint (PDF)]
1.	Gain and recombination dynamics in photodetectors made with quantum nanostructures: The quantum dot in a well and the quantum well B. Movaghar, S. Tsao, S. Abdollahi Pour, T. Yamanaka, and M. Razeghi Physical Review B, Vol. 78, No. 11-- September 15, 2008 ...[Visit Journal] We consider the problem of charge transport and recombination in semiconductor quantum well infrared photodetectors and quantum-dot-in-a-well infrared detectors. The photoexcited carrier relaxation is calculated using rigorous random-walk and diffusion methods, which take into account the finiteness of recombination cross sections, and if necessary the memory of the carrier generation point. In the present application, bias fields are high and it is sufficient to consider the drift limited regime. The photoconductive gain is discussed in a quantum-mechanical language, making it more transparent, especially with regard to understanding the bias and temperature dependence. Comparing experiment and theory, we can estimate the respective recombination times. The method developed here applies equally well to nanopillar structures, provided account is taken of changes in mobility and trapping. Finally, we also derive formulas for the photocurrent time decays, which in a clean system at high bias are sums of two exponentials. [reprint (PDF)]
1.	Mid-infrared quantum cascade lasers with high wall plug efficiency Y. Bai, B. Gokden, S. Slivken, S.R. Darvish, S.A. Pour, and M. Razeghi SPIE Proceedings, San Jose, CA Volume 7222-0O-- January 26, 2009 ...[Visit Journal] We demonstrate optimization of continuous wave (cw) operation of 4.6 µm quantum cascade lasers (QCLs). A 19.7 µm by 5 mm, double channel processed device exhibits 33% cw WPE at 80 K. Room temperature cw WPE as high as 12.5% is obtained from a 10.6 µm by 4.8 mm device, epilayer-down bonded on a diamond submount. With the semi-insulating regrowth in a buried ridge geometry, 15% WPE is obtained with 2.8 W total output power in cw mode at room temperature. This accomplishment is achieved by systematically decreasing the parasitic voltage drop, reducing the waveguide loss and improving the thermal management. [reprint (PDF)]
1.	8-13 μm InAsSb heterojunction photodiode operating at near room temperature J.D. Kim, S. Kim, D. Wu, J. Wojkowski, J. Xu, J. Piotrowski, E. Bigan, and M. Razeghi Applied Physics Letters 67 (18)-- October 30, 1995 ...[Visit Journal] p⁺-InSb/π-InAs_1−xSb_x/n⁺-InSb heterojunction photodiodes operating at near room temperature in the 8–13 μm region of infrared (IR) spectrum are reported. A room‐temperature photovoltaic response of up to 13 μm has been observed at 300 K with an x≊0.85 sample. The voltage responsivity‐area product of 3×10⁻⁵ V· cm²/W has been obtained at 300 K for the λ=10.6 μm optimized device. This was close to the theoretical limit set by the Auger mechanism, with a detectivity at room temperature of ≊1.5×10⁸ cm ·Hz^½/W. [reprint (PDF)]
1.	Suppression of surface leakage in gate controlled type-II InAs/GaSb mid-infrared photodetectors G. Chen; B.-M. Nguyen; A.M. Hoang; E.K. Huang; S.R. Darvish; M. Razeghi Proc. SPIE 8268, Quantum Sensing and Nanophotonic Devices IX, 826811 (January 20, 2012)-- January 20, 2012 ...[Visit Journal] One of the biggest challenges of improving the electrical performance in Type II InAs/GaSb superlattice photodetector is suppressing the surface leakage. Surface leakage screens important bulk dark current mechanisms, and brings difficulty and uncertainty to the material optimization and bulk intrinsic parameters extraction such as carrier lifetime and mobility. Most of surface treatments were attempted beyond the mid-infrared (MWIR) regime because compared to the bulk performance, surface leakage in MWIR was generally considered to be a minor factor. In this work, we show that below 150K, surface leakage still strongly affects the electrical performance of the very high bulk performance p-π-M-n MWIR photon detectors. With gating technique, we can effectively eliminate the surface leakage in a controllable manner. At 110K, the dark current density of a 4.7 μm cut-off gated photon diode is more than 2 orders of magnitude lower than the current density in SiO₂ passivated ungated diode. With a quantum efficiency of 48%, the specific detecivity of gated diodes attains 2.5 x 10¹⁴ cm·Hz^1/2/W, which is 3.6 times higher than that of ungated diodes. [reprint (PDF)]
1.	Hybrid green LEDs with n-type ZnO substituted for N-type GaN in an inverted P-N junction F. Hosseini Teherani; M. Razeghi; D.J. Rogers; Can Bayram; R. McClintock LEOS Annual Meeting Conference Proceedings, LEOS '09. IEEE, [5343231] (2009) -- October 4, 2009 ...[Visit Journal] Recently, the GaN and ZnO materials systems have attracted considerable attention because of their use in a broad range of emerging applications including light-emitting diodes (LEDs) and solar cells. GaN and ZnO are similar materials with direct wide bandgaps, wurtzite crystal structure, high thermal stability and comparable thermal expansion coefficients, which makes them well suited for heterojunction fabrication. Two important advantages of GaN over ZnO are the reliable p-type doping and the mature know-how for bandgap engineering. Thus GaN-based LEDs can be made to emit from the deep UV right into the green through alloying with Al and In, respectively. The performance is not identical at all wavelengths, however, and the performance of InGaN-based green LEDs is still relatively poor. [reprint (PDF)]
1.	AlN/GaN double-barrier resonant tunneling diodes grown by metal-organic chemical vapor deposition C. Bayram, Z. Vashaei and M. Razeghi Applied Physics Letters, Vol. 96, No. 4, p. 042103-1-- January 25, 2010 ...[Visit Journal] AlN/GaN double-barrier resonant tunneling diodes (RTDs) were grown by metal-organic chemical vapor deposition on sapphire. RTDs were fabricated via standard processing steps. RTDs demonstrate a clear negative differential resistance (NDR) at room temperature (RT). The NDR was observed around 4.7 V with a peak current density of 59 kA/cm² and a peak-to-valley ratio of 1.6 at RT. Dislocation-free material is shown to be the key for the performance of GaN RTDs. [reprint (PDF)]
1.	Direct growth of thick AlN layers on nanopatterned Si substrates by cantilever epitaxy Ilkay Demir, Yoann Robin, Ryan McClintock, Sezai Elagoz, Konstantinos Zekentes, and Manijeh Razeghi Phys. Status Solidi A, pp. 1–6-- September 30, 2016 ...[Visit Journal] AlN layers have been grown on 200 nm period of nanopatterned Si (111) substrates by cantilever epitaxy and compared with AlN layers grown by maskless lateral epitaxial overgrowth (LEO) on micropatterned Si (111) substrates. The material quality of 5–10 µm thick AlN grown by LEO is comparable to that of much thinner layers (2 µm) grown by cantilever epitaxy on the nanopatterned substrates. Indeed, the latter exhibited root mean square (RMS) roughness of 0.65 nm and X-ray diffraction full width at half-maximum (FWHM) of 710 arcsec along the (0002) reflection and 930 arcsec along the (10̅15) reflection. The corresponding room temperature photoluminescence spectra was dominated by a sharp band edge peak. Back emission ultra violet light emitting diodes (UV LEDs) were fabricated by flip chip bonding to patterned AlN heat sinks followed by complete Si (111) substrate removal demonstrating a peak pulsed power of ∼0.7 mW at 344 nm peak emission wavelength. The demonstrated UV LEDs were fabricated on a cost effective epitaxial structure grown on the nanopatterned Si substrate with a total thickness of 3.3 µm [reprint (PDF)]
1.	High Carrier Lifetime InSb Grown on GaAs Substrates E. Michel, H. Mohseni, J.D. Kim, J. Wojkowski, J. Sandven, J. Xu, M. Razeghi, R. Bredthauer, P. Vu, W. Mitchel, and M. Ahoujja Applied Physics Letters 71 (8-- August 25, 1997 ...[Visit Journal] We report on the growth of near bulklike InSb on GaAs substrates by molecular beam epitaxy despite the 14% lattice mismatch between the epilayer and the substrate. Structural, electrical, and optical properties were measured to assess material quality. X-ray full widths at half-maximum were as low as 55 arcsec for a 10 µm epilayer, peak mobilities as high as ~ 125 000 cm2/V s, and carrier lifetimes up to 240 ns at 80 K. [reprint (PDF)]
1.	Low irradiance background limited type-II superlattice MWIR M-barrier imager E.K. Huang, S. Abdollahi Pour, M.A. Hoang, A. Haddadi, M. Razeghi and M.Z. Tidrow OSA Optics Letters (OL), Vol. 37, No. 11, p. 2025-2027-- June 1, 2012 ...[Visit Journal] We report a type-II superlattice mid-wave infrared 320 × 256 imager at 81 K with the M-barrier design that achieved background limited performance (BLIP) and ∼99%operability. The 280 K blackbody’s photon irradiance was limited by an aperture and a band-pass filter from 3.6 μm to 3.8 μm resulting in a total flux of ∼5 × 10¹² ph·cm⁻²·s⁻¹. Under these low-light conditions, and consequently the use of a 13.5 ms integration time, the imager was observed to be BLIP thanks to a ∼5 pA dark current from the 27 μm wide pixels. The total noise was dominated by the photon flux and read-out circuit which gave the imager a noise equivalent input of ∼5 × 10¹⁰ ph·cm⁻²·s⁻¹ and temperature sensitivity of 9 mK with F∕2.3 optics. Excellent imagery obtained using a 1-point correction alludes to the array’s uniform responsivity. [reprint (PDF)]
1.	Cubic Phase GaN on Nano-grooved Si (100) via Maskless Selective Area Epitaxy Bayram, C., Ott, J. A., Shiu, K.-T., Cheng, C.-W., Zhu, Y., Kim, J., Razeghi, M. and Sadana, D. K. Adv. Funct. Mater. 2014-- April 1, 2014 ...[Visit Journal] A method of forming cubic phase (zinc blende) GaN (referred as c-GaN) on a CMOS-compatible on-axis Si (100) substrate is reported. Conventional GaN materials are hexagonal phase (wurtzite) (referred as h-GaN) and possess very high polarization fields (∼MV/cm) along the common growth direction of <0001>. Such large polarization fields lead to undesired shifts (e.g., wavelength and current) in the performance of photonic and vertical transport electronic devices. The cubic phase of GaN materials is polarization-free along the common growth direction of <001>, however, this phase is thermodynamically unstable, requiring low-temperature deposition conditions and unconventional substrates (e.g., GaAs). Here, novel nano-groove patterning and maskless selective area epitaxy processes are employed to integrate thermodynamically stable, stress-free, and low-defectivity c-GaN on CMOS-compatible on-axis Si. These results suggest that epitaxial growth conditions and nano-groove pattern parameters are critical to obtain such high quality c-GaN. InGaN/GaN multi-quantum-well structures grown on c-GaN/Si (100) show strong room temperature luminescence in the visible spectrum, promising visible emitter applications for this technology. [reprint (PDF)]
1.	High Quality Type-II InAs/GaSb Superlattices with Cutoff Wavelength ~3.7 µm Using Interface Engineering Y. Wei, J. Bae, A. Gin, A. Hood, M. Razeghi, G.J. Brown, and M. Tidrow Journal of Applied Physics, 94 (7)-- October 1, 2003 ...[Visit Journal] We report the most recent advance in the area of Type-II InAs/GaSb superlattices that have cutoff wavelength of ~3.7 µm. With Ga_xIn_1–x type interface engineering techniques, the mismatch between the superlattices and the GaSb (001) substrate has been reduced to <0.1%. There is no evidence of dislocations using the best examination tools of x-ray, atomic force microscopy, and transmission electron microscopy. The full width half maximum of the photoluminescence peak at 11 K was ~4.5 meV using an Ar+ ion laser (514 nm) at fluent power of 140 mW. The integrated photoluminescence intensity was linearly dependent on the fluent laser power from 2.2 to 140 mW at 11 K. The temperature-dependent photoluminescence measurement revealed a characteristic temperature of one T1 = 245 K at sample temperatures below 160 K with fluent power of 70 mW, and T1 = 203 K for sample temperatures above 180 K with fluent power of 70 and 420 mW. [reprint (PDF)]
1.	Growth of Al_xGa_1-xN:Ge on sapphire and silicon substrates X. Zhang, P. Kung, A. Saxler, D. Walker, T.C. Wang, and M. Razeghi Applied Physics Letters 67 (12)-- September 18, 1995 ...[Visit Journal] Al_xGa_1–xN were grown on (00.1) sapphire and (111) silicon substrates in the whole composition range (0 <= x <= 1). The high optical quality of the epilayers was assessed by room-temperature optical absorption and photoluminescence measurements. Layers with higher Al composition are more resistive. Resistive Al_xGa_1–xN epilayers were successfully doped with Ge and free-electron concentration as high as 3 × 10¹⁹ cm^–3 was achieved. [reprint (PDF)]
1.	High-quality visible-blind AlGaN p-i-n photodiodes E. Monroy, M. Hamilton, D. Walker, P. Kung, F.J. Sanchez, and M. Razeghi Applied Physics Letters 74 (8)-- February 22, 1999 ...[Visit Journal] We report the fabrication and characterization of Al_xGa_1−xN p-i-n photodiodes (0 < x < 0.15) grown on sapphire by low-pressure metalorganic chemical vapor deposition. The devices present a visible rejection of six orders of magnitude with a cutoff wavelength that shifts from 365 to 338 nm. Photocurrent decays are exponential for high load resistances, with a time constant that corresponds to the RC product of the system. For low load resistances, the transient response becomes non-exponential, with a decay time longer than the RC constant. This behavior is justified by the strong frequency dependence of the device capacitance. By an admittance analysis, we conclude that speed is not limited by deep levels, but by substitutional Mg capture and emission time. [reprint (PDF)]
1.	Optoelectronic Devices Based on III-V Compound Semiconductors Which Have Made a Major Scientific and Technological Impact in the Past 20 Years M. Razeghi IEEE Journal of Selected Topics in Quantum Electronics 6 (6), pp.1344 - 1354 -- November 1, 2000 ...[Visit Journal] This paper reviews some of our pioneering contributions to the field of III–V compound semiconductor materials and low-dimensional optoelectronic devices. These contributions span from the ultraviolet (200 nm) up to the far-infrared (25 μm) portion of the electromagnetic spectrum and have had a major scientific and technological impact on the semiconductor world in the past 20 years. [reprint (PDF)]
1.	Review of III-Nitride Optoelectronic Materials for light Emission and Detection M. Razeghi, A. Yasan, R. McClintock, K. Mayes, D. Shiell, S. Darvish, and P. Kung Physica Status Solidi C S141 - S148-- September 10, 2004 ...[Visit Journal] We review the significant achievements relating to optoelectronic devices based on III-nitrides at the center for quantum devices (CQD). Based on GaN/InGaN multiple-quantum well structures, we demonstrated blue laser diodes at a wavelength of 405 nm. This achievement was particularly significant at the time, because while no defect reduction technique was used, a fairly low threshold current density was achieved (3.8 kA/cm²). In the past few years, however, the interest has shifted towards shorter wavelength light emitters, i.e. ultraviolet LEDs and LDs. Lower crystalline quality and unsatisfactory doping levels of AlGaN compound semiconductors posed serious challenges en route to the realization of UV light emitters. However, steady progress in the growth of AlGaN and AlN epilayers made it possible to overcome some of the difficulties. To date, we have been able to demonstrate UV LEDs at wavelengths as short as 265 nm (corresponding to 45% Al in Al_xGa_1-xN) with optical output powers of over 5 mW. We have addressed the n-type AlGaN doping problem by using a Si-In co-doped scheme. We also employed high-quality AlGaN/AlN superlattice templates for the reduction of defects. We have also demonstrated 280 nm UV LEDs with output powers of over 6 mW and external quantum efficiencies of over 0.25%. Despite all the success in the realization of short-wavelength UV LEDs, UV laser diodes at these short wavelengths are yet to be realized. The main difficulties are the low material quality, high device resistance leading to excessive heating of the device, realization of smooth cavity mirrors, and issues related to the cracking of the material. We have also demonstrated different types of photodetectors in the UV range of the spectrum: photoconductors, MSM photodetector, Schottky barrier photodetectors, and p-i-n photodiodes to name a few. The most promising type of photodetector for realization of UV imaging focal plane arrays is the p-i-n photodiode. Realization of high-efficiency AlGaN-based p-i-n photodiodes becomes more difficult when considering the need for the collection of the light from the backside of the substrate. However, similar to our back-emission UV LED structure, we have demonstrated back-illuminated p-i-n solar-blind photodiodes with external quantum efficiencies as high as 68% under no applied bias and 74% under -5 V of bias. [reprint (PDF)]
1.	Top-emission ultraviolet light-emitting diodes with peak emission at 280 nm A. Yasan, R. McClintock, K. Mayes, S.R. Darvish, P. Kung, and M. Razeghi Applied Physics Letters 81 (5)-- July 29, 2002 ...[Visit Journal] We demonstrate light emission at 280 nm from UV light-emitting diodes consisting of AlInGaN/AlInGaN multiple quantum wells. Turn-on voltage of the devices is ~5 V with a differential resistance of ~40 Ω. The peak emission wavelength redshifts ~1 nm at high injection currents. [reprint (PDF)]
1.	Sandwich method to grow high quality AlN by MOCVD Demir , H Li, Y Robin, R McClintock, S Elagoz and M Razeghi Journal of Physics D: Applied Physics 51, pp. 085104-- February 7, 2018 ...[Visit Journal] We report pulsed atomic layer epitaxy growth of a very high crystalline quality, thick (~2 µm) and crack-free AlN material on c-plane sapphire substrates via a sandwich method using metal organic chemical vapor deposition. This sandwich method involves the introduction of a relatively low temperature (1050 °C) 1500 nm thick AlN layer between two 250 nm thick AlN layers which are grown at higher temperature (1170 °C). The surface morphology and crystalline quality remarkably improve using this sandwich method. A 2 µm thick AlN layer was realized with 33 arcsec and 136 arcsec full width at half maximum values for symmetric and asymmetric reflections of ω-scan, respectively, and it has an atomic force microscopy root-mean-square surface roughness of ~0.71 nm for a 5 × 5 µm² surface area. [reprint (PDF)]
1.	High-Power Continuous-Wave Operation of Quantum-Cascade Lasers Up to 60 °C J.S. Yu, A. Evans, J. David, L. Doris, S. Slivken and M. Razeghi IEEE Photonics Technology Letters, 16 (3)-- March 1, 2004 ...[Visit Journal] High-temperature high-power continuous-wave (CW) operation of high-reflectivity-coated 12 μm wide quantum-cascade lasers emitting at λ = 6 μm with a thick electroplated Au top contact layer is reported for different cavity lengths. For a 3 mm long laser, the CW optical output powers of 381 mW at 293 K and 22 mW at maximum operating temperature of 333 K (60°C) are achieved with threshold current densities of 1.93 and 3.09 kA/cm², respectively. At 298 K, the same cavity gives a maximum wall plug efficiency of 3.17% at 1.07 A. An even higher CW optical output power of 424 mW at 293 K is obtained for a 4-mm-long laser and the device also operates up to 332 K with an output power of 14 mW. Thermal resistance is also analyzed at threshold as a function of cavity length. [reprint (PDF)]
1.	Photovoltaic MWIR type-II superlattice focal plane array on GaAs substrate E.K. Huang, P.Y. Delaunay, B.M. Nguyen, S. Abdoullahi-Pour, and M. Razeghi IEEE Journal of Quantum Electronics (JQE), Vol. 46, No. 12, p. 1704-1708-- December 1, 2010 ...[Visit Journal] Recent improvements in the performance of Type-II superlattice (T2SL) photodetectors has spurred interest in developing low cost and large format focal plane arrays (FPA) on this material system. Due to the limitations of size and cost of native GaSb substrates, GaAs is an attractive alternative with 8” wafers commercially available, but is 7.8% lattice mismatched to T2SL. In this paper, we present a photovoltaic T2SL 320 x 256 focal plane array (FPA) in the MWIR on GaAs substrate. The FPA attained a median noise equivalent temperature difference (NEDT) of 13 mK and 10mK (F#=2.3) with integration times of 10.02 ms and 19.06 ms respectively at 67 K. [reprint (PDF)]
1.	Generation-recombination and trap-assisted tunneling in long wavelength infrared minority electron unipolar photodetectors based on InAs/GaSb superlattice F. Callewaert, A.M. Hoang, and M. Razeghi Applied Physics Letters, 104, 053508 (2014)-- February 6, 2014 ...[Visit Journal] A long wavelength infrared minority electron unipolar photodetector based on InAs/GaSb type-II superlattices is demonstrated. At 77 K, a dark current of 3 × 10⁻⁵ A/cm² and a differential resistance-area of 3 700 Ω·cm² are achieved at the turn-on bias, with a 50%-cutoff of 10.0 μm and a specific detectivity of 6.2 × 10¹¹ Jones. The dark current is fitted as a function of bias and temperature using a model combining generation-recombination and trap-assisted tunneling. Good agreement was observed between the theory and the experimental dark current. [reprint (PDF)]
1.	Characteristics of high quality p-type Al_xGa_1-xN/GaN superlattices A. Yasan, R. McClintock, S.R. Darvish, Z. Lin, K. Mi, P. Kung, and M. Razeghi Applied Physics Letters 80 (12)-- March 18, 2002 ...[Visit Journal] Very-high-quality p-type Al_xGa_1–xN/GaN superlattices have been grown by low-pressure metalorganic vapor-phase epitaxy through optimization of Mg flow and the period of the superlattice. For the superlattice with x = 26%, the hole concentration reaches a high value of 4.2×10¹⁸ cm^–3 with a resistivity as low as 0.19 Ω · cm by Hall measurement. Measurements confirm that superlattices with a larger period and higher Al composition have higher hole concentration and lower resistivity, as predicted by theory. [reprint (PDF)]
1.	Injector doping level dependent continuous-wave operation of InP-based QCLs at λ~ 7.3 µm above room temperature J.S. Yu, S. Slivken, and M. Razeghi Semiconductor Science and Technology (SST), Vol. 25, No. 12, p. 125015-- December 1, 2010 ...[Visit Journal] We report the continuous-wave (CW) operation of InGaAs/InAlAs quantum cascade lasers (QCLs) operating at λ ~ 7.3 µm above room temperature. The injector doping level–dependent CW characteristics above room temperature are investigated for doping densities between 7 × 10¹⁶ cm⁻³ and 2 × 10¹⁷ cm⁻³. The device performance, i.e. threshold current density, output power, operating temperature and characteristic temperature, depends strongly on the injector doping density. For a relatively low injector doping density of 7 × 10¹⁶ cm⁻³, a high-reflectivity-coated 10 µm wide and 4 mm long laser exhibits an improved device performance with an output power of 152 mW and a threshold current density of 1.37 kA cm⁻² at 298 K under CW mode, operating up to 343 K. The thermal characteristics are also analyzed by the estimation from the experimentally measured data for the QCLs with different injector doping densities. [reprint (PDF)]
1.	Quantum Devices Based on Modern Band Structure Engineering and Epitaxial Technology M. Razeghi Modern Physics Letters B, Vol. 22, No. 24, p. 2343-2371-- September 20, 2008 ...[Visit Journal] Modern band structure engineering is based both on the important discoveries of the past century and modern epitaxial technology. The general goal is to control the behavior of charge carriers on an atomic scale, which affects how they interact with each other and their environment. Starting from the basic semiconductor heterostructure, band structure engineering has evolved into a powerful discipline, employing lower dimensionality to demonstrate new material properties. Several modern technologies under development are used as examples of how this discipline is enabling new types of devices and new functionality in areas with immediate application.

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