Center for Quantum Devices - Most Downloaded Journal Articles

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15.	Comparison of chemical and laser lift-off for the transfer of InGaN-based p-i-n junctions from sapphire to glass substrates D. J. Rogers ; P. Bove ; F. Hosseini Teherani ; K. Pantzas ; T. Moudakir ; G. Orsal ; G. Patriarche ; S. Gautier ; A. Ougazzaden ; V. E. Sandana ; R. McClintock ; M. Razeghi Proc. SPIE 8626, Oxide-based Materials and Devices IV, 862611 (March 18, 2013)-- March 18, 2013 ...[Visit Journal] InGaN-based p-i-n structures were transferred from sapphire to soda-lime glass substrates using two approaches: (1) laser-lift-off (LLO) and thermo-metallic bonding and (2) chemical lift-off (LLO) by means sacrificial ZnO templates and direct wafer bonding. Both processes were found to function at RT and allow reclaim of the expensive single crystal substrate. Both approaches have also already been demonstrated to work for the wafer-scale transfer of III/V semiconductors. Compared with the industry-standard LLO, the CLO offers the added advantages of a lattice match to InGaN with higher indium contents, no need for an interfacial adhesive layer (which facilitates electrical, optical and thermal coupling), no damaged/contaminated GaN surface layer, simplified sapphire reclaim (GaN residue after LLO may complicate reclaim) and cost savings linked to elimination of the expensive LLO process. [reprint (PDF)]
15.	Growth of AlGaN on silicon substrates: a novel way to make back-illuminated ultraviolet photodetectors Ryan McClintock ; Manijeh Razeghi Proc. SPIE 9555, Optical Sensing, Imaging, and Photon Counting: Nanostructured Devices and Applications, 95550U-- August 28, 2015 ...[Visit Journal] AlGaN, with its tunable wide-bandgap is a good choice for the realization of ultraviolet photodetectors. AlGaN films tend to be grown on foreign substrates such as sapphire, which is the most common choice for back-illuminated devices. However, even ultraviolet opaque substrates like silicon holds promise because, silicon can be removed by chemical treatment to allow back-illumination,1 and it is a very low-cost substrate which is available in large diameters up to 300 mm. However, Implementation of silicon as the solar-blind PD substrates requires overcoming the lattice-mismatch (17%) with the AlxGa1-xN that leads to high density of dislocation and crack-initiating stress. In this talk, we report the growth of thick crack-free AlGaN films on (111) silicon substrates through the use of a substrate patterning and mask-less selective area regrowth. This technique is critical as it decouples the epilayers and the substrate and allows for crack-free growth; however, the masking also helps to reduce the dislocation density by inclining the growth direction and encouraging dislocations to annihilate. A back-illuminated p-i-n PD structure is subsequently grown on this high quality template layer. After processing and hybridizing the device we use a chemical process to selectively remove the silicon substrate. This removal has minimal effect on the device, but it removes the UV-opaque silicon and allows back-illumination of the photodetector. We report our latest results of back-illuminated solar-blind photodetectors growth on silicon. [reprint (PDF)]
15.	Semiconductor ultraviolet detectors M. Razeghi and A. Rogalski Journal of Applied Physics Applied Physics Review 79 (10)-- May 15, 1996 ...[Visit Journal] In this review article a comprehensive analysis of the developments in ultraviolet (UV) detector technology is described. At the beginning, the classification of UV detectors and general requirements imposed on these detectors are presented. Further considerations are restricted to modern semiconductor UV detectors, so the basic theory of photoconductive and photovoltaic detectors is presented in a uniform way convenient for various detector materials. Next, the current state of the art of different types of semiconductor UV detectors is presented. Hitherto, the semiconductor UV detectors have been mainly fabricated using Si. Industries such as the aerospace, automotive, petroleum, and others have continuously provided the impetus pushing the development of fringe technologies which are tolerant of increasingly high temperatures and hostile environments. As a result, the main efforts are currently directed to a new generation of UV detectors fabricated from wide band-gap semiconductors the most promising of which are diamond and AlGaN. The latest progress in development of AlGaN UV detectors is finally described in detail. [reprint (PDF)]
15.	The importance of band alignment in VLWIR type-II InAs/GaSb heterodiodes containing the M-structure barrier D. Hoffman, B.M. Nguyen, E.K. Huang, P.Y. Delaunay, S. Bogdanov, P. Manukar, M. Razeghi, and V. Nathan SPIE Proceedings, San Jose, CA Volume 7222-15-- January 26, 2009 ...[Visit Journal] The Type-II InAs/GaSb superlattice photon detector is an attractive alternative to HgCdTe photodiodes and QWIPS. The use of p+ - pi - M - N+ heterodiode allows for greater flexibility in enhancing the device performance. The utilization of the Empirical Tight Binding method gives the band structure of the InAs/GaSb superlattice and the new M- structure (InAs/GaSb/AlSb/GaSb) superlattice allowing for the band alignment between the binary superlattice and the M- superlattice to be determined and see how it affects the optical performance. Then by modifying the doping level of the M- superlattice an optimal level can be determined to achieve high detectivity, by simultaneously improving both photo-response and reducing dark current for devices with cutoffs greater than 14.5 µm. [reprint (PDF)]
15.	Self-assembled semiconductor quantum dot infrared photodetector operating at room temperature and focal plane array Ho-Chul Lim; Stanley Tsao; Wei Zhang; Manijen Razeghi Proc. SPIE 6542, Infrared Technology and Applications XXXIII, 65420R (May 14, 2007)-- May 14, 2007 ...[Visit Journal] Self-assembled semiconductor quantum dots have attracted much attention because of their novel properties and thus possible practical applications including the lasers, detectors and modulators. Especially the photodetectors which have quantum dots in their active region have been developed and show promising performances such as high operation temperature due to three dimensional confinement of the carriers and normal incidence in contrast to the case of quantum well detectors which require special optical coupling schemes. Here we report our recent results for mid-wavelength infrared quantum dot infrared photodetector grown by low-pressure metalorganic chemical vapor deposition. The material system we have investigated consists of 25 period self-assembled InAs quantum dot layers on InAlAs barriers, which are lattice-matched to InP substrates, covered with InGaAs quantum well layers and InAlAs barriers. This active region was sandwiched by highly doped InP contact layers. The device operates at 4.1 μm with a peak detectivity of 2.8×10¹¹ cm·Hz^1/2/W at 120 K and a quantum efficiency of 35 %. The photoresponse can be observed even at room temperature resulting in a peak detectivity of 6×10⁷ cm·Hz^1/2/W. A 320×256 focal plane array has been fabricated in this kind of device. Its performance will also be discussed here. [reprint (PDF)]
15.	High Power Mid-Infrared Quantum Cascade Lasers Grown on GaAs Steven Slivken and Manijeh Razeghi Photonics 2022, 9(4), 231 (COVER ARTICLE) ...[Visit Journal] The motivation behind this work is to show that InP-based intersubband lasers with high power can be realized on substrates with significant lattice mismatch. This is a primary concern for the integration of mid-infrared active optoelectronic devices on low-cost photonic platforms, such as Si. As evidence, an InP-based mid-infrared quantum cascade laser structure was grown on a GaAs substrate, which has a large (4%) lattice mismatch with respect to InP. Prior to laser core growth, a metamorphic buffer layer of InP was grown directly on a GaAs substrate to adjust the lattice constant. Wafer characterization data are given to establish general material characteristics. A simple fabrication procedure leads to lasers with high peak power (>14 W) at room temperature. These results are extremely promising for direct quantum cascade laser growth on Si substrates. [reprint (PDF)]
15.	Very high quality p-type Al_xGa_1-xN/GaN superlattice A. Yasan and M. Razeghi special ISDRS issue of Solid State Electronics Journal, 47-- January 1, 2003 ...[Visit Journal] Very high quality p-type Al_xGa_1−xN/GaN superlattice has been achieved through optimization of Mg flow and period of superlattice. Theoretical model was used to optimize the structure of superlattice by choosing suitable Al compositions and superlattice periods. The experiments show that for x=0.26, the resistivity is as low as 0.19 Ω cm and hole concentration is as high as 4.2×10¹⁸ cm⁻³, the highest values ever reported for p-type AlGaN/GaN superlattices. Hall effect measurement and admittance spectroscopy on the samples confirm the high quality of the superlattices. The activation energy calculated for p-type GaN and p-type A_0.1Ga_0.9N/GaN superlattice is estimated to be not, vert, similar 125 and 3 meV respectively. [reprint (PDF)]
14.	320x256 infrared focal plane array based on type-II InAs/GaSb superlattice with a 12 μm cutoff wavelength P.Y. Delaunay, B.M. Nguyen, D. Hoffman, and M. Razeghi SPIE Porceedings, Vol. 6542, Orlando, FL 2007, p. 654204-- April 9, 2007 ...[Visit Journal] In the past few years, significant progress has been made in the structure design, growth and processing of Type-II InAs/GaSb superlattice photodetectors. Type-II superlattice demonstrated its ability to perform imaging in the middle and long infra-red range, becoming a potential competitor for technologies such as QWIP and HgCdTe. Using an empirical tight-binding model, we developed a superlattice design that matches the lattice parameter of GaSb substrates and presents a cutoff wavelength of 12 μm. Electrical and optical measurements performed on single element detectors at 77 K showed an R₀A averaging 13 Ω·cm² and a quantum efficiency as high as 54%. We demonstrated high quality material growth with x-ray FWHM below 30 arcsec and an AFM rms roughness of 1.5 Å over an area of 20x20 μm². A 320x256 array of 25x25μm² pixels, hybridized to an Indigo Read Out Integrated Circuit, performed thermal imaging up to 185 K with an operability close to 97%. The noise equivalent temperature difference at 81 K presented a peak at 270 mK, corresponding to a mean value of 340 mK. [reprint (PDF)]
14.	Room temperature continuous wave THz frequency comb based on quantum cascade lasers M. Razeghi; Q. Y. Lu; F. H. Wang; D. H. Wu; S. Slivken Proc. SPIE 11124, Terahertz Emitters, Receivers, and Applications X, 1112407-- September 6, 2019 ...[Visit Journal] Frequency combs, spectra of phase-coherent equidistant lines, have revolutionized time and frequency metrology. The recently developed quantum cascade laser (QCL) comb has exhibits great potential with high power and broadband spectrum. However, in the terahertz (THz) range, cryogenic cooling has to be applied for THz QCL combs. We report a room temperature THz frequency comb at 3.0 THz based on difference-frequency generation from a mid-IR QCL comb. A largely detuned distributed-feedback grating is integrated into the QCL cavity to provide the single mode operation as well as enhanced spatial hole-burning effect for multimode comb operation. Multiheterodyne spectroscopy with multiple equally spaced lines by beating it with a reference Fabry-Pérot comb confirms the THz comb operation. This type of THz comb provides a new solution to chip-based high-speed high-resolution THz spectroscopy with compact size at room temperature. [reprint (PDF)]
14.	Combined resonant tunneling and rate equation modeling of terahertz quantum cascade lasers Zhichao Chen , Andong Liu, Dong Chang , Sukhdeep Dhillon , Manijeh Razeghi , Feihu Wang Journal of Applied Physics, 135, 115703 ...[Visit Journal] Terahertz (THz) quantum cascade lasers (QCLs) are technologically important laser sources for the THz range but are complex to model. An efficient extended rate equation model is developed here by incorporating the resonant tunneling mechanism from the density matrix formalism, which permits to simulate THz QCLs with thick carrier injection barriers within the semi-classical formalism. A self-consistent solution is obtained by iteratively solving the Schrödinger-Poisson equation with this transport model. Carrier-light coupling is also included to simulate the current behavior arising from stimulated emission. As a quasi-ab initio model, intermediate parameters such as pure dephasing time and optical linewidth are dynamically calculated in the convergence process, and the only fitting parameters are the interface roughness correlation length and height. Good agreement has been achieved by comparing the simulation results of various designs with experiments, and other models such as density matrix Monte Carlo and non-equilibrium Green’s function method that, unlike here, require important computational resources. The accuracy, compatibility, and computational efficiency of our model enables many application scenarios, such as design optimization and quantitative insights into THz QCLs. Finally, the source code of the model is also provided in the supplementary material of this article for readers to repeat the results presented here, investigate and optimize new designs. [reprint (PDF)]
14.	Growth of Deep UV Light Emitting Diodes by Metalorganic Chemical Vapor Deposition A. Yasan, R. McClintock, K. Mayes, D. Shiell, S. Darvish, P. Kung and M. Razeghi SPIE Conference, Jose, CA, Vol. 5359, pp. 400-- January 25, 2004 ...[Visit Journal] We demonstrate high power AlGaN based ultraviolet light-emitting diodes (UV LEDs) with an emission wavelength of 280 nm using an asymmetric single quantum well active layer configuration on top of a high-quality AlGaN/AlN template layer grown by metalorganic chemical vapor deposition (MOCVD). An output power of 1.8 mW at a pulsed current of 400 mA was achieved for a single 300 µm × 300 µm diode. This device reached a high peak external quantum efficiency of 0.24% at 40 mA. An array of four diodes produced 6.5 mW at 880 mA of pulsed current. [reprint (PDF)]
14.	p-doped GaAs/Ga_0.51In_0.49P quantum well intersub-band photodetectors J. Hoff, X. He, M. Erdtmann, E. Bigan, M. Razeghi, and G.J. Brown Journal of Applied Physics 78 (3)-- August 1, 1995 ...[Visit Journal] Lattice‐matched p-doped GaAs–Ga_0.51In_0.49P quantum well intersub‐band photodetectors with three different well widths have been grown on GaAs substrates by metal‐organic chemical‐vapor deposition and fabricated into mesa structures. The photoresponse cutoff wavelength varies between 3.5 and 5.5 μm by decreasing the well width from 50 down to 25 Å. Dark current measurements as a function of temperature reveal activation energies for thermionic emission that closely correspond to measured cutoff wavelengths. Experimental results are in reasonable agreement with Kronig–Penney calculations. [reprint (PDF)]
14.	Quantum Sensing Using Type-II InAs/GaSb Superlattice for Infrared Detection M. Razeghi, A. Gin, Y. Wei, J. Bae, and J. Nah Microelectronics Journal, 34 (5-8)-- May 1, 2003 ...[Visit Journal] Large, regular arrays of bulk GaSb and InAs/GaSb Type-II superlattice pillars have been fabricated by electron beam lithography and dry etching. A 2.5 keV electron beam lithography system and metal evaporation are used to form the Au mask on superlattice and bulk substrates. Dry etching of these materials has been developed with BCl3:Ar, CH4:H2:Ar and cyclic CH₄:H₂:Ar/O₂ plasmas. Etch temperatures were varied from 20 to 150 °C. The diameter of the superlattice pillars was below 50 nm with regular 200 nm spacing. Bulk GaSb pillars were etched with diameters below 20 nm. Areas of dense nanopillars as large as 500 μm×500 μm were fabricated. The best height/diameter aspect ratio was approximately 10:1. To date, these are the smallest diameter III–V superlattice pillar structures reported, and the first nanopillars in the InAs/GaSb material system. The basic theory of these devices and surface passivation with SiO₂ and Si₃N₄ thin films has also been discussed. [reprint (PDF)]
14.	High-power, room-temperature and continuous-wave operation of distributed-feedback quantum-cascade lasers at λ = 4.8 µm J.S. Yu, S. Slivken, S.R. Darvish, A. Evans, B. Gokden and M. Razeghi Virtual Journal of Nanoscale Science and Technology 12 (5)-- August 1, 2005 ...[Visit Journal][reprint (PDF)]
14.	ZnO Thin Films & Nanostructures for Emerging Optoelectronic Applications D.J. Rogers, F. Hosseini Teherani, V.E. Sandana, and M. Razeghi SPIE Proceedings, San Francisco, CA (January 22-28, 2010), Vol. 7605, p. 76050K-1-- January 27, 2010 ...[Visit Journal] ZnO-based thin films and nanostructures grown by PLD for various emerging optoelectronic applications. AZO thin films are currently displacing ITO for many TCO applications due to recent improvements in attainable AZO conductivity combined with processing, cost and toxicity advantages. Advances in the channel mobilities and Id on/off ratios in ZnO-based TTFTs have opened up the potential for use as a replacement for a-Si in AM-OLED and AM-LCD screens. Angular-dependent specular reflection measurements of self-forming, moth-eye-like, nanostructure arrays grown by PLD were seen to have <0.5% reflectivity over the whole visible spectrum for angles of incidence between 10 and 60 degrees. Such nanostructures may be useful for applications such as AR coatings on solar cells. Compliant ZnO layers on mismatched/amorphous substrates were shown to have potential for MOVPE regrowth of GaN. This approach could be used as a means to facilitate lift-off of GaN-based LEDs from insulating sapphire substrates and could allow the growth of InGaN-based solar cells on cheap substrates. The green gap in InGaN-based LEDs was combated by substituting low Ts PLD n-ZnO for MOCVD n-GaN in inverted hybrid heterojunctions. This approach maintained the integrity of the InGaN MQWs and gave LEDs with green emission at just over 510 nm. Hybrid n-ZnO/p-GaN heterojunctions were also seen to have the potential for UV (375 nm) EL, characteristic of ZnO NBE emission. This suggests that there was significant hole injection into the ZnO and that such LEDs could profit from the relatively high exciton binding energy of ZnO. [reprint (PDF)]
14.	Molecular beam epitaxial growth of InSb p-i-n photodetectors on GaAs and Si E. Michel, R. Peters, S. Slivken, C. Jelen, P. Bove, J. Xu, I. Ferguson, and M. Razeghi Optoelectronic Integrated Circuit Materials, Physics and Devices, SPIE Conference, San Jose, CA; Proceedings, Vol. 2397-- February 6, 1995 ...[Visit Journal] High quality InSb has been grown by Molecular Beam Epitaxy and optimized using Reflection High Energy Electron Diffraction. A 4.8 micrometers InSb layer grown on GaAs at a growth temperature of 395 degree(s)C and a III/V incorporation ratio of 1:1.2 had an X-ray rocking curve FWHM of 158 arcsec and a Hall mobility of 92300 cm2V-1s-1 at 77 K, the best reported to date for InSb nucleated directly onto GaAs. InSb p-i-n structures of 5.8 micrometers grown under the same conditions demonstrated a X-ray Full Width at Half Maximum of 101 arcsec and 131 arcsec for GaAs and Si substrates, respectively, and exhibited excellent uniformity of +/- 3 arcsec over a 3' substrate. Prototype InSb p-i-n detectors on Si have been fabricated and have demonstrated photovoltaic response at 6.5 micrometers up to 200 K. These p-i-n detectors have also exhibited the highest D* for a device grown onto Si. [reprint (PDF)]
14.	Monolithic integration of a short‐length GaInAs photoconductor with a GaAs/GaAlAs optical waveguide on a GaAs semi‐insulating substrate F. Mallecot; J. F. Vinchant; M. Razeghi; D. Vandermoere; J. P. Vilcot; D. Decoster Appl. Phys. Lett. 53, 2522–2524 (1988)-- December 19, 1988 ...[Visit Journal] We report the first fabrication of a GaO. 47 Inn. 53 As planar photoconductive detector, associated with a GaAs/GaAIAs rib waveguide grown on a semi-insulating GaAs substrate, which needs a short-length absorbing layer to detect the optical signal. Because of the GaAIAs epilayer, a GalnAs length of about 100 tl1n only is needed to detect 90% of the opticai signal, accordingly to results predicted using a four-layer model with complex refractive indices in each layer. [reprint (PDF)]
14.	Al_xGa_1-xN-based back-illuminated solar-blind photodetectors with external quantum efficiency of 89% E. Cicek, R. McClintock, C. Y. Cho, B. Rahnema, and M. Razeghi Appl. Phys. Lett. 103, 191108 (2013)-- November 5, 2013 ...[Visit Journal] We report on high performance Al_xGa_1−xN-based solar-blind ultraviolet photodetector (PD) array grown on sapphire substrate. First, high quality, crack-free AlN template layer is grown via metalorganic chemical vapor deposition. Then, we systematically optimized the device design and material doping through the growth and processing of multiple devices. After optimization, uniform and solar-blind operation is observed throughout the array; at the peak detection wavelength of 275 nm, 729 μm² area PD showed unbiased peak external quantum efficiency and responsivity of ∼80% and ∼176 mA/W, respectively, increasing to 89% under 5 V of reverse bias. Taking the reflection loses into consideration, the internal quantum efficiency of these optimized PD can be estimated to be as high as ∼98%. The visible rejection ratio measured to be more than six orders of magnitude. Electrical measurements yielded a low-dark current density: <2 × 10⁻⁹ A/cm², at 10 V of reverse bias. [reprint (PDF)]
14.	Room temperature operation of 8-12 μm InSbBi infrared photodetectors on GaAs substrates J.J. Lee, J.D. Kim, and M. Razeghi Applied Physics Letters 73 (5)-- August 3, 1998 ...[Visit Journal] We report the room temperature operation of 8–12 μm InSbBi long-wavelength infrared photodetectors. The InSbBi/InSb heterostructures were grown on semi-insulating GaAs (001) substrates by low pressure metalorganic chemical vapor deposition. The voltage responsivity at 10.6 μm was about 1.9 mV/W at room temperature and the corresponding Johnson noise limited detectivity was estimated to be about 1.2×10⁶ cm·Hz^½/W. The carrier lifetime derived from the voltage dependent responsivity measurements was about 0.7 ns. [reprint (PDF)]
14.	High Power 3-12 μm Infrared Lasers: Recent Improvements and Future Trends M. Razeghi, S. Slivken, A. Tahraoui, A. Matlis, and Y.S. Park Physica E: Low-Dimensional Systems and Nanostructures 11 (2-3)-- October 1, 2001 ...[Visit Journal] In this paper, we discuss the progress of quantum cascade lasers (QCLs) grown by gas-source molecular beam epitaxy. Room temperature QCL operation has been reported for lasers emitting between 5-11 μm, with 9-11 μm lasers operating up to 425 K. Laser technology for the 3-5 μm range takes advantage of a strain-balanced active layer design. We also demonstrate record room temperature peak output powers at 9 and 11 μm (2.5 and 1 W, respectively) as well as record low 80K threshold current densities (250 A/cm²) for some laser designs. Preliminary distributed feedback (DFB) results are also presented and exhibit single mode operation for 9 μm lasers at room temperature. [reprint (PDF)]
14.	Investigation of MgZnO/ZnO heterostructures grown on c-sapphire substrates by pulsed laser deposition D. J. Rogers ; F. Hosseini Teherani ; P. Bove ; A. Lusson ; M. Razeghi Proc. SPIE 8626, Oxide-based Materials and Devices IV, 86261X (March 18, 2013)-- March 18, 2013 ...[Visit Journal] MgZnO thin films were grown on c-sapphire and ZnO-coated c-sapphire substrates by pulsed laser deposition from a ZnMgO target with 4 at% Mg. The MgZnO grown on the ZnO underlayer showed significantly better crystal quality than that grown directly on sapphire. AFM studies revealed a significant deterioration in surface morphology for the MgZnO layers compared with the ZnO underlayer. Optical transmission studies indicated a MgZnO bandgap of 3.61eV (compared with 3.34eV for the ZnO), which corresponds to a Mg content of about 16.1 at%. The MgZnO/ZnO heterojunction showed an anomalously low resistivity, which was more than two orders of magnitude less than the MgZnO layer and an order of magnitude lower than that for the ZnO layer. It was suggested that this may be attributable to the presence of a 2D electron gas at the ZnMgO/ZnO heterointerface. [reprint (PDF)]
14.	Comparison of the Physical Properties of GaN Thin Films Deposited on (0112) and (0001) Sapphire Substrates C.J. Sun and M. Razeghi Applied Physics Letters 63 (7)-- August 16, 1993 ...[Visit Journal] A direct comparison of the physical properties of GaN thin films is made as a function of the choice of substrate orientations. Gallium nitride single crystals were grown on (0001) and (0112) sapphire substrates by metalorganic chemical vapor deposition. Better crystallinity with fine ridgelike facets is obtained on the (0112) sapphire. Also lower carrier concentration and higher mobilities indicate both lower nitrogen vacancies and less oxygen incorporation on the (0112) sapphire. The results of this study show better physical properties of GaN thin films achieved on (0112) sapphire. [reprint (PDF)]
14.	InAs/InAs_1-xSb_x type-II superlattices for high performance long wavelength infrared detection M. Razeghi, A. Haddadi, A. M. Hoang, R. Chevallier, S. Adhikary, A. Dehzangi Proc. SPIE 9819, Infrared Technology and Applications XLII, 981909-- May 20, 2016 ...[Visit Journal] We report InAs/InAs1-xSbx type-II superlattice base photodetector as high performance long-wavelength infrared nBn device grown on GaSb substrate. The device has 6 μm-thick absorption region, and shows optical performance with a peak responsivity of 4.47 A/W at 7.9 μm, which is corresponding to the quantum efficiency of 54% at a bias voltage of negative 90 mV, where no anti-reflection coating was used for front-side illumination. At 77K, the photodetector’s 50% cut-off wavelength was ~10 μm. The device shows the detectivity of 2.8x10¹¹ cm•Hz^½/W at 77 K, where RxA and dark current density were 119 Ω•cm² and 4.4x10^-4 A/cm² , respectively, under -90 mV applied bias voltage [reprint (PDF)]
14.	Band edge tunability of M-structure for heterojunction design in Sb based Type-II superlattice photodiodes B.M. Nguyen, D. Hoffman, P.Y. Delaunay, E.K. Huang, M. Razeghi, and J. Pellegrino Applied Physics Letters, Vol. 93, No. 16, p. 163502-1-- October 20, 2008 ...[Visit Journal] We present theoretically and experimentally the effect of the band discontinuity in Type-II misaligned InAs/GaSb superlattice heterodiodes. Calculations using the empirical tight binding method have shown the great flexibility in tuning the energy levels of the band edge in M-structure superlattice as compared to the standard InAs/GaSb superlattice. Through the experimental realization of several p-pi-M-n photodiodes, the band discontinuity alignment between the standard binary-binary superlattice and the M-structured superlattice was investigated via optical characterization. The agreement between the theoretical predictions and the experimental measurement confirms the capability of controlling the M-structure band edges and suggests a way to exploit this advantage for the realization of heterostructures containing an M-structured superlattice without bias dependent operation. [reprint (PDF)]
14.	Aluminum nitride films on different orientations of sapphire and silicon K. Dovidenko, S. Oktyabrsky, J. Narayan, and M. Razeghi Journal of Applied Physics79 (5)-- March 1, 1996 ...[Visit Journal] The details of epitaxial growth and microstrictural characteristics of AlN films grown on sapphire (0001), (1012) and Si (100), (111) substrates were investigated using plan‐view and cross‐sectional high‐resolution transmission electron microscopy and x‐ray diffraction techniques. The films were grown by metalorganic chemical vapor deposition using TMA1+NH3+N2 gas mixtures. Different degrees of epitaxy were observed for the films grown on α‐Al₂O₃ and Si substrates in different orientations. The epitaxial relationship for (0001) sapphire was found to be (0001)AlN∥(0001)sap with in‐plane orientation relationship of [0110]AlN∥[1210]sap. This is equivalent to a 30° rotation in the basal (0001) plane. For (1012) sapphire substrates, the epitaxial relationship was determined to be (1120)AlN∥(1012)sap with the in‐plane alignment of [0001]AlN∥[1011]sap. The AlN films on (0001) α‐Al₂O₃ were found to contain inverted domain boundaries and a/3〈1120〉 threading dislocations with the estimated density of 10¹⁰ cm⁻². The density of planar defects (stacking faults) found in AlN films was considerably higher in the case of (1012) compared to (0001) substrates. Films on Si substrates were found to be highly textured c axis oriented when grown on (111) Si, and c axis textured with random in‐plane orientation on (100) Si. The role of thin‐film defects and interfaces on device fabrication is discussed. [reprint (PDF)]

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