Center for Quantum Devices - Most Downloaded Journal Articles

Page 15 of 24: Prev << 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 >> Next (581 Items)

2.	Al_xGa_1−xN-based solar-blind ultraviolet photodetector based on lateral epitaxial overgrowth of AlN on Si substrate E. Cicek, R. McClintock, C. Y. Cho, B. Rahnema, and M. Razeghi Appl. Phys. Lett. 103, 181113 (2013)-- October 30, 2013 ...[Visit Journal] We report on Al_xGa_1−xN-based solar-blind ultraviolet (UV) photodetector (PD) grown on Si(111) substrate. First, Si(111) substrate is patterned, and then metalorganic chemical vapor deposition is implemented for a fully-coalesced ∼8.5 μm AlN template layer via a pulsed atomic layer epitaxial growth technique. A back-illuminated p-i-n PD structure is subsequently grown on the high quality AlN template layer. After processing and implementation of Si(111) substrate removal, the optical and electrical characteristic of PDs are studied. Solar-blind operation is observed throughout the array; at the peak detection wavelength of 290 nm, 625 μm² area PD showed unbiased peak external quantum efficiency and responsivity of ∼7% and 18.3 mA/W, respectively, with a UV and visible rejection ratio of more than three orders of magnitude. Electrical measurements yielded a low-dark current density below 1.6 × 10⁻⁸ A/cm² at 10 V reverse bias. [reprint (PDF)]
2.	Room temperature neagtive differential resistance characteristics of polar III-nitride resonant tunneling diodes C. Bayram, Z. Vashaei, and M. Razeghi Applied Physics Letters, Vol. 97, No. 9, p. 092104-1-- August 30, 2010 ...[Visit Journal] III-nitride resonant tunneling diodes (RTDs), consisting Al_0.2Ga_0.8N/GaN double-barrier (DB) active layers, were grown on c-plane lateral epitaxial overgrowth (LEO) GaN/sapphire and c-plane freestanding (FS) GaN. RTDs on both templates, fabricated into mesa diameters ranging from 5 to 35 μm, showed negative differential resistance (NDR) at room temperature. NDR characteristics (voltage and current density at NDR onset and current-peak-to-valley ratio) were analyzed and reported as a function of device size and substrate choice. Our results show that LEO RTDs perform as well as FS ones and DB active layer design and quality have been the bottlenecks in III-nitride RTDs. [reprint (PDF)]
2.	Minority electron unipolar photodetectors based on Type-II InAs/GaSb/AlSb superlattices for very long wavelength infrared detection B.M. Nguyen, S. Abdollahi Pour, S. Bogdanov and M. Razeghi SPIE Proceedings, San Francisco, CA (January 22-28, 2010), Vol. 7608, p. 760825-1-- January 22, 2010 ...[Visit Journal] The bandstructure tunability of Type-II antimonide-based superlattices has been significantly enhanced since the introduction of the M-structure superlattice, resulting in significant improvements of Type-II superlattice infrared detectors. By using M-structure, we developed the pMp design, a novel infrared photodetector architecture that inherits the advantages of traditional photoconductive and photovoltaic devices. This minority electron unipolar device consists of an M-structure barrier layer blocking the transport of majority holes in a p-type semiconductor, resulting in an electrical transport due to minority carriers with low current density. Applied for the very long wavelength detection, at 77K, a 14µm cutoff detector exhibits a dark current 3.3 mA·cm⁻², a photoresponsivity of 1.4 A/W at 50mV bias and the associated shot-noise detectivity of 4x10¹⁰ Jones. [reprint (PDF)]
2.	GaInAs/InP nanopillar arrays for long wavelength infrared detection A. Gin, Y. Wei, A. Hood, D. Hoffman, M. Razeghi and G.J. Brown SPIE Conference, Jose, CA, Vol. 5732, pp. 350-- January 22, 2005 ...[Visit Journal] Nanopillar devices have been fabricated from GaInAs/InP QWIP material grown by MOCVD. Using electron beam lithography and reactive ion etching techniques, large, regular arrays of nanopillars with controllable diameters ranging from 150 nm to less than 40 nm have been reproducibly formed. Photoluminescence experiments demonstrate a strong peak wavelength blue shift for nanopillar structures compared to the as-grown quantum well material. Top and bottom metal contacts have been realized using a polyimide planarization and etchback procedure. I-V and noise measurements have been performed. Optical measurements indicate photoconductive response in selected nanopillar arrays. Device peak wavelength response occurs at about 8 µm with peak device responsivity of 420 mA/W. Peak detectivity of 3×10⁸ cm·Hz^½/W has been achieved at -1V bias and 30 K. [reprint (PDF)]
2.	Status of III-V semiconductor thin films and their applications to future OEICs Manijeh Razeghi Proc. SPIE 10267, Integrated Optics and Optoelectronics, 102670T -- June 26, 2017 ...[Visit Journal] In the last decade, semiconductor technology has been advanced to a great extent in terms of electronic and photonic discrete devices. One of the main reasons for such a progress, is the result of advancement in the epitaxial growth techniques such as molecular beam epitaxy (MBE) and metalorganic chemical vapor deposition (MOCVD), where device quality films can be grown with great control over composition, uniformity and thickness. MOCVD has proven to be one of the best growth methods for many IH-V semiconductor thin films 1. Its flexibility and potential to yield a broad range of growth rates resulted in the layers featuring the thicknesses from tens of microns down to several nanometers. Planar structures containing quantum wells with atomically flat interfaces, superlattices, strained or graded-index layers were successfully grown by MOCVD. Furthermore, MOCVD proved its efficiency in producing a laser devices by overgrowth and epitaxy on patterned substrates. The importance of MOCVD is strongly enhanced by the possibility of large-scale production by simultaneous growth on several substrates in one process. Several III-V semiconductor films with bandgaps ranging from infrared to ultraviolet (15 to 0.2 μm) have been successfully grown by MOCVD. [reprint (PDF)]
2.	High-performance bias-selectable dual-band Short-/Mid-wavelength infrared photodetectors and focal plane arrays based on InAs/GaSb/AlSb Type-II superlattices M. Razeghi; A.M. Hoang; A. Haddadi; G. Chen; S. Ramezani-Darvish; P. Bijjam; P. Wijewarnasuriy; E. Decuir Proc. SPIE 8704, Infrared Technology and Applications XXXIX, 87041W (June 18, 2013)-- June 18, 2013 ...[Visit Journal] We report a bias selectable dual-band Type-II superlattice-based short-wave infrared (SWIR) and mid-wave infrared (MWIR) co-located photodetector capable of active and passive imaging. A new double-layer etch-stop scheme is introduced for back-side-illuminated photodetectors, which enhanced the external quantum efficiency both in the SWIR and MWIR spectral regions. Temperature-dependent dark current measurements of pixel-sized 27 μm detectors found the dark current density to be ∼1×10-5 A/cm2 for the ∼4.2 μm cut-off MWIR channel at 140 K. This corresponded to a reasonable imager noise equivalent difference in temperature of ∼49 mK using F/2.3 optics and a 10 ms integration time (tint), which lowered to ∼13 mK at 110 K using and integration time of 30 ms, illustrating the potential for high-temperature operation. The SWIR channel was found to be limited by readout noise below 150 K. An excellent imagery from the dual-band imager exemplifying pixel coincidence is shown. [reprint (PDF)]
2.	Demonstration of shortwavelength infrared photodiodes based on type-II InAs/GaSb/AlSb superlattices A.M. Hoang, G. Chen, A. Haddadi, S. Abdollahi Pour, and M. Razeghi Applied Physics Letters, Vol. 100, No. 21, p. 211101-1-- May 21, 2012 ...[Visit Journal] We demonstrate the feasibility of the InAs/GaSb/AlSb type-II superlattice photodiodes operating at the short wavelength infrared regime below 3 μm. An n-i-p type-II InAs/GaSb/AlSb photodiode was grown with a designed cut-off wavelength of 2 μm on a GaSb substrate. At 150 K, the photodiode exhibited a dark current density of 5.6 × 10⁻⁸ A/cm² and a front-side-illuminated quantum efficiency of 40.3%, providing an associated shot noise detectivity of 1.0 × 10¹³ Jones. The uncooled photodiode showed a dark current density of 2.2 × 10⁻³ A/cm² and a quantum efficiency of 41.5%, resulting in a detectivity of 1.7 × 10¹⁰ Jones [reprint (PDF)]
2.	On the interface properties of ZnO/Si electroluminescent diodes J.L. Pau, J. Piqueras, D.J. Rogers, F. Hosseini Teherani, K. Minder, R. McClintock, and M. Razeghi Journal of Applied Physics, Vol. 107, No. 3, p. 033719-1-- February 1, 2010 ...[Visit Journal] ZnO layers grown on n⁻–Si(100), n⁺–Si(100), and n^––Si(111) substrates by pulsed-laser deposition were found to give electroluminescence. Light emission was observed in the form of discrete spots for currents over 1 mA with a white appearance to the naked eye. The intensity of these spots showed an erratic behavior over time, appearing and disappearing at random, while showing an associated random telegraph noise in the current signal. Regardless the substrate used, the electroluminescence spectra had a main broadband emission centered at about 600 nm and a relatively small peak at around 380 nm which corresponds to the energy of ZnO near band edge emission. Furthermore, the devices exhibited rectifying characteristics, whose current blocking direction depended on the substrate orientation. Optimization of ZnO conductivity and performing sample growth in N₂ ambient were found to be critical to enhance the emission intensity. Rutherford backscattering characterization revealed the existence of an intermixed region at the interface between ZnO and Si. To study the electronic properties at the interface, frequency dependent capacitance measurements were carried out. The junction capacitance became frequency dependent at the bias voltages at which light emission occurs due to the relatively slow trapping and generation processes at deep centers. These centers are believed to play an important role in the mechanism of light emission. [reprint (PDF)]
2.	Demonstration of mid-wavelength infrared nBn photodetectors based on type-II InAs/InAs_1-xSb_x superlattice grown by metal-organic chemical vapor deposition Donghai Wu, Arash Dehzangi, and Manijeh Razeghi Appl. Phys. Lett. 115, 061102-- August 6, 2019 ...[Visit Journal] We report design, growth, and characterization of midwavelength infrared nBn photodetectors based on a type-II InAs/InAs_1-xSb_x superlattice on a GaSb substrate grown by metal-organic chemical vapor deposition. An InAs/AlAs_1-ySb_y/InAs/InAs_1-xSb_x superlattice design was used as the large bandgap electron barrier in the photodetectors. At 150 K, the photodetector exhibits a peak responsivity of 1.23 A/W, corresponding to a quantum efficiency of 41% at an applied bias voltage of −100 mV under front-side illumination, with a 50% cut-off wavelength of 4.6 μm. With an R × A of 356 Ω·cm² and a dark current density of 1.6 × 10⁻⁴ A/cm² under an applied bias of −100 mV at 150 K, the photodetector exhibits a specific detectivity of 1.4 × 10¹¹ cm·Hz^1/2/W. [reprint (PDF)]
2.	Photoluminescence linewidth narrowing in Yb-doped GaN and InGaN thin films K. Dasari, J. Wang, W.M. Jadwisienczak, V. Dierolf, M. Razeghi, R. Palai Journal of Luminescence Volume 209, May 2019, Pages 237-243-- January 14, 2019 ...[Visit Journal] We report on photoluminescence (PL) properties of GaN, GaN:Yb, InGaN, and InGaN:Yb thin films grown on (0001) sapphire substrates by plasma assisted molecular beam epitaxy (MBE). X-ray diffraction pattern of the films confirms c-axis oriented growth. The concentration of Yb and In was obtained by X-ray photoelectron spectroscopy (XPS) and was found to be 5 (+/- 0.5) at.% and 30 (+/- 1.5) at.%, respectively. The GaN:Yb and InGaN:Yb thin films show a significant linewidth narrowing in PL spectra compared to GaN and InGaN thin films. This could be attributed to the reduction of the defect related non-radiative recombination paths and suppression of the structural defects and dislocations because of the in situ rare earth (Yb)-doping during the growth. The temperature dependent photoluminescence of GaN:Yb thin film follows the Varshni model, whereas InGaN:Yb film shows a complex S-shaped like behavior, which can be explained by the localization effect using the Band-Tail model. [reprint (PDF)]
2.	8-13 μm InAsSb heterojunction photodiode operating at near room temperature J.D. Kim, S. Kim, D. Wu, J. Wojkowski, J. Xu, J. Piotrowski, E. Bigan, and M. Razeghi Applied Physics Letters 67 (18)-- October 30, 1995 ...[Visit Journal] p⁺-InSb/π-InAs_1−xSb_x/n⁺-InSb heterojunction photodiodes operating at near room temperature in the 8–13 μm region of infrared (IR) spectrum are reported. A room‐temperature photovoltaic response of up to 13 μm has been observed at 300 K with an x≊0.85 sample. The voltage responsivity‐area product of 3×10⁻⁵ V· cm²/W has been obtained at 300 K for the λ=10.6 μm optimized device. This was close to the theoretical limit set by the Auger mechanism, with a detectivity at room temperature of ≊1.5×10⁸ cm ·Hz^½/W. [reprint (PDF)]
2.	Toward realizing high power semiconductor terahertz laser sources at room temperature Manijeh Razeghi Proc. SPIE 8023, Terahertz Physics, Devices, and Systems V: Advance Applications in Industry and Defense, 802302 (May 25, 2011)-- May 25, 2011 ...[Visit Journal] The terahertz (THz) spectral range offers promising applications in science, industry, and military. THz penetration through nonconductors (fabrics, wood, plastic) enables a more efficient way of performing security checks (for example at airports), as illegal drugs and explosives could be detected. Being a non-ionizing radiation, THz radiation is environment-friendly enabling a safer analysis environment than conventional X-ray based techniques. However, the lack of a compact room temperature THz laser source greatly hinders mass deployment of THz systems in security check points and medical centers. In the past decade, tremendous development has been made in GaAs/AlGaAs based THz Quantum Cascade Laser (QCLs), with maximum operating temperatures close to 200 K (without magnetic field). However, higher temperature operation is severely limited by a small LO-phonon energy (∼ 36 meV) in this material system. With a much larger LO-phonon energy of ∼ 90 meV, III-Nitrides are promising candidates for room temperature THz lasers. However, realizing high quality material for GaN-based intersubband devices presents a significant challenge. Advances with this approach will be presented. Alternatively, recent demonstration of InP based mid-infrared QCLs with extremely high peak power of 120 W at room temperature opens up the possibility of producing high power THz emission with difference frequency generation through two mid-infrared wavelengths. [reprint (PDF)]
2.	High Detectivity InAs Quantum-Dot Infrared Photodetectors Grown on InP by Metalorganic Chemical Vapor Deposition W. Zhang, H. Lim, M. Taguchi, S. Tsao, B. Movaghar, and M. Razeghi Applied Physics Letters, 86 (19)-- May 9, 2005 ...[Visit Journal] We report a high-detectivity InAs quantum-dot infrared photodetector. The InAs quantum dots were grown by self-assembly on InP substrates via low-pressure metal–organic chemical–vapor deposition. Highly uniform quantum dots with a density of 4×10¹⁰ cm² were grown on a GaAs/InP matrix. Photoresponse was observed at temperatures up to 160 K with a peak of 6.4 µm and cutoff of 6.6 µm. Very low dark currents and noise currents were obtained by inserting Al_0.48In_0.52As current blocking layers. The background-limited performance temperature was 100 K. A detectivity of 1.0×10¹⁰ cm·Hz^½/W was obtained at 77 K with a bias of –1.1 V. [reprint (PDF)]
2.	Temperature dependence of the dark current and activation energy at avalanche onset of GaN Avalanche Photodiodes M.P. Ulmer, E. Cicek, R. McClintock, Z. Vashaei and M. Razeghi SPIE Proceedings, Vol. 8460, p. 84601G-1-- August 15, 2012 ...[Visit Journal] We report a study of the performance of an avalanche photodiode (APD) as a function of temperature from 564 K to 74 K. The dark current at avalanche onset decreases from 564 K to 74 K by approximately a factor of 125 and from 300 K to 74K the dark current at avalanche offset is reduced by a factor of about 10. The drop would have been considerably larger if the activation energy at avalanche onset (Ea) did not also decrease with decreasing temperature. These data give us insights into how to improve the single-photon counting performance of a GaN based ADP. [reprint (PDF)]
1.	Growth of Al_xGa_1-xN:Ge on sapphire and silicon substrates X. Zhang, P. Kung, A. Saxler, D. Walker, T.C. Wang, and M. Razeghi Applied Physics Letters 67 (12)-- September 18, 1995 ...[Visit Journal] Al_xGa_1–xN were grown on (00.1) sapphire and (111) silicon substrates in the whole composition range (0 <= x <= 1). The high optical quality of the epilayers was assessed by room-temperature optical absorption and photoluminescence measurements. Layers with higher Al composition are more resistive. Resistive Al_xGa_1–xN epilayers were successfully doped with Ge and free-electron concentration as high as 3 × 10¹⁹ cm^–3 was achieved. [reprint (PDF)]
1.	EPR Investigations of a Structural Phase Change in Lead Phosphate M. RAZEGHI M. RAZEGHI: EPR Investigations of a Structural Phase Change phys. stat. sol. (b) 108, 175 (1981)-- November 1, 1981 ...[Visit Journal] The temperature dependence of the EPR line width of the Mn2+ and Gd3+ in Pb3(PO4)2 is investigated from -270 to 500 °C. At the first-order ferroelastic transition point (180 °C), an abrupt change in the fine-structure splitting as well as in the resonance line width is observed. Various contributions to fine structure D and E parameters of Mn2+ and Gd3+ are computed, using a point-multipole model. For temperatures near to Tc the correlation time of the fluctuations is estimated to be greater than 10−9. [reprint (PDF)]
1.	Long-Wavelength InAsSb Photoconductors Operated at Near Room Temperatures (200-300 K) J.D. Kim, D. Wu, J. Wojkowski, J. Piotrowski, J. Xu, and M. Razeghi Applied Physics Letters., 68 (1),-- January 1, 1996 ...[Visit Journal] Long-wavelength InAs_1−xSb_x photoconductors operated without cryogenic cooling are reported. The devices are based on p-InAs_1−xSb_x/p-InSb heterostructures grown on (100) semi-insulating GaAs substrates by low pressure metalorganic chemical vapor deposition (LP‐MOCVD). Photoreponse up to 14 μm has been obtained in a sample with x=0.77 at 300 K, which is in good agreement with the measured infrared absorption spectra. The corresponding effective lifetime of ≊0.14 ns at 300 K has been derived from stationary photoconductivity. The Johnson noise limited detectivity at λ=10.6 μm is estimated to be about 3.27×10⁷ cm· Hz^½/W at 300 K. [reprint (PDF)]
1.	Temperature dependence of threshold current density J_th and differential efficiency of High Power InGaAsP/GaAs ( λ = 0.8 μm) lasers H. Yi, J. Diaz, I. Eliashevich, M. Stanton, M. Erdtmann, X. He, L. Wang, and M. Razeghi Applied Physics Letters 66 (3)-- January 16, 1995 ...[Visit Journal] An experimental and theoretical study on temperature dependence of the threshold current density J_th and differential efficiency ηd for the InGaAsP/GaAs laser diodes emitting at λ=0.8 μm was performed. Threshold current density J_th increases and differential efficiency η_d decreases as temperature is increased mainly because of thermal broadening of the gain spectrum. However, the measured temperature dependence of J_th and η_d could not be explained when only this effect was considered. In this letter, the temperature dependence of momentum relaxation rate ℏ/τ of carriers was investigated by performing the photoluminescence study. At high temperature, increase of the momentum relaxation rate ℏ/τ leads to reduction of the gain and mobility and increase of the optical loss, causing higher J_th and lower η_d as experimentally observed. The resulting theoretical model provides a good explanation for the mechanism of the increase of J_th and decrease of η_d. [reprint (PDF)]
1.	Demonstration of 256x256 Focal Plane Arrays Based on Al-free GaInAs/InP QWIP J. Jiang, K. Mi, R. McClintock, M. Razeghi, G.J. Brown, and C. Jelen IEEE Photonics Technology Letters 15 (9)-- September 1, 2003 ...[Visit Journal] We report the first demonstration of an infrared focal plane array based on aluminum-free GaInAs-InP quantum-well infrared photodetectors (QWIPs).A unique positive lithography method was developed to perform indium-bump liftoff. The noise equivalent differential temperature (NEΔT) of 29 mK was achieved at 70 K with f/2 optics. [reprint (PDF)]
1.	Room temperature continuous wave THz frequency comb based on quantum cascade lasers M. Razeghi; Q. Y. Lu; F. H. Wang; D. H. Wu; S. Slivken Proc. SPIE 11124, Terahertz Emitters, Receivers, and Applications X, 1112407-- September 6, 2019 ...[Visit Journal] Frequency combs, spectra of phase-coherent equidistant lines, have revolutionized time and frequency metrology. The recently developed quantum cascade laser (QCL) comb has exhibits great potential with high power and broadband spectrum. However, in the terahertz (THz) range, cryogenic cooling has to be applied for THz QCL combs. We report a room temperature THz frequency comb at 3.0 THz based on difference-frequency generation from a mid-IR QCL comb. A largely detuned distributed-feedback grating is integrated into the QCL cavity to provide the single mode operation as well as enhanced spatial hole-burning effect for multimode comb operation. Multiheterodyne spectroscopy with multiple equally spaced lines by beating it with a reference Fabry-Pérot comb confirms the THz comb operation. This type of THz comb provides a new solution to chip-based high-speed high-resolution THz spectroscopy with compact size at room temperature. [reprint (PDF)]
1.	Wafer-scale epitaxial lift-off of optoelectronic grade GaN from a GaN substrate using a sacrificial ZnO interlayer Akhil Rajan, David J Rogers, Cuong Ton-That, Liangchen Zhu, Matthew R Phillips, Suresh Sundaram, Simon Gautier, Tarik Moudakir, Youssef El-Gmili, Abdallah Ougazzaden, Vinod E Sandana, Ferechteh H Teherani, Philippe Bove, Kevin A Prior, Zakaria Djebbour, Ryan McClintock and Manijeh Razeghi Journal of Physics D: Applied Physics, Volume 49, Number 31 -- July 15, 2016 ...[Visit Journal] Full 2 inch GaN epilayers were lifted off GaN and c-sapphire substrates by preferential chemical dissolution of sacrificial ZnO underlayers. Modification of the standard epitaxial lift-off (ELO) process by supporting the wax host with a glass substrate proved key in enabling full wafer scale-up. Scanning electron microscopy and x-ray diffraction confirmed that intact epitaxial GaN had been transferred to the glass host. Depth-resolved cathodoluminescence (CL) analysis of the bottom surface of the lifted-off GaN layer revealed strong near-band-edge (3.33 eV) emission indicating a superior optical quality for the GaN which was lifted off the GaN substrate. This modified ELO approach demonstrates that previous theories proposing that wax host curling was necessary to keep the ELO etch channel open do not apply to the GaN/ZnO system. The unprecedented full wafer transfer of epitaxial GaN to an alternative support by ELO offers the perspective of accelerating industrial adoption of the expensive GaN substrate through cost-reducing recycling. [reprint (PDF)]
1.	Gallium nitride on silicon for consumer & scalable photonics C. Bayram, K.T. Shiu, Y. Zhu, C.W. Cheng, D.K. Sadana, Z. Vashaei, E. Cicek, R. McClintock and M. Razeghi SPIE Proceedings, Vol. 8631, p. 863112-1, Photonics West, San Francisco, CA-- February 4, 2013 ...[Visit Journal] Gallium Nitride (GaN) is a unique material system that has been heavily exploited for photonic devices thanks to ultraviolet-to-terahertz spectral tunability. However, without a cost effective approach, GaN technology is limited to laboratory demonstrations and niche applications. In this investigation, integration of GaN on Silicon (100) substrates is attempted to enable widespread application of GaN based optoelectronics. Controlled local epitaxy of wurtzite phase GaN on on-axis Si(100) substrates is demonstrated via metal organic chemical vapor deposition (MOCVD). CMOS-compatible fabrication scheme is used to realize [SiO2-Si{111}-Si{100}] groove structures on conventional 200-mm Si(100) substrates. MOCVD growth (surface treatment, nucleation, initiation) conditions are studied to achieve controlled GaN epitaxy on such grooved Si(100) substrates. Scanning electron microscopy and transmission electron microscopy techniques are used to determine uniformity and defectivity of the GaN. Our results show that aforementioned groove structures along with optimized MOCVD growth conditions can be used to achieve controlled local epitaxy of wurtzite phase GaN on on-axis Si(100) substrates. [reprint (PDF)]
1.	Novel Green Light Emitting Diodes: Exploring Droop-Free Lighting Solutions for a Sustainable Earth M. Razeghi, C. Bayram, R. McClintock, F. Hosseini Teherani, D.J. Rogers, and V.E. Sandana Journal of Light Emitting Diodes, Vol. 2, No. 1, p. 1-33-- April 30, 2010 ...[Visit Journal] The total annual energy consumption in the United States for lighting is approximately 800 Terawatt-hours and costs $80 billion to the public. The energy consumed for lighting throughout the world entails to greenhouse gas emission equivalent to 70% of the emissions from all the cars in the world. Novel solutions to lighting with higher efficiency will drastically reduce the energy consumption and help greenhouse gas emissions to be lowered. Novel green light emitting diodes are the key components of an affordable, durable and environmentally benign lighting solution that can achieve unique spectral quality and promise superior energy conversion efficiency. Light-emitting diodes (LEDs), based on the InGaN alloy, are currently the most promising candidates for realizing solid state lighting (SSL). InGaN is a direct wide bandgap semiconductor with an emission that can span the entire visible spectrum via compositional tuning. However, InGaN LED performance remains wavelength-dependent. Indeed, ultrabright and efficient blue InGaN-based LEDs are readily available but the performance of InGaN-based green LEDs is still far from adequate for use in SSL. Our recent work demonstrated hybrid green light-emitting diodes (LEDs) comprised of n-ZnO/(InGaN/GaN) multi-quantum-wells/p-GaN were grown on semi-insulating AlN/sapphire using pulsed laser deposition for the n-ZnO and metal organic chemical vapor deposition for the other layers.. We have shown that atop grown ZnO layer by Pulsed Laser Deposition can be a good replacement for GaN. The green wavelength emission requires significant indium content in the active layer (growth temperature ~ 700ºC) that makes InGaN quantum wells very susceptible to thermal degradation. With our technology, diffusion and segregation of indium in the green emitting active is inhibited thanks to the lower ZnO deposition temperatures (<600ºC) than is required for GaN (>1000ºC). Our novel technology preserves the integrity of the as-grown active layer and demonstrates superior green spectral quality (as demonstrated for LEDs on c-sapphire). The results indicate that hybrid LED structures could hold prospects for the development of green LEDs with superior performance.
1.	Stranski-Krastanov growth of InGaN quantum dots emitting in green spectra C. Bayram and M. Razeghi Applied Physics A: Materials Science and Processing, Vol. 96, No. 2, p. 403-408-- August 1, 2009 ...[Visit Journal] Self-assembled InGaN quantum dots (QDs) were grown on GaN templates by metalorganic chemical vapor deposition. 2D–3D growth mode transition through Stranski–Krastanov mode was observed via atomic force microscopy. The critical thickness for In_0.67Ga_0.33N QDs was determined to be four monolayers. The effects of growth temperature, deposition thickness, and V/III ratio on QD formation were examined. The capping of InGaN QDs with GaN was analyzed. Optimized InGaN quantum dots emitted in green spectra at room temperature. [reprint (PDF)]
1.	Band edge tunability of M-structure for heterojunction design in Sb based Type-II superlattice photodiodes B.M. Nguyen, D. Hoffman, P.Y. Delaunay, E.K. Huang, M. Razeghi, and J. Pellegrino Applied Physics Letters, Vol. 93, No. 16, p. 163502-1-- October 20, 2008 ...[Visit Journal] We present theoretically and experimentally the effect of the band discontinuity in Type-II misaligned InAs/GaSb superlattice heterodiodes. Calculations using the empirical tight binding method have shown the great flexibility in tuning the energy levels of the band edge in M-structure superlattice as compared to the standard InAs/GaSb superlattice. Through the experimental realization of several p-pi-M-n photodiodes, the band discontinuity alignment between the standard binary-binary superlattice and the M-structured superlattice was investigated via optical characterization. The agreement between the theoretical predictions and the experimental measurement confirms the capability of controlling the M-structure band edges and suggests a way to exploit this advantage for the realization of heterostructures containing an M-structured superlattice without bias dependent operation. [reprint (PDF)]

Page 15 of 24: Prev << 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 >> Next (581 Items)