Center for Quantum Devices - Most Downloaded Journal Articles

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14.	Recent Advances in LWIR Type-II InAs/GaSb Superlattice Photodetectors and Focal Plane Arrays at the Center for Quantum Devices M. Razeghi, D. Hoffman, B.M. Nguyen, P.Y. Delaunay, E.K. Huang, M.Z. Tidrow, and V. Nathan IEEE Proceedings, Vol. 97, No. 6, p. 1056-1066-- June 1, 2009 ...[Visit Journal] In recent years, Type-II InAs/GaSb superlattice photo-detectors have experienced significant improvements in material quality, structural designs, and imaging applications. They now appear to be a possible alternative to the state-of-the-art HgCdTe (MCT) technology in the long and very long wavelength infrared regimes. At the Center for Quantum Devices, we have successfully realized very high quantum efficiency, very high dynamic differential resistance R₀A - product LWIR Type – II InAs/GaSb superlattice photodiodes with efficient surface passivation techniques. The demonstration of high quality LWIR Focal Plane Arrays that were 100 % fabricated in - house reaffirms the pioneer position of this university-based laboratory. [reprint (PDF)]
14.	Recent progress of widely tunable, CW THz sources based QCLs at room temperature Manijeh Razeghi Terahertz Science and Technology, Vol.10, No.4, pp. 87-151-- December 7, 2017 ...[Visit Journal] The THz spectral region is of significant interest to the scientific community, but is one of the hardest regions to access with conventional technology. A wide range of compelling new applications are initiating a new revolution in THz technology, especially with regard to the development of compact and versatile devices for THz emission and detection. In this article, recent advances with regard to III-V semiconductor optoelectronics are explored with emphasis on how these advances will lead to the next generation of THz component technology [reprint (PDF)]
14.	EPR Investigations of a Structural Phase Change in Lead Phosphate M. RAZEG M. RAZEGHI: EPR Investigations of a Structural Phase Change, phys. stat. sol. (b) 108, 175 (1981)-- April 10, 2010 ...[Visit Journal] The temperature dependence of the EPR line width of the Mn2+ and Gd3+ in Pb,(PO,), is investigated from -270 to 500 "C. At the first-order ferroelastic transition point (180 "C), an abrupt change in the fine-structure splitting as well as in the resonance line width is observed. Various contributions to fine structure D and E parameters of Mn2+ and Gd3+ are computed, using a point-multipole model. For temperatures near to Tc the correlation time of the fluctuations is estimated to be greater than Die Temperaturabhangigkeit der EPR-Linienbreite von Mn2+,'und Gd3+ in Pb,(PO,), wird zwischen -270 und 500 "C untersucht. Am ferroelastischen vbergangspunkt erster Ordnung (180 "C) wird eine abrupte Anderung der Feinstrukturaufspaltung sowie der Linienbreite der Resonanzlinien beobachtet. Verschiedene Beitrage zu den Feinstrukturparametern D und E von Mn2+ und Gd3+ werden mittels eines Punkt-Multipol-Modells berechnet. Fur Temperaturen in der Nahe von T, wird die Korrelationszeit der Fluktuationen eu groI3er als s. s bestimmt. [reprint (PDF)]
14.	Hybrid green LEDs with n-type ZnO substituted for N-type GaN in an inverted P-N junction F. Hosseini Teherani; M. Razeghi; D.J. Rogers; Can Bayram; R. McClintock LEOS Annual Meeting Conference Proceedings, LEOS '09. IEEE, [5343231] (2009) -- October 4, 2009 ...[Visit Journal] Recently, the GaN and ZnO materials systems have attracted considerable attention because of their use in a broad range of emerging applications including light-emitting diodes (LEDs) and solar cells. GaN and ZnO are similar materials with direct wide bandgaps, wurtzite crystal structure, high thermal stability and comparable thermal expansion coefficients, which makes them well suited for heterojunction fabrication. Two important advantages of GaN over ZnO are the reliable p-type doping and the mature know-how for bandgap engineering. Thus GaN-based LEDs can be made to emit from the deep UV right into the green through alloying with Al and In, respectively. The performance is not identical at all wavelengths, however, and the performance of InGaN-based green LEDs is still relatively poor. [reprint (PDF)]
14.	Temperature dependence of the dark current and activation energy at avalanche onset of GaN Avalanche Photodiodes M.P. Ulmer, E. Cicek, R. McClintock, Z. Vashaei and M. Razeghi SPIE Proceedings, Vol. 8460, p. 84601G-1-- August 15, 2012 ...[Visit Journal] We report a study of the performance of an avalanche photodiode (APD) as a function of temperature from 564 K to 74 K. The dark current at avalanche onset decreases from 564 K to 74 K by approximately a factor of 125 and from 300 K to 74K the dark current at avalanche offset is reduced by a factor of about 10. The drop would have been considerably larger if the activation energy at avalanche onset (Ea) did not also decrease with decreasing temperature. These data give us insights into how to improve the single-photon counting performance of a GaN based ADP. [reprint (PDF)]
14.	High speed type-II superlattice based photodetectors transferred on sapphire Arash Dehzangi, Ryan McClintock, Donghai Wu, Jiakai Li, Stephen Johnson, Emily Dial and Manijeh Razeghi Applied Physics Express, Volume 12, Number 11-- October 3, 2019 ...[Visit Journal] We report the substrate transfer of InAs/GaSb/AlSb based type-II superlattice (T2SL) e-SWIR photodetector from native GaSb substrates to low loss sapphire substrate in order to enhance the frequency response of the device. We have demonstrated the damage-free transfer of T2SL-based thin-films to sapphire substrate using top–down processing and a chemical epilayer release technique. After transfer the −3 dB cut-off frequency increased from 6.4 GHz to 17.2 GHz, for 8 μm diameter circular mesas under -15 V applied bias. We also investigated the cut-off frequency verses applied bias and lateral scaling to assess the limitations for even higher frequency performance. Direct Link [reprint (PDF)]
14.	Monolithic integration of a short‐length GaInAs photoconductor with a GaAs/GaAlAs optical waveguide on a GaAs semi‐insulating substrate F. Mallecot; J. F. Vinchant; M. Razeghi; D. Vandermoere; J. P. Vilcot; D. Decoster Appl. Phys. Lett. 53, 2522–2524 (1988)-- December 19, 1988 ...[Visit Journal] We report the first fabrication of a GaO. 47 Inn. 53 As planar photoconductive detector, associated with a GaAs/GaAIAs rib waveguide grown on a semi-insulating GaAs substrate, which needs a short-length absorbing layer to detect the optical signal. Because of the GaAIAs epilayer, a GalnAs length of about 100 tl1n only is needed to detect 90% of the opticai signal, accordingly to results predicted using a four-layer model with complex refractive indices in each layer. [reprint (PDF)]
14.	Quantum Sensing Using Type-II InAs/GaSb Superlattice for Infrared Detection M. Razeghi, A. Gin, Y. Wei, J. Bae, and J. Nah Microelectronics Journal, 34 (5-8)-- May 1, 2003 ...[Visit Journal] Large, regular arrays of bulk GaSb and InAs/GaSb Type-II superlattice pillars have been fabricated by electron beam lithography and dry etching. A 2.5 keV electron beam lithography system and metal evaporation are used to form the Au mask on superlattice and bulk substrates. Dry etching of these materials has been developed with BCl3:Ar, CH4:H2:Ar and cyclic CH₄:H₂:Ar/O₂ plasmas. Etch temperatures were varied from 20 to 150 °C. The diameter of the superlattice pillars was below 50 nm with regular 200 nm spacing. Bulk GaSb pillars were etched with diameters below 20 nm. Areas of dense nanopillars as large as 500 μm×500 μm were fabricated. The best height/diameter aspect ratio was approximately 10:1. To date, these are the smallest diameter III–V superlattice pillar structures reported, and the first nanopillars in the InAs/GaSb material system. The basic theory of these devices and surface passivation with SiO₂ and Si₃N₄ thin films has also been discussed. [reprint (PDF)]
14.	Crystallography of epitaxial growth of wurtzite-type thin films on sapphire substrates P. Kung, C.J. Sun, A. Saxler, H. Ohsato, and M. Razeghi Journal of Applied Physics 75 (9)-- May 1, 1994 ...[Visit Journal] In this article, we present a crystallographic model to describe the epitaxial growth of wurtzite‐type thin films such as gallium nitride (GaN) on different orientations of sapphire (Al2O3) substrates. Through this model, we demonstrate the thin films grown on (00⋅1)Al₂O₃ have a better epilayer‐substrate interface quality than those grown on (01⋅2)Al₂O₃. We also show the epilayer grown on (00⋅1)Al₂O₃ are gallium‐terminated, and both (00⋅1) and (01⋅2) surfaces of sapphire crystals are oxygen‐terminated. [reprint (PDF)]
14.	Comprehensive study of blue and green multi-quantum-well light-emitting diodes grown on conventional and lateral epitaxial overgrowth GaN C. Bayram, J.L. Pau, R. McClintock and M. Razeghi Applied Physics B: Lasers and Optics, Vol. 95, p. 307-314-- November 29, 2008 ...[Visit Journal] Growths of blue and green multi-quantum wells (MQWs) and light-emitting diodes (LEDs) are realized on lateral epitaxial overgrowth (LEO) GaN, and compared with identical structures grown on conventional GaN. Atomic force microscopy is used to confirm the significant reduction of dislocations in the wing region of our LEO samples before active-region growth. Differences between surface morphologies of blue and green MQWs are analyzed. These MQWs are integrated into LEDs. All devices show a blue shift in the electroluminescence (EL) peak and narrowing in EL spectra with increasing injection current, both characteristics attributed to the band-gap renormalization. Green LEDs show a larger EL peak shift and a broader EL spectrum due to larger piezoelectric field and more indium segregation in the MQWs, respectively. Blue LEDs on LEO GaN show a higher performance than those on conventional GaN; however, no performance difference is observed for green LEDs on LEO GaN versus conventional GaN. The performance of the green LEDs is shown to be primarily limited by the active layer growth quality. [reprint (PDF)]
14.	Demonstration of high performance bias-selectable dual-band short-/mid-wavelength infrared photodetectors based on type-II InAs/GaSb/AlSb superlattices A.M. Hoang, G. Chen, A. Haddadi and M. Razeghi Applied Physics Letters, Vol. 102, No. 1, p. 011108-1-- January 7, 2013 ...[Visit Journal] High performance bias-selectable dual-band short-/mid-wavelength infrared photodetector based on InAs/GaSb/AlSb type-II superlattice with designed cut-off wavelengths of 2 μm and 4 μm was demonstrated. At 150 K, the short-wave channel exhibited a quantum efficiency of 55%, a dark current density of 1.0 × 10⁻⁹ A/cm² at −50 mV bias voltage, providing an associated shot noise detectivity of 3.0 × 10¹³ Jones. The mid-wavelength channel exhibited a quantum efficiency of 33% and a dark current density of 2.6 × 10⁻⁵ A/cm² at 300 mV bias voltage, resulting in a detectivity of 4.0 × 10¹¹ Jones. The spectral cross-talk between the two channels was also discussed for further optimization. [reprint (PDF)]
14.	Performance characteristics of high-purity mid-wave and long-wave infrared type-II InAs/GaSb superlattice infrared photodiodes A. Hood, M. Razeghi, V. Nathan and M.Z. Tidrow SPIE Conference, San Jose, CA, Vol. 6127, pp. 61270U-- January 23, 2006 ...[Visit Journal] The authors report on recent advances in the development of mid-, long-, and very long-wavelength infrared (MWIR, LWIR, and VLWIR) Type-II InAs/GaSb superlattice infrared photodiodes. The residual carrier background of binary Type-II InAs/GaSb superlattice photodiodes of cut-off wavelengths around 5 µm has been studied in the temperature range between 10 and 200 K. A four-point, capacitance-voltage technique on mid-wavelength and long-wavelength Type-II InAs/GaSb superlattice infrared photodiodes reveal residual background concentrations around 5×10¹⁴ cm^-3. Additionally, recent progress towards LWIR photodiodes for focal plane array imaging applications is presented. [reprint (PDF)]
14.	Very High Average Power at Room Temperature from λ ~ 5.9 μm Quantum Cascade Lasers J.S. Yu, S. Slivken, A. Evans, J. David and M. Razeghi Virtual Journal of Nanoscale Science & Technology 26-- May 26, 2003 ...[Visit Journal][reprint (PDF)]
14.	High power, electrically tunable quantum cascade lasers Steven Slivken; Manijeh Razeghi Proc. SPIE 9755, Quantum Sensing and Nano Electronics and Photonics-- February 13, 2016 ...[Visit Journal] Mid-infrared laser sources (3-14 μm wavelengths) which have wide spectral coverage and high output power are attractive for many applications. This spectral range contains unique absorption fingerprints of most molecules, including toxins, explosives, and nerve agents. Infrared spectroscopy can also be used to detect important biomarkers, which can be used for medical diagnostics by means of breath analysis. The challenge is to produce a broadband midinfrared source which is small, lightweight, robust, and inexpensive. We are currently investigating monolithic solutions using quantum cascade lasers. A wide gain bandwidth is not sufficient to make an ideal spectroscopy source. Single mode output with rapid tuning is desirable. For dynamic wavelength selection, our group is developing multi-section laser geometries with wide electrical tuning (hundreds of cm-1). These devices are roughly the same size as a traditional quantum cascade lasers, but tuning is accomplished without any external optical components. When combined with suitable amplifiers, these lasers are capable of multi-Watt single mode output powers. This manuscript will describe our current research efforts and the potential for high performance, broadband electrical tuning with the quantum cascade laser. [reprint (PDF)]
14.	Type-II InAs/GaSb photodiodes and focal plane arrays aimed at high operating temperatures M. Razeghi, S. Abdollahi Pour, E.K. Huang, G. Chen, A. Haddadi, and B.M. Nguyen Opto-Electronics Review (OER), Vol. 19, No. 3, June 2011, p. 46-54-- June 1, 2011 ...[Visit Journal] Recent efforts to improve the performance of type-II InAs/GaSb superlattice photodiodes and focal plane arrays (FPA) have been reviewed. The theoretical bandstructure models have been discussed first. A review of recent developments in growth and characterization techniques is given. The efforts to improve the performance of MWIR photodiodes and focal plane arrays (FPAs) have been reviewed and the latest results have been reported. It is shown that these improvements has resulted in background limited performance (BLIP) of single element photodiodes up to 180 K. FPA shows a constant noise equivalent temperature difference (NEDT) of 11 mK up to 120 K and it shows human body imaging up to 170 K. [reprint (PDF)]
14.	Solar-Blind Al_xGa_1-xN p-i-n Photodetectors grown on LEO and non-LEO GaN P. Sandvik, D. Walker, P. Kung, K. Mi, F. Shahedipour, V. Kumar, X. Zhang, J. Diaz, C. Jelen, and M. Razeghi SPIE Conference, San Jose, CA, Vol. 3948, pp. 265 -- January 26, 2000 ...[Visit Journal] The III-Nitride material system is an excellent candidate for UV photodetector applications due to its wide, direct bandgaps and robust material nature. However, despite many inherent material advantages, the III-Nitride material system typically suffers from a large number of extended defects which degrade material quality and device performance. One technique aimed at reducing defect densities in these materials is lateral epitaxial overgrowth (LEO). In this work, we present a preliminary comparison between AlGaN UV, solar-blind p-i-n photodiodes fabricated form LEO GaN and non-LEO GaN. Improvements in both responsivity and rejection ratio are observed, however, further device improvements are necessary. For these, we focus on the optimization of the p- i-n structure and a reduction in contact resistivity to p- GaN and p-AlGaN layers. By improving the structure of the device, GaN p-i-n photodiodes were fabricated and demonstrate 86 percent internal quantum efficiency at 362 nm and a peak to visible rejection ratio of 105. Contact treatments have reduced the contact resistivity to p-GaN and p-AlGaN by over one order of magnitude form our previous results. [reprint (PDF)]
14.	Radiative recombination of confined electrons at the MgZnO/ ZnO heterojunction interface Sumin Choi, David J. Rogers, Eric V. Sandana, Philippe Bove, Ferechteh H. Teherani, Christian Nenstiel, Axel Hoffmann, Ryan McClintock, Manijeh Razeghi, David Look, Angus Gentle, Matthew R. Phillips & Cuong Ton-That Nature Scientific Reports 7, pp. 7457-- August 7, 2017 ...[Visit Journal] We investigate the optical signature of the interface in a single MgZnO/ZnO heterojunction, which exhibits two orders of magnitude lower resistivity and 10 times higher electron mobility compared with the MgZnO/Al₂O₃ film grown under the same conditions. These impressive transport properties are attributed to increased mobility of electrons at the MgZnO/ZnO heterojunction interface. Depthresolved cathodoluminescence and photoluminescence studies reveal a 3.2 eV H-band optical emission from the heterointerface, which exhibits excitonic properties and a localization energy of 19.6 meV. The emission is attributed to band-bending due to the polarization discontinuity at the interface, which leads to formation of a triangular quantum well and localized excitons by electrostatic coupling. [reprint (PDF)]
14.	Ammonium Sulfide Passivation of Type-II InAs/GaSb Superlattice Photodiodes A. Gin, Y. Wei, A. Hood, A. Bajowala, V. Yazdanpanah, M. Razeghi and M.Z. Tidrow Applied Physics Letters, 84 (12)-- March 22, 2004 ...[Visit Journal] We report on the surface passivation of Type-II InAs/GaSb superlattice photodetectors using various ammonium sulfide solutions. Compared to unpassivated detectors, zero-bias resistance of treated 400 µm×400 µm devices with 8 µm cutoff wavelength was improved by over an order of magnitude to ~20 kΩ at 80 K. Reverse-bias dark current density was reduced by approximately two orders of magnitude to less than 10 mA/cm² at –2 V. Dark current modeling, which takes into account trap-assisted tunneling, indicates greater than 70 times reduction in bulk trap density for passivated detectors. [reprint (PDF)]
14.	High quantum efficiency two color type-II InAs/GaSb n-i-p-p-i-n photodiodes P.Y. Delaunay, B.M. Nguyen, D. Hoffman, A. Hood, E.K. Huang, M. Razeghi, and M.Z. Tidrow Applied Physics Letters, Vol. 92, No. 11, p. 111112-1-- March 17, 2008 ...[Visit Journal] A n-i-p-p-i-n photodiode based on type-II InAs/GaSb superlattice was grown on a GaSb substrate. The two channels, with respective 50% of responsivity cutoff wavelengths at 7.7 and 10 µm, presented quantum efficiencies (QEs) of 47% and 39% at 77 K. The devices can be operated as two diodes for simultaneous detection or as a single n-i-p-p-i-n detector for sequential detection. In the latter configuration, the QEs at 5.3 and 8.5 µm were measured as high as 40% and 39% at 77 K. The optical cross-talk between the two channels could be reduced from 0.36 to 0.08 by applying a 50 mV bias. [reprint (PDF)]
14.	Comparison of ultraviolet APDs grown on free-standing GaN and sapphire substrates E. Cicek, Z. Vashaei, C. Bayram, R. McClintock, M. Razeghi and M. Ulmer Proceedings, Vol. 7780, p. 77801P, SPIE Optics and Photonics Symposium, Conference on Detectors and Imaging Devices: Infrared, Focal Plane and Single Photon, San Diego, CA -- August 4, 2010 ...[Visit Journal] There is a need for semiconductor-based ultraviolet photodetectors to support avalanche gain in order to realize better performance andmore effective compete with existing technologies. Wide bandgap III-Nitride semiconductors are the promising material system for the development of avalanche photodiodes (APDs) that could be a viable alternative to current bulky UV detectors such as photomultiplier tubes. In this paper, we review the current state-of-the-art in IIINitride visible-blind APDs, and present our latest results on GaN APDs grown on both conventional sapphire and low dislocation density free-standing c- and m-plane GaN substrates. Leakage current, gain, and single photon detection efficiency (SPDE) of these APDs were compared. The spectral response and Geiger-mode photon counting performance of UV APDs are studied under low photon fluxes, with single photon detection capabilities as much as 30% being demonstrated in smaller devices. Geiger-mode operation conditions are optimized for enhanced SPDE. [reprint (PDF)]
14.	MOCVD challenge for III-V semiconductor materials for photonic and electronic devices on alternative substrates M. Razeghi, M. Defour , F. Omnes, P. Maurel , E. Bigan , O. Acher, J. Nagle, F. Brillouet , J.C. Portal M. Razeghi, M. Defour, F. Omnes, P. Maurel, E. Bigan, O. Acher, J. Nagle, F. Brillouet, J.C. Portal, MOCVD challenge for III-V semiconductor materials for photonic and electronic devices on alternative substrates, Journal of Crystal Growth, Volume 93, Issues 1–4, 1988, Pages 776-781,-- January 1, 1988 ...[Visit Journal] High quality II[-V semiconductor heterojunctions, quantum wells and superlauices have been grown on lattice matched and alternative substrates such as silicon for photonic and electronic devices, using low pressure metalorganic chemical vapor deposition growth technique. [reprint (PDF)]
14.	Surface leakage current reduction in long wavelength infrared type-II InAs/GaSb superlattice photodiodes S. Bogdanov, B.M. Nguyen, A.M. Hoang, and M. Razeghi Applied Physics Letters, Vol. 98, No. 18, p. 183501-1-- May 2, 2011 ...[Visit Journal] Dielectric passivation of long wavelength infrared Type-II InAs/GaSb superlattice photodetectors with different active region doping profiles has been studied. SiO₂ passivation was shown to be efficient as long as it was not put in direct contact with the highly doped superlattice. A hybrid graded doping profile combined with the shallow etch technique reduced the surface leakage current in SiO₂ passivated devices by up to two orders of magnitude compared to the usual design. As a result, at 77 K the SiO(2) passivated devices with 10.5 μm cutoff wavelength exhibit an R₀A of 120 Ω·cm², R_maxA of 6000 Ω·cm², and a dark current level of 3.5×10⁻⁵ A·cm⁻² at −50 mV bias. [reprint (PDF)]
14.	Effects of substrate quality and orientation on the characteristics of III-nitride resonant tunneling diodes Z. Vashaei, C. Bayram, R. McClintock and M. Razeghi SPIE Proceedings, San Francisco, CA (January 22-27, 2011), Vol 7945, p. 79451A-- January 23, 2011 ...[Visit Journal] Al(Ga)N/GaN resonant tunneling diodes (RTDs) are grown by metal-organic chemical vapor deposition. The effects of material quality on room temperature negative differential resistance (NDR) behaviour of RTDs are investigated by growing the RTD structure on AlN, GaN, and lateral epitaxial overgrowth GaN templates. This reveals that NDR characteristics of RTDs are very sensitive to material quality (such as surface roughness and dislocations density). The effects of the aluminum content of AlGaN double barriers (DB) and polarization fields on NDR characteristic of AlGaN/GaN RTDs were also investigated by employing low dislocation density c-plane (polar) and m-plane (nonpolar) freestanding GaN substrates. Lower aluminum content in the DB RTD active layer and minimization of dislocations and polarization fields enabled a more reliable and reproducible NDR behaviour at room temperature. [reprint (PDF)]
14.	Efficiency of photoluminescence and excess carrier confinement in InGaAsP/GaAs structures prepared by metal-organic chemical vapor deposition J. Diaz, H.J. Yi, M. Erdtmann, X. He, E. Kolev, D. Garbuzov, E. Bigan, and M. Razeghi Journal of Applied Physics 76 (2)-- July 15, 1994 ...[Visit Journal] Special double‐ and separate‐confinement InGaAsP/GaAs heterostructures intended for photoluminescence measurements have been grown by low‐pressure metal‐organic chemical‐vapor deposition. The band gap of the active region quaternary material was close to 1.5 eV, and the waveguide of the separate‐confinement structures was near 1.8 eV. Measurement of the integrated luminescence efficiency at 300 K has shown that over a wide range of excitation level (10–10³ W/cm²) radiative transitions are the dominant mechanism for excess carrier recombination in the active region of the structures studied. As determined by spectral measurements, the excess carrier concentration in the waveguide of the separate‐confinement heterostructures and the intensity of the waveguide emission band correspond to a condition of thermal equilibrium of the excess carrier populations in the active region and the waveguide. The ratio of the intensity of the waveguide emission to the active region emission fits a model which assumes that the barrier height for minority carriers (holes) is equal to the difference in band gaps between the active region and the waveguide region. [reprint (PDF)]
14.	Aluminum nitride films on different orientations of sapphire and silicon K. Dovidenko, S. Oktyabrsky, J. Narayan, and M. Razeghi Journal of Applied Physics79 (5)-- March 1, 1996 ...[Visit Journal] The details of epitaxial growth and microstrictural characteristics of AlN films grown on sapphire (0001), (1012) and Si (100), (111) substrates were investigated using plan‐view and cross‐sectional high‐resolution transmission electron microscopy and x‐ray diffraction techniques. The films were grown by metalorganic chemical vapor deposition using TMA1+NH3+N2 gas mixtures. Different degrees of epitaxy were observed for the films grown on α‐Al₂O₃ and Si substrates in different orientations. The epitaxial relationship for (0001) sapphire was found to be (0001)AlN∥(0001)sap with in‐plane orientation relationship of [0110]AlN∥[1210]sap. This is equivalent to a 30° rotation in the basal (0001) plane. For (1012) sapphire substrates, the epitaxial relationship was determined to be (1120)AlN∥(1012)sap with the in‐plane alignment of [0001]AlN∥[1011]sap. The AlN films on (0001) α‐Al₂O₃ were found to contain inverted domain boundaries and a/3〈1120〉 threading dislocations with the estimated density of 10¹⁰ cm⁻². The density of planar defects (stacking faults) found in AlN films was considerably higher in the case of (1012) compared to (0001) substrates. Films on Si substrates were found to be highly textured c axis oriented when grown on (111) Si, and c axis textured with random in‐plane orientation on (100) Si. The role of thin‐film defects and interfaces on device fabrication is discussed. [reprint (PDF)]

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