Center for Quantum Devices - Most Downloaded Journal Articles

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17.	Room temperature neagtive differential resistance characteristics of polar III-nitride resonant tunneling diodes C. Bayram, Z. Vashaei, and M. Razeghi Applied Physics Letters, Vol. 97, No. 9, p. 092104-1-- August 30, 2010 ...[Visit Journal] III-nitride resonant tunneling diodes (RTDs), consisting Al_0.2Ga_0.8N/GaN double-barrier (DB) active layers, were grown on c-plane lateral epitaxial overgrowth (LEO) GaN/sapphire and c-plane freestanding (FS) GaN. RTDs on both templates, fabricated into mesa diameters ranging from 5 to 35 μm, showed negative differential resistance (NDR) at room temperature. NDR characteristics (voltage and current density at NDR onset and current-peak-to-valley ratio) were analyzed and reported as a function of device size and substrate choice. Our results show that LEO RTDs perform as well as FS ones and DB active layer design and quality have been the bottlenecks in III-nitride RTDs. [reprint (PDF)]
17.	Room temperature operation of 8-12 μm InSbBi infrared photodetectors on GaAs substrates J.J. Lee, J.D. Kim, and M. Razeghi Applied Physics Letters 73 (5)-- August 3, 1998 ...[Visit Journal] We report the room temperature operation of 8–12 μm InSbBi long-wavelength infrared photodetectors. The InSbBi/InSb heterostructures were grown on semi-insulating GaAs (001) substrates by low pressure metalorganic chemical vapor deposition. The voltage responsivity at 10.6 μm was about 1.9 mV/W at room temperature and the corresponding Johnson noise limited detectivity was estimated to be about 1.2×10⁶ cm·Hz^½/W. The carrier lifetime derived from the voltage dependent responsivity measurements was about 0.7 ns. [reprint (PDF)]
17.	Aluminum nitride films on different orientations of sapphire and silicon K. Dovidenko, S. Oktyabrsky, J. Narayan, and M. Razeghi Journal of Applied Physics79 (5)-- March 1, 1996 ...[Visit Journal] The details of epitaxial growth and microstrictural characteristics of AlN films grown on sapphire (0001), (1012) and Si (100), (111) substrates were investigated using plan‐view and cross‐sectional high‐resolution transmission electron microscopy and x‐ray diffraction techniques. The films were grown by metalorganic chemical vapor deposition using TMA1+NH3+N2 gas mixtures. Different degrees of epitaxy were observed for the films grown on α‐Al₂O₃ and Si substrates in different orientations. The epitaxial relationship for (0001) sapphire was found to be (0001)AlN∥(0001)sap with in‐plane orientation relationship of [0110]AlN∥[1210]sap. This is equivalent to a 30° rotation in the basal (0001) plane. For (1012) sapphire substrates, the epitaxial relationship was determined to be (1120)AlN∥(1012)sap with the in‐plane alignment of [0001]AlN∥[1011]sap. The AlN films on (0001) α‐Al₂O₃ were found to contain inverted domain boundaries and a/3〈1120〉 threading dislocations with the estimated density of 10¹⁰ cm⁻². The density of planar defects (stacking faults) found in AlN films was considerably higher in the case of (1012) compared to (0001) substrates. Films on Si substrates were found to be highly textured c axis oriented when grown on (111) Si, and c axis textured with random in‐plane orientation on (100) Si. The role of thin‐film defects and interfaces on device fabrication is discussed. [reprint (PDF)]
17.	Two-dimensional magnetophonon resonance. I. GaInAs-InP superlattices J C Portal, J Cisowski, R J Nicholas, M A Brummell, M Razeghi and M A Poisson J C Portal et al 1983 J. Phys. C: Solid State Phys. 16 L573-- April 5, 1983 ...[Visit Journal] Magnetophonon resonance results are reported for two-dimensional electron gases confined in the GaInAs layers of GaInAs-InP superlattices. Two series of oscillations are observed: one due to scattering by the 'GaAs-like' LO phonon mode of GaInAs, and the second due to interaction with InP LO phonons. The strength of the latter series increases relative to the former as the GaInAs layer thickness is reduced. This is evidence for a long-range phonon interaction, with the InP phonon field extending into the GaInAs to couple significantly with the electrons bound in the quantum wells. No evidence of interface phonons is seen. [reprint (PDF)]
17.	III-Nitride Optoelectronic Devices: From ultraviolet detectors and visible emitters towards terahertz intersubband devices M. Razeghi, C. Bayram, Z. Vashaei, E. Cicek and R. McClintock IEEE Photonics Society 23rd Annual Meeting, November 7-10, 2010, Denver, CO, Proceedings, p. 351-352-- January 20, 2011 ...[Visit Journal] III-nitride optoelectronic devices are discussed. Ultraviolet detectors and visible emitters towards terahertz intersubband devices are reported. Demonstration of single photon detection efficiencies of 33% in the ultraviolet regime, intersubband energy level as low as in the mid-infrared regime, and GaN-based resonant tunneling diodes with negative resistance of 67 Ω are demonstrated. [reprint (PDF)]
17.	High Thermal Stability of κ-Ga2O3 Grown by MOCVD Junhee Lee, Honghyuk Kim, Lakshay Gautam and Manijeh Razeghi Lee, J.; Kim, H.; Gautam, L.; Razeghi, M. High Thermal Stability of κ-Ga2O3 Grown by MOCVD. Crystals 2021, 11, 446. https://doi.org/ 10.3390/cryst11040446 ...[Visit Journal] We report a high thermal stability of kappa gallium oxide grown on c-plane sapphire substrate by metal organic chemical vapor deposition. Kappa gallium oxide is widely known as a metastable polymorph transitioning its phase when subjected to a high temperature. Here, we show the kappa gallium oxide whose phase is stable in a high temperature annealing process at 1000 °C. These oxide films were grown at 690 °C under nitrogen carrier gas. The materials showed high electrical resistivity when doped with silicon, whereas the film conductivity was significantly improved when doped with both indium and silicon. This work provides a pathway to overcoming limitations for the advance in utilizing kappa gallium oxide possessing superior electrical characteristics. [reprint (PDF)]
17.	Observation of Room Temperature Surface-Emitting Stimulated Emission from GaN:Ge by Optical pumping X. Zhang, P. Kung, A. Saxler, D. Walker, and M. Razeghi Journal of Applied Physics 80 (11)-- December 1, 1996 ...[Visit Journal] Optically pumped surface-emitting stimulated emission at room temperature was observed from GaN:Ge grown by metalorganic chemical vapor deposition. The sample was optically pumped perpendicularly on the top surface while the stimulated emission was collected from the back colinearly with the pump beam. The cavity was formed by the GaN/air and GaN/sapphire interfaces without any other structure. The stimulated emission was gain guided by the pump beam. The threshold optical pump density for stimulated emission was approximately 2.8 MW/cm² and the linewidth was 2.5 nm. The emission from GaN:Ge showed a redshift as the pump density increased. The comparison between theoretical calculations and experimental results suggested that many-body interactions can account well for the redshift. [reprint (PDF)]
17.	High-power λ ~ 9.5 µm quantum-cascade lasers operating above room temperature in continuous-wave mode J.S. Yu, S. Slivken, A. Evans, S.R. Darvish, J. Nguyen, and M. Razeghi Applied Physics Letters, 88 (9)-- February 27, 2006 ...[Visit Journal] We report high-power continuous-wave (cw) operation of λ~9.5 μm quantum-cascade lasers to a temperature of 318 K. A high-reflectivity-coated 19-μm-wide and 3-mm-long device exhibits cw output powers as high as 150 mW at 288 K and still 22 mW at 318 K. In cw operation at 298 K, a threshold current density of 1.57 kA/cm², a slope efficiency of 391 mW/A, and a maximum wall-plug efficiency of 0.71% are obtained. [reprint (PDF)]
17.	High power photonic crystal distributed feedback quantum cascade lasers emitting at 4.5 micron B. Gokden, S. Slivken and M. Razeghi SPIE Proceedings, San Francisco, CA (January 22-28, 2010), Vol. 7608, p. 760806-1-- January 22, 2010 ...[Visit Journal] Quantum cascade lasers possess very small linewidth enhancement factor, which makes them very prominent candidates for realization of high power, nearly diffraction limited and single mode photonic crystal distributed feedback broad area lasers in the mid-infrared frequencies. In this paper, we present room temperature operation of a two dimensional photonic crystal distributed feedback quantum cascade laser emitting at 4.5 µm. peak power up to ~0.9 W per facet is obtained from a 2 mm long laser with 100 µm cavity width at room temperature. The observed spectrum is single mode with a very narrow linewidth. Far-field profile has nearly diffraction limited single lobe with full width at half maximum of 3.5 degree normal to the facet. The mode selection and power output relationships are experimentally established with respect to different cavity lengths for photonic crystal distributed feedback quantum cascade lasers. [reprint (PDF)]
17.	Characterization of ZnO thin films grown on c-sapphire by pulsed laser deposition as templates for regrowth of zno by metal organic chemical vapor deposition D. J. Rogers ; F. Hosseini Teherani ; C. Sartel ; V. Sallet ; F. Jomard ; P. Galtier ; M. Razeghi Proc. SPIE 7217, Zinc Oxide Materials and Devices IV, 72170F (February 17, 2009)-- February 17, 2009 ...[Visit Journal] The use of ZnO template layers grown Pulsed Laser Deposition (PLD) has been seen to produce dramatic improvements in the surface morphology, crystallographic quality and optical properties of ZnO layers grown on c-sapphire substrates by Metal Organic Chemical Vapor Deposition. This paper provides complementary details on the PLD-grown ZnO template properties. [reprint (PDF)]
17.	Schottky MSM Photodetectors on GaN Films Grown on Sapphire by Lateral Epitaxial Overgrowth P. Kung, D. Walker, P. Sandvik, M. Hamilton, J. Diaz, I.H. Lee and M. Razeghi SPIE Conference, San Jose, CA, -- January 27, 1999 ...[Visit Journal] We report the growth and characterization of Schottky based metal-semiconductor-metal ultraviolet photodetectors fabricated on lateral epitaxially overgrown GaN films. The lateral epitaxial overgrowth of GaN was carried out on basal plane sapphire substrates by low pressure metalorganic chemical vapor deposition and exhibited lateral growth rates more than 5 times as high as vertical growth rates. The spectral responsivity, the dependence on bias voltage, on incident optical power, and the time response of these photodetectors have been characterized. Two detector orientations were investigated: one with the interdigitated finger pattern parallel and the other perpendicular to the underlying SiO_x mask stripes. [reprint (PDF)]
17.	Investigations on the substrate dependence of the properties in nominally-undoped β-Ga2O3 thin films grown by PLD F. H. Teherani ; D. J. Rogers ; V. E. Sandana ; P. Bove ; C. Ton-That ; L. L. C. Lem ; E. Chikoidze ; M. Neumann-Spallart ; Y. Dumont ; T. Huynh ; M. R. Phillips ; P. Chapon ; R. McClintock ; M. Razeghi Proc. SPIE 10105, Oxide-based Materials and Devices VIII, 101051R-OLD-- March 23, 2017 ...[Visit Journal] Nominally-undoped Ga₂O₃ layers were deposited on a-, c- and r-plane sapphire substrates using pulsed laser deposition. Conventional x-ray diffraction analysis for films grown on a- and c-plane sapphire showed the layers to be in the β-Ga₂O₃ phase with preferential orientation of the (-201) axis along the growth direction. Pole figures revealed the film grown on r-plane sapphire to also be in the β-Ga₂O₃ phase but with epitaxial offsets of 29.5°, 38.5° and 64° from the growth direction for the (-201) axis. Optical transmission spectroscopy indicated that the bandgap was ~5.2eV, for all the layers and that the transparency was > 80% in the visible wavelength range. Four point collinear resistivity and Van der Pauw based Hall measurements revealed the β-Ga₂O₃ layer on r-plane sapphire to be 4 orders of magnitude more conducting than layers grown on a- and c-plane sapphire under similar conditions. The absolute values of conductivity, carrier mobility and carrier concentration for the β-Ga₂O₃ layer on r-sapphire (at 20Ω-1.cm^-1, 6 cm²/Vs and 1.7 x 10¹⁹ cm^-3, respectively) all exceeded values found in the literature for nominally-undoped β-Ga₂O₃ thin films by at least an order of magnitude. Gas discharge optical emission spectroscopy compositional depth profiling for common shallow donor impurities (Cl, F, Si and Sn) did not indicate any discernable increase in their concentrations compared to background levels in the sapphire substrate. It is proposed that the fundamentally anisotropic conductivity in β-Ga₂O₃ combined with the epitaxial offset of the (-201) axis observed for the layer grown on r-plane sapphire may explain the much larger carrier concentration, electrical conductivity and mobility compared with layers having the (-201) axis aligned along the growth direction. [reprint (PDF)]
17.	Use of ZnO thin films as sacrifical templates for metal organic vapor phase epitaxy and chemical lift-off of GaN D.J. Rogers, F. Hosseini Teherani, A. Ougazzaden, S. Gautier, L. Divay, A. Lusson, O. Durand, F. Wyczisk, G. Garry, T. Monteiro, M.R. Correira, M. Peres, A. Neves, D. McGrouther, J.N. Chapman, and M. Razeghi Applied Physics Letters, Vol. 91, No. 7, p. 071120-1-- August 13, 2007 ...[Visit Journal] Continued development of GaN-based light emitting diodes is being hampered by constraints imposed by current non-native substrates. ZnO is a promising alternative substrate but it decomposes under the conditions used in conventional GaN metal organic vapor phase epitaxy (MOVPE). In this work, GaN was grown on ZnO/c-Al₂O₃ using low temperature/pressure MOVPE with N₂ as a carrier and dimethylhydrazine as a N source. Characterization confirmed the epitaxial growth of GaN. The GaN was lifted-off the c-Al₂O₃ by chemically etching away the ZnO underlayer. This approach opens up the way for bonding of the GaN onto a support of choice. [reprint (PDF)]
17.	Mid-wavelength infrared heterojunction phototransistors based on type-II InAs/AlSb/GaSb superlattices A. Haddadi, S. Adhikary, A. Dehzangi, and M. Razeghi Applied Physics Letters 109, 021107-- July 12, 2016 ...[Visit Journal] A mid-wavelength infrared heterojunction phototransistor based on type-II InAs/AlSb/GaSb superlattices on GaSb substrate has been demonstrated. Near a wavelength of 4 μm saturated optical gains of 668 and 639 at 77 and 150 K, respectively, are demonstrated over a wide dynamic range. At 150 K, the unity optical gain collector dark current density and DC current gain are 1 × 10⁻³ A/cm² and 3710, respectively. This demonstrates the potential for use in high-speed applications. In addition, the phototransistor exhibits a specific detectivity value that is four times higher compared with a state-of-the-art type-II superlattice-based photodiode with a similar cut-off wavelength at 150 K. [reprint (PDF)]
17.	Bias-selectable dual-band mid-/long-wavelength infrared photodetectors based on InAs/InAs_1−xSb_x type-II superlattices A. Haddadi, R. Chevallier, G. Chen, A. M. Hoang, and M. Razeghi Applied Physics Letters 106 , 011104-- January 8, 2015 ...[Visit Journal] A high performance bias-selectable mid-/long-wavelength infrared photodetector based on InAs/InAs_1−xSb_x type-II superlattices on GaSb substrate has been demonstrated. The mid- and long-wavelength channels' 50% cut-off wavelengths were ∼5.1 and ∼9.5 μm at 77 K. The mid-wavelength channel exhibited a quantum efficiency of 45% at 100 mV bias voltage under front-side illumination and without any anti-reflection coating. With a dark current density of 1 × 10⁻⁷ A/cm² under 100 mV applied bias, the mid-wavelength channel exhibited a specific detectivity of 8.2 × 10¹² cm·Hz^½·W^-1 at 77 K. The long-wavelength channel exhibited a quantum efficiency of 40%, a dark current density of 5.7 × 10⁻⁴ A/cm² under −150 mV applied bias at 77 K, providing a specific detectivity value of 1.64 × 10¹¹ cm·Hz^½·W^-1. [reprint (PDF)]
17.	Very high wall plug efficiency of quantum cascade lasers Y. Bai, S. Slivken, S.R. Darvish, and M. Razeghi SPIE Proceedings, San Francisco, CA (January 22-28, 2010), Vol. 7608, p. 76080F-1-- January 22, 2010 ...[Visit Journal] We demonstrate very high wall plug efficiency (WPE) of mid-infrared quantum cascade lasers (QCLs) in low temperature pulsed mode operation (53%), room temperature pulsed mode operation (23%), and room temperature continuous wave operation (18%). All of these values are the highest to date for any QCLs. The optimization of WPE takes the route of understanding the limiting factors of each sub-efficiency, exploring new designs to overcome the limiting factor, and constantly improving the material quality. [reprint (PDF)]
17.	First Demonstration of ~ 10 microns FPAs in InAs/GaSb SLS M. Razeghi, P.Y. Delaunay, B.M. Nguyen, A. Hood, D. Hoffman, R. McClintock, Y. Wei, E. Michel, V. Nathan and M. Tidrow IEEE LEOS Newsletter 20 (5)-- October 1, 2006 ...[Visit Journal] The concept of Type-II InAs/GaSb superlattice was first brought by Nobel Laureate L. Esaki, et al. in the 1970s. There had been few studies on this material system until two decades later when reasonable quality material growth was made possible using molecular beam epitaxy. With the addition of cracker cells for the group V sources and optimizations of material growth conditions, the superlattice quality become significantly improved and the detectors made of these superlattice materials can meet the demand in some practical field applications. Especially in the LWIR regime, it provides a very promising alternative to HgCdTe for better material stability and uniformity, etc. We have developed the empirical tight binding model (ETBM) for precise determination of the superlattice bandgap. [reprint (PDF)]
17.	High Power 3-12 μm Infrared Lasers: Recent Improvements and Future Trends M. Razeghi, S. Slivken, A. Tahraoui, A. Matlis, and Y.S. Park Physica E: Low-Dimensional Systems and Nanostructures 11 (2-3)-- October 1, 2001 ...[Visit Journal] In this paper, we discuss the progress of quantum cascade lasers (QCLs) grown by gas-source molecular beam epitaxy. Room temperature QCL operation has been reported for lasers emitting between 5-11 μm, with 9-11 μm lasers operating up to 425 K. Laser technology for the 3-5 μm range takes advantage of a strain-balanced active layer design. We also demonstrate record room temperature peak output powers at 9 and 11 μm (2.5 and 1 W, respectively) as well as record low 80K threshold current densities (250 A/cm²) for some laser designs. Preliminary distributed feedback (DFB) results are also presented and exhibit single mode operation for 9 μm lasers at room temperature. [reprint (PDF)]
17.	Al_xGa_1-xN Materials and Device Technology for Solar Blind Ultraviolet Photodetector Applications R. McClintock, P. Sandvik, K. Mi, F. Shahedipour, A. Yasan, C. Jelen, P. Kung, and M. Razeghi SPIE Conference, San Jose, CA, Vol. 4288, pp. 219-- January 22, 2001 ...[Visit Journal] There has been a growing interest for the development of solar blind ultraviolet (UV) photodetectors for use in a variety of applications, including early missile threat warning, flame monitoring, UV radiation monitoring and chemical/biological reagent detection. The Al_xGa_1-xN material system has emerged as the most promising approach for such devices. However, the control of the material quality and the device technology are still rather immature. We report here the metalorganic chemical vapor deposition, the n-type and the p-type doping of high quality Al_xGa_1-xN thin films on sapphire substrates over a wide range of Al concentration. [reprint (PDF)]
17.	III-Nitride Optoelectronic Devices: From Ultraviolet Toward Terahertz M. Razeghi IEEE Photonics Journal-Breakthroughs in Photonics 2010, Vol. 3, No. 2, p. 263-267-- April 26, 2011 ...[Visit Journal] We review III-Nitride optoelectronic device technologies with an emphasis on recent breakthroughs. We start with a brief summary of historical accomplishments and then report the state-of-the-art in three key spectral regimes: (1) Ultraviolet (AlGaN-based avalanche photodiodes, single photon detectors, focal plane arrays, and light emitting diodes), (2) Visible (InGaN-based solid state lighting, lasers, and solar cells), and (3) Near-, mid-infrared, and terahertz (AlGaN/GaN-based gap-engineered intersubband devices). We also describe future trends in III-Nitride optoelectronic devices. [reprint (PDF)]
17.	High Quality Aluminum Nitride Epitaxial Layers Grown on Sapphire Substrates A. Saxler, P. Kung, C.J. Sun, E. Bigan and M. Razeghi Applied Physics Letters 64 (3)-- January 17, 1994 ...[Visit Journal] In this letter we report the growth of high quality AlN epitaxial layers on sapphire substrates. The AlN grown on (00·1) sapphire exhibited a better crystalline quality than that grown on (01·2) sapphire. An x-ray rocking curve of AlN on (00·1) Al₂O₃ yielded a full width at half-maximum of 97.2 arcsec, which is the narrowest value reported to our knowledge. The AlN peak on (01·2) Al₂O₃ was about 30 times wider. The absorption edge measured by ultraviolet transmission spectroscopy for AlN grown on (00·1) Al₂O₃ was about 197 nm. [reprint (PDF)]
17.	Core-shell GaN-ZnO Moth-eye Nanostructure Arrays Grown on a-SiO₂/Si (111) as a basis for Improved InGaN-based Photovoltaics and LEDs D.J. Rogers, V.E. Sandana, S. Gautier, T. Moudakir, M. Abid, A. Ougazzaden, F. Hosseini Teherani, P. Bove, M. Molinari, M. Troyon, M. Peres, Manuel J. Soares, A.J. Neves, T. Monteiro, D. McGrouther, J.N. Chapman, H.-J. Drouhin, R. McClintock, M. Razeghi Photonics and Nanostructures - Fundamentals and Applications, Volume 15, Pages 53-58-- March 30, 2015 ...[Visit Journal] Self-forming, vertically-aligned, ZnO moth-eye-like nanoarrays were grown by catalyst-free pulsed laser deposition on a-SiO₂/Si (111) substrates. X-Ray Diffraction (XRD) and Cathodoluminescence (CL) studies indicated that nanostructures were highly c-axis oriented wurtzite ZnO with strong near band edge emission. The nanostructures were used as templates for the growth of non-polar GaN by metal organic vapor phase epitaxy. XRD, scanning electron microscopy, energy dispersive X-ray microanalysis and CL revealed ZnO encapsulated with GaN, without evidence of ZnO back-etching. XRD showed compressive epitaxial strain in the GaN, which is conducive to stabilization of the higher indium contents required for more efficient green light emitting diode (LED) and photovoltaic (PV) operation. Angular-dependent specular reflection measurements showed a relative reflectance of less than 1% over the wavelength range of 400–720 nm at all angles up to 60°. The superior black-body performance of this moth-eye-like structure would boost LED light extraction and PV anti-reflection performance compared with existing planar or nanowire LED and PV morphologies. The enhancement in core conductivity, provided by the ZnO, would also improve current distribution and increase the effective junction area compared with nanowire devices based solely on GaN. [reprint (PDF)]
17.	Photoluminescence Study of AlGaN-based 280 nm Ultraviolet Light-Emitting Diodes A. Yasan, R. McClintock, K. Mayes, D.H. Kim, P. Kung, and M. Razeghi Applied Physics Letters, 83 (20)-- November 17, 2003 ...[Visit Journal] We investigated optical properties of single quantum well AlGaN-based UV 280 nm light-emitting diodes using temperature-dependent photoluminescence (PL) measurement. We found an "S-shaped" temperature dependence of the peak energy. From the Arrhenius plot of integrated PL intensity, we speculate that dislocations as well as thermal emission of carriers out of the quantum well are responsible for the PL quenching behavior. Also a second nonradiative channel with much lower activation energy was found, the origin of which we believe to be quenching of the bound excitons [reprint (PDF)]
17.	Demonstration of type-II superlattice MWIR minority carrier unipolar imager for high operation temperature application Guanxi Chen, Abbas Haddadi, Anh-Minh Hoang, Romain Chevallier, and Manijeh Razeghi Optics Letters Vol. 40, Iss. 1, pp. 29–32-- December 18, 2014 ...[Visit Journal] An InAs/GaSb type-II superlattice-based mid-wavelength infrared (MWIR) 320×256 unipolar focal plane array (FPA) using pMp architecture exhibited excellent infrared image from 81 to 150 K and ∼98% operability, which illustrated the possibility for high operation temperature application. At 150 K and −50 mV operation bias, the 27 μm pixels exhibited dark current density to be 1.2×10⁻⁵ A/cm², with 50% cutoff wavelength of 4.9 μm, quantum efficiency of 67% at peak responsivity (4.6 μm), and specific detectivity of 1.2×10¹² Jones. At 90 K and below, the 27 μm pixels exhibited system limited dark current density, which is below 1×10⁻⁹ A/cm², and specific detectivity of 1.5×10¹⁴ Jones. From 81 to 100 K, the FPA showed ∼11 mK NEDT by using F/2.3 optics and a 9.69 ms integration time. [reprint (PDF)]
17.	InP-based quantum-dot infrared photodetectors with high quantum efficiency and high temperature imaging S. Tsao, H. Lim, H. Seo, W. Zhang and M. Razeghi IEEE Sensors Journal, Vol. 8, No. 6, p. 936-941-- June 1, 2008 ...[Visit Journal] We report a room temperature operating InAs quantum-dot infrared photodetector grown on InP substrate. The self-assembled InAs quantum dots and the device structure were grown by low-pressure metalorganic chemical vapor depositon. The detectivity was 6 x 10¹⁰cm·Hz^1/2·W^-1 at 150 K and a bias of 5 V with a peak detection wavelength around 4.0 micron and a quantum efficiency of 48%. Due to the low dark current and high responsivity, a clear photoresponse has been observed at room temperature. A 320 x 256 middle wavelength infrared focal plane array operating at temperatures up to 200 K was also demonstrated. The focal plane array had 34 mA/W responsivity, 1.1% conversion efficiency, and noise equivalent temperature difference of 344 mK at 120 K operating temperature. [reprint (PDF)]

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