Center for Quantum Devices - Most Downloaded Journal Articles

Page 17 of 31: Prev << 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 >> Next (766 Items)

17.	Quantum Dot Infrared Photodetectors: Comparison Experiment and Theory H. Lim, W. Zhang, S. Tsao, T. Sills, J. Szafraniec, K. Mi, B. Movaghar, and M. Razeghi Physical Review B, 72-- August 17, 2005 ...[Visit Journal] We present data and calculations and examine the factors that determine the detectivities in self-assembled InAs and InGaAs based quantum dot infrared photodetectors (QDIPs). We investigate a class of devices that combine good wavelength selectivity with “high detectivity.” We study the factors that limit the temperature performance of quantum dot detectors. For this we develop a formalism to evaluate the optical absorption and the electron transport properties. We examine the performance limiting factors and compare theory with experimental data. We find that the notion of a phonon bottleneck does not apply to large-diameter lenslike quantum dots, which have many closely spaced energy levels. The observed strong decrease of responsivity with temperature is ultimately due to a rapid thermal cascade back into the ground states. High temperature performance is improved by engineering the excited state to be near the continuum. The good low temperature (77 K) performance in strongly bound QDIPs is shown to be due to the high gain and the low noise achievable in these micron size devices. [reprint (PDF)]
17.	Optical Investigations of GaAs-GaInP Quantum Wells Grown on the GaAs, InP, and Si Substrates H. Xiaoguang, M. Razeghi Applied Physics Letters 61 (14)-- October 5, 1992 ...[Visit Journal] We report the first photoluminescence investigation of GaAs‐Ga_0.51In_0.49P lattice matched multiquantum wells grown by the low pressure metalorganic chemical vapor deposition simultaneously in the same run on GaAs, Si, and InP substrates. The sharp photoluminescence peaks indicate the high quality of the samples on three different substrates. The temperature dependence of the photoluminescence indicates that the intrinsic excitonic transitions dominate at low temperature and free‐carrier recombinations at room temperature. The photoluminescence peaks of the samples grown on Si and InP substrates shift about 15 meV from the corresponding peaks of the sample grown on the GaAs substrate. Two possible interpretations are provided for the observed energy shift. One is the diffusion of In along the dislocation threads from GaInP to GaAs and another is the localized strain induced by defects and In segregations. [reprint (PDF)]
17.	The new oxide paradigm for solid state ultraviolet photodetectors D. J. Rogers, P. Bove, X. Arrateig, V. E. Sandana, F. H. Teherani, M. Razeghi, R. McClintock, E. Frisch, S. Harel, Proceedings Volume 10533, Oxide-based Materials and Devices IX; 105331P-- March 22, 2018 ...[Visit Journal] The bandgap of wurzite ZnO layers grown on 2 inch diameter c-Al₂O₃ substrates by pulsed laser deposition was engineered from 3.7 to 4.8 eV by alloying with Mg. Above this Mg content the layers transformed from single phase hcp to mixed hcp/fcc phase before becoming single phase fcc above a bandgap of about 5.5 eV. Metal-Semiconductor-Metal (MSM) photodetectors based on gold Inter-Digitated-Transducer structures were fabricated from the single phase hcp layers by single step negative photolithography and then packaged in TO5 cans. The devices gave over 6 orders of magnitude of separation between dark and light signal with solar rejection ratios (I270 : I350) of over 3 x 10⁵ and dark signals of 300 pA (at a bias of −5V). Spectral responsivities were engineered to fit the “Deutscher Verein des Gas- und Wasserfaches” industry standard form and gave over two decade higher responsivities (14 A/W, peaked at 270 nm) than commercial SiC based devices. Homogeneous Ga₂O₃ layers were also grown on 2 inch diameter c-Al₂O₃ substrates by PLD. Optical transmission spectra were coherent with a bandgap that increased from 4.9 to 5.4 eV when film thickness was decreased from 825 to 145 nm. X-ray diffraction revealed that the films were of the β-Ga₂O₃ (monoclinic) polytype with strong (−201) orientation. β-Ga₂O₃ MSM photodetectors gave over 4 orders of magnitude of separation between dark and light signal (at −5V bias) with dark currents of 250 pA and spectral responsivities of up to 40 A/W (at -0.75V bias). It was found that the spectral responsivity peak position could be decreased from 250 to 230 nm by reducing film thickness from 825 to 145 nm. This shift in peak responsivity wavelength with film thickness (a) was coherent with the apparent bandgap shift that was observed in transmission spectroscopy for the same layers and (b) conveniently provides a coverage of the spectral region in which MgZnO layers show fcc/hcp phase mixing. [reprint (PDF)]
17.	Room Temperature Epitaxy of Ni1−xMgxO on c Plane Sapphire by Plasma Assisted Pulsed Laser Deposition David J. Rogers, Eric V. Sandana, Ferechteh H. Teherani, M. Razeghi physica status solidi (b) 2026, 263 (7), e202500648. ...[Visit Journal] This paper reports on room-temperature (RT) epitaxial growth of NiO and Ni1-xMgxO (x ≈ 0.50) thin films on c-plane sapphire (0001) using plasma-assisted pulsed laser deposition. Optical transmission reveals absorption edges at ~3.6 eV (NiO) and ~4.4 eV (Ni0.5Mg0.50O), confirming bandgap engineering via Mg incorporation consistent with prior alloy data. X-ray reflectivity (XRR) indicates smooth surfaces and thicknesses of ~60 nm (NiO) and ~65 nm (Ni0.5Mg0.50O). High-resolution X-ray diffraction 2θ/ω scans indicate fcc (111) orientation for both films; ω-rocking curves exhibit full width half maxima of 0.07°—remarkably low mosaic spread for RT-grown oxides. (002) pole figures display six-fold symmetry, evidencing epitaxial relationships featuring two rotational domains (±60°) about [111] on c-sapphire. AFM (1 µm × 1 µm) yields root mean square roughness of ~0.5 nm (NiO) and ~2.6 nm (Ni0.5Mg0.50O). Four-point probe gives ρ ≈ 26 Ω·cm (NiO) and insulating behavior for Ni0.5Mg0.50O, consistent with bandgap widening and reduced hole concentration. These results establish RT epitaxial Mg-alloyed NiO with exceptional crystallinity, directly relevant to Ga2O3 heterojunctions for power electronics and solar-blind ultra violet C-band photodetectors, where tunable band alignment and sharp interfaces are critical. [reprint (PDF)]
17.	InAs quantum dot infrared photodetectors on InP by MOCVD W. Zhang, H. Lim, M. Taguchi, A. Quivy and M. Razeghi SPIE Conference, San Jose, CA, Vol. 6127, pp. 61270M -- January 23, 2006 ...[Visit Journal] We report our recent results of InAs quantum dots grown on InP substrate by low-pressure metalorganic chemical vapor deposition (MOCVD) for the application of quantum dot infrared photodetector (QDIP). We have previously demonstrated the first InP-based QDIP with a peak detection wavelength at 6.4 µm and a detectivity of 10¹⁰ cm·Hz^½/W at 77K. Here we show our recent work toward shifting the detection wavelength to the 3-5 µm middlewavelength infrared (MWIR) range. The dependence of the quantum dot on the growth conditions is studied by atomic force microscopy, photoluminescence and Fourier transform infrared spectroscopy. Possible ways to increase the quantum efficiency of QDIPs are discussed. [reprint (PDF)]
17.	Solar-Blind Al_xGa_1-xN p-i-n Photodetectors grown on LEO and non-LEO GaN P. Sandvik, D. Walker, P. Kung, K. Mi, F. Shahedipour, V. Kumar, X. Zhang, J. Diaz, C. Jelen, and M. Razeghi SPIE Conference, San Jose, CA, Vol. 3948, pp. 265 -- January 26, 2000 ...[Visit Journal] The III-Nitride material system is an excellent candidate for UV photodetector applications due to its wide, direct bandgaps and robust material nature. However, despite many inherent material advantages, the III-Nitride material system typically suffers from a large number of extended defects which degrade material quality and device performance. One technique aimed at reducing defect densities in these materials is lateral epitaxial overgrowth (LEO). In this work, we present a preliminary comparison between AlGaN UV, solar-blind p-i-n photodiodes fabricated form LEO GaN and non-LEO GaN. Improvements in both responsivity and rejection ratio are observed, however, further device improvements are necessary. For these, we focus on the optimization of the p- i-n structure and a reduction in contact resistivity to p- GaN and p-AlGaN layers. By improving the structure of the device, GaN p-i-n photodiodes were fabricated and demonstrate 86 percent internal quantum efficiency at 362 nm and a peak to visible rejection ratio of 105. Contact treatments have reduced the contact resistivity to p-GaN and p-AlGaN by over one order of magnitude form our previous results. [reprint (PDF)]
17.	Ridge-Width Dependence on High-Temperature Continuous-Wave Quantum-Cascade Laser Operation S. Slivken, J.S. Yu, A. Evans, L. Doris, J. David, and M. Razeghi IEEE Photonics Technology Letters, 16 (3)-- March 1, 2004 ...[Visit Journal] We report continuous-wave (CW) operation of quantum-cascade lasers (λ=6 μm) up to a temperature of 313 K (40°C). The maximum CW optical output powers range from 212 mW at 288 K to 22 mW at 313 K and are achieved with threshold current densities of 2.21 and 3.11 kA/cm2, respectively, for a high-reflectivity-coated 12-μm-wide and 2-mm-long laser. At room temperature (298 K), the power output is 145 mW at 0.87 A, corresponding to a power conversion efficiency of 1.68%. The maximum CW operating temperature of double-channel ridge waveguide lasers mounted epilayer-up on copper heatsinks is analyzed in terms of the ridge width, which is varied between 12 and 40 μm. A clear trend of improved performance is observed as the ridge narrows. [reprint (PDF)]
17.	Structural, Optical, Electrical and Morphological Study of Transparent p-NiO/n-ZnO Heterojunctions Grown by PLD V. E. Sandana, D. J. Rogers, F. Hosseini Teherani, P. Bove, N. Ben Sedrine, M. R. Correia, T. Monteiro, R. McClintock, and M. Razeghi Proc. SPIE 9364, Oxide-based Materials and Devices VI, 93641O-- March 24, 2015 ...[Visit Journal] NiO/ZnO heterostructures were fabricated on FTO/glass and bulk hydrothermal ZnO substrates by pulsed laser deposition. X-Ray diffraction and Room Temperature (RT) Raman studies were consistent with the formation of (0002) oriented wurtzite ZnO and (111) oriented fcc NiO. RT optical transmission studies revealed bandgap energy values of ~3.70 eV and ~3.30 eV for NiO and ZnO, respectively and more than 80% transmission for the whole ZnO/NiO/FTO/glass stack over the majority of the visible spectrum. Lateral p-n heterojunction mesas (~6mm x 6mm) were fabricated using a shadow mask during PLD growth. n-n and p-p measurements showed that Ti/Au contacting gave an Ohmic reponse for the NiO, ZnO and FTO. Both heterojunctions had rectifying I/V characteristics. The junction on FTO/glass gave forward bias currents (243mA at +10V) that were over 5 orders of magnitude higher than those for the junction formed on bulk ZnO. At ~ 10^-7 A (for 10V of reverse bias) the heterojunction leakage current was approximately two orders of magnitude lower on the bulk ZnO substrate than on FTO. Overall, the lateral p-NiO/n-ZnO/FTO/glass device proved far superior to that formed by growing p-NiO directly on the bulk n-ZnO substrate and gave a combination of electrical performance and visible wavelength transparency that could predispose it for use in various third generation transparent electronics applications. [reprint (PDF)]
17.	High power broad area quantum cascade lasers Y. Bai, S. Slivken, S.R. Darvish, A. Haddadi, B. Gokden and M. Razeghi Applied Physics Letters, Vol. 95, No. 22, p. 221104-1-- November 30, 2009 ...[Visit Journal] Broad area quantum cascade lasers (QCLs) are studied with ridge widths up to 400 µm, in room temperature pulsed mode operation at an emission wavelength around 4.45 µm. The peak output power scales linearly with the ridge width. A maximum total peak output power of 120 W is obtained from a single 400-µm-wide device with a cavity length of 3 mm. A stable far field emission characteristic is observed with dual lobes at ±38° for all tested devices, which suggests that these broad area QCLs are highly resistant to filamentation. [reprint (PDF)]
17.	Monolithic integrated photoreceiver for 1.3–1.55‐μm wavelengths: Association of a Schottky photodiode and a field‐effect transistor on GaInP‐GaInAs heteroepitaxy A. Hosseini Therani; D. Decoster; J. P. Vilcot; M. Razeghi J. Appl. Phys. 64, 2215–2218 (1988) -- March 24, 1988 ...[Visit Journal] We present a monolithic integrated circuit associating a Schottky photodiode and a field-effect transistor which has been fabricated, for the first time, on G8.0.49 InO.51 P /GaO,47 Ino.53 As strained heteroepitaxiaI material. Static, dynamic, and noise properties of the Schottky photodiode, the field-effect transistor, and the integrated circuit have been investigated and are reported. As an example, dynamic responsivity up to 50 A/W can be achieved at 1.3-pm wavelength for the integrated photoreceiver. The performance of the device is discussed, taking into account the integrated circuit design and the main characteristics of the material. [reprint (PDF)]
17.	Demonstration of type-II superlattice MWIR minority carrier unipolar imager for high operation temperature application Guanxi Chen, Abbas Haddadi, Anh-Minh Hoang, Romain Chevallier, and Manijeh Razeghi Optics Letters Vol. 40, Iss. 1, pp. 29–32-- December 18, 2014 ...[Visit Journal] An InAs/GaSb type-II superlattice-based mid-wavelength infrared (MWIR) 320×256 unipolar focal plane array (FPA) using pMp architecture exhibited excellent infrared image from 81 to 150 K and ∼98% operability, which illustrated the possibility for high operation temperature application. At 150 K and −50 mV operation bias, the 27 μm pixels exhibited dark current density to be 1.2×10⁻⁵ A/cm², with 50% cutoff wavelength of 4.9 μm, quantum efficiency of 67% at peak responsivity (4.6 μm), and specific detectivity of 1.2×10¹² Jones. At 90 K and below, the 27 μm pixels exhibited system limited dark current density, which is below 1×10⁻⁹ A/cm², and specific detectivity of 1.5×10¹⁴ Jones. From 81 to 100 K, the FPA showed ∼11 mK NEDT by using F/2.3 optics and a 9.69 ms integration time. [reprint (PDF)]
17.	Low frequency noise in 1024 x 1024 long wavelength infrared focal plane array base on Type-II InAs/GaSb superlattice A. Haddadi, S.R. Darvish, G. Chen, A.M. Hoang, B.M. Nguyen and M. Razeghi SPIE Proceedings, Vol. 8268, p. 82680X-- January 22, 2012 ...[Visit Journal] Recently, the type-II InAs/GaSb superlattice (T2SL) material platform is considered as a potential alternative for HgCdTe technology in long wavelength infrared (LWIR) imaging. This is due to the incredible growth in the understanding of its material properties and improvement of device processing which leads to design and fabrication of better devices. In this paper, we report electrical low frequency noise measurement on a high performance type-II InAs/GaSb superlattice 1024×1024 LWIR focal plane array. [reprint (PDF)]
17.	Type-II Antimonide-based Superlattices for the Third Generation Infrared Focal Plane Arrays Manijeh Razeghi, Edward Kwei-wei Huang, Binh-Minh Nguyen, Siamak Abdollahi Pour, and Pierre-Yves Delaunay SPIE Proceedings, Infrared Technology and Applications XXXVI, Vol. 7660, pp. 76601F-- May 10, 2010 ...[Visit Journal] In recent years, the Type-II superlattice (T2SL) material platform has seen incredible growth in the understanding of its material properties which has lead to unprecedented development in the arena of device design. Its versatility in band-structure engineering is perhaps one of the greatest hallmarks of the T2SL that other material platforms are lacking. In this paper, we discuss advantages of the T2SL, specifically the M-structure T2SL, which incorporates AlSb in the traditional InAs/GaSb superlattice. Using the M-structure, we present a new unipolar minority electron detector coined as the p-M-p, the letters which describe the composition of the device. Demonstration of this device structure with a 14 μm cutoff attained a detectivity of 4x10¹⁰ Jones (-50 mV) at 77 K. As device performance improves year after year with novel design contributions from the many researchers in this field, the natural progression in further enabling the ubiquitous use of this technology is to reduce cost and support the fabrication of large infrared imagers. In this paper, we also discuss the use of GaAs substrates as an enabling technology for third generation imaging on T2SLs. Despite the 7.8% lattice mismatch between the native GaSb and alternative GaAs substrates, T2SL photodiodes grown on GaAs at the MWIR and LWIR have been demonstrated at an operating temperature of 77 K [reprint (PDF)]
17.	Structural and compositional characterization of MOVPE GaN thin films transferred from sapphire to glass substrates using chemical lift-off and room temperature direct wafer bonding and GaN wafer scale MOVPE growth on ZnO-buffered sapphire S. Gautier, T. Moudakir, G. Patriarche, D.J. Rogers, V.E. Sandana, F. Hosseini Teherani, P. Bove, Y. El Gmili, K. Pantzas, Suresh Sundaram, D. Troadec, P.L. Voss, M. Razeghi, A. Ougazzaden Journal of Crystal Growth, Volume 370, Pages 63-67 (2013)-- May 1, 2013 ...[Visit Journal] GaN thin films were grown on ZnO/c-Al₂O₃ with excellent uniformity over 2 in. diameter wafers using a low temperature/pressure MOVPE process with N₂ as a carrier and dimethylhydrazine as an N source. 5 mm×5 mm sections of similar GaN layers were direct-fusion-bonded onto soda lime glass substrates after chemical lift-off from the sapphire substrates. X-Ray Diffraction, Scanning Electron Microscopy and Transmission Electron Microscopy confirmed the bonding of crack-free wurtzite GaN films onto a glass substrate with a very good quality of interface, i.e. continuous/uniform adherence and absence of voids or particle inclusions. Using this approach, (In) GaN based devices can be lifted-off expensive single crystal substrates and bonded onto supports with a better cost-performance profile. Moreover, the approach offers the possibility of reclaiming the expensive sapphire substrate so it can be utilized again for growth. [reprint (PDF)]
17.	High Power Electrically Injected Mid-Infrared Interband Lasers Grown by LP-MOCVD B. Lane and M. Razeghi Journal of Crystal Growth 221 (1-4)-- December 1, 2000[reprint (PDF)]
17.	EPR Investigations of a Structural Phase Change in Lead Phosphate M. RAZEG M. RAZEGHI: EPR Investigations of a Structural Phase Change, phys. stat. sol. (b) 108, 175 (1981)-- April 10, 2010 ...[Visit Journal] The temperature dependence of the EPR line width of the Mn2+ and Gd3+ in Pb,(PO,), is investigated from -270 to 500 "C. At the first-order ferroelastic transition point (180 "C), an abrupt change in the fine-structure splitting as well as in the resonance line width is observed. Various contributions to fine structure D and E parameters of Mn2+ and Gd3+ are computed, using a point-multipole model. For temperatures near to Tc the correlation time of the fluctuations is estimated to be greater than Die Temperaturabhangigkeit der EPR-Linienbreite von Mn2+,'und Gd3+ in Pb,(PO,), wird zwischen -270 und 500 "C untersucht. Am ferroelastischen vbergangspunkt erster Ordnung (180 "C) wird eine abrupte Anderung der Feinstrukturaufspaltung sowie der Linienbreite der Resonanzlinien beobachtet. Verschiedene Beitrage zu den Feinstrukturparametern D und E von Mn2+ und Gd3+ werden mittels eines Punkt-Multipol-Modells berechnet. Fur Temperaturen in der Nahe von T, wird die Korrelationszeit der Fluktuationen eu groI3er als s. s bestimmt. [reprint (PDF)]
17.	Crystallography of epitaxial growth of wurtzite-type thin films on sapphire substrates P. Kung, C.J. Sun, A. Saxler, H. Ohsato, and M. Razeghi Journal of Applied Physics 75 (9)-- May 1, 1994 ...[Visit Journal] In this article, we present a crystallographic model to describe the epitaxial growth of wurtzite‐type thin films such as gallium nitride (GaN) on different orientations of sapphire (Al2O3) substrates. Through this model, we demonstrate the thin films grown on (00⋅1)Al₂O₃ have a better epilayer‐substrate interface quality than those grown on (01⋅2)Al₂O₃. We also show the epilayer grown on (00⋅1)Al₂O₃ are gallium‐terminated, and both (00⋅1) and (01⋅2) surfaces of sapphire crystals are oxygen‐terminated. [reprint (PDF)]
17.	Room temperature operation of Ge/SixGe1−x−ySny terahertz quantum cascade lasers predicted using extended combined resonant tunneling and rate equation model Zhou Li,, Zhichao Chen, Baiqi Zhang, Qiyun Lai, Zhanfeng Jiang, Yaoyao Liang Yulong Fan, Haoxiang Li, Qi Qin, Manijeh Razeghi∗, and Feihu Wang∗ J Appl Phys 138 (23) (2025) ...[Visit Journal] Raising operation temperature of terahertz (THz) quantum cascade lasers (QCLs) to room temperature remains a key challenge in QCL community. Group-IV semiconductors are believed to be a promising solution to this problem since the polar phonon–electron scattering is negligible at elevated temperature. Here, we develop a theoretical model for THz QCL development. This model is established on the combined resonant tunneling and rate equation framework and is extended to be applicable for group-IV QCL design through introducing new scattering mechanisms and continuum states carrier leakage. A two-well THz QCL based on a direct phonon extraction strategy is designed and predicted to be capable of working above 300 K. This result lays the foundation for future room temperature THz QCL devices development using group-IV semiconductors. [reprint (PDF)]
17.	Investigation of MgZnO/ZnO heterostructures grown on c-sapphire substrates by pulsed laser deposition D. J. Rogers ; F. Hosseini Teherani ; P. Bove ; A. Lusson ; M. Razeghi Proc. SPIE 8626, Oxide-based Materials and Devices IV, 86261X (March 18, 2013)-- March 18, 2013 ...[Visit Journal] MgZnO thin films were grown on c-sapphire and ZnO-coated c-sapphire substrates by pulsed laser deposition from a ZnMgO target with 4 at% Mg. The MgZnO grown on the ZnO underlayer showed significantly better crystal quality than that grown directly on sapphire. AFM studies revealed a significant deterioration in surface morphology for the MgZnO layers compared with the ZnO underlayer. Optical transmission studies indicated a MgZnO bandgap of 3.61eV (compared with 3.34eV for the ZnO), which corresponds to a Mg content of about 16.1 at%. The MgZnO/ZnO heterojunction showed an anomalously low resistivity, which was more than two orders of magnitude less than the MgZnO layer and an order of magnitude lower than that for the ZnO layer. It was suggested that this may be attributable to the presence of a 2D electron gas at the ZnMgO/ZnO heterointerface. [reprint (PDF)]
17.	Thermal characteristics and analysis of quantum cascade lasers for biochemical sensing applications J.S. Yu, H.K. Lee, S. Slivken, and M. Razeghi SPIE Proceedings, Biosensing II, San Diego, CA (August 2-6, 2009), Vol. 7397, p. 739705-1-- August 2, 2009 ...[Visit Journal] We studied the thermal characteristics and analysis of InGaAs/InAlAs quantum cascade lasers (QCLs) in terms of internal temperature distribution, heat flux, and thermal conductance from the heat transfer simulation. The heat source densities were obtained from threshold power densities measured experimentally for QCLs under room-temperature continuous-wave operation. The use of a thick electroplated Au around the laser ridges helps increase the heat removal from devices. The two-dimensional anisotropic heat dissipation model was used to analyze the thermal behaviors inside the device. The simulation results were also compared with those estimated from experimental data. [reprint (PDF)]
17.	High Power, Continuous-Wave, Quantum Cascade Lasers for MWIR and LWIR Applications S. Slivken, A. Evans, J.S. Yu, S.R. Darvish and M. Razeghi SPIE Conference, San Jose, CA, Vol. 6127, pp. 612703-- January 23, 2006 ...[Visit Journal] Over the past several years, our group has endeavored to develop high power quantum cascade lasers for a variety of remote and high sensitivity infrared applications. The systematic optimization of laser performance has allowed for demonstration of high power, continuous-wave quantum cascade lasers operating above room temperature. Since 2002, the power levels for individual devices have jumped from 20 mW to 600 mW. Expanding on this development, we have able to demonstrate continuous wave operation at many wavelengths throughout the mid- and far-infrared spectral range, and have now achieved >100 mW output in the 4.0 to 9.5 µm range. [reprint (PDF)]
17.	Gain and recombination dynamics of quantum-dot infrared photodetectors H. Lim, B. Movaghar, S. Tsao, M. Taguchi, W. Zhang, A.A. Quivy, and M. Razeghi Physical Review B, 74 (20)-- November 15, 2006 ...[Visit Journal] In this paper we present a theory of diffusion and recombination in QDIPs which is an attempt to explain the recently reported values of gain in these devices. We allow the kinetics to encompass both the diffusion and capture rate limited regimes of carrier relaxation using rigorous random walk and diffusion methods. The photoconductive gains are calculated and compared with the experimental values obtained from InGaAs/InGaP/GaAs and InAs/InP QDIPs using the generation-recombination noise analysis. [reprint (PDF)]
17.	High Performance Planar Antimony-Based Superlattice Photodetectors Using Zinc Diffusion Grown by MBE Jiakai Li, R. K. Saroj, Steven Slivken, V. H. Nguyen, Gail Brown and Manijeh Razeghi Photonics 2022, 9, 664 ...[Visit Journal] In this letter, we report a mid-wavelength infrared (MWIR) planar photodetector based on InAs/InAsSb type-II superlattices (T2SLs) that has a cut-off wavelength of 4.3 um at 77 K. The superlattice for the device was grown by molecular beam epitaxy while the planar device structure was achieved by Zinc diffusion process in a metal–organic chemical vapor deposition reactor. At 77 K, the peak responsivity and the corresponding quantum efficiency had the value of 1.42 A/W and 48% respectively at 3.7 um under -20 mV for the MWIR planar photodetector. At 77 K, the MWIR planar photodetector exhibits a dark current density of 2.0E5 A/cm^2 and the R0A value of ~3.0E2 Ohm cm^2 under -20 mV, which yielded a specific detectivity of 4.0E11 cm Hz^(1/2)/W at 3.7 um. At 150 K, the planar device showed a dark current density of 6.4E-5 A/cm^2 and a quantum efficiency of 49% at ~3.7 um under -20 mV, which yielded a specific detectivity of 2.0E11 cm Hz^(1/2)/W. [reprint (PDF)]
17.	Photoluminescence linewidth narrowing in Yb-doped GaN and InGaN thin films K. Dasari, J. Wang, W.M. Jadwisienczak, V. Dierolf, M. Razeghi, R. Palai Journal of Luminescence Volume 209, May 2019, Pages 237-243-- January 14, 2019 ...[Visit Journal] We report on photoluminescence (PL) properties of GaN, GaN:Yb, InGaN, and InGaN:Yb thin films grown on (0001) sapphire substrates by plasma assisted molecular beam epitaxy (MBE). X-ray diffraction pattern of the films confirms c-axis oriented growth. The concentration of Yb and In was obtained by X-ray photoelectron spectroscopy (XPS) and was found to be 5 (+/- 0.5) at.% and 30 (+/- 1.5) at.%, respectively. The GaN:Yb and InGaN:Yb thin films show a significant linewidth narrowing in PL spectra compared to GaN and InGaN thin films. This could be attributed to the reduction of the defect related non-radiative recombination paths and suppression of the structural defects and dislocations because of the in situ rare earth (Yb)-doping during the growth. The temperature dependent photoluminescence of GaN:Yb thin film follows the Varshni model, whereas InGaN:Yb film shows a complex S-shaped like behavior, which can be explained by the localization effect using the Band-Tail model. [reprint (PDF)]
17.	Investigation of surface leakage reduction for small pitch shortwave infrared photodetectors Arash Dehzangi, Quentin Durlin, Donghai Wu, Ryan McClintock, Manijeh Razeghi Semiconductor Science and Technology, 34(6), 06LT01-- May 25, 2019 ...[Visit Journal] Different passivation techniques are investigated for reducing leakage current in small pixel (down to 9 μm) heterostructure photodetectors designed for the short-wavelength infrared range. Process evaluation test chips were fabricated using the same process as for focal plane arrays. Arrays of small photodetectors were electrically characterized under dark conditions from 150 K to room temperature. In order to evaluate the leakage current, we studied the relation between the inverse of dynamic resistance at −20 mV and zero bias and perimeter over area P/A ratio as the pixel size is scaled down. At 150 K, leakage current arising from the perimeter dominates while bulk leakage dominates at room temperature. We find that in shortwave devices directly underfilling hybridized devices with a thermoset epoxy resin without first doing any additional passivation/protection after etching gives the lowest leakage with a surface resistance of 4.2 × 10⁹ and 8.9 × 10³ Ω· cm⁻¹ at 150 and 300 K, for −20 mV of bias voltage, respectively. [reprint (PDF)]

Page 17 of 31: Prev << 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 >> Next (766 Items)