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12.  Type-II superlattice-based heterojunction phototransistors for high speed applications
Jiakai Li, Arash Dehzangi, Donghai Wu, Ryan McClintock, Manijeh Razeghi
Infrared Physics and Technology 108, 1033502-- May 2, 2020 ...[Visit Journal]
In this study, high speed performance of heterojunction phototransistors (HPTs) based on InAs/GaSb/AlSb type-II superlattice with 30 nm base thickness and 50% cut-off wavelength of 2.0 μm at room temperature are demonstrated. We studied the relationship between -3 dB cut-off frequency of these HPT versus mesa size, applied bias, and collector layer thickness. For 8 μm diameter circular mesas HPT devices with a 0.5 μm collector layer, under 20 V applied bias voltage, we achieved a -3 dB cut-off frequency of 2.8 GHz. [reprint (PDF)]
 
12.  Growth of GaInAs‐InP multiquantum wells on garnet (GGG=Gd3Ga5O12) substrate by metalorganic chemical vapor deposition
M. Razeghi; P‐L. Meunier; P. Maurel
M. Razeghi, P‐L. Meunier, P. Maurel; Growth of GaInAs‐InP multiquantum wells on garnet (GGG=Gd3Ga5O12) substrate by metalorganic chemical vapor deposition. J. Appl. Phys. 15 March 1986; 59 (6): 2261–2263-- March 15, 1986 ...[Visit Journal]
Ga0.47In0.53As‐InP multiquantum wells grown by low‐pressure metalorganic chemical vapor deposition on garnet (GGG=Gd3Ga5O12 with a=12.383 Å) substrates are presented for the first time. The x‐ray diffraction pattern shows that the orientation of the epitaxial layer is (111) while the underlying substrate orientation is (100). The photoluminescence at 77 K is due to the GaInAs layers. [reprint (PDF)]
 
12.  Schottky MSM Photodetectors on GaN Films Grown on Sapphire by Lateral Epitaxial Overgrowth
P. Kung, D. Walker, P. Sandvik, M. Hamilton, J. Diaz, I.H. Lee and M. Razeghi
SPIE Conference, San Jose, CA, -- January 27, 1999 ...[Visit Journal]
We report the growth and characterization of Schottky based metal-semiconductor-metal ultraviolet photodetectors fabricated on lateral epitaxially overgrown GaN films. The lateral epitaxial overgrowth of GaN was carried out on basal plane sapphire substrates by low pressure metalorganic chemical vapor deposition and exhibited lateral growth rates more than 5 times as high as vertical growth rates. The spectral responsivity, the dependence on bias voltage, on incident optical power, and the time response of these photodetectors have been characterized. Two detector orientations were investigated: one with the interdigitated finger pattern parallel and the other perpendicular to the underlying SiOx mask stripes. [reprint (PDF)]
 
12.  InTlSb alloys for infrared detection
E. Bigan, Y.H. Choi, G. Labeyrie, and M. Razeghi
Proceedings, SPIE Nonlinear Optics for High-Speed Electronics and Optical Frequency Conversion, Vol. 2145-- January 24, 1994 ...[Visit Journal]
InTISb alloys have been grown by low-pressure metalorganic chemical vapor deposition, and characterized. Photoconductors exhibit a cutoff wavelength that can be tailored from 5.5 μm up to 9 μm by varying the thallium content. Experimental observations suggest that this can be further extended by increasing the thallium content. An InTISb photoconductor having a 9 μm cutoff wavelength exhibited a D* of 109 cm·Hz½·W-1 at 7 μm operating wavelength. [reprint (PDF)]
 
12.  Surface leakage reduction in narrow band gap type-II antimonide-based superlattice photodiodes
E.K. Huang, D. Hoffman, B.M. Nguyen, P.Y. Delaunay and M. Razeghi
Applied Physics Letters, Vol. 94, No. 5, p. 053506-1-- February 2, 2009 ...[Visit Journal]
Inductively coupled plasma (ICP) dry etching rendered structural and electrical enhancements on type-II antimonide-based superlattices compared to those delineated by electron cyclotron resonance (ECR) with a regenerative chemical wet etch. The surface resistivity of 4×105 Ω·cm is evidence of the surface quality achieved with ICP etching and polyimide passivation. By only modifying the etching technique in the fabrication steps, the ICP-etched devices with a 9.3 µm cutoff wavelength revealed a diffusion-limited dark current density of 4.1×10−6 A/cm2 and a maximum differential resistance at zero bias in excess of 5300 Ω·cm2 at 77 K, which are an order of magnitude better in comparison to the ECR-etched devices. [reprint (PDF)]
 
12.  World's first demonstration of type-II superlattice dual band 640 x 512 LWIR focal plane array
E.K. Huang and M. Razeghi
SPIE Proceedings, Vol. 8268, p. 82680Z-- January 22, 2012 ...[Visit Journal]
High resolution multi-band infrared detection of terrestrial objects is useful in applications such as long range and high altitude surveillance. In this paper, we present a 640 x 512 type-II superlattice focal plane array (FPA) in the long-wave infrared (LWIR) suitable for such purposes, featuring 100% cutoff wavelengths at 9.5 μm (blue channel) and 13 μm (red). The dual band camera is single-bump hybridized to an Indigo 30 μm pitch ISC0905 read-out integrated circuit. Test pixels revealed background limited behavior with specific detectivities as high as ~5x1011 Jones at 7.9 μm (blue) and ~1x1011 Jones at 10.2 μm (red) at 77K. [reprint (PDF)]
 
12.  Ultraviolet avalanche photodiodes
Ryan McClintock ; Manijeh Razeghi
Proc. SPIE 9555, Optical Sensing, Imaging, and Photon Counting: Nanostructured Devices and Applications, 95550B -- August 28, 2015 ...[Visit Journal]
The III-Nitride material system is rapidly maturing; having proved itself as a material for LEDs and laser, and now finding use in the area of UV photodetectors. However, many UV applications are still dominated by the use of photomultiplier tubes (PMT). PMTs are capable of obtaining very high sensitivity using internal electron multiplication gain (typically ~106). It is highly desirable to develop a compact semiconductor-based photodetector capable of realizing this level of sensitivity. In principle, this can be obtained in III-Nitrides by taking advantage of avalanche multiplication under high electric fields – typically 2.7 MV/cm, which with proper design can correspond to an external reverse bias of less than 100 volts. In this talk, we review the current state-of-the-art in III-Nitride solar- and visible-blind APDs, and present our latest results on GaN APDs grown on both conventional sapphire and low dislocation density free-standing c- and m-plane GaN substrates. Leakage current, gain, and single photon detection efficiency (SPDE) of these APDs were compared. The spectral response and Geiger-mode photon counting performance of UV APDs are studied under low photon fluxes, with single photon detection capabilities as much as 30% being demonstrated in smaller devices. Geiger-mode operation conditions are optimized for enhanced SPDE. [reprint (PDF)]
 
12.  Stranski-Krastanov growth of InGaN quantum dots emitting in green spectra
C. Bayram and M. Razeghi
Applied Physics A: Materials Science and Processing, Vol. 96, No. 2, p. 403-408-- August 1, 2009 ...[Visit Journal]
Self-assembled InGaN quantum dots (QDs) were grown on GaN templates by metalorganic chemical vapor deposition. 2D–3D growth mode transition through Stranski–Krastanov mode was observed via atomic force microscopy. The critical thickness for In0.67Ga0.33N QDs was determined to be four monolayers. The effects of growth temperature, deposition thickness, and V/III ratio on QD formation were examined. The capping of InGaN QDs with GaN was analyzed. Optimized InGaN quantum dots emitted in green spectra at room temperature. [reprint (PDF)]
 
12.  AlGaN-based deep UV light emitting diodes with peak emission below 255 nm
A. Yasan, R. McClintock, K. Mayes, P. Kung, and M. Razeghi
SPIE Conference, Jose, CA, Vol. 5732, pp. 197-- January 22, 2005 ...[Visit Journal]
We report on the growth and fabrication of AlGaN-based deep ultraviolet light-emitting diodes (LEDs) with peak emission of below 255 nm. In order to achieve such short wavelength UV LEDs, the Al mole fractions in the device layers should be greater than ~60%. This introdues serious challenges on the growth and doping of AlxGa1-xN epilayers. However, with the aid of a high-quality AlN template layer and refinement of the growth conditions we have been able to demonstrate UV LEDs emitting below 255 nm. [reprint (PDF)]
 
12.  Highly temperature insensitive quantum cascade lasers
Y. Bai, N. Bandyopadhyay, S. Tsao, E. Selcuk, S. Slivken and M. Razeghi
Applied Physics Letters, Vol. 97, No. 25-- December 20, 2010 ...[Visit Journal]
An InP based quantum cascade laser (QCL) heterostructure emitting around 5 μm is grown with gas-source molecular beam epitaxy. The QCL core design takes a shallow-well approach to maximize the characteristic temperatures, T(0) and T(1), for operations above room temperature. A T(0) value of 383 K and a T(1) value of 645 K are obtained within a temperature range of 298–373 K. In room temperature continuous wave operation, this design gives a single facet output power of 3 W and a wall plug efficiency of 16% from a device with a cavity length of 5 mm and a ridge width of 8 μm. [reprint (PDF)]
 
12.  Background limited performance of long wavelength infrared focal plane arrays fabricated from M-structure InAs-GaSb superlattices
P.Y. Delaunay, B.M. Nguyen, D. Hoffman, E.K. Huang, and M. Razeghi
IEEE Journal of Quantum Electronics, Vol. 45, No. 2, p. 157-162.-- February 1, 2009 ...[Visit Journal]
The recent introduction of a M-structure design improved both the dark current and R0A performances of Type-II InAs-GaSb photodiodes. A focal plane array fabricated with this design was characterized at 81 K. The dark current of individual pixels was measured between 1.1 and 1.6 nA, 7 times lower than previous superlattice FPAs. This led to a higher dynamic range and longer integration times. The quantum efficiency of detectors without antireflective coating was 74%. The noise equivalent temperature difference reached 23 mK, limited only by the performance of the testing system and the read out integrated circuit. Background limited performances were demonstrated at 81 K for a 300 K background. [reprint (PDF)]
 
12.  InAsSb/InAsP strained-layer superlattice injection lasers operating at 4.0 μm grown by metal-organic chemical vapor deposition
B. Lane, Z. Wu, A. Stein, J. Diaz, and M. Razeghi
Applied Physics Letters 74 (23)-- June 7, 1999 ...[Visit Journal]
We report high power mid-infrared electrical injection operation of laser diodes based on InAsSb/InAsP strained-layer superlattices grown on InAs substrate by metal-organic chemical vapor deposition. The broad-area laser diodes with 100 μm aperture and 1800 μm cavity length demonstrate peak output powers of 546 and 94 mW in pulsed and cw operation respectively at 100 K with a threshold current density as low as 100 A/cm². [reprint (PDF)]
 
12.  Spatial Noise and Correctability of Type-II InAs/GaSb Focal Plane Arrays
P.Y. Delaunay and M. Razeghi
IEEE Journal of Quanutm Electronics, April 2010, Vol. 46, No. 4, p. 584-588-- April 1, 2010 ...[Visit Journal]
A long wavelength infrared focal plane array based on Type-II InAs/GaSb superlattices was fabricated and characterized at 80 K. The noise equivalent temperature difference of the array was measured as low as 23 mK (f# = 2), for an integration time of 0.129 ms. The spatial noise of the array was dominated by the nonuniformity of the illumination through the circular aperture. A standard two-point nonuniformity correction improved the inhomogeneity equivalent temperature difference to 16 mK. The correctability just after calibration was 0.6. The long-term stability time was superior to 25 hours. [reprint (PDF)]
 
12.  On the interface properties of ZnO/Si electroluminescent diodes
J.L. Pau, J. Piqueras, D.J. Rogers, F. Hosseini Teherani, K. Minder, R. McClintock, and M. Razeghi
Journal of Applied Physics, Vol. 107, No. 3, p. 033719-1-- February 1, 2010 ...[Visit Journal]
ZnO layers grown on n–Si(100), n+–Si(100), and n–Si(111) substrates by pulsed-laser deposition were found to give electroluminescence. Light emission was observed in the form of discrete spots for currents over 1 mA with a white appearance to the naked eye. The intensity of these spots showed an erratic behavior over time, appearing and disappearing at random, while showing an associated random telegraph noise in the current signal. Regardless the substrate used, the electroluminescence spectra had a main broadband emission centered at about 600 nm and a relatively small peak at around 380 nm which corresponds to the energy of ZnO near band edge emission. Furthermore, the devices exhibited rectifying characteristics, whose current blocking direction depended on the substrate orientation. Optimization of ZnO conductivity and performing sample growth in N2 ambient were found to be critical to enhance the emission intensity. Rutherford backscattering characterization revealed the existence of an intermixed region at the interface between ZnO and Si. To study the electronic properties at the interface, frequency dependent capacitance measurements were carried out. The junction capacitance became frequency dependent at the bias voltages at which light emission occurs due to the relatively slow trapping and generation processes at deep centers. These centers are believed to play an important role in the mechanism of light emission. [reprint (PDF)]
 
12.  Reliable GaN-based resonant tunneling diodes with reproducible room-temperature negative differential resistance
C. Bayram, D.K. Sadana, Z. Vashaei and M. Razeghi
SPIE Proceedings, Vol. 8268, p. 826827-- January 22, 2012 ...[Visit Journal]
negative differential resistance (NDR). Compared to other negative resistance devices such as (Esaki) tunnel and transferred-electron devices, RTDs operate much faster and at higher temperatures. III-nitride materials, composed of AlGaInN alloys, have wide bandgap, high carrier mobility and thermal stability; making them ideal for high power high frequency RTDs. Moreover, larger conduction band discontinuity promise higher NDR than other materials (such as GaAs) and room-temperature operation. However, earlier efforts on GaN-based RTD structures have failed to achieve a reliable and reproducible NDR. Recently, we have demonstrated for the first time that minimizing dislocation density and eliminating the piezoelectric fields enable reliable and reproducible NDR in GaN-based RTDs even at room temperature. Observation of NDR under both forward and reverse bias as well as at room and low temperatures attribute the NDR behaviour to quantum tunneling. This demonstration marks an important milestone in exploring III-nitride quantum devices, and will pave the way towards fundamental quantum transport studies as well as for high frequency optoelectronic devices such as terahertz emitters based on oscillators and cascading structures. [reprint (PDF)]
 
12.  Gain-length scaling in quantum dot/quantum well infrared photodetectors
T. Yamanaka, B. Movaghar, S. Tsao, S. Kuboya, A. Myzaferi and M. Razeghi
Virtual Journal of Nanoscale Science & Technology-- September 14, 2009 ...[Visit Journal][reprint (PDF)]
 
12.  First room‐temperature cw operation of a GaInAsP/InP light‐emitting diode on a silicon substrate
M. Razeghi; R. Blondeau; M. Defour; F. Omnes; P. Maurel; F. Brillouet
Appl. Phys. Lett. 53, 854–855 (1988)-- July 4, 1988 ...[Visit Journal]
We report in this letter the first successful fabrication of an InP-GalnAsP light-emitting diode, emitting at 1.15 pm grown by low-pressure metalorganic chemical vapor deposition on a silicon substrate. The device has been operated under continuous wave operation at room temperature for 24 h (with an injection current of 200 rnA), and showed no degradation. [reprint (PDF)]
 
12.  Roadmap of Semiconductor Infrared Lasers and Detectors for the 21st Century
M. Razeghi
SPIE Conference, San Jose, CA, -- January 27, 1999 ...[Visit Journal]
Since the first discovery, semiconductor infrared lasers and detectors have found many various applications in military, communications, medical, and industry sections. In this paper, the current status of semiconductor infrared lasers and detectors will be reviewed. Advantages and disadvantages of different methods and techniques is discussed later. Some basic physical limitations of current technology are studied and the direction to overcome these problems will be suggested. [reprint (PDF)]
 
12.  Suppression of surface leakage in gate controlled type-II InAs/GaSb mid-infrared photodetectors
G. Chen; B.-M. Nguyen; A.M. Hoang; E.K. Huang; S.R. Darvish; M. Razeghi
Proc. SPIE 8268, Quantum Sensing and Nanophotonic Devices IX, 826811 (January 20, 2012)-- January 20, 2012 ...[Visit Journal]
One of the biggest challenges of improving the electrical performance in Type II InAs/GaSb superlattice photodetector is suppressing the surface leakage. Surface leakage screens important bulk dark current mechanisms, and brings difficulty and uncertainty to the material optimization and bulk intrinsic parameters extraction such as carrier lifetime and mobility. Most of surface treatments were attempted beyond the mid-infrared (MWIR) regime because compared to the bulk performance, surface leakage in MWIR was generally considered to be a minor factor. In this work, we show that below 150K, surface leakage still strongly affects the electrical performance of the very high bulk performance p-π-M-n MWIR photon detectors. With gating technique, we can effectively eliminate the surface leakage in a controllable manner. At 110K, the dark current density of a 4.7 μm cut-off gated photon diode is more than 2 orders of magnitude lower than the current density in SiO2 passivated ungated diode. With a quantum efficiency of 48%, the specific detecivity of gated diodes attains 2.5 x 1014 cm·Hz1/2/W, which is 3.6 times higher than that of ungated diodes. [reprint (PDF)]
 
12.  Back-illuminated separate absorption and multiplication GaN avalanche photodiodes
J.L. Pau, C. Bayram, R. McClintock, M. Razeghi and D. Silversmith
Applied Physics Letters, Vol. 92, No. 10, p. 101120-1-- March 10, 2008 ...[Visit Journal]
The performance of back-illuminated avalanche photodiodes with separate absorption and multiplication regions is presented. Devices with an active area of 225 µm2 show a maximum multiplication gain of 41,200. The calculation of the noise equivalent power yields a minimum value of 3.3×10−14 W·Hz−1/2 at a gain of 3000, increasing to 2.0×10−13 W·Hz−1/2 at a gain of 41,200. The broadening of the response edge has been analyzed as a function of bias. [reprint (PDF)]
 
12.  High-power laser diodes based on InGaAsP alloys
M. Razeghi
Nature, Vol.369, p.631-633-- June 23, 1994 ...[Visit Journal]
HIGH-POWER, high-coherence solid-state lasers, based on dielectric materials such as ruby or Nd:YAG (yttrium aluminium garnet), have many civilian and military applications. The active media in these lasers are insulating, and must therefore be excited (or ‘pumped’) by optical, rather than electrical, means. Conventional gas-discharge lamps can be used as the pumping source, but semiconductor diode lasers are more efficient, as their wavelength can be tailored to match the absorption properties of the lasing material. Semiconducting AlGaAs alloys are widely used for this purpose, but oxidation of the aluminium and the spreading of defects during device operation limit the lifetime of the diodes3, and hence the reliability of the system as a whole. Aluminium-free InGaAsP compounds, on the other hand, do not have these lifetime-limiting properties. We report here the fabrication of high-power lasers based on InGaAsP (lattice-matched to GaAs substrates), which operate over the same wavelength range as conventional AlGaAs laser diodes and show significantly improved reliability. The other optical and electrical properties of these diodes are either comparable or superior to those of the AlGaAs system. [reprint (PDF)]
 
12.  LEO of III-Nitride on Al2O3 and Si Substrates
M. Razeghi, P. Kung, P. Sandvik, K. Mi, X. Zhang, V.P. Dravid, J. Freitas, and A. Saxler
SPIE Conference, San Jose, CA, -- January 26, 2000 ...[Visit Journal]
Lateral epitaxial overgrowth (LEO) has recently become the method of choice to reduce the density of dislocations in heteroepitaxial GaN thin films, and is thus expected to lead to enhanced performance devices. We present here the LEO growth and characterization of GaN films by low pressure metalorganic chemical vapor deposition. Various substrates were used, including basal plane sapphire and oriented Si substrates. The steps in the LEO growth technology will be briefly reviewed. The characterization results will be discussed in detail. The structural, electrical and optical properties of the films were assessed through scanning, atomic and transmission electron microscopy, x-ray diffraction, capacitance-voltage, deep level transient spectroscopy, photoluminescence, and scanning cathodoluminenscence measurements. Single-step and double- step LEO GaN was achieved on sapphire. Similarly high quality LEO grown GaN films were obtained on sapphire and silicon substrates. Clear and dramatic reduction in the density of defects are observed in LEO grown materials using the various characterization techniques mentioned previously. [reprint (PDF)]
 
12.  III-Nitride Optoelectronic Devices: From Ultraviolet Toward Terahertz
M. Razeghi
IEEE Photonics Journal-Breakthroughs in Photonics 2010, Vol. 3, No. 2, p. 263-267-- April 26, 2011 ...[Visit Journal]
We review III-Nitride optoelectronic device technologies with an emphasis on recent breakthroughs. We start with a brief summary of historical accomplishments and then report the state-of-the-art in three key spectral regimes: (1) Ultraviolet (AlGaN-based avalanche photodiodes, single photon detectors, focal plane arrays, and light emitting diodes), (2) Visible (InGaN-based solid state lighting, lasers, and solar cells), and (3) Near-, mid-infrared, and terahertz (AlGaN/GaN-based gap-engineered intersubband devices). We also describe future trends in III-Nitride optoelectronic devices. [reprint (PDF)]
 
12.  Ga/sub 0.51/In/sub 0.49/P/GaAs HEMT's exhibiting good electrical performance at cryogenic temperatures
Y.-J. Chan; D. Pavlidis; M. Razeghi; F. Omnes
IEEE TRANS. ELEC.DEVICES. 77. IO. 1990-- October 1, 1990 ...[Visit Journal]
The DC and microwave characteristics of Ga/sub 0.51/In/sub 0.49/P/GaAs HEMTs grown by metalorganic chemical vapor deposition (MOCVD) are presented. Devices with 1- mu m-long gates show transconductances of 163 and 213 mS/mm at 300 and 77 K, respectively. Their maximum cutoff frequency is 17.8 GHz. Deep traps in the doped layer are evaluated at low temperature by the threshold voltage shift and current collapse phenomena. GaInP/GaAs HEMTs show no current collapse and have almost zero threshold voltage shift compared to AlGaAs/GaAs and InAlAs/InGaAs where the corresponding values are 0.5 and 0.25 V, respectively. [reprint (PDF)]
 
12.  Quantum-Cascade Lasers Operating in Continuous-Wave Mode Above 90°C at λ ~5.25 µm
A. Evans, J. Nguyen, S. Slivken, J.S. Yu, S.R. Darvish, and M. Razeghi
Applied Physics Letters 88 (5)-- January 30, 2006 ...[Visit Journal]
We report on the design and fabrication of λ~5.25 μm quantum-cascade lasers (QCLs) for very high temperature continuous-wave (CW) operation. CW operation is reported up to a maximum temperature of 90 °C (363 K). CW output power is reported in excess of 500 mW near room temperature with a low threshold current density. A finite element thermal model is used to investigate the Gth and maximum CW operating temperature of the QCLs. [reprint (PDF)]
 

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