Center for Quantum Devices - Most Downloaded Journal Articles

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12.	Gain-length scaling in quantum dot/quantum well infrared photodetectors T. Yamanaka, B. Movaghar, S. Tsao, S. Kuboya, A. Myzaferi and M. Razeghi Virtual Journal of Nanoscale Science & Technology-- September 14, 2009 ...[Visit Journal][reprint (PDF)]
12.	First room‐temperature cw operation of a GaInAsP/InP light‐emitting diode on a silicon substrate M. Razeghi; R. Blondeau; M. Defour; F. Omnes; P. Maurel; F. Brillouet Appl. Phys. Lett. 53, 854–855 (1988)-- July 4, 1988 ...[Visit Journal] We report in this letter the first successful fabrication of an InP-GalnAsP light-emitting diode, emitting at 1.15 pm grown by low-pressure metalorganic chemical vapor deposition on a silicon substrate. The device has been operated under continuous wave operation at room temperature for 24 h (with an injection current of 200 rnA), and showed no degradation. [reprint (PDF)]
12.	GaInN/GaN Multi-Quantum Well Laser Diodes Grown by Low-Pressure Metalorganic Chemical Vapor Deposition P. Kung, A. Saxler, D. Walker, A. Rybaltowski, X. Zhang, J. Diaz, and M. Razeghi MRS Internet Journal of Nitride Semiconductor Research 3 (1)-- January 1, 1998 ...[Visit Journal] We report the growth, fabrication and characterization of GaInN/GaN multi-quantum well lasers grown on (00·1) sapphire substrates by low pressure metalorganic chemical vapor deposition. The threshold current density of a 1800 µm long cavity length laser was 1.4 kA/cm² with a threshold voltage of 25 V. These lasers exhibited series resistances of 13 and 14 Ω at 300 and 79 K, respectively. [reprint (PDF)]
12.	Back-illuminated separate absorption and multiplication GaN avalanche photodiodes J.L. Pau, C. Bayram, R. McClintock, M. Razeghi and D. Silversmith Applied Physics Letters, Vol. 92, No. 10, p. 101120-1-- March 10, 2008 ...[Visit Journal] The performance of back-illuminated avalanche photodiodes with separate absorption and multiplication regions is presented. Devices with an active area of 225 µm² show a maximum multiplication gain of 41,200. The calculation of the noise equivalent power yields a minimum value of 3.3×10⁻¹⁴ W·Hz^−1/2 at a gain of 3000, increasing to 2.0×10⁻¹³ W·Hz^−1/2 at a gain of 41,200. The broadening of the response edge has been analyzed as a function of bias. [reprint (PDF)]
12.	Miniaturization: enabling technology for the new millennium M. Razeghi and H. Mohseni SPIE International Conference on Solid State Crystals, Zakopane, Poland, -- April 1, 2001 ...[Visit Journal] The history of semiconductor devices has been characterized by a constant drive toward lower dimensions in order to increase integration density, system functionality and performance. However, this is still far from being comparable with the performance of natural systems such as human brain. The challenges facing semiconductor technologies in the millennium will be to move toward miniaturization. The influence of this trend on the quantum sensing of infrared radiation is one example that is elaborated here. A new generation of infrared detectors has been developed by growing layers of different semiconductors with nanometer thicknesses. The resulted badgap engineered semiconductor has superior performance compared to the bulk material. To enhance this technology further, we plan to move from quantum wells to quantum wire and quantum dots. [reprint (PDF)]
12.	Metalorganic chemical vapor deposition of monocrystalline GaN thin films on β-LiGaO2substrates P. Kung, A. Saxler, X. Zhang, D. Walker, R. Lavado, and M. Razeghi Applied Physics Letters 69 (14)-- September 30, 1996 ...[Visit Journal] We report the metalorganic chemical vapor deposition growth and characterization of monocrystalline GaN thin films on β-LiGaO₂ substrates. The influence of the growth temperature on the crystal quality was studied. The structural, electrical, and optical properties of the films were assessed through scanning electron microscopy, x-ray diffraction, Hall measurements, optical transmission, photoluminescence. [reprint (PDF)]
12.	Type-II superlattice-based heterojunction phototransistors for high speed applications Jiakai Li, Arash Dehzangi, Donghai Wu, Ryan McClintock, Manijeh Razeghi Infrared Physics and Technology 108, 1033502-- May 2, 2020 ...[Visit Journal] In this study, high speed performance of heterojunction phototransistors (HPTs) based on InAs/GaSb/AlSb type-II superlattice with 30 nm base thickness and 50% cut-off wavelength of 2.0 μm at room temperature are demonstrated. We studied the relationship between -3 dB cut-off frequency of these HPT versus mesa size, applied bias, and collector layer thickness. For 8 μm diameter circular mesas HPT devices with a 0.5 μm collector layer, under 20 V applied bias voltage, we achieved a -3 dB cut-off frequency of 2.8 GHz. [reprint (PDF)]
12.	III-Nitride Optoelectronic Devices: From Ultraviolet Toward Terahertz M. Razeghi IEEE Photonics Journal-Breakthroughs in Photonics 2010, Vol. 3, No. 2, p. 263-267-- April 26, 2011 ...[Visit Journal] We review III-Nitride optoelectronic device technologies with an emphasis on recent breakthroughs. We start with a brief summary of historical accomplishments and then report the state-of-the-art in three key spectral regimes: (1) Ultraviolet (AlGaN-based avalanche photodiodes, single photon detectors, focal plane arrays, and light emitting diodes), (2) Visible (InGaN-based solid state lighting, lasers, and solar cells), and (3) Near-, mid-infrared, and terahertz (AlGaN/GaN-based gap-engineered intersubband devices). We also describe future trends in III-Nitride optoelectronic devices. [reprint (PDF)]
12.	High-power, continuous-operation intersubband laser for wavelengths greater than 10 micron S. Slivken, A. Evans, W. Zhang and M. Razeghi Applied Physics Letters, Vol. 90, No. 15, p. 151115-1-- April 9, 2007 ...[Visit Journal] In this letter, high-power continuous-wave emission (>100 mW) and high temperature operation (358 K) at a wavelength of 10.6 µm is demonstrated using an individual diode laser. This wavelength is advantageous for many medium-power applications previously reserved for the carbon dioxide laser. Improved performance was accomplished using industry-standard InP-based materials and by careful attention to design, growth, and fabrication limitations specific to long-wave infrared semiconductor lasers. The main problem areas are explored with regard to laser performance, and general steps are outlined to minimize their impact. [reprint (PDF)]
12.	Chemical lift-off and direct wafer bonding of GaN/InGaN P-I-N structures grown on ZnO K. Pantzas, D.J. Rogers, P. Bove, V.E. Sandana, F.H. Teherani, Y. El Gmili, M. Molinari, G. Patriarche, L. Largeau, O. Mauguin, S. Suresh, P.L. Voss, M. Razeghi, A. Ougazzaden Journal of Crystal Growth, Volume 435, Pages 105-109-- November 7, 2015 ...[Visit Journal] p-GaN/i-InGaN/n-GaN (PIN) structures were grown epitaxially on ZnO-buffered c-sapphire substrates by metal organic vapor phase epitaxy using the industry standard ammonia precursor for nitrogen. Scanning electron microscopy revealed continuous layers with a smooth interface between GaN and ZnO and no evidence of ZnO back-etching. Energy Dispersive X-ray Spectroscopy revealed a peak indium content of just under 5at% in the active layers. The PIN structure was lifted off the sapphire by selectively etching away the ZnO buffer in an acid and then direct bonded onto a glass substrate. Detailed high resolution transmission electron microscopy and grazing incidence X-ray diffraction studies revealed that the structural quality of the PIN structures was preserved during the transfer process. [reprint (PDF)]
12.	Schottky MSM Photodetectors on GaN Films Grown on Sapphire by Lateral Epitaxial Overgrowth P. Kung, D. Walker, P. Sandvik, M. Hamilton, J. Diaz, I.H. Lee and M. Razeghi SPIE Conference, San Jose, CA, -- January 27, 1999 ...[Visit Journal] We report the growth and characterization of Schottky based metal-semiconductor-metal ultraviolet photodetectors fabricated on lateral epitaxially overgrown GaN films. The lateral epitaxial overgrowth of GaN was carried out on basal plane sapphire substrates by low pressure metalorganic chemical vapor deposition and exhibited lateral growth rates more than 5 times as high as vertical growth rates. The spectral responsivity, the dependence on bias voltage, on incident optical power, and the time response of these photodetectors have been characterized. Two detector orientations were investigated: one with the interdigitated finger pattern parallel and the other perpendicular to the underlying SiO_x mask stripes. [reprint (PDF)]
12.	InTlSb alloys for infrared detection E. Bigan, Y.H. Choi, G. Labeyrie, and M. Razeghi Proceedings, SPIE Nonlinear Optics for High-Speed Electronics and Optical Frequency Conversion, Vol. 2145-- January 24, 1994 ...[Visit Journal] InTISb alloys have been grown by low-pressure metalorganic chemical vapor deposition, and characterized. Photoconductors exhibit a cutoff wavelength that can be tailored from 5.5 μm up to 9 μm by varying the thallium content. Experimental observations suggest that this can be further extended by increasing the thallium content. An InTISb photoconductor having a 9 μm cutoff wavelength exhibited a D* of 10⁹ cm·Hz^½·W^-1 at 7 μm operating wavelength. [reprint (PDF)]
12.	Surface leakage reduction in narrow band gap type-II antimonide-based superlattice photodiodes E.K. Huang, D. Hoffman, B.M. Nguyen, P.Y. Delaunay and M. Razeghi Applied Physics Letters, Vol. 94, No. 5, p. 053506-1-- February 2, 2009 ...[Visit Journal] Inductively coupled plasma (ICP) dry etching rendered structural and electrical enhancements on type-II antimonide-based superlattices compared to those delineated by electron cyclotron resonance (ECR) with a regenerative chemical wet etch. The surface resistivity of 4×10⁵ Ω·cm is evidence of the surface quality achieved with ICP etching and polyimide passivation. By only modifying the etching technique in the fabrication steps, the ICP-etched devices with a 9.3 µm cutoff wavelength revealed a diffusion-limited dark current density of 4.1×10⁻⁶ A/cm² and a maximum differential resistance at zero bias in excess of 5300 Ω·cm² at 77 K, which are an order of magnitude better in comparison to the ECR-etched devices. [reprint (PDF)]
12.	Spatial Noise and Correctability of Type-II InAs/GaSb Focal Plane Arrays P.Y. Delaunay and M. Razeghi IEEE Journal of Quanutm Electronics, April 2010, Vol. 46, No. 4, p. 584-588-- April 1, 2010 ...[Visit Journal] A long wavelength infrared focal plane array based on Type-II InAs/GaSb superlattices was fabricated and characterized at 80 K. The noise equivalent temperature difference of the array was measured as low as 23 mK (f# = 2), for an integration time of 0.129 ms. The spatial noise of the array was dominated by the nonuniformity of the illumination through the circular aperture. A standard two-point nonuniformity correction improved the inhomogeneity equivalent temperature difference to 16 mK. The correctability just after calibration was 0.6. The long-term stability time was superior to 25 hours. [reprint (PDF)]
12.	On the interface properties of ZnO/Si electroluminescent diodes J.L. Pau, J. Piqueras, D.J. Rogers, F. Hosseini Teherani, K. Minder, R. McClintock, and M. Razeghi Journal of Applied Physics, Vol. 107, No. 3, p. 033719-1-- February 1, 2010 ...[Visit Journal] ZnO layers grown on n⁻–Si(100), n⁺–Si(100), and n^––Si(111) substrates by pulsed-laser deposition were found to give electroluminescence. Light emission was observed in the form of discrete spots for currents over 1 mA with a white appearance to the naked eye. The intensity of these spots showed an erratic behavior over time, appearing and disappearing at random, while showing an associated random telegraph noise in the current signal. Regardless the substrate used, the electroluminescence spectra had a main broadband emission centered at about 600 nm and a relatively small peak at around 380 nm which corresponds to the energy of ZnO near band edge emission. Furthermore, the devices exhibited rectifying characteristics, whose current blocking direction depended on the substrate orientation. Optimization of ZnO conductivity and performing sample growth in N₂ ambient were found to be critical to enhance the emission intensity. Rutherford backscattering characterization revealed the existence of an intermixed region at the interface between ZnO and Si. To study the electronic properties at the interface, frequency dependent capacitance measurements were carried out. The junction capacitance became frequency dependent at the bias voltages at which light emission occurs due to the relatively slow trapping and generation processes at deep centers. These centers are believed to play an important role in the mechanism of light emission. [reprint (PDF)]
12.	Recent advances in III-Nitride materials, characterization and device applications M. Razeghi, X. Zhang, P. Kung, A. Saxler, D. Walker, K.Y. Lim, and K.S. Kim SPIE Conference: Solid State Crystals in Optoelectronics and Semiconductor Technology; Proceedings 3179-- October 7, 1996 ...[Visit Journal] High-quality AlN, GaN, AlGaN have been grown on sapphire substrate by low-pressure metalorganic chemical vapor deposition (LP-MOCVD). The x-ray rocking curve of AlN and GaN were 100 arcsecs and 30 arcsecs respectively with Pendelloesung oscillations, which are the best reported to date. GaN with high crystallinity simultaneously exhibited high optical and electrical quality. Photoluminescence linewidth of GaN at 77K was as low as 17 meV, which is the best reported to date. Si-doped GaN had a mobility higher than 300 cm²/V·s. GaN has been also successfully grown on LiGaO₂ substrate with LP-MOCVD for the first time. AlGaN for the entire composition range has been grown. These layers exhibited the lowest x-ray FWHM reported to date. The excellent optical quality of these layers have been characterized by room temperature UV transmission and photoluminescence. N-type doping of AlGaN with Si has ben achieved up to 60 percent Al with mobility as high as 78 cm²/V·s. Al_xGa_1-xN/Al_yGa_1-yN superlattice with atomically sharp interface have been demonstrated. Optically-pumped stimulated emission in GaN:Ge and GaN:Si has been observed with threshold optical power density as low as 0.4 MW/cm². AlGaN photoconductors with cut-off wavelengths from 200 nm to 365 nm have been achieved for the first time. GaN p-n junction photovoltaic detector with very selective photoresponse have been demonstrated and theoretically modeled. Ti/AlN/Si metal-insulator- semiconductor capacitor with high capacitance-voltage performances at both low and high frequencies and low interface trap level density have been demonstrated for the first time in this material system. [reprint (PDF)]
12.	AlGaN/AlN MOVPE heteroepitaxy: pulsed co-doping SiH4 and TMIn Ilkay Demir, Yusuf Koçak, A. Emre Kasapoğlu, Manijeh Razeghi, Emre Gür and Sezai Elagoz Semicond. Sci. Technol. 34 075028-- June 24, 2019 ...[Visit Journal] We report a new growth approach pulsed co-doping growth of Al_xGa_1−xN (x > 0.5) epilayers on AlN/Al₂O₃ templates by metal organic vapor phase epitaxy (MOVPE). Using this approach SiH₄ (silane) and TMIn (trimethylindium) supplied to the growth chamber alternately and pulsed during the growth of AlGaN epilayers. Structural and morphological quality of AlGaN epilayers were investigated by high resolution x-ray diffraction (HR-XRD), atomic force microscopy (AFM), Raman spectroscopy, and scanning electron microscopy (SEM) techniques. It has shown that higher crystalline quality with low full width at half maximum (FWHM) and smoother surface morphology with reduced hexagonal hillock density has been obtained by the pulsed co-doping growth approach. Volcano like hillock structures has been confirmed by Raman mapping. [reprint (PDF)]
12.	Background limited performance of long wavelength infrared focal plane arrays fabricated from M-structure InAs-GaSb superlattices P.Y. Delaunay, B.M. Nguyen, D. Hoffman, E.K. Huang, and M. Razeghi IEEE Journal of Quantum Electronics, Vol. 45, No. 2, p. 157-162.-- February 1, 2009 ...[Visit Journal] The recent introduction of a M-structure design improved both the dark current and R₀A performances of Type-II InAs-GaSb photodiodes. A focal plane array fabricated with this design was characterized at 81 K. The dark current of individual pixels was measured between 1.1 and 1.6 nA, 7 times lower than previous superlattice FPAs. This led to a higher dynamic range and longer integration times. The quantum efficiency of detectors without antireflective coating was 74%. The noise equivalent temperature difference reached 23 mK, limited only by the performance of the testing system and the read out integrated circuit. Background limited performances were demonstrated at 81 K for a 300 K background. [reprint (PDF)]
12.	InAsSb/InAsP strained-layer superlattice injection lasers operating at 4.0 μm grown by metal-organic chemical vapor deposition B. Lane, Z. Wu, A. Stein, J. Diaz, and M. Razeghi Applied Physics Letters 74 (23)-- June 7, 1999 ...[Visit Journal] We report high power mid-infrared electrical injection operation of laser diodes based on InAsSb/InAsP strained-layer superlattices grown on InAs substrate by metal-organic chemical vapor deposition. The broad-area laser diodes with 100 μm aperture and 1800 μm cavity length demonstrate peak output powers of 546 and 94 mW in pulsed and cw operation respectively at 100 K with a threshold current density as low as 100 A/cm². [reprint (PDF)]
12.	Suppression of surface leakage in gate controlled type-II InAs/GaSb mid-infrared photodetectors G. Chen; B.-M. Nguyen; A.M. Hoang; E.K. Huang; S.R. Darvish; M. Razeghi Proc. SPIE 8268, Quantum Sensing and Nanophotonic Devices IX, 826811 (January 20, 2012)-- January 20, 2012 ...[Visit Journal] One of the biggest challenges of improving the electrical performance in Type II InAs/GaSb superlattice photodetector is suppressing the surface leakage. Surface leakage screens important bulk dark current mechanisms, and brings difficulty and uncertainty to the material optimization and bulk intrinsic parameters extraction such as carrier lifetime and mobility. Most of surface treatments were attempted beyond the mid-infrared (MWIR) regime because compared to the bulk performance, surface leakage in MWIR was generally considered to be a minor factor. In this work, we show that below 150K, surface leakage still strongly affects the electrical performance of the very high bulk performance p-π-M-n MWIR photon detectors. With gating technique, we can effectively eliminate the surface leakage in a controllable manner. At 110K, the dark current density of a 4.7 μm cut-off gated photon diode is more than 2 orders of magnitude lower than the current density in SiO₂ passivated ungated diode. With a quantum efficiency of 48%, the specific detecivity of gated diodes attains 2.5 x 10¹⁴ cm·Hz^1/2/W, which is 3.6 times higher than that of ungated diodes. [reprint (PDF)]
12.	Characterization of high quality GaInP/GaAs superlattices grown on GaAs and Si substrates by gas source molecular beam epitaxy C. Jelen, S. Slivken, X.G. He, and M. Razeghi and S. Shastry Journal of Vacuum Science and Technology B 12 (2)-- March 1, 1994 ...[Visit Journal] We report an analysis of the heteroepitaxial interfaces in high quality GaInP–GaAs superlattices grown simultaneously on GaAs and Si substrates by gas source molecular beam epitaxy. These two superlattices have been studied using high resolution x-ray diffraction measurements. Sharp superlattice satellites, with very little broadening, are observed within a 6° range for the sample on GaAs. Photoluminescence peaks with full widths at half-maximums of 5 and 7 meV are obtained at 4 K for samples with 58 Å wells on GaAs and Si, respectively. Room temperature exciton absorption is observed in the photovoltage measurements for a superlattice grown on Si substrate. The thicknesses determined by x-ray analysis are consistent with those obtained by a Kronig–Penny model fitting of the photovoltage spectroscopy. [reprint (PDF)]
12.	AlGaN-based deep UV light emitting diodes with peak emission below 255 nm A. Yasan, R. McClintock, K. Mayes, P. Kung, and M. Razeghi SPIE Conference, Jose, CA, Vol. 5732, pp. 197-- January 22, 2005 ...[Visit Journal] We report on the growth and fabrication of AlGaN-based deep ultraviolet light-emitting diodes (LEDs) with peak emission of below 255 nm. In order to achieve such short wavelength UV LEDs, the Al mole fractions in the device layers should be greater than ~60%. This introdues serious challenges on the growth and doping of Al_xGa_1-xN epilayers. However, with the aid of a high-quality AlN template layer and refinement of the growth conditions we have been able to demonstrate UV LEDs emitting below 255 nm. [reprint (PDF)]
12.	Highly temperature insensitive quantum cascade lasers Y. Bai, N. Bandyopadhyay, S. Tsao, E. Selcuk, S. Slivken and M. Razeghi Applied Physics Letters, Vol. 97, No. 25-- December 20, 2010 ...[Visit Journal] An InP based quantum cascade laser (QCL) heterostructure emitting around 5 μm is grown with gas-source molecular beam epitaxy. The QCL core design takes a shallow-well approach to maximize the characteristic temperatures, T(0) and T(1), for operations above room temperature. A T(0) value of 383 K and a T(1) value of 645 K are obtained within a temperature range of 298–373 K. In room temperature continuous wave operation, this design gives a single facet output power of 3 W and a wall plug efficiency of 16% from a device with a cavity length of 5 mm and a ridge width of 8 μm. [reprint (PDF)]
12.	Demonstration of shortwavelength infrared photodiodes based on type-II InAs/GaSb/AlSb superlattices A.M. Hoang, G. Chen, A. Haddadi, S. Abdollahi Pour, and M. Razeghi Applied Physics Letters, Vol. 100, No. 21, p. 211101-1-- May 21, 2012 ...[Visit Journal] We demonstrate the feasibility of the InAs/GaSb/AlSb type-II superlattice photodiodes operating at the short wavelength infrared regime below 3 μm. An n-i-p type-II InAs/GaSb/AlSb photodiode was grown with a designed cut-off wavelength of 2 μm on a GaSb substrate. At 150 K, the photodiode exhibited a dark current density of 5.6 × 10⁻⁸ A/cm² and a front-side-illuminated quantum efficiency of 40.3%, providing an associated shot noise detectivity of 1.0 × 10¹³ Jones. The uncooled photodiode showed a dark current density of 2.2 × 10⁻³ A/cm² and a quantum efficiency of 41.5%, resulting in a detectivity of 1.7 × 10¹⁰ Jones [reprint (PDF)]
12.	LEO of III-Nitride on Al₂O₃ and Si Substrates M. Razeghi, P. Kung, P. Sandvik, K. Mi, X. Zhang, V.P. Dravid, J. Freitas, and A. Saxler SPIE Conference, San Jose, CA, -- January 26, 2000 ...[Visit Journal] Lateral epitaxial overgrowth (LEO) has recently become the method of choice to reduce the density of dislocations in heteroepitaxial GaN thin films, and is thus expected to lead to enhanced performance devices. We present here the LEO growth and characterization of GaN films by low pressure metalorganic chemical vapor deposition. Various substrates were used, including basal plane sapphire and oriented Si substrates. The steps in the LEO growth technology will be briefly reviewed. The characterization results will be discussed in detail. The structural, electrical and optical properties of the films were assessed through scanning, atomic and transmission electron microscopy, x-ray diffraction, capacitance-voltage, deep level transient spectroscopy, photoluminescence, and scanning cathodoluminenscence measurements. Single-step and double- step LEO GaN was achieved on sapphire. Similarly high quality LEO grown GaN films were obtained on sapphire and silicon substrates. Clear and dramatic reduction in the density of defects are observed in LEO grown materials using the various characterization techniques mentioned previously. [reprint (PDF)]

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