Center for Quantum Devices - Most Downloaded Journal Articles

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11.	High Performance Planar Antimony-Based Superlattice Photodetectors Using Zinc Diffusion Grown by MBE Jiakai Li, R. K. Saroj, Steven Slivken, V. H. Nguyen, Gail Brown and Manijeh Razeghi Photonics 2022, 9, 664 ...[Visit Journal] In this letter, we report a mid-wavelength infrared (MWIR) planar photodetector based on InAs/InAsSb type-II superlattices (T2SLs) that has a cut-off wavelength of 4.3 um at 77 K. The superlattice for the device was grown by molecular beam epitaxy while the planar device structure was achieved by Zinc diffusion process in a metal–organic chemical vapor deposition reactor. At 77 K, the peak responsivity and the corresponding quantum efficiency had the value of 1.42 A/W and 48% respectively at 3.7 um under -20 mV for the MWIR planar photodetector. At 77 K, the MWIR planar photodetector exhibits a dark current density of 2.0E5 A/cm^2 and the R0A value of ~3.0E2 Ohm cm^2 under -20 mV, which yielded a specific detectivity of 4.0E11 cm Hz^(1/2)/W at 3.7 um. At 150 K, the planar device showed a dark current density of 6.4E-5 A/cm^2 and a quantum efficiency of 49% at ~3.7 um under -20 mV, which yielded a specific detectivity of 2.0E11 cm Hz^(1/2)/W. [reprint (PDF)]
11.	Demonstration of Planar Type-II Superlattice-Based Photodetectors Using Silicon Ion-Implantation Arash Dehzangi, Donghai Wu, Ryan McClintock, Jiakai Li, Alexander Jaud and Manijeh Razeghi Photonics 2020, 7(3), 68; https://doi.org/10.3390/photonics7030068-- September 3, 2020 ...[Visit Journal] In this letter, we report the demonstration of a pBn planar mid-wavelength infrared photodetectors based on type-II InAs/InAs1−xSbx superlattices, using silicon ion-implantation to isolate the devices. At 77 K the photodetectors exhibited peak responsivity of 0.76 A/W at 3.8 µm, corresponding to a quantum efficiency, without anti-reflection coating, of 21.5% under an applied bias of +40 mV with a 100% cut-off wavelength of 4.6 µm. With a dark current density of 5.21 × 10−6 A/cm2, under +40 mV applied bias and at 77 K, the photodetector exhibited a specific detectivity of 4.95 × 1011 cm·Hz1/2/W. [reprint (PDF)]
11.	Stable single mode terahertz semiconductor sources at room temperature M. Razeghi 2011 International Semiconductor Device Research Symposium, ISDRS [6135180] (2011).-- December 7, 2011 ...[Visit Journal] Terahertz (THz) range is an area of the electromagnetic spectra which has lots of applications but it suffers from the lack of simple working devices which can emit THz radiation, such as the high performance mid-infrared (mid-IR) quantum cascade lasers (QCLs) based on InP technology. The applications for the THz can be found in astronomy and space research, biology imaging, security, industrial inspection, etc. Unlike THz QCLs based on the fundamental oscillators, which are limited to cryogenic operations, semiconductor THz sources based on nonlinear effects of mid-IR QCLs do not suffer from operating temperature limitations, because mid-IR QCLs can operate well above room temperature. THz sources based on difference frequency generation (DFG) utilize nonlinear properties of asymmetric quantum structures, such as QCL structures. [reprint (PDF)]
11.	Optical losses of Al-free lasers for λ = 0.808 and 0.98 μm H. Yi, J. Diaz, B. Lane, and M. Razeghi Applied Physics Letters 69 (20)-- November 11, 1996 ...[Visit Journal] In this work, we study the origin of the optical losses in Al‐free InGaAsP/GaAs (λ=0.808 μm) and InGaAs/GaAs/InGaP (λ=0.980 μm) lasers. Theoretical modeling and the experimental results indicate that the scattering of the laser beam by refractive index fluctuation in the alloys is the dominant loss in our lasers, and the loss due to the free‐carrier absorption and scattering by interface roughness are negligible. [reprint (PDF)]
11.	High-power laser diodes based on InGaAsP alloys M. Razeghi Nature, Vol.369, p.631-633-- June 23, 1994 ...[Visit Journal] HIGH-POWER, high-coherence solid-state lasers, based on dielectric materials such as ruby or Nd:YAG (yttrium aluminium garnet), have many civilian and military applications. The active media in these lasers are insulating, and must therefore be excited (or ‘pumped’) by optical, rather than electrical, means. Conventional gas-discharge lamps can be used as the pumping source, but semiconductor diode lasers are more efficient, as their wavelength can be tailored to match the absorption properties of the lasing material. Semiconducting AlGaAs alloys are widely used for this purpose, but oxidation of the aluminium and the spreading of defects during device operation limit the lifetime of the diodes3, and hence the reliability of the system as a whole. Aluminium-free InGaAsP compounds, on the other hand, do not have these lifetime-limiting properties. We report here the fabrication of high-power lasers based on InGaAsP (lattice-matched to GaAs substrates), which operate over the same wavelength range as conventional AlGaAs laser diodes and show significantly improved reliability. The other optical and electrical properties of these diodes are either comparable or superior to those of the AlGaAs system. [reprint (PDF)]
11.	Gain-length scaling in quantum dot/quantum well infrared photodetectors T. Yamanaka, B. Movaghar, S. Tsao, S. Kuboya, A. Myzaferi and M. Razeghi Applied Physics Letters, Vol. 95, No. 9-- August 31, 2009 ...[Visit Journal] The gain in quantum dot/quantum well infrared photodetectors is investigated. The scaling of the gain with device length has been analyzed, and the behavior agrees with the previously proposed model. We conclude that we understand the gain in the low bias region, but in the high field region, discrepancies remain. An extension of the gain model is presented to cover the very high electric field region. The high field data are compared to the extended model and discussed. [reprint (PDF)]
11.	High performance GaAs/GaInP heterostructure bipolar transistors grown by low-pressure metal-organic chemical vapour deposition M Razeghi, F Omnes, M Defour, P Maurel, J Hu, E Wolk and D Pavlidis M Razeghi et al 1990 Semicond. Sci. Technol. 5 278-- December 11, 1989 ...[Visit Journal] The authors report the fabrication of high-quality GaAs/GaInP n-p-n heterojunction bipolar transistors grown by low-pressure metal-organic chemical vapour deposition on semi-insulating substrates. Various structures with homogeneous and graded bases have been fabricated. Doping profiles together with X-ray double diffraction patterns demonstrate the excellent control of growth parameters such as thicknesses, doping levels and interface quality. The static characteristics of the devices show current gains as high as 400, which is the highest value reported in that system [reprint (PDF)]
11.	Solar-blind AlGaN photodiodes with very low cutoff wavelength D. Walker, V. Kumar, K. Mi, P. Sandvik, P. Kung, X.H. Zhang, and M. Razeghi Applied Physics Letters 76 (4)-- January 24, 2000 ...[Visit Journal] We report the fabrication and characterization of AlxGa1–xN photodiodes (x~0.70) grown on sapphire by low-pressure metalorganic chemical vapor deposition. The peak responsivity for –5 V bias is 0.11 A/W at 232 nm, corresponding to an internal quantum efficiency greater than 90%. The device response drops four orders of magnitude by 275 nm and remains at low response for the entire near-ultraviolet and visible spectrum. Improvements were made to the device design including a semitransparent Ni/Au contact layer and a GaN:Mg cap layer, which dramatically increased device response by enhancing the carrier collection efficiency. [reprint (PDF)]
11.	Delta-doping optimization for high qualityp-type GaN C. Bayram, J.L. Pau, R. McClintock and M. Razeghi Journal of Applied Physics, Vol. 104, No. 8-- October 15, 2008 ...[Visit Journal] Delta-doping is studied in order to achieve high quality p-type GaN. Atomic force microscopy, x-ray diffraction, photoluminescence, and Hall measurements are performed on the samples to optimize the delta-doping characteristics. The effect of annealing on the electrical, optical, and structural quality is also investigated for different delta-doping parameters. Optimized pulsing conditions result in layers with hole concentrations near 10¹⁸ cm⁻³ and superior crystal quality compared to conventional p-GaN. This material improvement is achieved thanks to the reduction in the Mg activation energy and self-compensation effects in delta-doped p-GaN. [reprint (PDF)]
11.	Advanced Monolithic Quantum Well Infrared Photodetector Focal Plane Array Integrated with Silicon Readout Integrated Circuit J. Jiang, S. Tsao, K. Mi, M. Razeghi, G.J. Brown, C. Jelen and M.Z. Tidrow Infrared Physics and Technology, 46 (3)-- January 1, 2005 ...[Visit Journal] Today, most infrared focal plane arrays (FPAs) utilize a hybrid scheme. To achieve higher device reliability and lower cost, monolithic FPAs with Si based readout integrated circuits (ROICs) are the trend of the future development. In this paper, two approaches for monolithic FPAs are proposed: double sided integration and selective epitaxy integration. For comparison, the fabrication process for hybrid quantum well infrared photodetectors (QWIP) FPAs are also described. Many problems, such as the growth of QWIPs on Si substrate and processing incompatibility between Si and III–V semiconductors, need to be solved before monolithic FPAs can be realized. Experimental work on GaInAs/InP QWIP-on-Si is given in this paper. A record high detectivity of 2.3×10⁹ jones was obtained for one QWIP-on-Si detector at 77 K. [reprint (PDF)]
11.	A Review of III-Nitride Research at the Center for Quantum Devices M. Razeghi and R. McClintock Journal of Crystal Growth, Vol. 311, No. 10-- May 1, 2009 ...[Visit Journal] In this paper, we review the history of the Center for Quantum Devices’ (CQD) III-nitride research covering the past 15 years. We review early work developing III-nitride material growth. We then present a review of laser and light-emitting diode (LED) results covering everything from blue lasers to deep UV LEDs emitting at 250 nm. This is followed by a discussion of our UV photodetector research from early photoconductors all the way to current state of the art Geiger-mode UV single photon detectors. [reprint (PDF)]
11.	Investigations of ZnO thin films grown on c-Al(2)O(3) by pulsed laser deposition in N(2) + O(2) ambient D.J. Rogers, D.C. Look, F.H. Teherani, K. Minder, M. Razeghi, A. Largeteau, G. Demazeau, J. Morrod, K.A. Prior, A. Lusson, and S. Hassani Physica Status Solidi (c), Vol. 5, No. 9, p. 3084-3087-- July 1, 2008 ...[Visit Journal] ZnO films were deposited on c-Al₂O₃ using pulsed laser deposition both with and without N₂ in the growth ambient. X-ray diffraction revealed poorer crystal quality and surface morphology for one-step growths with N₂ in the ambient. A marked improvement in both the crystallographic and surface quality was obtained through use of two-step growths employing nominally undoped ZnO buffer layers prior to growth with N₂ in the ambient. All films showed majority n-type conduction in Hall measurements. Post-annealing for 30 minutes at 600 ºC in O₂ systematically reduced both the carrier concentration and the conductivity. A base room temperature carrier concentration of ~ 10¹⁶ cm^-3 was linked to Al diffusing from the substrate. 4.2 K photoluminescence spectra exhibited blue bands associated with the growths having N₂ in the ambient. Temperature dependent Hall measurements were consistent with N being incorporated in the films. Processed devices did not, however, show rectifying behavior or electroluminescence. [reprint (PDF)]
11.	Electron capture processes in optically excited In0.53Ga 0.47As/InP quantum wells U. Cebulla, G. Bacher, A. Forchel, D. Schmitz, H. Jürgensen, M. Razeghi Appl. Phys. Lett. 55, 933–935 (1989)-- September 4, 1989* ...[Visit Journal] We have performed picosecond time-resolved measurements on Ir:.O. 53 GaO. 47 As/lnP quantum wells with varying barrier thicknesses using 10 ps Nd:Y AG excitation. For this excitation, holes and electrons are created in the Ino . 53 GaOA7 As layers. Due to momentum conservation the Nd:YAG excitation accelerates the electrons above the InP barrier where they can diffuse but cannot recombine. By examining the rise time of the quantum well emission, we can show that for samples with thick barriers, the harrier geometry largely controls the dynamic properties of the carriers after Nd:YAG excitation. [reprint (PDF)]
11.	High-power continuous-wave operation of distributed-feedback quantum-cascade lasers at λ ~ 7.8 µm S.R. Darvish, W. Zhang, A. Evans, J.S. Yu, S. Slivken, and M. Razeghi Applied Physics Letters, 89 (25)-- December 18, 2006 ...[Visit Journal] The authors present high-power continuous-wave (cw) operation of distributed-feedback quantum-cascade lasers. Continuous-wave output powers of 56 mW at 25 °C and 15 mW at 40 °C are obtained. Single-mode emission near 7.8 μm with a side-mode suppression ratio of >=30 dB and a tuning range of 2.83 cm⁻¹ was obtained between 15 and 40 °C. The device exhibits no beam steering with a full width at half maximum of 27.4° at 25 °C in cw mode. [reprint (PDF)]
11.	High performance quantum cascade lasers (~11 μm) operating at high temperature (T>= 425K) A. Tahraoui, A. Matlis, S. Slivken, J. Diaz, and M. Razeghi Applied Physics Letters 78 (4)-- January 22, 2001 ...[Visit Journal] We report record-low threshold current density and high output power for λ ∼ 11 μm Al_0.48In_0.52As/Ga_0.47In_0.53As quantum cascade lasers operating up to 425 K. The threshold current density is 1.1, 3.83, and 7.08 kA/cm² at 80, 300, and 425 K, respectively, for 5 μs pulses at a 200 Hz repetition rate. The cavity length is 3 mm with a stripe width of 20 μm. The maximum peak output power per facet is 1 W at 80 K, 0.5 W at 300 K, and more than 75 mW at 425 K. The characteristic temperature of these lasers is 174 K between 80 and 300 K and 218 K in the range of 300–425 K. [reprint (PDF)]
11.	Top-emission ultraviolet light-emitting diodes with peak emission at 280 nm A. Yasan, R. McClintock, K. Mayes, S.R. Darvish, P. Kung, and M. Razeghi Virtual Journal of Nanoscale Science & Technology, 5-- August 5, 2002 ...[Visit Journal][reprint (PDF)]
11.	Ga₂O₃ Metal-oxide-semiconductor Field Effect Transistors on Sapphire Substrate by MOCVD Ji-Hyeon Park, Ryan McClintock and Manijeh Razeghi Semiconductor Science and Technology, Volume 34, Number 8-- June 26, 2019 ...[Visit Journal] Si-doped gallium oxide (Ga₂O₃) thin films were grown on a c-plane sapphire substrate by metalorganic chemical vapor deposition (MOCVD) and fabricated into metal oxide semiconductor field effect transistors (MOSFETs). The Ga₂O₃ MOSFETs exhibited effective gate modulation of the drain current with a complete channel pinch-off for VG < −25 V, and the three-terminal off-state breakdown voltage was 390 V. The device shows a very low gate leakage current (~50 pA/mm), which led to a high on/off ratio of ~10⁸. These transistor characteristics were stable from room temperature to 250 °C [reprint (PDF)]
11.	High-power InGaAsP/GaAs 0.8 μm laser diodes and peculiarities of operational characteristics J. Diaz, I. Eliashevich, X. He, H. Yi, L. Wang, E. Kolev, D. Garbuzov, and M. Razeghi Applied Physics Letters 65 (8)-- August 22, 1994 ...[Visit Journal] High-power operation of 3 W in pulse mode, 750 mW in quasi-continuous wave and 650 mW in continuous wave per uncoated facet from 100 μm aperture has been demonstrated for 1 mm long cavity InGaAsP/GaAs 808 nm laser diodes prepared by low-pressure metalorganic chemical vapor deposition. Threshold current density of 300 A/cm², differential efficiency of 1.1 W/A, T₀=155 °C, transverse beam divergence of 27°, and less than 2 nm linewidth at 808 nm have been measured. No degradation has been observed after 1000 h of operation in a quasi-continuous wave regime. [reprint (PDF)]
11.	*High quality AlN and GaN epilayers grown on (001) sapphire, (100) and (111) silicon substrates P. Kung, A. Saxler, X. Zhang, D. Walker, T.C. Wang, I. Ferguson, and M. Razeghi Applied Physics Letters 66 (22)-- May 29, 1995** ...[Visit Journal] The growth of high quality AlN and GaN thin films on basal plane sapphire, (100), and (111) silicon substrates is reported using low pressure metalorganic chemical vapor deposition. X-ray rocking curve linewidths of about 100 and 30 arcsec were obtained for AlN and GaN on sapphire, respectively. Room‐temperature optical transmission and photoluminescence (of GaN) measurements confirmed the high quality of the films. The luminescence at 300 and 77 K of the GaN films grown on basal plane sapphire, (100), and (111) silicon was compared. [reprint (PDF)]
11.	Inductively coupled plasma etching and processing techniques for type-II InAs/GaSb superlattices infrared detectors toward high fill factor focal plane arrays E.K. Huang, B.M. Nguyen, D. Hoffman, P.Y. Delaunay and M. Razeghi SPIE Proceedings, San Jose, CA Volume 7222-0Z-- January 26, 2009 ...[Visit Journal] A challenge for Type-II InAs/GaSb superlattice (T2SL) photodetectors is to achieve high fill factor, high aspect ratio etching for third generation focal plane arrays (FPAs). Initially, we compare the morphological and electrical results of single element T2SL photodiodes after BCl₃/Ar inductively coupled plasma (ICP) and electron cyclotron resonance (ECR) dry etching. Using a Si₃N₄ hard mask, ICP-etched structures exemplify greater sidewall verticality and smoothness, which are essential toward the realization of high fill factor FPAs. ICP-etched single element devices with SiO₂ passivation that are 9.3 µm in cutoff wavelength achieved vertical sidewalls of 7.7 µm in depth with a resistance area product at zero bias of greater than 1,000 Ω·cm² and maximum differential resistance in excess of 10,000 Ω·cm² at 77 K. By only modifying the etching technique in the fabrication steps, the ICP-etched photodiodes showed an order of magnitude decrease in their dark current densities in comparison to the ECR-etched devices. Finally, high aspect ratio etching is demonstrated on mutli-element arrays with 3 µm-wide trenches that are 11 µm deep. [reprint (PDF)]
11.	Structural and compositional characterization of MOVPE GaN thin films transferred from sapphire to glass substrates using chemical lift-off and room temperature direct wafer bonding and GaN wafer scale MOVPE growth on ZnO-buffered sapphire S. Gautier, T. Moudakir, G. Patriarche, D.J. Rogers, V.E. Sandana, F. Hosseini Teherani, P. Bove, Y. El Gmili, K. Pantzas, Suresh Sundaram, D. Troadec, P.L. Voss, M. Razeghi, A. Ougazzaden Journal of Crystal Growth, Volume 370, Pages 63-67 (2013)-- May 1, 2013 ...[Visit Journal] GaN thin films were grown on ZnO/c-Al₂O₃ with excellent uniformity over 2 in. diameter wafers using a low temperature/pressure MOVPE process with N₂ as a carrier and dimethylhydrazine as an N source. 5 mm×5 mm sections of similar GaN layers were direct-fusion-bonded onto soda lime glass substrates after chemical lift-off from the sapphire substrates. X-Ray Diffraction, Scanning Electron Microscopy and Transmission Electron Microscopy confirmed the bonding of crack-free wurtzite GaN films onto a glass substrate with a very good quality of interface, i.e. continuous/uniform adherence and absence of voids or particle inclusions. Using this approach, (In) GaN based devices can be lifted-off expensive single crystal substrates and bonded onto supports with a better cost-performance profile. Moreover, the approach offers the possibility of reclaiming the expensive sapphire substrate so it can be utilized again for growth. [reprint (PDF)]
11.	MOCVD Growth of ZnO Nanostructures Using Au Droplets as Catalysts V.E. Sandana, D.J. Rogers, F.H. Teherani, R. McClintock, M. Razeghi, H.J. Drouhin, M.C. Clochard, V. Sallett, G. Garry and F. Fayoud SPIE Conference, January 20-25, 2008, San Jose, CA Proceedings – Zinc Oxide Materials and Devices III, Vol. 6895, p. 68950Z-1-6.-- February 1, 2008 ...[Visit Journal] ZnO nanostructures were synthesised by Metal Organic Chemical Vapor Deposition growth on Si (100) and c-Al₂O₃ substrates coated with a 5nm thick layer of Au. The Au coated substrates were annealed in air prior to deposition of ZnO so as to promote formation of Au nanodroplets. The development of the nanodroplets was studied as a function of annealing duration and temperature. Under optimised conditions, a relatively homogeneous distribution of regular Au nanodroplets was obtained. Using the Au nanodroplets as a catalyst, MOCVD growth of ZnO nanostructures was studied. Scanning electron microscopy revealed nanostructures with various forms including commonly observed structures such as nanorods, nanoneedles and nanotubes. Some novel nanostructures were also observed, however, which resembled twist pastries and bevelled-multifaceted table legs. [reprint (PDF)]
11.	Frequency-Shifted Polaron Coupling in Ga0.47In0.53As Heterojunctions R. J. Nicholas, L. C. Brunel, S. Huant, K. Karrai, and J. C. Portal† M. A. Brummell M. Razeghi K. Y. Cheng and A. Y. Cho Phys. Rev. Lett. 55, 883 – 1985-- August 19, 1985* ...[Visit Journal] Frequency-dependent cyclotron-resonance measurements are reported on Ga0.47In0.53As-InP and Ga0.47In0.53A⁢s−A⁢l0.48In0.52As heterojunctions. Discontinuities in the effective mass occur at two frequencies as a result of resonant polaron coupling with both optic-phonon modes present in the Ga0.47In0.53As alloy. The coupling occurs at the frequencies at the TO phonons, in contrast to measurements on bulk materials. Possible changes in the screening and polarization of the optic-phonon modes are considered. [reprint (PDF)]
11.	Second harmonic generation in hexagonal silicon carbide P.M. Lundquist, W.P. Lin, G.K. Wong, M. Razeghi, and J.B. Ketterson Applied Physics Letters 66 (15)-- April 10, 1995 ...[Visit Journal] We report optical second harmonic generation measurements in single crystal α-SiC of polytype 6H. The angular dependence of second harmonic intensity was consistent with two independent nonvanishing second order susceptibility components, as expected for a crystal with hexagonal symmetry. For the fundamental wavelength of 1.064 μm the magnitudes of the two components were determined to be χ_zzz⁽²⁾=±1.2×10⁻⁷ and χ_zxx⁽²⁾=∓1.2×10⁻⁸ esu. The corresponding linear electro‐optic coefficient computed from this value is r^zzz=±100 pm/V. The wavelength dependence of the nonlinear susceptibility was examined for second harmonic wavelengths between the bandgap (400 nm) and the red (700 nm), and was found to be relatively uniform over this region. The refractory nature of this compound and its large nonlinear optical coefficients make it an attractive candidate for high power nonlinear optical waveguide applications. [reprint (PDF)]
11.	High quantum efficiency mid-wavelength infrared type-II InAs/InAs_1-xSb_x superlattice photodiodes grown by metal-organic chemical vapor deposition Donghai Wu , Quentin Durlin, Arash Dehzangi , Yiyun Zhang , and Manijeh Razeghi Appl. Phys. Lett. 114, 011104-- January 8, 2019 ...[Visit Journal] We report the growth and characterization of mid-wavelength infrared type-II InAs/InAs_1-xSb_x superlattice photodiodes on GaSb substrates grown by metal-organic chemical vapor deposition. At 150 K, the 50% cut-off wavelength is 5.0 um, the dark current density is 3.3x10⁻⁴ A/cm² under −20mV bias, and the peak responsivity is 1.76A/W corresponding to a quantum efficiency of 55% without anti-reflection coating. A specific detectivity of 1.2x10¹¹cmHz^1/2/W is achieved at 4.0 um under −20mV bias at 150 K. [reprint (PDF)]

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