Center for Quantum Devices - Most Downloaded Journal Articles

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11.	Hybrid green LEDs based on n-ZnO/(InGaN/GaN) multi-quantum-wells/p-GaN C. Bayram, F. Hosseini Teherani, D.J. Rogers and M. Razeghi SPIE Proceedings, San Jose, CA Volume 7217-0P-- January 26, 2009 ...[Visit Journal] Hybrid green light-emitting diodes (LEDs) comprised of n-ZnO/(InGaN/GaN) multi-quantum-wells/p-GaN were grown on semi-insulating AlN/sapphire using pulsed laser deposition for the n-ZnO and metal organic chemical vapor deposition for the other layers. X-ray diffraction revealed that high crystallographic quality was preserved after the n- ZnO growth. LEDs showed a turn-on voltage of 2.5 V and a room temperature electroluminescence (EL) centered at 510 nm. A blueshift and narrowing of the EL peak with increasing current was attributed to bandgap renormalization. The results indicate that hybrid LED structures could hold the prospect for the development of green LEDs with superior performance. [reprint (PDF)]
11.	Top-emission ultraviolet light-emitting diodes with peak emission at 280 nm A. Yasan, R. McClintock, K. Mayes, S.R. Darvish, P. Kung, and M. Razeghi Virtual Journal of Nanoscale Science & Technology, 5-- August 5, 2002 ...[Visit Journal][reprint (PDF)]
11.	Ga₂O₃ Metal-oxide-semiconductor Field Effect Transistors on Sapphire Substrate by MOCVD Ji-Hyeon Park, Ryan McClintock and Manijeh Razeghi Semiconductor Science and Technology, Volume 34, Number 8-- June 26, 2019 ...[Visit Journal] Si-doped gallium oxide (Ga₂O₃) thin films were grown on a c-plane sapphire substrate by metalorganic chemical vapor deposition (MOCVD) and fabricated into metal oxide semiconductor field effect transistors (MOSFETs). The Ga₂O₃ MOSFETs exhibited effective gate modulation of the drain current with a complete channel pinch-off for VG < −25 V, and the three-terminal off-state breakdown voltage was 390 V. The device shows a very low gate leakage current (~50 pA/mm), which led to a high on/off ratio of ~10⁸. These transistor characteristics were stable from room temperature to 250 °C [reprint (PDF)]
11.	Very high performance LWIR and VLWIR type-II InAs/GaSb superlattice photodiodes with M-structure barrier B.M. Nguyen, D. Hoffman, P.Y. Delaunay, E.K. Huang and M. Razeghi SPIE Proceedings, Vol. 7082, San Diego, CA 2008, p. 708205-- September 3, 2008 ...[Visit Journal] LWIR and VLWIR type-II InAs/GaSb superlattice photodetectors have for long time suffered from a high dark current level and a low dynamic resistance which hampers the its emergence to the infrared detection and imaging industry. However, with the use of M-structure superlattice, a new Type-II binary InAs/GaSb/AlSb superlattice design, as an effective blocking barrier, the dark current in type-II superlattice diode has been significantly reduced. We have obtained comparable differential resistance product to the MCT technology at the cut-off wavelength of 10 and 14μm. Also, this new design is compatible with the optical optimization scheme, leading to high quantum efficiency, high special detectivity devices for photon detectors and focal plane arrays. [reprint (PDF)]
11.	Thermal conductivity tensors of the cladding and active layers of antimonide infrared lasers and detectors Chuanle Zhou, I. Vurgaftman, C. L. Canedy, C. S. Kim, M. Kim, W. W. Bewley, C. D. Merritt, J. Abell, J. R. Meyer, A. Hoang, A. Haddadi, M. Razeghi, and M. Grayson Optical Materials Express. 2013;3(10):1632-1640.-- October 1, 2013 ...[Visit Journal] The in-plane and cross-plane thermal conductivities of the cladding layers and active quantum wells of interband cascade lasers and type-II superlattice infrared detector are measured by the 2-wire 3ω method. The layers investigated include InAs/AlSb superlattice cladding layers, InAs/GaInSb/InAs/AlSb W-active quantum wells, an InAs/GaSb superlattice absorber, an InAs/GaSb/AlSb M-structure, and an AlAsSb digital alloy. The in-plane thermal conductivity of the InAs/AlSb superlattice is 4-5 times higher than the cross-plane value. The isotropic thermal conductivity of the AlAsSb digital alloy matches a theoretical expectation, but it is one order of magnitude lower than the only previously-reported experimental value. [reprint (PDF)]
11.	A hybrid green light-emitting diode comprised of n-ZnO/(InGaN/GaN) multi-quantum-wells/p-GaN C. Bayram, F. Hosseini Teherani, D.J. Rogers and M. Razeghi Applied Physics Letters, Vol. 93, No. 8, p. 081111-1-- August 25, 2008 ...[Visit Journal] Hybrid green light-emitting diodes (LEDs) comprised of n-ZnO/(InGaN/GaN) multi-quantum-wells/p-GaN were grown on semi-insulating AlN/sapphire using pulsed laser deposition for the n-ZnO and metal organic chemical vapor deposition for the other layers. X-ray diffraction revealed that high crystallographic quality was preserved after the n-ZnO growth. LEDs showed a turn-on voltage of 2.5 V and a room temperature electroluminescence (EL) centered at 510 nm. A blueshift and narrowing of the EL peak with increasing current was attributed to bandgap renormalization. The results indicate that hybrid LED structures could hold the prospect for the development of green LEDs with superior performance. [reprint (PDF)]
11.	Gain-length scaling in quantum dot/quantum well infrared photodetectors T. Yamanaka, B. Movaghar, S. Tsao, S. Kuboya, A. Myzaferi and M. Razeghi Applied Physics Letters, Vol. 95, No. 9-- August 31, 2009 ...[Visit Journal] The gain in quantum dot/quantum well infrared photodetectors is investigated. The scaling of the gain with device length has been analyzed, and the behavior agrees with the previously proposed model. We conclude that we understand the gain in the low bias region, but in the high field region, discrepancies remain. An extension of the gain model is presented to cover the very high electric field region. The high field data are compared to the extended model and discussed. [reprint (PDF)]
11.	GaInAsP/InP 1.35 μm Double Heterostructure Laser Grown on Silicon Substrate by Metalorganic Chemical Vapor Deposition K. Mobarhan, C. Jelen, E. Kolev, and M. Razeghi Journal of Applied Physics 74 (1)-- July 1, 1993 ...[Visit Journal] A 1.35 μm GaInAsP/InP double heterostructure laser has been grown on a Si substrate using low‐pressure metalorganic chemical vapor deposition. This was done without the use of a superlattice layer or a very thick InP buffer layer, which are used to prevent the dislocations from spreading into the active layer. Pulsed operation with output power of over 200 mW per facet was achieved at room temperature for broad area lasers with 20 μm width and 170 μm cavity length. The threshold current density of a 350 μm cavity length device was 9.8 kA/cm². The characteristic temperature was 66 K. [reprint (PDF)]
11.	Very Long Wavelength Infrared Type-II Detectors Operating at 80K H. Mohseni, A. Tahraoui, J. Wojkowski, M. Razeghi, G.J. Brown, W.C. Mitchel, and Y.S. Park Applied Physics Letters 77 (11)-- September 11, 2000 ...[Visit Journal] We report a demonstration of very long wavelength infrared detectors based on InAs/GaSb superlattices operating at T = 80 K. Detector structures with excellent material quality were grown on an optimized GaSb buffer layer on GaAs semi-insulating substrates. Photoconductive devices with 50% cutoff wavelength of λ_c = 17 μm showed a peak responsivity of about 100 mA/W at T = 80 K. Devices with 50% cutoff wavelengths up to λ_c = 22 μm were demonstrated at this temperature. Good uniformity was obtained over large areas even for the devices with very long cutoff wavelengths. [reprint (PDF)]
11.	*High quality AlN and GaN epilayers grown on (001) sapphire, (100) and (111) silicon substrates P. Kung, A. Saxler, X. Zhang, D. Walker, T.C. Wang, I. Ferguson, and M. Razeghi Applied Physics Letters 66 (22)-- May 29, 1995** ...[Visit Journal] The growth of high quality AlN and GaN thin films on basal plane sapphire, (100), and (111) silicon substrates is reported using low pressure metalorganic chemical vapor deposition. X-ray rocking curve linewidths of about 100 and 30 arcsec were obtained for AlN and GaN on sapphire, respectively. Room‐temperature optical transmission and photoluminescence (of GaN) measurements confirmed the high quality of the films. The luminescence at 300 and 77 K of the GaN films grown on basal plane sapphire, (100), and (111) silicon was compared. [reprint (PDF)]
11.	High Performance InAs/InAsSb Type-II Superlattice Mid-Wavelength Infrared Photodetectors with Double Barrier Donghai Wu, Jiakai Li, Arash Dehzangi, Manijeh Razeghi Infrared Physics &Technology 103439-- July 18, 2020 ...[Visit Journal] By introducing a double barrier design, a high performance InAs/InAsSb type-II superlattice mid-wavelength infrared photodetector has been demonstrated. The photodetector exhibits a cut-off wavelength of ~4.50 µm at 150 K. At 150 K and −120 mV applied bias, the photodetector exhibits a dark current density of 1.21 × 10−5 A/cm2, a quantum efficiency of 45% at peak responsivity (~3.95 µm), and a specific detectivity of 6.9 × 1011 cm·Hz1/2/W. The photodetector shows background-limited operating temperature up to 160 K. [reprint (PDF)]
10.	High performance LWIR Type-II InAs/GaSb superlattice photodetectors and infrared focal plane array Y. Wei, A. Hood, A. Gin, V. Yazdanpanah, M. Razeghi and M. Tidrow SPIE Conference, Jose, CA, Vol. 5732, pp. 309-- January 22, 2005 ...[Visit Journal] We report on the demonstration of a focal plane array based on Type-II InAs-GaSb superlattices grown on n-type GaSb substrate with a 50% cutoff wavelength at 10 μm. The surface leakage occurring after flip-chip bonding and underfill in the Type-II devices was suppressed using a double heterostructure design. The R₀A of diodes passivated with SiO₂ was 23 Ω·cm² after underfill. A focal plane array hybridized to an Indigo readout integrated circuit demonstrated a noise equivalent temperature difference of 33 mK at 81 K, with an integration time of 0.23 ms. [reprint (PDF)]
10.	Study on the effects of minority carrier leakage in InAsSb/InPAsSb double heterostructure B. Lane, D. Wu, H.J. Yi, J. Diaz, A. Rybaltowski, S. Kim, M. Erdtmann, H. Jeon and M. Razeghi Applied Physics Letters 70 (11)-- April 17, 1997 ...[Visit Journal] InAs_xSb_1−x/InP_1−x−yAs_xSb_y double heterostructures have been grown on InAs substrates by metal-organic chemical vapor deposition. The minority carrier leakage to the cladding layers was studied with photoluminescence measurements on the InAsSb/InPAsSb double heterostructures. A carrier leakage model is used to extract parameters related to the leakage current (diffusion-coefficient and length) from experimental results. Using the obtained parameters, the temperature dependence of the threshold current density of InAsSb/InPAsSb double heterostructure lasers is predicted and compared with experimental results. [reprint (PDF)]
10.	Passivation of Type-II InAs/GaSb superlattice photodetectors A. Hood, Y. Wei, A. Gin, M. Razeghi, M. Tidrow, and V. Nathan SPIE Conference, Jose, CA, Vol. 5732, pp. 316-- January 22, 2005 ...[Visit Journal] Leakage currents limit the operation of high performance Type-II InAs/GaSb superlattice photodiode technology. Surface leakage current becomes a dominant limiting factor, especially at the scale of a focal plane array pixel (< 25 µm) and must be addressed. A reduction of the surface state density, unpinning the Fermi level at the surface, and appropriate termination of the semiconductor crystal are all aims of effective passivation. Recent work in the passivation of Type-II InAs\GaSb superlattice photodetectors with aqueous sulfur-based solutions has resulted in increased R₀A products and reduced dark current densities by reducing the surface trap density. Additionally, photoluminescence of similarly passivated Type-II InAs/GaSb superlattice and InAs GaSb bulk material will be discussed. [reprint (PDF)]
10.	Planar nBn type-II superlattice mid-wavelength infrared photodetectors using zinc ion-implantation Arash Dehzangi, Donghai Wu, Ryan McClintock, Jiakai Li, and Manijeh Razeghi Appl. Phys. Lett. 116, 221103 https://doi.org/10.1063/5.0010273-- June 2, 2020 ...[Visit Journal] In this Letter, we report the demonstration of zinc ion-implantation to realize planar mid-wavelength infrared photodetectors based on type-II InAs/InAs1−xSbx superlattices. At 77 K, the photodetectors exhibit a peak responsivity of 0.68 A/W at 3.35 μm, corresponding to a quantum efficiency of 23.5% under Vb = −80 mV, without anti-reflection coating; these photodetectors have a 100% cutoff wavelength of 4.28 μm. With an R0 × A value of 1.53 × 104 Ω cm2 and a dark current density of 1.23 × 10−6 A/cm2 under an applied bias of −80 mV at 77 K, the photodetectors exhibit a specific detectivity of 9.12 × 1011 cm·Hz1/2/W. [reprint (PDF)]
10.	Pressure-induced depopulation of the first excited subband in GaInAs/InP heterojunctions D Gauthier, J C Portal and M Razeghi D Gauthier et al 1989 Semicond. Sci. Technol. 4 218-- December 8, 1988 ...[Visit Journal] Following our previous work on (GalnAs)/(lnP) heterojunctions under hydrostatic pressure we present recent experimental results where the evidence for the total depopulation of the first excited electric subband with pressure is demonstrated. The total electron concentration decreases at a rate of 2.7% kbar”, much higher than in previous experiments. The experimental situation can be fitted with the triangular-well approximation if we both assume the change with pressure of the conduction band discontinuity AE, and the deepening of a deep impurity level with activation energy of the order 160 meV at zero pressure. [reprint (PDF)]
10.	High quality LEO growth and characterization of GaN films on Al₂O₃ and Si substrates M. Razeghi, P. Kung, D. Walker, M. Hamilton, and J. Diaz SPIE International Conference on Solid State Crystals, Zakopane, Poland; Proceedings 3725-- October 12, 1998 ...[Visit Journal] We report the lateral epitaxial overgrowth (LEO) of GaN films on (00.1) Al₂O₃ and (111) Si substrates by metalorganic chemical vapor deposition. The LEO on Si substrates was possible after achieving quasi monocrystalline GaN template films on (111) Si substrates. X-ray diffraction, photoluminescence, scanning electron microscopy and atomic force microscopy were used to assess the quality of the LEO films. Lateral growth rates more than 5 times as high as vertical growth rates were achieved for both LEO growths of GaN on sapphire and silicon substrates. [reprint (PDF)]
10.	Suppressing Spectral Crosstalk in Dual-Band LongWavelength Infrared Photodetectors With Monolithically Integrated Air-Gapped Distributed Bragg Reﬂectors Yiyun Zhang, Abbas Haddadi, Arash Dehzangi , Romain Chevallier, Manijeh Razeghi IEEE Journal of Quantum Electronics Volume: 55, Issue:1-- November 22, 2018 ...[Visit Journal] Antimonide-based type-II superlattices (T2SLs) have made possible the development of high-performance infrared cameras for use in a wide variety of thermal imaging applications, many of which could beneﬁt from dual-band imaging. The performance of this material system has not reached its limits. One of the key issues in dual-band infrared photodetection is spectral crosstalk. In this paper, air-gapped distributed Bragg reﬂectors (DBRs) have been monolithically integrated between the two channels in long-/very long-wavelength dualband InAs/InAs_1−xSb_x/AlAs_1−xSb_x-based T2SLs photodetectors to suppress the spectral crosstalk. This air-gapped DBR has achieved a signiﬁcant spectral suppression in the 4.5–7.5-µm photonic stopband while transmitting the optical wavelengths beyond 7.5 µm, which is conﬁrmed by theoretical calculations, numerical simulation, and experimental results. [reprint (PDF)]
10.	Exciton localization in group-III nitride quantum wells V.I. Litvinov and M. Razeghi Physical Review B 59 (15)-- May 15, 1999 ...[Visit Journal] Exciton density of states broadened by compositional disorder in the group-III nitride quantum well is calculated. The excitonic photoluminescence linewidth is estimated and related to the material parameters of the alloy for two limiting cases of two-dimensional (2D) and three-dimensional excitons in the quantum well. It is shown that the effect of the compositional fluctuations depends on dimensionality of the exciton: the 2D excitons are more sensitive to the inhomogeneities than 3D ones. The broad near-band-gap energy states distribution for quasi-two-dimensional excitons is consistent with the experimental evidence of the spontaneous and stimulated emissions from excitonic states localized on compositional fluctuations. [reprint (PDF)]
10.	Optical Absorption and Photoresponse in fully Quaternary p-type Quantum Well Detectors J. Hoff, C. Jelen, S. Slivken, G.J. Brown, and M. Razeghi SPIE Photonics West '96 Photodetectors: Materials and Devices; Proceedings 2685-- January 27, 1996 ...[Visit Journal] Acceptor doped, non-strained aluminum-free Quantum Well Intersubband Photodetectors lattice matched to GaAs with Ga_0.79In_0.21As_0.59P_0.41 wells and Ga_0.62In_0.38As_0.22P_0.78 barriers have been demonstrated on semi-insulating GaAs substrates. These devices which operate at normal incidence demonstrate a unique spectral response which extends from approximately 2 μm up to 10 μm. To explain such a broad spectral shape, a detailed theoretical analysis based on the 8 x 8 Kane Hamiltonian was necessary to probe all aspect of optical absorption. The results of this analysis revealed that spectral shape results from the influence of the Spin Split-off band on the band structure and the optical matrix. [reprint (PDF)]
10.	Concentration gradient at an InP/GaAs interface determined by Auger analysis on a chemical bevel J. Cazaux; P. Etienne; M. Razeghi J. Cazaux, P. Etienne, M. Razeghi; Concentration gradient at an InP/GaAs interface determined by Auger analysis on a chemical bevel. J. Appl. Phys. 15 May 1986; 59 (10): 3598–3601-- June 15, 1986 ...[Visit Journal] Experimental results of Auger profiles obtained on a chemical bevel of an InP/GaAs structure are reported. A theoretical procedure is established to convert the intensity profile into concentration profiles. It is applied to evaluate the concentration distribution of each species–Ga, In, As, P–independently of each others with a precision of ±5%. It is verified that the composition of the interface is GaxIn1−xAsyP1−y (0≤x, y≤1). Owing to differences between the atomic diffusions of III‐ and V‐type elements, the transition region can be subdivided into three regions having the following compositions: (i) GaAsyP1−y with 0.87≤y≤1; (ii) GaxIn1−xAsyP1−y with 0≤y≤0.87 and 0.24≤x<1; (iii) PGaxIn1−x with x<0.24. The width of each region is also indicated. [reprint (PDF)]
10.	GaN nanostructured p-i-n photodiodes J.L. Pau, C. Bayram, P. Giedraitis, R. McClintock, and M. Razeghi Applied Physics Letters, Vol. 93, No. 22, p. 221104-1-- December 1, 2008 ...[Visit Journal] We report the fabrication of nanostructured p-i-n photodiodes based on GaN. Each device comprises arrays of ~200 nm diameter and 520 nm tall nanopillars on a 1 µm period, fabricated by e-beam lithography. Strong rectifying behavior was obtained with an average reverse current per nanopillar of 5 fA at −5 V. In contrast to conventional GaN diodes, nanostructured devices reproducibly show ideality factors lower than 2. Enhanced tunneling through sidewall surface states is proposed as the responsible mechanism for this behavior. Under backillumination, the quantum efficiency in nanostructured devices is partly limited by the collection efficiency of holes into the nanopillars. [reprint (PDF)]
10.	AlN/GaN double-barrier resonant tunneling diodes grown by metal-organic chemical vapor deposition C. Bayram, Z. Vashaei and M. Razeghi Applied Physics Letters, Vol. 96, No. 4, p. 042103-1-- January 25, 2010 ...[Visit Journal] AlN/GaN double-barrier resonant tunneling diodes (RTDs) were grown by metal-organic chemical vapor deposition on sapphire. RTDs were fabricated via standard processing steps. RTDs demonstrate a clear negative differential resistance (NDR) at room temperature (RT). The NDR was observed around 4.7 V with a peak current density of 59 kA/cm² and a peak-to-valley ratio of 1.6 at RT. Dislocation-free material is shown to be the key for the performance of GaN RTDs. [reprint (PDF)]
10.	Reliability of Aluminum-Free 808 nm High-Power Laser Diodes with Uncoated Mirrors I. Eliashevich, J. Diaz, H. Yi, L. Wang, and M. Razeghi Applied Physics Letters 66 (23)-- June 5, 1995 ...[Visit Journal] The reliability of uncoated InGaAsP/GaAs high‐power diode lasers emitting at 808 nm wavelength has been studied. 47 W of quasicontinuous wave output power (pulse width 200 μs, frequency 20 Hz) have been obtained from a 1 cm wide laser bar. A single‐stripe diode without mirror coating has been life tested at 40 °C for emitting power of 800 mW continuous wave (cw) and showed no noticeable degradation and no change of the lasing wavelength after 6000 h of operation. [reprint (PDF)]
10.	p-Type thin film field effect transistors based on lithium-doped nickel oxide channels grown by pulsed laser deposition V. E. Sandana; D. J. Rogers; F. H. Teherani; P. Bove; R. McClintock; M. Razeghi SPIE Proceedings Volume 10919, Oxide-based Materials and Devices X; 109191H -- March 12, 2019 ...[Visit Journal] Staggered back-gated Field Effect Transistor (FET) structures were made by growing Li-doped NiO on Si₃N₄/SiO₂/Si (111) using room temperature pulsed laser deposition. Optical studies showed over 80% transmission for the NiO:Li channel at wavelengths > 500nm. The MISFET revealed rectifying transfer characteristics, with a V_ON close to zero, a channel mobility of ~ 1 cm²/V·s, a gate leakage current (at +5V) of 0.8 mA and an ION/IOFF ratio (at a Vgs of −15V) of ~ 10³. The transistors showed enhancement-mode output characteristics indicative of a p-type channel with sharp pinchoff, hard saturation, a comparatively high (milliampere range) Id and a relatively low on-resistance of ~11 kΩ. Hence the adoption of Li doping in NiO channels would appear to be a promising approach to obtain p-type TFTs with superior transparency, speed and energy efficiency. [reprint (PDF)]

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