Center for Quantum Devices - Most Downloaded Journal Articles

Page 27 of 31: Prev << 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 >> Next (768 Items)

14.	AlGaN/AlN MOVPE heteroepitaxy: pulsed co-doping SiH4 and TMIn Ilkay Demir, Yusuf Koçak, A. Emre Kasapoğlu, Manijeh Razeghi, Emre Gür and Sezai Elagoz Semicond. Sci. Technol. 34 075028-- June 24, 2019 ...[Visit Journal] We report a new growth approach pulsed co-doping growth of Al_xGa_1−xN (x > 0.5) epilayers on AlN/Al₂O₃ templates by metal organic vapor phase epitaxy (MOVPE). Using this approach SiH₄ (silane) and TMIn (trimethylindium) supplied to the growth chamber alternately and pulsed during the growth of AlGaN epilayers. Structural and morphological quality of AlGaN epilayers were investigated by high resolution x-ray diffraction (HR-XRD), atomic force microscopy (AFM), Raman spectroscopy, and scanning electron microscopy (SEM) techniques. It has shown that higher crystalline quality with low full width at half maximum (FWHM) and smoother surface morphology with reduced hexagonal hillock density has been obtained by the pulsed co-doping growth approach. Volcano like hillock structures has been confirmed by Raman mapping. [reprint (PDF)]
14.	High quality LEO growth and characterization of GaN films on Al₂O₃ and Si substrates M. Razeghi, P. Kung, D. Walker, M. Hamilton, and J. Diaz SPIE International Conference on Solid State Crystals, Zakopane, Poland; Proceedings 3725-- October 12, 1998 ...[Visit Journal] We report the lateral epitaxial overgrowth (LEO) of GaN films on (00.1) Al₂O₃ and (111) Si substrates by metalorganic chemical vapor deposition. The LEO on Si substrates was possible after achieving quasi monocrystalline GaN template films on (111) Si substrates. X-ray diffraction, photoluminescence, scanning electron microscopy and atomic force microscopy were used to assess the quality of the LEO films. Lateral growth rates more than 5 times as high as vertical growth rates were achieved for both LEO growths of GaN on sapphire and silicon substrates. [reprint (PDF)]
14.	Reliability of strain-balanced Ga_0.331In_0.669As/Al_0.659In_0.341As/InP quantum-cascade lasers under continuous-wave room-temperature operation A. Evans and M. Razeghi Applied Physics Letters, 88 (26)-- June 26, 2006 ...[Visit Journal] Constant current aging is reported for two randomly selected high-reflectivity-coated QCLs with an output power over 100 mW. QCLs are tested under continuous-wave operation at a heat sink temperature of 298 K(25 °C) corresponding to an internal temperature of 378 K (105 °C). Over 4000 h of continuous testing is reported without any decrease in output power. [reprint (PDF)]
14.	High Detectivity InGaAs/InGaP Quantum-Dot Infrared Photodetectors Grown by Low Pressure Metalorganic Chemical Vapor Deposition J. Jiang, S. Tsao, T. O'Sullivan, W. Zhang, H. Lim, T. Sills, K. Mi, M. Razeghi, G.J. Brown, and M.Z. Tidrow Applied Physics Letters, 84 (12)-- April 22, 2004 ...[Visit Journal] We report a high detectivity middle-wavelength infrared quantum dot infrared photodetector (QDIP). The InGaAs quantum dots were grown by self-assembly on an InGaP matrix via low pressure metalorganic chemical vapor deposition. Photoresponse was observed at temperatures above 200 K with a peak wavelength of 4.7 µm and cutoff wavelength of 5.2 µm. The background limited performance temperature was 140 K, and this was attributed to the super low dark current observed in this QDIP. A detectivity of 3.6×10¹⁰ cm·Hz^½/W, which is comparable to the state-of-the-art quantum well infrared photodetectors in a similar wavelength range, was obtained for this InGaAs/InGaP QDIP at both T = 77 K and T = 95 K at biases of –1.6 and –1.4 V, [reprint (PDF)]
14.	8.5 μm Room Temperature Quantum Cascade Lasers Grown by Gas-Source Molecular Beam Epitaxy S. Slivken and M. Razeghi SPIE Conference, San Jose, CA, -- January 28, 1998 ...[Visit Journal] We report room-temperature pulsed-mode operation of 8.5 μm quantum cascade lasers grown by gas-source molecular beam epitaxy. The theory necessary to understand the operation of the laser is presented and current problems are analyzed. Very good agreement is shown to exist between theoretical and experimental emission wavelengths. The high- temperature operation is achieved with 1 μs pulses at a repetition rate of 200 Hz. Peak output power in these conditions is in excess of 700 mW per 2 facets at 79 K and 25 mW at 300 K. Threshold current as a function of temperature shows an exponential dependence with T₀ equals 188 K for a 1.5 mm cavity. [reprint (PDF)]
14.	Sandwich method to grow high quality AlN by MOCVD Demir , H Li, Y Robin, R McClintock, S Elagoz and M Razeghi Journal of Physics D: Applied Physics 51, pp. 085104-- February 7, 2018 ...[Visit Journal] We report pulsed atomic layer epitaxy growth of a very high crystalline quality, thick (~2 µm) and crack-free AlN material on c-plane sapphire substrates via a sandwich method using metal organic chemical vapor deposition. This sandwich method involves the introduction of a relatively low temperature (1050 °C) 1500 nm thick AlN layer between two 250 nm thick AlN layers which are grown at higher temperature (1170 °C). The surface morphology and crystalline quality remarkably improve using this sandwich method. A 2 µm thick AlN layer was realized with 33 arcsec and 136 arcsec full width at half maximum values for symmetric and asymmetric reflections of ω-scan, respectively, and it has an atomic force microscopy root-mean-square surface roughness of ~0.71 nm for a 5 × 5 µm² surface area. [reprint (PDF)]
14.	Direct growth of thick AlN layers on nanopatterned Si substrates by cantilever epitaxy Ilkay Demir, Yoann Robin, Ryan McClintock, Sezai Elagoz, Konstantinos Zekentes, and Manijeh Razeghi Phys. Status Solidi A, pp. 1–6-- September 30, 2016 ...[Visit Journal] AlN layers have been grown on 200 nm period of nanopatterned Si (111) substrates by cantilever epitaxy and compared with AlN layers grown by maskless lateral epitaxial overgrowth (LEO) on micropatterned Si (111) substrates. The material quality of 5–10 µm thick AlN grown by LEO is comparable to that of much thinner layers (2 µm) grown by cantilever epitaxy on the nanopatterned substrates. Indeed, the latter exhibited root mean square (RMS) roughness of 0.65 nm and X-ray diffraction full width at half-maximum (FWHM) of 710 arcsec along the (0002) reflection and 930 arcsec along the (10̅15) reflection. The corresponding room temperature photoluminescence spectra was dominated by a sharp band edge peak. Back emission ultra violet light emitting diodes (UV LEDs) were fabricated by flip chip bonding to patterned AlN heat sinks followed by complete Si (111) substrate removal demonstrating a peak pulsed power of ∼0.7 mW at 344 nm peak emission wavelength. The demonstrated UV LEDs were fabricated on a cost effective epitaxial structure grown on the nanopatterned Si substrate with a total thickness of 3.3 µm [reprint (PDF)]
14.	Stranski-Krastanov growth of InGaN quantum dots emitting in green spectra C. Bayram and M. Razeghi Applied Physics A: Materials Science and Processing, Vol. 96, No. 2, p. 403-408-- August 1, 2009 ...[Visit Journal] Self-assembled InGaN quantum dots (QDs) were grown on GaN templates by metalorganic chemical vapor deposition. 2D–3D growth mode transition through Stranski–Krastanov mode was observed via atomic force microscopy. The critical thickness for In_0.67Ga_0.33N QDs was determined to be four monolayers. The effects of growth temperature, deposition thickness, and V/III ratio on QD formation were examined. The capping of InGaN QDs with GaN was analyzed. Optimized InGaN quantum dots emitted in green spectra at room temperature. [reprint (PDF)]
14.	Quantum oscillations at a Ga0.47In0.53AsInP heterojunction interface R.J Nicholas a, M.A Brummell a , J.C Portal b, M Razeghi c, M.A Poisson R.J Nicholas, M.A Brummell, J.C Portal, M Razeghi, M.A Poisson, Quantum oscillations at a Ga0.47In0.53AsInP heterojunction interface, Solid State Communications, Volume 43, Issue 11, 1982, Pages 825-828,-- September 1, 1982 ...[Visit Journal] We report the observation of a two dimensional gas of high mobility electrons at the interface of a Ga0.47In0.53AsInP heterojunction grown by MOCVD. The two dimensional electron concentrations and effective mass are determined by Shubnikov-de Haas studies, and compared with theoretical predictions. Evidence of an enhancement of the g-factor is observed. We also report observations of very pronounced quantum Hall steps as seen in GaAs-GaAlAs heterojunctions. [reprint (PDF)]
14.	Minority electron unipolar photodetectors based on Type-II InAs/GaSb/AlSb superlattices for very long wavelength infrared detection B.M. Nguyen, S. Bogdanov, S. Abdollahi Pour, and M. Razeghi Applied Physics Letters, Vol. 95, No. 18, p. 183502-- November 2, 2009 ...[Visit Journal] We present a hybrid photodetector design that inherits the advantages of traditional photoconductive and photovoltaic devices. The structure consists of a barrier layer blocking the transport of majority holes in a p-type semiconductor, resulting in an electrical transport due to minority carriers with low current density. By using the M-structure superlattice as a barrier region, the band alignments can be experimentally controlled, allowing for the efficient extraction of the photosignal with less than 50 mV bias. At 77 K, a 14 µm cutoff detector exhibits a dark current 3.3 mA·cm⁻², a photoresponsivity of 1.4 A/W, and the associated shot noise detectivity of 4×10¹⁰ Jones. [reprint (PDF)]
14.	Gain-length scaling in quantum dot/quantum well infrared photodetectors T. Yamanaka, B. Movaghar, S. Tsao, S. Kuboya, A. Myzaferi and M. Razeghi Applied Physics Letters, Vol. 95, No. 9-- August 31, 2009 ...[Visit Journal] The gain in quantum dot/quantum well infrared photodetectors is investigated. The scaling of the gain with device length has been analyzed, and the behavior agrees with the previously proposed model. We conclude that we understand the gain in the low bias region, but in the high field region, discrepancies remain. An extension of the gain model is presented to cover the very high electric field region. The high field data are compared to the extended model and discussed. [reprint (PDF)]
14.	Investigation of 0.8 μm InGaAsP-GaAs laser diodes with Multiple Quantum Wells J. Diaz, H. Yi, S. Kim, M. Erdtmann, L.J. Wang, I. Eliashevich, E. Bigan and M. Razeghi Optoelectronic Integrated Circuit Materials, Physics and Devices, SPIE Conference, San Jose, CA; Proceedings, Vol. 2397-- February 6, 1995 ...[Visit Journal] In this paper, we studied the effects of the active region structure (one, two and three quantum wells with same total thickness) for high-power InGaAsP-GaAs separate confinement heterostructure lasers emitting at 0.8 μm wavelength. Experimental results for the lasers grown by low pressure metalorganic chemical vapor deposition show excellent agreement with the theoretical model. Total output power of 47 W from an uncoated 1 cm-wide laser bar was achieved in quasi-continuous wave operation [reprint (PDF)]
13.	Type-II superlattice photodetectors for MWIR to VLWIR focal plane arrays M. Razeghi, Y. Wei, A. Hood, D. Hoffman, B.M. Nguyen, P.Y. Delaunay, E. Michel and R. McClintock SPIE Infrared Technology and Applications Conference, April 17-21, 2006, Orlando, FL Proceedings – Infrared Technology and Applications XXXII, Vol. 6206, p. 62060N-1-- April 21, 2006 ...[Visit Journal] Results obtained on GaSb/InAs Type-II superlattices have shown performance comparable to HgCdTe detectors, with the promise of higher performance due to reduced Auger recombination and dark current through improvements in device design and material quality. In this paper, we discuss advancements in Type-II IR sensors that cover the 3 to > 30 µm wavelength range. Specific topics covered will be device design and modeling using the Empirical Tight Binding Method (ETBM), material growth and characterization, device fabrication and testing, as well as focal plane array processing and imaging. Imaging has been demonstrated at room temperature for the first time with a 5 µm cutoff wavelength 256×256 focal plane array. [reprint (PDF)]
13.	Characterization and Analysis of Single-Mode High-Power CW Quantum-Cascade Laser W.W. Bewley, I. Vurgaftman, C.S. Kim, J.R. Meyer, J. Nguyen, A. Evans, J.S. Yu, S.R. Darvish, S. Slivken, and M. Razeghi Journal of Applied Physics 98-- October 15, 2005 ...[Visit Journal] We measured and modeled the performance characteristics of a distributed-feedback quantum-cascade laser exhibiting high-power continuous-wave (CW) operation in a single spectral mode at λ~4.8 µm and temperatures up to 333 K. The sidemode suppression ratio exceeds 25 dB, and the emission remains robustly single mode at all currents and temperatures tested. CW output powers of 99 mW at 298 K and 357 mW at 200 K are obtained at currents well below the thermal rollover point. The slope efficiency and subthreshold amplified spontaneous emission spectra are shown to be consistent with a coupling coefficient of no more than κL ~ 4–5, which is substantially lower than the estimate of 9 based on the nominal grating fabrication parameters. [reprint (PDF)]
13.	Inductively coupled plasma etching and processing techniques for type-II InAs/GaSb superlattices infrared detectors toward high fill factor focal plane arrays E.K. Huang, B.M. Nguyen, D. Hoffman, P.Y. Delaunay and M. Razeghi SPIE Proceedings, San Jose, CA Volume 7222-0Z-- January 26, 2009 ...[Visit Journal] A challenge for Type-II InAs/GaSb superlattice (T2SL) photodetectors is to achieve high fill factor, high aspect ratio etching for third generation focal plane arrays (FPAs). Initially, we compare the morphological and electrical results of single element T2SL photodiodes after BCl₃/Ar inductively coupled plasma (ICP) and electron cyclotron resonance (ECR) dry etching. Using a Si₃N₄ hard mask, ICP-etched structures exemplify greater sidewall verticality and smoothness, which are essential toward the realization of high fill factor FPAs. ICP-etched single element devices with SiO₂ passivation that are 9.3 µm in cutoff wavelength achieved vertical sidewalls of 7.7 µm in depth with a resistance area product at zero bias of greater than 1,000 Ω·cm² and maximum differential resistance in excess of 10,000 Ω·cm² at 77 K. By only modifying the etching technique in the fabrication steps, the ICP-etched photodiodes showed an order of magnitude decrease in their dark current densities in comparison to the ECR-etched devices. Finally, high aspect ratio etching is demonstrated on mutli-element arrays with 3 µm-wide trenches that are 11 µm deep. [reprint (PDF)]
13.	GaInN/GaN Multi-Quantum Well Laser Diodes Grown by Low-Pressure Metalorganic Chemical Vapor Deposition P. Kung, A. Saxler, D. Walker, A. Rybaltowski, X. Zhang, J. Diaz, and M. Razeghi MRS Internet Journal of Nitride Semiconductor Research 3 (1)-- January 1, 1998 ...[Visit Journal] We report the growth, fabrication and characterization of GaInN/GaN multi-quantum well lasers grown on (00·1) sapphire substrates by low pressure metalorganic chemical vapor deposition. The threshold current density of a 1800 µm long cavity length laser was 1.4 kA/cm² with a threshold voltage of 25 V. These lasers exhibited series resistances of 13 and 14 Ω at 300 and 79 K, respectively. [reprint (PDF)]
13.	LEO of III-Nitride on Al₂O₃ and Si Substrates M. Razeghi, P. Kung, P. Sandvik, K. Mi, X. Zhang, V.P. Dravid, J. Freitas, and A. Saxler SPIE Conference, San Jose, CA, -- January 26, 2000 ...[Visit Journal] Lateral epitaxial overgrowth (LEO) has recently become the method of choice to reduce the density of dislocations in heteroepitaxial GaN thin films, and is thus expected to lead to enhanced performance devices. We present here the LEO growth and characterization of GaN films by low pressure metalorganic chemical vapor deposition. Various substrates were used, including basal plane sapphire and oriented Si substrates. The steps in the LEO growth technology will be briefly reviewed. The characterization results will be discussed in detail. The structural, electrical and optical properties of the films were assessed through scanning, atomic and transmission electron microscopy, x-ray diffraction, capacitance-voltage, deep level transient spectroscopy, photoluminescence, and scanning cathodoluminenscence measurements. Single-step and double- step LEO GaN was achieved on sapphire. Similarly high quality LEO grown GaN films were obtained on sapphire and silicon substrates. Clear and dramatic reduction in the density of defects are observed in LEO grown materials using the various characterization techniques mentioned previously. [reprint (PDF)]
13.	Thin-Film Antimonide-Based Photodetectors Integrated on Si Yiyun Zhang , Member, IEEE, Abbas Haddadi, Member, IEEE, Romain Chevallier, Arash Dehzangi, Member, IEEE, and Manijeh Razeghi , Life Fellow, IEEE IEEE JOURNAL OF QUANTUM ELECTRONICS, VOL. 54, NO. 2-- April 1, 2018 ...[Visit Journal] Monolithic integration of antimonide (Sb)-based compound semiconductors on Si is in high demand to enrich silicon photonics by extending the detection range to longer infrared wavelengths. In this paper, we have demonstrated the damage-free transfer of large-area (1×1 cm² ) narrow-bandgap Sb-based type-II superlattice (T2SL)-based thin-film materials onto a Si substrate using a combination of wafer-bonding and chemical epilayer release techniques. An array of Sb-based T2SL-based long-wavelength infrared (LWIR) photodetectors with diameters from 100 to 400 μm has been successfully fabricated using standard "top–down" processing technique. The transferred LWIR photodetectors exhibit a cut-off wavelength of λ 8.6 μm at 77 K. The dark current density of the transferred photodetectors under 200 mV applied bias at 77 K is as low as 5.7×10⁻⁴ A/cm² and the R×A reaches 66.3 Ω·cm², exhibiting no electrical degradation compared with reference samples on GaSb native substrate. The quantum efficiency and peak responsivity at 6.75 μm (@77 K, 200 mV) are 46.2% and 2.44 A/W, respectively. The specific detectivity (D^*) at 6.75 μm reaches as high as 1.6×10¹¹ cm·Hz^1/2/W under 200 mV bias at 77 K. Our method opens a reliable pathway to realize high performance and practical Sb-based optoelectronic devices on a Si platform. [reprint (PDF)]
13.	Transport and photodetection in self-assembled semiconductor quantum dots M Razeghi, H Lim, S Tsao, J Szafraniec, W Zhang, K Mi and B Movaghar Nanotechnology 16 219-- January 7, 2005 ...[Visit Journal] A great step forward in science and technology was made when it was discovered that lattice mismatch can be used to grow highly ordered, artificial atom-like structures called self-assembled quantum dots. Several groups have in the meantime successfully demonstrated useful infrared photodetection devices which are based on this technology. The new physics is fascinating, and there is no doubt that many new applications will be found when we have developed a better understanding of the underlying physical processes, and in particular when we have learned how to integrate the exciting new developments made in nanoscopic addressing and molecular self-assembly methods with semiconducting dots. In this paper we examine the scientific and technical questions encountered in current state of the art infrared detector technology and suggest ways of overcoming these difficulties. Promoting simple physical pictures, we focus in particular on the problem of high temperature detector operation and discuss the origin of dark current, noise, and photoresponse. [reprint (PDF)]
13.	Type-II superlattice-based heterojunction phototransistors for high speed applications Jiakai Li, Arash Dehzangi, Donghai Wu, Ryan McClintock, Manijeh Razeghi Infrared Physics and Technology 108, 1033502-- May 2, 2020 ...[Visit Journal] In this study, high speed performance of heterojunction phototransistors (HPTs) based on InAs/GaSb/AlSb type-II superlattice with 30 nm base thickness and 50% cut-off wavelength of 2.0 μm at room temperature are demonstrated. We studied the relationship between -3 dB cut-off frequency of these HPT versus mesa size, applied bias, and collector layer thickness. For 8 μm diameter circular mesas HPT devices with a 0.5 μm collector layer, under 20 V applied bias voltage, we achieved a -3 dB cut-off frequency of 2.8 GHz. [reprint (PDF)]
13.	Electroluminescence at 375 nm from a Zn0/GaN:Mg/c-Al₂O₃ heterojunction light emitting diodes D.J. Rogers, F.Hosseini Teherani, A. Yasan, K. Minder, P. Kung, and M. Razeghi Applied Physics Letters, 88 (14)-- April 13, 2006 ...[Visit Journal] n-ZnO/p-GaN:Mg heterojunction light emitting diode (LED) mesas were fabricated on c-Al₂O₃ substrates using pulsed laser deposition for the ZnO and metal organic chemical vapor deposition for the GaN:Mg. Room temperature (RT) photoluminescence (PL) showed an intense main peak at 375 nm and a negligibly low green emission indicative of a near band edge excitonic emission from a ZnO layer with low dislocation/defect density. The LEDs showed I-V characteristics confirming a rectifying diode behavior and a RT electroluminescence (EL) peaked at about 375 nm. [reprint (PDF)]
13.	Planar nBn type-II superlattice mid-wavelength infrared photodetectors using zinc ion-implantation Arash Dehzangi, Donghai Wu, Ryan McClintock, Jiakai Li, and Manijeh Razeghi Appl. Phys. Lett. 116, 221103 https://doi.org/10.1063/5.0010273-- June 2, 2020 ...[Visit Journal] In this Letter, we report the demonstration of zinc ion-implantation to realize planar mid-wavelength infrared photodetectors based on type-II InAs/InAs1−xSbx superlattices. At 77 K, the photodetectors exhibit a peak responsivity of 0.68 A/W at 3.35 μm, corresponding to a quantum efficiency of 23.5% under Vb = −80 mV, without anti-reflection coating; these photodetectors have a 100% cutoff wavelength of 4.28 μm. With an R0 × A value of 1.53 × 104 Ω cm2 and a dark current density of 1.23 × 10−6 A/cm2 under an applied bias of −80 mV at 77 K, the photodetectors exhibit a specific detectivity of 9.12 × 1011 cm·Hz1/2/W. [reprint (PDF)]
13.	Thermal Conductivity of InAs/GaSb Type II Superlattice C. Zhou, B.M. Nguyen, M. Razeghi and M. Grayson Journal of Electronic Materials, Vol. 41, No. 9, p. 2322-2325-- August 1, 2012 ...[Visit Journal] The cross-plane thermal conductivity of a type II InAs/GaSb superlattice(T2SL) is measured from 13 K to 300 K using the 3x method. Thermal conductivity is reduced by up to two orders of magnitude relative to the GaSb bulk substrate. The low thermal conductivity of around 1 W/m K to 8 W/m K may serve as an advantage for thermoelectric applications at low temperatures, while presenting a challenge for T2SL interband cascade lasers and highpower photodiodes. We describe a power-law approximation to model nonlinearities in the thermal conductivity, resulting in increased or decreased peak temperature for negative or positive exponents, respectively. [reprint (PDF)]
13.	Very Long Wavelength Infrared Type-II Detectors Operating at 80K H. Mohseni, A. Tahraoui, J. Wojkowski, M. Razeghi, G.J. Brown, W.C. Mitchel, and Y.S. Park Applied Physics Letters 77 (11)-- September 11, 2000 ...[Visit Journal] We report a demonstration of very long wavelength infrared detectors based on InAs/GaSb superlattices operating at T = 80 K. Detector structures with excellent material quality were grown on an optimized GaSb buffer layer on GaAs semi-insulating substrates. Photoconductive devices with 50% cutoff wavelength of λ_c = 17 μm showed a peak responsivity of about 100 mA/W at T = 80 K. Devices with 50% cutoff wavelengths up to λ_c = 22 μm were demonstrated at this temperature. Good uniformity was obtained over large areas even for the devices with very long cutoff wavelengths. [reprint (PDF)]
13.	High Performance InAs/InAsSb Type-II Superlattice Mid-Wavelength Infrared Photodetectors with Double Barrier Donghai Wu, Jiakai Li, Arash Dehzangi, Manijeh Razeghi Infrared Physics &Technology 103439-- July 18, 2020 ...[Visit Journal] By introducing a double barrier design, a high performance InAs/InAsSb type-II superlattice mid-wavelength infrared photodetector has been demonstrated. The photodetector exhibits a cut-off wavelength of ~4.50 µm at 150 K. At 150 K and −120 mV applied bias, the photodetector exhibits a dark current density of 1.21 × 10−5 A/cm2, a quantum efficiency of 45% at peak responsivity (~3.95 µm), and a specific detectivity of 6.9 × 1011 cm·Hz1/2/W. The photodetector shows background-limited operating temperature up to 160 K. [reprint (PDF)]

Page 27 of 31: Prev << 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 >> Next (768 Items)