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3.  High operability 1024 x 1024 long wavelength Type-II superlattice focal plane array
A. Haddadi, S.R. Darvish, G. Chen, A.M. Hoang, B.M. Nguyen and M. Razeghi
IEEE Journal of Quantum Electronics (JQE), Vol. 48, No. 2, p. 221-228-- February 10, 2012 ...[Visit Journal]
Electrical and radiometric characterization results of a high-operability 1024 x 1024 long wavelength infrared type-II superlattice focal plane array are described. It demonstrates excellent quantum efficiency operability of 95.8% and 97.4% at operating temperatures of 81 K and 68 K, respectively. The external quantum efficiency is 81% without any antireflective coating. The dynamic range is 37 dB at 81 K and increases to 39 dB at 68 K operating temperature. The focal plane array has noise equivalent temperature difference as low as 27 mK and 19 mK at operating temperatures of 81 K and 68 K, respectively, using f/2 optics and an integration time of 0.13 ms. [reprint (PDF)]
 
3.  Low Noise Short Wavelength Infrared Avalanche Photodetector Using SB-Based Strained Layer Superlattice
Arash Dehzangi, Jiakai Li, Manijeh Razeghi
Photonics 2021, 8(5), 148; https://doi.org/10.3390/photonics8050148 Received: 8 March 2021 / Revised: 12 April 2021 / Accepted: 25 April 2021 / Published: 30 April 2021 ...[Visit Journal]
We demonstrate low noise short wavelength infrared (SWIR) Sb-based type II superlattice (T2SL) avalanche photodiodes (APDs). The SWIR GaSb/(AlAsSb/GaSb) APD structure was designed based on impact ionization engineering and grown by molecular beam epitaxy on a GaSb substrate. At room temperature, the device exhibits a 50% cut-off wavelength of 1.74 µm. The device was revealed to have an electron-dominated avalanching mechanism with a gain value of 48 at room temperature. The electron and hole impact ionization coefficients were calculated and compared to give a better prospect of the performance of the device. Low excess noise, as characterized by a carrier ionization ratio of ~0.07, has been achieved. [reprint (PDF)]
 
3.  High Power Mid-Infrared Quantum Cascade Lasers Grown on GaAs
Steven Slivken and Manijeh Razeghi
Photonics 2022, 9(4), 231 (COVER ARTICLE) ...[Visit Journal]
The motivation behind this work is to show that InP-based intersubband lasers with high power can be realized on substrates with significant lattice mismatch. This is a primary concern for the integration of mid-infrared active optoelectronic devices on low-cost photonic platforms, such as Si. As evidence, an InP-based mid-infrared quantum cascade laser structure was grown on a GaAs substrate, which has a large (4%) lattice mismatch with respect to InP. Prior to laser core growth, a metamorphic buffer layer of InP was grown directly on a GaAs substrate to adjust the lattice constant. Wafer characterization data are given to establish general material characteristics. A simple fabrication procedure leads to lasers with high peak power (>14 W) at room temperature. These results are extremely promising for direct quantum cascade laser growth on Si substrates. [reprint (PDF)]
 
3.  The new oxide paradigm for solid state ultraviolet photodetectors
D. J. Rogers, P. Bove, X. Arrateig, V. E. Sandana, F. H. Teherani, M. Razeghi, R. McClintock, E. Frisch, S. Harel,
Proceedings Volume 10533, Oxide-based Materials and Devices IX; 105331P-- March 22, 2018 ...[Visit Journal]
The bandgap of wurzite ZnO layers grown on 2 inch diameter c-Al2O3 substrates by pulsed laser deposition was engineered from 3.7 to 4.8 eV by alloying with Mg. Above this Mg content the layers transformed from single phase hcp to mixed hcp/fcc phase before becoming single phase fcc above a bandgap of about 5.5 eV. Metal-Semiconductor-Metal (MSM) photodetectors based on gold Inter-Digitated-Transducer structures were fabricated from the single phase hcp layers by single step negative photolithography and then packaged in TO5 cans. The devices gave over 6 orders of magnitude of separation between dark and light signal with solar rejection ratios (I270 : I350) of over 3 x 105 and dark signals of 300 pA (at a bias of −5V). Spectral responsivities were engineered to fit the “Deutscher Verein des Gas- und Wasserfaches” industry standard form and gave over two decade higher responsivities (14 A/W, peaked at 270 nm) than commercial SiC based devices. Homogeneous Ga2O3 layers were also grown on 2 inch diameter c-Al2O3 substrates by PLD. Optical transmission spectra were coherent with a bandgap that increased from 4.9 to 5.4 eV when film thickness was decreased from 825 to 145 nm. X-ray diffraction revealed that the films were of the β-Ga2O3 (monoclinic) polytype with strong (−201) orientation. β-Ga2O3 MSM photodetectors gave over 4 orders of magnitude of separation between dark and light signal (at −5V bias) with dark currents of 250 pA and spectral responsivities of up to 40 A/W (at -0.75V bias). It was found that the spectral responsivity peak position could be decreased from 250 to 230 nm by reducing film thickness from 825 to 145 nm. This shift in peak responsivity wavelength with film thickness (a) was coherent with the apparent bandgap shift that was observed in transmission spectroscopy for the same layers and (b) conveniently provides a coverage of the spectral region in which MgZnO layers show fcc/hcp phase mixing. [reprint (PDF)]
 
3.  Chemical lift-off and direct wafer bonding of GaN/InGaN P-I-N structures grown on ZnO
K. Pantzas, D.J. Rogers, P. Bove, V.E. Sandana, F.H. Teherani, Y. El Gmili, M. Molinari, G. Patriarche, L. Largeau, O. Mauguin, S. Suresh, P.L. Voss, M. Razeghi, A. Ougazzaden
Journal of Crystal Growth, Volume 435, Pages 105-109-- November 7, 2015 ...[Visit Journal]
p-GaN/i-InGaN/n-GaN (PIN) structures were grown epitaxially on ZnO-buffered c-sapphire substrates by metal organic vapor phase epitaxy using the industry standard ammonia precursor for nitrogen. Scanning electron microscopy revealed continuous layers with a smooth interface between GaN and ZnO and no evidence of ZnO back-etching. Energy Dispersive X-ray Spectroscopy revealed a peak indium content of just under 5at% in the active layers. The PIN structure was lifted off the sapphire by selectively etching away the ZnO buffer in an acid and then direct bonded onto a glass substrate. Detailed high resolution transmission electron microscopy and grazing incidence X-ray diffraction studies revealed that the structural quality of the PIN structures was preserved during the transfer process. [reprint (PDF)]
 
3.  Investigations on the substrate dependence of the properties in nominally-undoped β-Ga2O3 thin films grown by PLD
F. H. Teherani ; D. J. Rogers ; V. E. Sandana ; P. Bove ; C. Ton-That ; L. L. C. Lem ; E. Chikoidze ; M. Neumann-Spallart ; Y. Dumont ; T. Huynh ; M. R. Phillips ; P. Chapon ; R. McClintock ; M. Razeghi
Proc. SPIE 10105, Oxide-based Materials and Devices VIII, 101051R-OLD-- March 23, 2017 ...[Visit Journal]
Nominally-undoped Ga2O3 layers were deposited on a-, c- and r-plane sapphire substrates using pulsed laser deposition. Conventional x-ray diffraction analysis for films grown on a- and c-plane sapphire showed the layers to be in the β-Ga2O3 phase with preferential orientation of the (-201) axis along the growth direction. Pole figures revealed the film grown on r-plane sapphire to also be in the β-Ga2O3 phase but with epitaxial offsets of 29.5°, 38.5° and 64° from the growth direction for the (-201) axis. Optical transmission spectroscopy indicated that the bandgap was ~5.2eV, for all the layers and that the transparency was > 80% in the visible wavelength range. Four point collinear resistivity and Van der Pauw based Hall measurements revealed the β-Ga2O3 layer on r-plane sapphire to be 4 orders of magnitude more conducting than layers grown on a- and c-plane sapphire under similar conditions. The absolute values of conductivity, carrier mobility and carrier concentration for the β-Ga2O3 layer on r-sapphire (at 20Ω-1.cm-1, 6 cm²/Vs and 1.7 x 1019 cm-3, respectively) all exceeded values found in the literature for nominally-undoped β-Ga2O3 thin films by at least an order of magnitude. Gas discharge optical emission spectroscopy compositional depth profiling for common shallow donor impurities (Cl, F, Si and Sn) did not indicate any discernable increase in their concentrations compared to background levels in the sapphire substrate. It is proposed that the fundamentally anisotropic conductivity in β-Ga2O3 combined with the epitaxial offset of the (-201) axis observed for the layer grown on r-plane sapphire may explain the much larger carrier concentration, electrical conductivity and mobility compared with layers having the (-201) axis aligned along the growth direction. [reprint (PDF)]
 
3.  Recent progress of quantum cascade laser research from 3 to 12 μm at the Center for Quantum Devices
MANIJEH RAZEGHI,* WENJIA ZHOU,STEVEN SLIVKEN,QUAN-YONG LU,DONGHAI WU, AND RYAN MCCLINTOC
Applied Optics Vol. 56, No. 31 -- October 10, 2017 ...[Visit Journal]
The quantum cascade laser (QCL) is becoming the leading laser source in the mid-infrared (mid-IR) range, which contains two atmospheric transmission windows and many molecular fingerprint absorption features. Since its first demonstration in 1994, the QCL has undergone tremendous development in terms of the output power, wall plug efficiency, wavelength coverage, tunability and beam quality. At the Center for Quantum Devices, we have demonstrated high-power continuous wave operation of QCLs covering a wide wavelength range from 3 to 12 μm, with power output up to 5.1 W at room temperature. Recent research has resulted in power scaling in pulsed mode with up to 203 W output, electrically tunable QCLs based on monolithic sampled grating design, heterogeneous QCLs with a broad spectral gain, broadly tunable on-chip beam-combined QCLs, QCL-based mid-IR frequency combs, and fundamental mode surface emitting quantum cascade ring lasers. The developed QCLs will be the basis for a number of next-generation spectroscopy and sensing systems. [reprint (PDF)]
 
3.  Nanoselective area growth of defect-free thick indium-rich InGaN nanostructures on sacrificial ZnO templates
Renaud Puybaret, David J Rogers, Youssef El Gmili, Suresh Sundaram, Matthew B Jordan, Xin Li, Gilles Patriarche, Ferechteh H Teherani, Eric V Sandana, Philippe Bove, Paul L Voss, Ryan McClintock, Manijeh Razeghi, Ian Ferguson, Jean-Paul Salvestrini, and Abdallah Ougazzade
Nanotechnology 28 195304-- April 29, 2017 ...[Visit Journal]
Nanoselective area growth (NSAG) by metal organic vapor phase epitaxy of high-quality InGaN nanopyramids on GaN-coated ZnO/c-sapphire is reported. Nanopyramids grown on epitaxial low-temperature GaN-on-ZnO are uniform and appear to be single crystalline, as well as free of dislocations and V-pits. They are also indium-rich (with homogeneous 22% indium incorporation) and relatively thick (100 nm). These properties make them comparable to nanostructures grown on GaN and AlN/Si templates, in terms of crystallinity, quality, morphology, chemical composition and thickness. Moreover, the ability to selectively etch away the ZnO allows for the potential lift-off and transfer of the InGaN/GaN nanopyramids onto alternative substrates, e.g. cheaper and/or flexible. This technology offers an attractive alternative to NSAG on AlN/Si as a platform for the fabrication of high quality, thick and indium-rich InGaN monocrystals suitable for cheap, flexible and tunable light-emitting diodes. [reprint (PDF)]
 
2.  Demonstration of Planar Type-II Superlattice-Based Photodetectors Using Silicon Ion-Implantation
Arash Dehzangi, Donghai Wu, Ryan McClintock, Jiakai Li, Alexander Jaud and Manijeh Razeghi
Photonics 2020, 7(3), 68; https://doi.org/10.3390/photonics7030068-- September 3, 2020 ...[Visit Journal]
In this letter, we report the demonstration of a pBn planar mid-wavelength infrared photodetectors based on type-II InAs/InAs1−xSbx superlattices, using silicon ion-implantation to isolate the devices. At 77 K the photodetectors exhibited peak responsivity of 0.76 A/W at 3.8 µm, corresponding to a quantum efficiency, without anti-reflection coating, of 21.5% under an applied bias of +40 mV with a 100% cut-off wavelength of 4.6 µm. With a dark current density of 5.21 × 10−6 A/cm2, under +40 mV applied bias and at 77 K, the photodetector exhibited a specific detectivity of 4.95 × 1011 cm·Hz1/2/W. [reprint (PDF)]
 
2.  Radiative recombination of confined electrons at the MgZnO/ ZnO heterojunction interface
Sumin Choi, David J. Rogers, Eric V. Sandana, Philippe Bove, Ferechteh H. Teherani, Christian Nenstiel, Axel Hoffmann, Ryan McClintock, Manijeh Razeghi, David Look, Angus Gentle, Matthew R. Phillips & Cuong Ton-That
Nature Scientific Reports 7, pp. 7457-- August 7, 2017 ...[Visit Journal]
We investigate the optical signature of the interface in a single MgZnO/ZnO heterojunction, which exhibits two orders of magnitude lower resistivity and 10 times higher electron mobility compared with the MgZnO/Al2O3 film grown under the same conditions. These impressive transport properties are attributed to increased mobility of electrons at the MgZnO/ZnO heterojunction interface. Depthresolved cathodoluminescence and photoluminescence studies reveal a 3.2 eV H-band optical emission from the heterointerface, which exhibits excitonic properties and a localization energy of 19.6 meV. The emission is attributed to band-bending due to the polarization discontinuity at the interface, which leads to formation of a triangular quantum well and localized excitons by electrostatic coupling. [reprint (PDF)]
 
2.  

-- November 30, 1999
 
2.  High performance Zn-diffused planar mid-wavelength infrared type-II InAs/InAs1-xSbx superlattice photodetector by MOCVD
Donghai Wu, Arash Dehzangi, Jiakai Li, and Manijeh Razeghi
Appl. Phys. Lett. 116, 161108-- April 21, 2020 ...[Visit Journal]
We report a Zn-diffused planar mid-wavelength infrared photodetector based on type-II InAs/InAs1-xSbx superlattices. Both the superlattice growth and Zn diffusion were performed in a metal-organic chemical vapor deposition system. At 77K, the photodetector exhibits a peak responsivity of 0.70A/W at 3.65λ, corresponding to a quantum efficiency of 24% at zero bias without anti-reflection coating, with a 50% cutoff wavelength of 4.28λ. With an R0A value of 3.2x105 Ω·cm2 and a dark current density of 9.6x10-8 A/cm² bias of -20mV at 77K, the photodetector exhibits a specific detectivity of 2.9x1012cm·Hz½/W. At 150K, the photodetector exhibits a dark current density of 9.1x10-6 A/cm² and a quantum efficiency of 25%, resulting in a detectivity of 3.4x1011cm·Hz/W. [reprint (PDF)]
 
2.  High operability 1024 x 1024 long wavelength infrared focal plane array base on Type-II InAs/GaSb superlattice
A. Haddadi, S.R. Darvish, G. Chen, A.M. Hoang, B.M. Nguyen and M. Razeghi
AIP Conference Proceedings, Vol. 1416, p. 56-58_NGS15 Conf_Blacksburg, VA_Aug 1-5, 2011-- December 31, 2011 ...[Visit Journal]
Fabrication and characterization of a high performance 1024×1024 long wavelength infrared type‐II superlattice focal plane array are described. The FPA performs imaging at a continous rate of 15.00 frames/sec. Each pixel has pitch of 18μm with a fill factor of 71.31%. It demonstrates excellent operability of 95.8% and 97.4% at 81 and 68K operation temperature. The external quantum efficiency is ∼81% without any antireflective coating. Using F∕2 optics and an integration time of 0.13ms, the FPA exhibits an NEDT as low as 27 and 19mK at operating temperatures of 81 and 68K respectively. [reprint (PDF)]
 
2.  Bias–selectable nBn dual–band long–/very long–wavelength infrared photodetectors based on InAs/InAsSb/AlAsSb type–II superlattices
Abbas Haddadi, Arash Dehzangi, Romain Chevallier, Sourav Adhikary, & Manijeh Razeghi
Nature Scientific Reports 7, Article number: 3379-- June 13, 2017 ...[Visit Journal]
Type–II superlattices (T2SLs) are a class of artificial semiconductors that have demonstrated themselves as a viable candidate to compete with the state–of–the–art mercury–cadmium–telluride material system in the field of infrared detection and imaging. Within type–II superlattices, InAs/InAs1−xSbx T2SLs have been shown to have a significantly longer minority carrier lifetime. However, demonstration of high–performance dual–band photodetectors based on InAs/InAs1−xSbx T2SLs in the long and very long wavelength infrared (LWIR & VLWIR) regimes remains challenging. We report the demonstration of high–performance bias–selectable dual–band long–wavelength infrared photodetectors based on new InAs/InAsSb/AlAsSb type–II superlattice design. Our design uses two different bandgap absorption regions separated by an electron barrier that blocks the transport of majority carriers to reduce the dark current density of the device. As the applied bias is varied, the device exhibits well–defined cut–off wavelengths of either ∼8.7 or ∼12.5 μm at 77 K. This bias–selectable dual–band photodetector is compact, with no moving parts, and will open new opportunities for multi–spectral LWIR and VLWIR imaging and detection. [reprint (PDF)]
 
2.  Nickel oxide growth on Si (111), c-Al2O3 and FTO/glass by pulsed laser deposition
V. E. Sandana ; D. J. Rogers ; F. Hosseini Teherani ; P. Bove ; R. McClintock ; M. Razeghi
03/07/2014-- March 7, 2014 ...[Visit Journal]
NiO was grown on Si (111), c-Al2O3 and FTO/glass substrates by pulsed laser deposition (PLD). X-Ray Diffraction (XRD) and scanning electron microscope (SEM) studies revealed that layers grown on c-Al2O3 were fcc NiO with a dense morphology of cubic grains that were strongly (111) oriented along the growth direction. The relatively low ω rocking curve linewidth, of 0.12°suggests that there may have been epitaxial growth on the c-Al2O3 substrate. XRD and SEM indicated that films grown on Si (111) were also fcc NiO, with cubic grains, but that the grain orientation was random. This is consistent with the presence of an amorphous SiO2 layer at the surface of the Si substrate, which precluded epitaxial growth. NiO grown at lower temperature (200°C) on temperature-sensitive FTO/glass substrates showed no evidence of crystallinity in XRD and SEM studies. After flash annealing in air, however, peaks characteristic of randomly oriented fcc NiO appeared in the XRD scans and the surface morphology became more granular in appearance. Such layers appear promising for the development of future dye-sensitised solar cell devices based on NiO grown by PLD. [reprint (PDF)]
 
2.  Ultraviolet Detectors for AstroPhysics Present and Future
M. Ulmer, M. Razeghi, and E. Bigan
Optoelectronic Integrated Circuit Materials, Physics and Devices, SPIE Conference, San Jose, CA; Proceedings, Vol. 239-- February 6, 1995 ...[Visit Journal]
Astronomical instruments for the study of UV astronomy have been developed for NASA missions such as the Hubble Space Telescope. The systems that are `blind to the visible' (`solar-blind') yet sensitive to the UV that have been flown in satellites have detective efficiencies of about 10 to 20%, although typically electron bombardment charge coupled devices are higher at 30 - 40% and ordinary CCDs achieve 1 - 5%. Therefore, there is a large payoff still to be gained by further improvements in the performance of solar blind UV detectors. We provide a brief review of some aspects of UV astronomy, UV detector development, and possible technologies for the future. We suggest that a particularly promising future technology is one based on the ability of investigators to produce high quality films made of wide bandgap III-V semiconductors. [reprint (PDF)]
 
2.  EPR Investigations of a Structural Phase Change in Lead Phosphate
M. RAZEGHI
M. RAZEGHI: EPR Investigations of a Structural Phase Change phys. stat. sol. (b) 108, 175 (1981)-- November 1, 1981 ...[Visit Journal]
The temperature dependence of the EPR line width of the Mn2+ and Gd3+ in Pb3(PO4)2 is investigated from -270 to 500 °C. At the first-order ferroelastic transition point (180 °C), an abrupt change in the fine-structure splitting as well as in the resonance line width is observed. Various contributions to fine structure D and E parameters of Mn2+ and Gd3+ are computed, using a point-multipole model. For temperatures near to Tc the correlation time of the fluctuations is estimated to be greater than 10−9. [reprint (PDF)]
 
2.  Recent advances in antimonide-based gap-engineered Type-II superlattices material system for 2 and 3 colors infrared imagers
Manijeh. Razeghi, Abbas Haddadi, Arash Dehzangi, Romain Chevallier, and Thomas Yang
Proceedings of SPIE 10177, Infrared Technology and Applications XLIII, 1017705-- May 9, 2017 ...[Visit Journal]
InAs/InAs1-xSbx/AlAs1-xSbx type-II superlattices (T2SLs) is a system of multi-interacting quantum wells. Since its introduction, this material system has drawn a lot of attention especially for infrared detection. In recent years, InAs/InAs1- xSbx/AlAs1-xSbx T2SL material system has experienced incredible improvements in material quality, device structure designs and device fabrication process which elevated the performances of T2SL-based photodetectors to a comparable level to the state-of-the-art material systems for infrared detection such as Mercury Cadmium Telluride (MCT). In this paper, we will present the current status of InAs/InAs1-xSbx/AlAs1-xSbx T2SL-based photodetectors for detection in different infrared regions, from short-wavelength (SWIR) to long-wavelength (LWIR) infrared, and the future outlook of this material system. [reprint (PDF)]
 
2.  High quantum efficiency mid-wavelength infrared type-II InAs/InAs1-xSbx superlattice photodiodes grown by metal-organic chemical vapor deposition
Donghai Wu , Quentin Durlin, Arash Dehzangi , Yiyun Zhang , and Manijeh Razeghi
Appl. Phys. Lett. 114, 011104-- January 8, 2019 ...[Visit Journal]
We report the growth and characterization of mid-wavelength infrared type-II InAs/InAs1-xSbx superlattice photodiodes on GaSb substrates grown by metal-organic chemical vapor deposition. At 150 K, the 50% cut-off wavelength is 5.0 um, the dark current density is 3.3x10−4 A/cm2 under −20mV bias, and the peak responsivity is 1.76A/W corresponding to a quantum efficiency of 55% without anti-reflection coating. A specific detectivity of 1.2x1011cmHz1/2/W is achieved at 4.0 um under −20mV bias at 150 K. [reprint (PDF)]
 
2.  AlGaN ultraviolet photoconductors grown on sapphire
D. Walker, X. Zhang, P. Kung, A. Saxler, S. Javadpour, J. Xu, and M. Razeghi
Applied Physics Letters 68 (15)-- April 8, 1996 ...[Visit Journal]
AlxGa1−xN (0≤x≤0.50) ultraviolet photoconductors with a minimum cutoff wavelength shorter than 260 nm have been fabricated and characterized. The AlGaN active layers were grown on (00⋅1) sapphire substrates by metalorganic chemical vapor deposition (MOCVD). The spectral responsivity of the GaN detector at 360 nm is about 1 A/W biased at 8 V at room temperature. The carrier lifetime derived from the voltage‐dependent responsivity is 0.13–0.36 ms. [reprint (PDF)]
 
2.  III-Nitride/Ga2O3 heterostructure for future power electronics: opportunity and challenges
Nirajman Shrestha, Jun Hee Lee, F. H. Teherani, Manijeh Razeghi
Proc. of SPIE Vol. 12895, Quantum Sensing and Nano Electronics and Photonics XX, 128950B (28 January - 1 February 2024, San Francisco)http://dx.doi.org/10.1117/12.3011688 ...[Visit Journal]
Ga2O3 has become the new focal point of high-power semiconductor device research due to its superior capability to handle high voltages in smaller dimensions and with higher efficiencies compared to other commercialized semiconductors. However, the low thermal conductivity of the material is expected to limit device performance. To compensate for the low thermal conductivity of Ga2O3 and to achieve a very high density 2-dimensional electron gas (2DEG), an innovative idea is to combine Ga2O3 with III-Nitrides (which have higher thermal conductivity), such as AlN. However, metal-polar AlN/β-Ga2O3 heterojunction provides type-II heterojunction which are beneficial for optoelectronic application, because of the negative value of specific charge density. On the other hand, N-polar AlN/β- Ga2O3 heterostructures provide higher 2DEG concentration and larger breakdown voltage compared to conventional AlGaN/GaN devices. This advancement would allow the demonstration of RF power transistors with a 10x increase in power density compared to today’s State of the Art (SoA) and provide a solution to size, weight, and power-constrained applications [reprint (PDF)]
 
2.  High-performance short-wavelength infrared photodetectors based on type-II InAs/InAs1-xSbx/AlAs1-xSbx superlattices
A. Haddadi, X.V. Suo, S. Adhikary, P. Dianat, R. Chevallier, A.M. Hoang, and M. Razeghi
Applied Physics Letters 107 , 141104-- October 5, 2015 ...[Visit Journal]
A high-performance short-wavelength infrared n-i-p photodiode based on InAs/InAs1-xSbx/AlAs1-xSbx type-II superlattices on GaSb substrate has been demonstrated. The device is designed to have a 50% cut-off wavelength of ~1.8μm at 300K. The photodetector exhibited a room-temperature (300 K) peak responsivity of 0.47 A/W at 1.6μm, corresponding to a quantum efficiency of 37% at zero bias under front-side illumination, without any anti-reflection coating. With an R×A of 285 Ω·cm² and a dark current density of 9.6×10-5 A/cm² under −50mV applied bias at 300 K, the photodiode exhibited a specific detectivity of 6.45×1010 cm·Hz½/W. At 200 K, the photodiode exhibited a dark current density of 1.3×10-8 A/cm² and a quantum efficiency of 36%, resulting in a detectivity of 5.66×1012 cm·Hz½/W. [reprint (PDF)]
 
2.  A study into the impact of sapphire substrate orientation on the properties of nominally-undoped β-Ga2O3 thin films grown by pulsed laser deposition
F. H. Teherani; D. J. Rogers; V. E. Sandana; P. Bove; C. Ton-That; L. L. C. Lem; E. Chikoidze; M. Neumann-Spallart; Y. Dumont; T. Huynh; M. R. Phillips; P. Chapon; R. McClintock; M. Razeghi
Proceedings Volume 10105, Oxide-based Materials and Devices VIII; 101051R-- March 23, 2017 ...[Visit Journal]
Nominally-undoped Ga2O3 layers were deposited on a-, c- and r-plane sapphire substrates using pulsed laser deposition. Conventional x-ray diffraction analysis for films grown on a- and c-plane sapphire showed the layers to be in the β-Ga2O3 phase with preferential orientation of the (-201) axis along the growth direction. Pole figures revealed the film grown on r-plane sapphire to also be in theβ-Ga2O3 phase but with epitaxial offsets of 29.5°, 38.5° and 64° from the growth direction for the (-201) axis. Optical transmission spectroscopy indicated that the bandgap was ~5.2eV, for all the layers and that the transparency was > 80% in the visible wavelength range. Four point collinear resistivity and Van der Pauw based Hall measurements revealed the β-Ga2O3 layer on r-plane sapphire to be 4 orders of magnitude more conducting than layers grown on a- and c-plane sapphire under similar conditions. The absolute values of conductivity, carrier mobility and carrier concentration for the β-Ga2O3 layer on r-sapphire (at 20Ω-1.cm-1, 6 cm2/Vs and 1.7 x 1019 cm-3, respectively) all exceeded values found in the literature for nominally-undoped β-Ga2O3 thin films by at least an order of magnitude. Gas discharge optical emission spectroscopy compositional depth profiling for common shallow donor impurities (Cl, F, Si and Sn) did not indicate any discernable increase in their concentrations compared to background levels in the sapphire substrate. It is proposed that the fundamentally anisotropic conductivity in β-Ga2O3 combined with the epitaxial offset of the (-201) axis observed for the layer grown on r-plane sapphire may explain the much larger carrier concentration, electrical conductivity and mobility compared with layers having the (-201) axis aligned along the growth direction. [reprint (PDF)]
 
2.  Growth of Deep UV Light Emitting Diodes by Metalorganic Chemical Vapor Deposition
A. Yasan, R. McClintock, K. Mayes, D. Shiell, S. Darvish, P. Kung and M. Razeghi
SPIE Conference, Jose, CA, Vol. 5359, pp. 400-- January 25, 2004 ...[Visit Journal]
We demonstrate high power AlGaN based ultraviolet light-emitting diodes (UV LEDs) with an emission wavelength of 280 nm using an asymmetric single quantum well active layer configuration on top of a high-quality AlGaN/AlN template layer grown by metalorganic chemical vapor deposition (MOCVD). An output power of 1.8 mW at a pulsed current of 400 mA was achieved for a single 300 µm × 300 µm diode. This device reached a high peak external quantum efficiency of 0.24% at 40 mA. An array of four diodes produced 6.5 mW at 880 mA of pulsed current. [reprint (PDF)]
 
2.  Effect of the spin split-off band on optical absorption in p-type Ga1 xInxAsyP1-y quantum-well infrared detectors
J.R. Hoff, M. Razeghi and G. Brown
Physical Review B 54 (15)-- October 15, 1996 ...[Visit Journal]
Experimental investigations of p-type Ga1-xInxAsyP1-y quantum-well intersubband photodetectors (QWIP’s) led to the discovery of unique features in photoresponse spectra of these devices. In particular, the strong 2–5 μm photoresponse of these QWIP’s was not anticipated based on previous experimental and theoretical results for p-type GaAs/AlxGa1-xAs QWIP’s. Our theoretical modeling of p-type QWIP’s based on the Ga1-xInxAsyP1-y system revealed that the intense short-wavelength photoresponse was due to a much stronger coupling to the spin-orbit split-off components in the continuum than occurs for GaAs/AlxGa1-xAs QWIP’s. Due to the strong influence of the spin split-off band, an eight-band Kane Hamiltonian was required to accurately model the measured photoresponse spectra. This theoretical model is first applied to a standard p-type GaAs/Al0.3Ga0.7As QWIP, and then to a series of GaAs/Ga0.51In0.49P, GaAs/Ga0.62In0.38As0.22P0.78, Ga0.79In0.21As0.59P0.41/Ga0.51In0.49P, and Ga0.79In0.21As0.59P0.41/Ga0.62In0.38As0.22P0.78 QWIP’s. Through this analysis, the insignificance of spin split-off absorption in GaAs/AlxGa1-xAs QWIP’s is verified, as is the dual role of light-hole extended-state and spin split-off hole-extended-state absorption on the spectral shape of Ga1-xInxAsyP1-y QWIP’s. [reprint (PDF)]
 

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