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3.  AlGaN-based deep UV light emitting diodes with peak emission below 255 nm
A. Yasan, R. McClintock, K. Mayes, P. Kung, and M. Razeghi
SPIE Conference, Jose, CA, Vol. 5732, pp. 197-- January 22, 2005 ...[Visit Journal]
We report on the growth and fabrication of AlGaN-based deep ultraviolet light-emitting diodes (LEDs) with peak emission of below 255 nm. In order to achieve such short wavelength UV LEDs, the Al mole fractions in the device layers should be greater than ~60%. This introdues serious challenges on the growth and doping of AlxGa1-xN epilayers. However, with the aid of a high-quality AlN template layer and refinement of the growth conditions we have been able to demonstrate UV LEDs emitting below 255 nm. [reprint (PDF)]
 
3.  High quantum efficiency mid-wavelength infrared type-II InAs/InAs1-xSbx superlattice photodiodes grown by metal-organic chemical vapor deposition
Donghai Wu , Quentin Durlin, Arash Dehzangi , Yiyun Zhang , and Manijeh Razeghi
Appl. Phys. Lett. 114, 011104-- January 8, 2019 ...[Visit Journal]
We report the growth and characterization of mid-wavelength infrared type-II InAs/InAs1-xSbx superlattice photodiodes on GaSb substrates grown by metal-organic chemical vapor deposition. At 150 K, the 50% cut-off wavelength is 5.0 um, the dark current density is 3.3x10−4 A/cm2 under −20mV bias, and the peak responsivity is 1.76A/W corresponding to a quantum efficiency of 55% without anti-reflection coating. A specific detectivity of 1.2x1011cmHz1/2/W is achieved at 4.0 um under −20mV bias at 150 K. [reprint (PDF)]
 
3.  Direct growth of thick AlN layers on nanopatterned Si substrates by cantilever epitaxy
Ilkay Demir, Yoann Robin, Ryan McClintock, Sezai Elagoz, Konstantinos Zekentes, and Manijeh Razeghi
Physica Status Solidi 214 (4), pp. 1770120-- April 4, 2017 ...[Visit Journal]
The growth of thick, high quality, and low stress AlN films on Si substrates is highly desired for a number of applications like the development of micro and nano electromechanical system (MEMS and NEMS) technologies [1] and particularly for fabricating AlGaNbased UV LEDs [2–5]. UV LEDs are attractive as they are applied in many areas, such as biomedical instrumentations and dermatology, curing of industrial resins and inks, air purification, water sterilization, and many others [2, 3]. UV LEDs have been generally fabricated on AlN, GaN, Al2O3, or SiC substrates because of better lattice mismatching to AlGaN material systems. [reprint (PDF)]
 
3.  The new oxide paradigm for solid state ultraviolet photodetectors
D. J. Rogers, P. Bove, X. Arrateig, V. E. Sandana, F. H. Teherani, M. Razeghi, R. McClintock, E. Frisch, S. Harel,
Proceedings Volume 10533, Oxide-based Materials and Devices IX; 105331P-- March 22, 2018 ...[Visit Journal]
The bandgap of wurzite ZnO layers grown on 2 inch diameter c-Al2O3 substrates by pulsed laser deposition was engineered from 3.7 to 4.8 eV by alloying with Mg. Above this Mg content the layers transformed from single phase hcp to mixed hcp/fcc phase before becoming single phase fcc above a bandgap of about 5.5 eV. Metal-Semiconductor-Metal (MSM) photodetectors based on gold Inter-Digitated-Transducer structures were fabricated from the single phase hcp layers by single step negative photolithography and then packaged in TO5 cans. The devices gave over 6 orders of magnitude of separation between dark and light signal with solar rejection ratios (I270 : I350) of over 3 x 105 and dark signals of 300 pA (at a bias of −5V). Spectral responsivities were engineered to fit the “Deutscher Verein des Gas- und Wasserfaches” industry standard form and gave over two decade higher responsivities (14 A/W, peaked at 270 nm) than commercial SiC based devices. Homogeneous Ga2O3 layers were also grown on 2 inch diameter c-Al2O3 substrates by PLD. Optical transmission spectra were coherent with a bandgap that increased from 4.9 to 5.4 eV when film thickness was decreased from 825 to 145 nm. X-ray diffraction revealed that the films were of the β-Ga2O3 (monoclinic) polytype with strong (−201) orientation. β-Ga2O3 MSM photodetectors gave over 4 orders of magnitude of separation between dark and light signal (at −5V bias) with dark currents of 250 pA and spectral responsivities of up to 40 A/W (at -0.75V bias). It was found that the spectral responsivity peak position could be decreased from 250 to 230 nm by reducing film thickness from 825 to 145 nm. This shift in peak responsivity wavelength with film thickness (a) was coherent with the apparent bandgap shift that was observed in transmission spectroscopy for the same layers and (b) conveniently provides a coverage of the spectral region in which MgZnO layers show fcc/hcp phase mixing. [reprint (PDF)]
 
3.  Very high quantum efficiency in type-II InAs/GaSb superlattice photodiode with cutoff of 12 µm
B.M. Nguyen, D. Hoffman, Y. Wei, P.Y. Delaunay, A. Hood and M. Razeghi
Applied Physics Letters, Vol. 90, No. 23, p. 231108-1-- June 4, 2007 ...[Visit Journal]
The authors report the dependence of the quantum efficiency on device thickness of Type-II InAs/GaSb superlattice photodetectors with a cutoff wavelength around 12 µm. The quantum efficiency and responsivity show a clear delineation in comparison to the device thickness. An external single-pass quantum efficiency of 54% is obtained for a 12 µm cutoff wavelength photodiodes with a -region thickness of 6.0 µm. The R0A value is kept stable for the range of structure thicknesses allowing for a specific detectivity (2.2×1011 cm·Hz½/W). [reprint (PDF)]
 
3.  Optical Investigations of GaAs-GaInP Quantum Wells Grown on the GaAs, InP, and Si Substrates
H. Xiaoguang, M. Razeghi
Applied Physics Letters 61 (14)-- October 5, 1992 ...[Visit Journal]
We report the first photoluminescence investigation of GaAs‐Ga0.51In0.49P lattice matched multiquantum wells grown by the low pressure metalorganic chemical vapor deposition simultaneously in the same run on GaAs, Si, and InP substrates. The sharp photoluminescence peaks indicate the high quality of the samples on three different substrates. The temperature dependence of the photoluminescence indicates that the intrinsic excitonic transitions dominate at low temperature and free‐carrier recombinations at room temperature. The photoluminescence peaks of the samples grown on Si and InP substrates shift about 15 meV from the corresponding peaks of the sample grown on the GaAs substrate. Two possible interpretations are provided for the observed energy shift. One is the diffusion of In along the dislocation threads from GaInP to GaAs and another is the localized strain induced by defects and In segregations. [reprint (PDF)]
 
3.  High operating temperature MWIR photon detectors based on Type-II InAs/GaSb superlattice
M. Razeghi, B.M. Nguyen, P.Y. Delaunay, S. Abdollahi Pour, E.K.W. Huang, P. Manukar, S. Bogdanov, and G. Chen
SPIE Proceedings, San Francisco, CA (January 22-28, 2010), Vol. 7608, p. 76081Q-1-- January 22, 2010 ...[Visit Journal]
Recent efforts have been paid to elevate the operating temperature of Type-II InAs/GaSb superlattice Mid Infrared photon detectors. Optimized growth parameters and interface engineering technique enable high quality material with a quantum efficiency above 50%. Intensive study on device architecture and doping profile has resulted in almost one order of magnitude of improvement to the electrical performance and lifted up the 300 K-background BLIP operation temperature to 166 K. At 77 K, the ~4.2 µm cut-off devices exhibit a differential resistance area product in excess of the measurement system limit (106 Ω·cm²) and a detectivity of 3x1013 cm·Hz½·W−1. High quality focal plane arrays were demonstrated with a noise equivalent temperature of 10 mK at 77 K. Uncooled camera is capable to capture hot objects such as soldering iron. [reprint (PDF)]
 
3.  High Performance InAs/GaSb Superlattice Photodiodes for the Very Long Wavelength Infrared Range
H. Mohseni, M. Razeghi, G.J. Brown, Y.S. Park
Applied Physics Letters 78 (15)-- April 9, 2001 ...[Visit Journal]
We report on the demonstration of high-performance p-i-n photodiodes based on type-II InAs/GaSb superlattices with 50% cut-off wavelength λc = 16 μm operating at 80 K. Material is grown by molecular beam epitaxy on GaSb substrates with excellent crystal quality as evidenced by x-ray diffraction and atomic force microscopy. The processed devices show a current responsivity of 3.5 A/W at 80 K leading to a detectivity of ∼ 1.51×1010 cm·Hz½/W. The quantum efficiency of these devices is about 35% which is comparable to HgCdTe detectors with a similar active layer thickness. [reprint (PDF)]
 
3.  Development of Quantum Cascade Lasers for High Peak Output Power and Low Threshold Current Density
S. Slivken and M. Razeghi
Solid State Electronics 46-- January 1, 2002 ...[Visit Journal]
Design and material optimization are used to both decrease the threshold current density and increase the output power for quantum cascade lasers. Waveguides are designed to try and minimize free-carrier and surface-plasmon absorption. Excellent material characterization is also presented, showing excellent control over layer thickness, interface quality, and doping level. Experiments are done to both optimize the injector doping level and to maximize the output power from a single aperture. At 300 K, a threshold current density as low as 1.8 kA/cm² is reported, along with peak powers of approximately 2.5 W. Strain-balanced lasers are also demonstrated at λnot, vert, similar5 μm, exhibiting threshold current densities<300 A/cm² at 80 K. These values represent the state-of-the-art for mid-infrared lasers with λ>4 μm [reprint (PDF)]
 
3.  High Performance Type-II InAs/GaSb Superlattice Photodiodes
H. Mohseni, Y. Wei, and M. Razeghi
SPIE Conference, San Jose, CA, -- January 22, 2001 ...[Visit Journal]
We report on the demonstration of high performance p-i-n photodiodes based on Type-II InAs/GaSb superlattices operating in the very long wavelength infrared (VLWIR) range at 80 K. Material is grown by molecular beam epitaxy on GaSb substrates with excellent crystal quality as evidenced by x-ray diffraction and atomic force microscopy. The processed devices with a 50% cutoff wavelength of λc equals 22 μm show a peak current responsivity about 5.5 A/W at 80 K. The use of binary layers in the superlattice has significantly enhanced the uniformity and reproducibility of the energy gap. The 90% to 10% cut-off energy width of these devices is on the order of 2 kT which is about four times smaller compared to the devices based on InAs/Ga1-xInxSb superlattices. Similar photovoltaic devices with cut-off wavelengths up to 25 μm have been measured at 80 K. Our experimental results shows excellent uniformity over a three inch wafer area, indicating the possibility of VLWIR focal plane arrays based on Type-II superlattices. [reprint (PDF)]
 
3.  Photoconductance measurements on InTlSb/InSb/GaAs grown by low-pressure metalorganic chemical vapor deposition
P.T. Staveteig, Y.H. Choi, G. Labeyrie, E. Bigan, and M. Razeghi
Applied Physics Letters 64 (4)-- January 24, 1994 ...[Visit Journal]
We report infrared photoconductors based on InTlSb/InSb grown by low‐pressure metalorganic chemical vapor deposition on semi-insulating GaAs substrates. The photoresponse spectrum extends up to 8 μm at 77 K. The absolute magnitude of the photoresponse is measured as a function of bias. The specific detectivity is estimated to be 3×108 Hz½·cm·W-1 at 7 μm wavelength. [reprint (PDF)]
 
3.  AlGaN/AlN MOVPE heteroepitaxy: pulsed co-doping SiH4 and TMIn
Ilkay Demir, Yusuf Koçak, A. Emre Kasapoğlu, Manijeh Razeghi, Emre Gür and Sezai Elagoz
Semicond. Sci. Technol. 34 075028-- June 24, 2019 ...[Visit Journal]
We report a new growth approach pulsed co-doping growth of AlxGa1−xN (x > 0.5) epilayers on AlN/Al2O3 templates by metal organic vapor phase epitaxy (MOVPE). Using this approach SiH4 (silane) and TMIn (trimethylindium) supplied to the growth chamber alternately and pulsed during the growth of AlGaN epilayers. Structural and morphological quality of AlGaN epilayers were investigated by high resolution x-ray diffraction (HR-XRD), atomic force microscopy (AFM), Raman spectroscopy, and scanning electron microscopy (SEM) techniques. It has shown that higher crystalline quality with low full width at half maximum (FWHM) and smoother surface morphology with reduced hexagonal hillock density has been obtained by the pulsed co-doping growth approach. Volcano like hillock structures has been confirmed by Raman mapping. [reprint (PDF)]
 
3.  Antimonide-Based Type II Superlattices: A Superior Candidate for the Third Generation of Infrared Imaging Systems
M. Razeghi, A. Haddadi, A.M. Hoang, G. Chen, S. Bogdanov, S.R. Darvish, F. Callewaert, P.R. Bijjam, and R. McClintock
Journal of ELECTRONIC MATERIALS, Vol. 43, No. 8, 2014-- August 1, 2014 ...[Visit Journal]
Type II superlattices (T2SLs), a system of interacting multiquantum wells,were introduced by Nobel Laureate L. Esaki in the 1970s. Since then, this material system has drawn a lot of attention, especially for infrared detection and imaging. In recent years, the T2SL material system has experienced incredible improvements in material growth quality, device structure design, and device fabrication techniques that have elevated the performance of T2SL-based photodetectors and focal-plane arrays (FPAs) to a level comparable to state-of-the-art material systems for infrared detection and imaging, such as mercury cadmium telluride compounds. We present the current status of T2SL-based photodetectors and FPAs for imaging in different infrared regimes, from short wavelength to very long wavelength, and dual-band infrared detection and imaging, as well as the future outlook for this material system. [reprint (PDF)]
 
3.  New design strategies for multifunctional and inexpensive quantum cascade lasers
Steven Slivken; Manijeh Razeghi
Proc. SPIE 10926, Quantum Sensing and Nano Electronics and Photonics XVI, 1092611-- February 1, 2019 ...[Visit Journal]
This manuscript describes some of the new advances in active mid-infrared photonic integrated circuits enabled by new quantum cascade laser technologies. This includes monolithic beam steering which was achieved via the integration of a widely tunable QCL and a tapered grating outcoupler. A record 17.9 degrees of steering with a low divergence beam (0.5 degrees) was achieved. In addition, the use of surface emitting architectures is proposed as a means to reduce the manufacturing cost of next-generation QCLs. A reflective outcoupler is demonstrated which can allow for stable surface emission from a quantum cascade laser and has potential for cost-effective wafer-scale manufacturing. This outcoupler is integrated with an amplified, electrically tunable laser architecture to demonstrate high power surface emission at a wavelength near 4.9 μm. Single mode peak power up to 6.7 W is demonstrated with >6 W available over a 90 cm−1 (215 nm) spectral range. All of this is achieved while maintaining a high quality output beam, similar to a standard edge emitter. [reprint (PDF)]
 
3.  AlGaN-based deep-ultraviolet 320 x 256 focal plane array
E. Cicek, Z. Vashaei, E.K. Huang, R. McClintock and M. Razeghi
OSA Optics Letters, Vol. 37, No. 5, p. 896-898-- March 1, 2012 ...[Visit Journal]
We report the synthesis, fabrication, and testing of a 320 × 256 focal plane array (FPA) of back-illuminated, solarblind, p-i-n, AlxGa1−xN–based detectors, fully realized within our research laboratory. We implemented a pulse atomic layer deposition technique for the metalorganic chemical vapor deposition growth of thick, high-quality, crack-free, high Al composition AlxGa1−xN layers. The FPA is hybridized to a matching ISC 9809 readout integrated circuit and operated in a SE-IR camera system. Solar-blind operation is observed throughout the array with peak detection occurring at wavelengths of 256 nm and lower, and falling off three orders of magnitude by ∼285 nm. By developing an opaque masking technology, the visible response of the ROIC is significantly reduced; thus the need for external filtering to achieve solar- and visible-blind operation is eliminated. This allows the FPA to achieve high external quantum efficiency (EQE); at 254 nm, average pixels showed unbiased peak responsivity of 75 mA∕W, which corresponds to an EQE of ∼37%. Finally, the uniformity of the FPA and imaging properties are investigated. [reprint (PDF)]
 
3.  Positive and negative luminescence in binary Type-II InAs/GaSb superlattice photodiodes
D. Hoffman and M. Razeghi
SPIE Conference, San Jose, CA, Vol. 6127, pp. 61271H-- January 23, 2006 ...[Visit Journal]
In the present work, we show measurements of both positive and negative luminescence of binary Type-II InAs/GaSb superlattice photodiodes in the 3 to 13 μm spectral range. Through a radiometric calibration technique, we demonstrate temperature independent negative luminescence efficiencies of 45 % in the midwavelength (MWIR) sample from 220 K to 320 K without anti-reflective coating and values reaching 35 % in the long wavelength infrared (LWIR) spectrum sample. [reprint (PDF)]
 
3.  High-performance InAs quantum-dot infrared photodetectors grown on InP substrate operating at room temperature
H. Lim, S. Tsao, W. Zhang, and M. Razeghi
Applied Physics Letters, Vol. 90, No. 13, p. 131112-1-- March 26, 2007 ...[Visit Journal]
The authors report a room temperature operating InAs quantum-dot infrared photodetector grown on InP substrate. The self-assembled InAs quantum dots and the device structure were grown by low-pressure metal-organic chemical vapor deposition. The detectivity was 2.8×1011 cm·Hz1/2/W at 120 K and a bias of −5 V with a peak detection wavelength around 4.1 μm and a quantum efficiency of 35%. Due to the low dark current and high responsivity, a clear photoresponse has been observed at room temperature, which gives a detectivity of 6.7×107 cm·Hz1/2/W. [reprint (PDF)]
 
3.  Type-II superlattice-based extended short-wavelength infrared focal plane array with an AlAsSb/GaSb superlattice etch-stop layer to allow near-visible light detection
Romain Chevallier, Arash Dehzangi, Abbas Haddadi, and Manijeh Razeghi
Optics Letters Vol. 42, Iss. 21, pp. 4299-4302-- October 17, 2017 ...[Visit Journal]
A versatile infrared imager capable of imaging the near-visible to the extended short-wavelength infrared (e-SWIR) is demonstrated using e-SWIR InAs/GaSb/AlSb type-II superlattice-based photodiodes. A bi-layer etch-stop scheme consisting of bulk InAs0.91Sb0.09 and AlAs0.1Sb0.9/GaSb superlattice layers is introduced for substrate removal from the hybridized back-side illuminated photodetectors. The implementation of this new technique on an e-SWIR focal plane array results in a significant enhancement in the external quantum efficiency (QE) in the 1.8–0.8μm spectral region, while maintaining a high QE at wavelengths longer than 1.8μm. Test pixels exhibit 100% cutoff wavelengths of ∼2.1 and ∼2.25μm at 150 and 300K, respectively. They achieve saturated QE values of 56% and 68% at 150 and 300K, respectively, under back-side illumination and without any anti-reflection coating. At 150K, the photodetectors (27μm×27μm area) exhibit a dark current density of 4.7×10−7  A/cm2 under a −50  mV applied bias providing a specific detectivity of 1.77×1012  cm·Hz1/2/W. At 300K, the dark current density reaches 6.6×10−2  A/cm2 under −50 mV bias, providing a specific detectivity of 5.17×109  cm·Hz1/2/W. [reprint (PDF)]
 
2.  Gain-length scaling in quantum dot/quantum well infrared photodetectors
T. Yamanaka, B. Movaghar, S. Tsao, S. Kuboya, A. Myzaferi and M. Razeghi
Applied Physics Letters, Vol. 95, No. 9-- August 31, 2009 ...[Visit Journal]
The gain in quantum dot/quantum well infrared photodetectors is investigated. The scaling of the gain with device length has been analyzed, and the behavior agrees with the previously proposed model. We conclude that we understand the gain in the low bias region, but in the high field region, discrepancies remain. An extension of the gain model is presented to cover the very high electric field region. The high field data are compared to the extended model and discussed. [reprint (PDF)]
 
2.  Mid-wavelength infrared high operating temperature pBn photodetectors based on type-II InAs/InAsSb superlattice
Donghai Wu, Jiakai Li, Arash Dehzangi, and Manijeh Razeghi
AIP Advances 10, 025018-- February 11, 2020 ...[Visit Journal]
A high operating temperature mid-wavelength infrared pBn photodetector based on the type-II InAs/InAsSb superlattice on a GaSb substrate has been demonstrated. At 150 K, the photodetector exhibits a peak responsivity of 1.48 A/W, corresponding to a quantum efficiency of 47% at −50 mV applied bias under front-side illumination, with a 50% cutoff wavelength of 4.4 μm. With an R×A of 12,783 Ω·cm² and a dark current density of 1.16×10−5A/cm² under −50 mV applied bias, the photodetector exhibits a specific detectivity of 7.1×1011 cm·Hz½/W. At 300 K, the photodetector exhibits a dark current density of 0.44 A/cm²and a quantum efficiency of 39%, resultingin a specific detectivity of 2.5×109 cm·Hz½/W. [reprint (PDF)]
 
2.  Negative luminescence of InAs/GaSb superlattice photodiodes
F. Fuchs, D. Hoffman, A. Gin, A. Hood, Y. Wei, and M. Razeghi
Phys. Stat. Sol. C 3 (3)-- February 22, 2006 ...[Visit Journal]
The emission behaviour of InAs/GaSb superlattice photodiodes has been studied in the spectral range between 8 µm and 13 μm. With a radiometric calibration of the experimental set-up the internal quantum efficiency has been determined in the temperature range between 80 K and 300 K for both, the negative and positive luminescence. The quantitative analysis of the internal quantum efficiency of the non-equilibrium radiation enables the determination of the Auger coefficient. [reprint (PDF)]
 
2.  High differential resistance type-II InAs/GaSb superlattice photodiodes for the long-wavelength infrared
A. Hood, D. Hoffman, B.M. Nguyen, P.Y. Delaunay, E. Michel and M. Razeghi
Applied Physics Letters, 89 (9)-- August 28, 2006 ...[Visit Journal]
Type-II InAs/GaSb superlattice photodiodes with a 50% cutoff wavelength ranging from 11 to 13 μm are presented. Optimization of diffusion limited photodiodes provided superlattice structures for improved injection efficiency in direct injection hybrid focal plane array applications. [reprint (PDF)]
 
2.  Comparison of chemical and laser lift-off for the transfer of InGaN-based p-i-n junctions from sapphire to glass substrates
D. J. Rogers ; P. Bove ; F. Hosseini Teherani ; K. Pantzas ; T. Moudakir ; G. Orsal ; G. Patriarche ; S. Gautier ; A. Ougazzaden ; V. E. Sandana ; R. McClintock ; M. Razeghi
Proc. SPIE 8626, Oxide-based Materials and Devices IV, 862611 (March 18, 2013)-- March 18, 2013 ...[Visit Journal]
InGaN-based p-i-n structures were transferred from sapphire to soda-lime glass substrates using two approaches: (1) laser-lift-off (LLO) and thermo-metallic bonding and (2) chemical lift-off (LLO) by means sacrificial ZnO templates and direct wafer bonding. Both processes were found to function at RT and allow reclaim of the expensive single crystal substrate. Both approaches have also already been demonstrated to work for the wafer-scale transfer of III/V semiconductors. Compared with the industry-standard LLO, the CLO offers the added advantages of a lattice match to InGaN with higher indium contents, no need for an interfacial adhesive layer (which facilitates electrical, optical and thermal coupling), no damaged/contaminated GaN surface layer, simplified sapphire reclaim (GaN residue after LLO may complicate reclaim) and cost savings linked to elimination of the expensive LLO process. [reprint (PDF)]
 
2.  Chemical lift-off and direct wafer bonding of GaN/InGaN P-I-N structures grown on ZnO
K. Pantzas, D.J. Rogers, P. Bove, V.E. Sandana, F.H. Teherani, Y. El Gmili, M. Molinari, G. Patriarche, L. Largeau, O. Mauguin, S. Suresh, P.L. Voss, M. Razeghi, A. Ougazzaden
Journal of Crystal Growth, Volume 435, Pages 105-109-- November 7, 2015 ...[Visit Journal]
p-GaN/i-InGaN/n-GaN (PIN) structures were grown epitaxially on ZnO-buffered c-sapphire substrates by metal organic vapor phase epitaxy using the industry standard ammonia precursor for nitrogen. Scanning electron microscopy revealed continuous layers with a smooth interface between GaN and ZnO and no evidence of ZnO back-etching. Energy Dispersive X-ray Spectroscopy revealed a peak indium content of just under 5at% in the active layers. The PIN structure was lifted off the sapphire by selectively etching away the ZnO buffer in an acid and then direct bonded onto a glass substrate. Detailed high resolution transmission electron microscopy and grazing incidence X-ray diffraction studies revealed that the structural quality of the PIN structures was preserved during the transfer process. [reprint (PDF)]
 
2.  Tunability of intersubband absorption from 4.5 to 5.3 µm in a GaN/Al0.2Ga0.8N superlattices grown by metalorganic chemical vapor deposition
N. Péré-Laperne, C. Bayram, L. Nguyen-Thê, R. McClintock, and M. Razeghi
Applied Physics Letters, Vol. 95, No. 13, p. 131109-- September 28, 2009 ...[Visit Journal]
Intersubband (ISB) absorption at wavelengths as long as 5.3 µm is realized in GaN/Al0.2Ga0.8N superlattices grown by metalorganic chemical vapor deposition. By employing low aluminum content Al0.2Ga0.8N barriers and varying the well width from 2.6 to 5.1 nm, ISB absorption has been tuned from 4.5 to 5.3 µm. Theoretical ISB absorption and interband emission models are developed and compared to the experimental results. The effects of band offsets and the piezoelectric fields on these superlattices are investigated. [reprint (PDF)]
 

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