Center for Quantum Devices - Most Downloaded Journal Articles

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18.	Effect of contact doping on superlattice-based minority carrier unipolar detectors B.M. Nguyen, G. Chen, A.M. Hoang, S. Abdollahi Pour, S. Bogdanov, and M. Razeghi Applied Physics Letters, Vol. 99, No. 3, p. 033501-1-- July 18, 2011 ...[Visit Journal] We report the influence of the contact doping profile on the performance of superlattice-based minority carrier unipolar devices for mid-wave infrared detection. Unlike in a photodiode, the space charge in the p-contact of a pMp unipolar device is formed with accumulated mobile carriers, resulting in higher dark current in the device with highly doped p-contact. By reducing the doping concentration in the contact layer, the dark current is decreased by one order of magnitude. At 150 K, 4.9 μm cut-off devices exhibit a dark current of 2 × 10⁻⁵A/cm² and a quantum efficiency of 44%. The resulting specific detectivity is 6.2 × 10¹¹ cm·Hz^1/2/W at 150 K and exceeds 1.9 × 10¹⁴ cm·Hz^1/2/W at 77 K. [reprint (PDF)]
18.	Demonstration of mid-infrared type-II InAs/GaSb superlattice photodiodes grown on GaAs substrate B.M. Nguyen, D. Hoffman, E.K. Huang, S. Bogdanov, P.Y. Delaunay, M. Razeghi and M.Z. Tidrow Applied Physics Letters, Vol. 94, No. 22-- June 8, 2009 ...[Visit Journal] We report the growth and characterization of type-II InAs/GaSb superlattice photodiodes grown on a GaAs substrate. Through a low nucleation temperature and a reduced growth rate, a smooth GaSb surface was obtained on the GaAs substrate with clear atomic steps and low roughness morphology. On the top of the GaSb buffer, a p⁺-i-n⁺ type-II InAs/GaSb superlattice photodiode was grown with a designed cutoff wavelength of 4 μm. The detector exhibited a differential resistance at zero bias (R₀A)in excess of 1600 Ω·cm² and a quantum efficiency of 36.4% at 77 K, providing a specific detectivity of 6 X 10¹¹ cm·Hz^½/W and a background limited operating temperature of 100 K with a 300 K background. Uncooled detectors showed similar performance to those grown on GaSb substrates with a carrier lifetime of 110 ns and a detectivity of 6 X 10⁸ cm·Hz^½/W. [reprint (PDF)]
18.	Molecular Beam Epitaxial Growth of High Quality InSb for p-i-n Photodetectors G. Singh, E. Michel, C. Jelen, S. Slivken, J. Xu, P. Bove, I. Ferguson, and M. Razeghi Journal of Vacuum Science and Technology B, 13 (2)-- March 1, 1995 ...[Visit Journal] The InSb infrared photodetectors grown heteroepitaxially on Si substrates by molecular beam epitaxy (MBE) are reported. Excellent InSb material quality is obtained on 3-inch Si substrates (with a GaAs predeposition) as confirmed by structural, optical, and electrical analysis. InSb infrared photodetectors on Si substrates that can operate from 77 K to room temperature have been demonstrated. The peak voltage-responsitivity at 4 μm is about 1.0×10³ V/W and the corresponding Johnson-noise-limited detectivity is calculated to be 2.8×10¹⁰ cm·Hz^½/W. This is the first important stage in developing InSb detector arrays or monolithic focal plane arrays (FPAs) on silicon. The development of this technology could provide a challenge to traditional hybrid FPA's in the future. [reprint (PDF)]
18.	Top-emission ultraviolet light-emitting diodes with peak emission at 280 nm A. Yasan, R. McClintock, K. Mayes, S.R. Darvish, P. Kung, and M. Razeghi Applied Physics Letters 81 (5)-- July 29, 2002 ...[Visit Journal] We demonstrate light emission at 280 nm from UV light-emitting diodes consisting of AlInGaN/AlInGaN multiple quantum wells. Turn-on voltage of the devices is ~5 V with a differential resistance of ~40 Ω. The peak emission wavelength redshifts ~1 nm at high injection currents. [reprint (PDF)]
18.	Recent advances in IR semiconductor laser diodes and future trends M. Razeghi; Y. Bai; N. Bandyopadhyay; B. Gokden; Q.Y. Lu; S. Slivken Photonics Society Summer Topical Meeting Series, IEEE [6000041], pp. 55-56 (2011)-- July 18, 2011 ...[Visit Journal] The wall plug efficiency of the mid-infrared quantum cascade laser in room temperature continuous wave (cw) operation is brought to 21%, with a maximum output power of 5.1 W. Using a surface grating distributed feedback (DFB) approach, we demonstrated 2.4 W single mode output in room temperature cw operation. With a photonic crystal distributed feedback (PCDFB) design, we achieved single mode spectrum and close to diffraction limited far field with a room temperature high peak power of 34 W. [reprint (PDF)]
18.	Structural, Optical, Electrical and Morphological Study of Transparent p-NiO/n-ZnO Heterojunctions Grown by PLD V. E. Sandana, D. J. Rogers, F. Hosseini Teherani, P. Bove, N. Ben Sedrine, M. R. Correia, T. Monteiro, R. McClintock, and M. Razeghi Proc. SPIE 9364, Oxide-based Materials and Devices VI, 93641O-- March 24, 2015 ...[Visit Journal] NiO/ZnO heterostructures were fabricated on FTO/glass and bulk hydrothermal ZnO substrates by pulsed laser deposition. X-Ray diffraction and Room Temperature (RT) Raman studies were consistent with the formation of (0002) oriented wurtzite ZnO and (111) oriented fcc NiO. RT optical transmission studies revealed bandgap energy values of ~3.70 eV and ~3.30 eV for NiO and ZnO, respectively and more than 80% transmission for the whole ZnO/NiO/FTO/glass stack over the majority of the visible spectrum. Lateral p-n heterojunction mesas (~6mm x 6mm) were fabricated using a shadow mask during PLD growth. n-n and p-p measurements showed that Ti/Au contacting gave an Ohmic reponse for the NiO, ZnO and FTO. Both heterojunctions had rectifying I/V characteristics. The junction on FTO/glass gave forward bias currents (243mA at +10V) that were over 5 orders of magnitude higher than those for the junction formed on bulk ZnO. At ~ 10^-7 A (for 10V of reverse bias) the heterojunction leakage current was approximately two orders of magnitude lower on the bulk ZnO substrate than on FTO. Overall, the lateral p-NiO/n-ZnO/FTO/glass device proved far superior to that formed by growing p-NiO directly on the bulk n-ZnO substrate and gave a combination of electrical performance and visible wavelength transparency that could predispose it for use in various third generation transparent electronics applications. [reprint (PDF)]
18.	Engineering future light emitting diodes and photovoltaics with inexpensive materials: Integrating ZnO and Si into GaN-based devices C. Bayram ; K. T. Shiu ; Y. Zhu ; C. W. Cheng ; D. K. Sadana ; F. H. Teherani ; D. J. Rogers ; V. E. Sandana ; P. Bove ; Y. Zhang ; S. Gautier ; C.-Y. Cho ; E. Cicek ; Z. Vashaei ; R. McClintock ; M. Razeghi Proc. SPIE 8626, Oxide-based Materials and Devices IV, 86260L (March 18, 2013)-- March 18, 2013 ...[Visit Journal] Indium Gallium Nitride (InGaN) based PV have the best fit to the solar spectrum of any alloy system and emerging LED lighting based on InGaN technology and has the potential to reduce energy consumption by nearly one half while enabling significant carbon emission reduction. However, getting the maximum benefit from GaN diode -based PV and LEDs will require wide-scale adoption. A key bottleneck for this is the device cost, which is currently dominated by the substrate (i.e. sapphire) and the epitaxy (i.e. GaN). This work investigates two schemes for reducing such costs. First, we investigated the integration of Zinc Oxide (ZnO) in InGaN-based diodes. (Successful growth of GaN on ZnO template layers (on sapphire) was illustrated. These templates can then be used as sacrificial release layers for chemical lift-off. Such an approach provides an alternative to laser lift-off for the transfer of GaN to substrates with a superior cost-performance profile, plus an added advantage of reclaiming the expensive single-crystal sapphire. It was also illustrated that substitution of low temperature n-type ZnO for n-GaN layers can combat indium leakage from InGaN quantum well active layers in inverted p-n junction structures. The ZnO overlayers can also double as transparent contacts with a nanostructured surface which enhances light in/out coupling. Thus ZnO was confirmed to be an effective GaN substitute which offers added flexibility in device design and can be used in order to simultaneously reduce the epitaxial cost and boost the device performance. Second, we investigated the use of GaN templates on patterned Silicon (100) substrates for reduced substrate cost LED applications. Controlled local metal organic chemical vapor deposition epitaxy of cubic phase GaN with on-axis Si(100) substrates was illustrated. Scanning electron microscopy and transmission electron microscopy techniques were used to investigate uniformity and examine the defect structure in the GaN. Our results suggest that groove structures are very promising for controlled local epitaxy of cubic phase GaN. Overall, it is concluded that there are significant opportunities for cost reduction in novel hybrid diodes based on ZnO-InGaN-Si hybridization. [reprint (PDF)]
18.	Bias-selectable three-color short-, extended-short-, and mid-wavelength infrared photodetectors based on type-II InAs/GaSb/AlSb superlattices Abbas Haddadi, and Manijeh Razeghi Optics Letters Vol. 42, Iss. 21, pp. 4275-4278-- October 16, 2017 ...[Visit Journal] A bias-selectable, high operating temperature, three-color short-, extended-short-, and mid-wavelength infrared photodetector based on InAs/GaSb/AlSb type-II superlattices on GaSb substrate has been demonstrated. The short-, extended-short-, and mid-wavelength channels’ 50% cutoff wavelengths were 2.3, 2.9, and 4.4μm, respectively, at 150K. The mid-wavelength channel exhibited a saturated quantum efficiency of 34% at 4μm under +200 mV bias voltage in a front-side illumination configuration and without any antireflection coating. At 200mV, the device exhibited a dark current density of 8.7×10⁻⁵ A/cm² providing a specific detectivity of ∼2×10¹¹ cm·Hz^1/2/W at 150K. The short-wavelength channel achieved a saturated quantum efficiency of 20% at 1.8μm. At −10 mV, the device’s dark current density was 5.5×10⁻⁸ A/cm². At zero bias, its specific detectivity was 1×10¹¹ cm·Hz^1/2/W at 150K. The extended short-wavelength channel achieved a saturated quantum efficiency of 22% at 2.75 μm. Under −2 V bias voltage, the device exhibited a dark current density of 1.8×10⁻⁶ A/cm² providing a specific detectivity of 6.3×10¹¹ cm·Hz^1/2/W at 150K. [reprint (PDF)]
18.	Thermal stability of GaN thin films grown on (0001) Al₂O₃, (0112) Al₂O₃ and (0001)Si 6H-SiC substrates C.J. Sun, P. Kung, A. Saxler, H. Ohsato, E. Bigan, M. Razeghi, and D.K. Gaskill Journal of Applied Physics 76 (1)-- July 1, 1994 ...[Visit Journal] Single crystals of GaN were grown on (0001), (0112) Al₂O₃ and (0001)Si 6H‐SiC substrates using an atmospheric pressure metalorganic chemical‐vapor‐deposition reactor. The relationship has been studied between the thermal stability of the GaN films and the substrate’s surface polarity. It appeared that the N‐terminated (0001) GaN surface grown on (0001)Si 6H‐SiC has the most stable surface, followed by the nonpolar (1120) GaN surface grown on (0112) Al₂O₃, while the Ga‐terminated (0001) GaN surface grown on (0001) Al₂O₃ has the least stable surface. This is explained with the difference in the atomic configuration of each of these surfaces which induces a difference in their thermal decomposition. [reprint (PDF)]
18.	Fabrication of GaN nanotubular material using MOCVD with aluminum oxide membrane W.G. Jung, S.H. Jung, P. Kung, and M. Razeghi SPIE Conference, San Jose, CA, Vol. 6127, pp. 61270K-- January 23, 2006 ...[Visit Journal] GaN nanotubular material is fabricated with aluminum oxide membrane in MOCVD. SEM, XRD, TEM and PL are employed to characterize the fabricated GaN nanotubular material. An aluminum oxide membrane with ordered nano holes is used as template. Gallium nitride is deposited at the inner wall of the nano holes in aluminum oxide template, and the nanotubular material with high aspect ratio is synthesized using the precursors of TMG and ammonia gas. Optimal synthesis condition in MOCVD is obtained successfully for the gallium nitride nanotubular material in this research. The diameter of GaN nanotube fabricated is approximately 200 ~ 250 nm and the wall thickness is about 40 ~ 50 nm. GaN nanotubular material consists of numerous fine GaN particulates with sizes ranging 15 to 30 nm. [reprint (PDF)]
18.	Characteristics of Self-Assembled InGaAs/InGaP Quantum Dot Mid-Infrared Photoconductive Detectors Grown by Low Pressure MOCVD S. Kim, M. Erdtmann, and M. Razeghi SPIE Conference, San Jose, CA, -- January 27, 1999 ...[Visit Journal] We report the first self-assembled InGaAs/InGaP quantum dot intersubband infrared photoconductive detectors (QDIPs) grown on semi-insulating GaAs substrate by low pressure metal organic chemical vapor deposition (MOCVD). The InGaAs quantum dots were constructed on an InGaP matrix as self assembling in Stranski-Krastanow growth mode in optimum growth conditions. The detector structure was prepared for single layer and multi-stacked quantum dots for active region. Normal incident photoconductive response was observed at a peak wavelength of 5.5 μm with a high responsivity of 130 mA/W, and a detectivity of 4.74 X 10⁷ cm·Hz^½/W at 77 K for multi-stack QDIP. Low temperature photoresponse of the single quantum dot photodetector was characterized. Peak response was obtained between 16 K and 60 K. The detailed dark current noise measurements were carried on single and multistack quantum dot infrared detectors. High photoconductive gain as 7.6 x 10³ biased at 0.5 V results in increasing the intersubband carrier relaxation time as two order of magnitude compared quantum well infrared photodetectors. [reprint (PDF)]
18.	High performance Type-II InAs/GaSb superlattices for mid, long, and very long wavelength infrared focal plane arrays M. Razeghi, Y. Wei, A. Gin, A. Hood, V. Yazdanpanah, M.Z. Tidrow, and V. Nathan SPIE Conference, Orlando, FL, Vol. 5783, pp. 86-- March 28, 2005 ...[Visit Journal] We present our most recent results and review our progress over the past few years regarding InAs/GaSb Type-II superlattices for photovoltaic detectors and focal plane arrays. Empirical tight binding methods have been proven to be very effective and accurate in designing superlattices for various cutoff wavelengths from 3.7 µm up to 32 µm. Excellent agreement between theoretical calculations and experimental results has been obtained. High quality material growths were performed using an Intevac modular Gen II molecular beam epitaxy system. The material quality was characterized using x-ray, atomic force microscopy, transmission electron microscope and photoluminescence, etc. Detector performance confirmed high material electrical quality. Details of the demonstration of 256×256 long wavelength infrared focal plane arrays are presented. [reprint (PDF)]
18.	320x256 Solar-Blind Focal Plane Arrays based on Al_xGa_1-xN R. McClintock, K. Mayes, A. Yasan, D. Shiell, P. Kung, and M. Razeghi Applied Physics Letters, 86 (1)-- January 3, 2005 ...[Visit Journal] We report AlGaN-based back-illuminated solar-blind ultraviolet focal plane arrays operating at a wavelength of 280 nm. The electrical characteristics of the individual pixels are discussed, and the uniformity of the array is presented. The p–i–n photodiode array was hybridized to a 320×256 read-out integrated circuit entirely within our university research lab, and a working 320×256 camera was demonstrated. Several example solar-blind images from the camera are also provided. [reprint (PDF)]
18.	Antimonide-Based Type II Superlattices: A Superior Candidate for the Third Generation of Infrared Imaging Systems M. Razeghi, A. Haddadi, A.M. Hoang, G. Chen, S. Bogdanov, S.R. Darvish, F. Callewaert, P.R. Bijjam, and R. McClintock Journal of ELECTRONIC MATERIALS, Vol. 43, No. 8, 2014-- August 1, 2014 ...[Visit Journal] Type II superlattices (T2SLs), a system of interacting multiquantum wells,were introduced by Nobel Laureate L. Esaki in the 1970s. Since then, this material system has drawn a lot of attention, especially for infrared detection and imaging. In recent years, the T2SL material system has experienced incredible improvements in material growth quality, device structure design, and device fabrication techniques that have elevated the performance of T2SL-based photodetectors and focal-plane arrays (FPAs) to a level comparable to state-of-the-art material systems for infrared detection and imaging, such as mercury cadmium telluride compounds. We present the current status of T2SL-based photodetectors and FPAs for imaging in different infrared regimes, from short wavelength to very long wavelength, and dual-band infrared detection and imaging, as well as the future outlook for this material system. [reprint (PDF)]
18.	High power photonic crystal distributed feedback quantum cascade lasers emitting at 4.5 micron B. Gokden, S. Slivken and M. Razeghi SPIE Proceedings, San Francisco, CA (January 22-28, 2010), Vol. 7608, p. 760806-1-- January 22, 2010 ...[Visit Journal] Quantum cascade lasers possess very small linewidth enhancement factor, which makes them very prominent candidates for realization of high power, nearly diffraction limited and single mode photonic crystal distributed feedback broad area lasers in the mid-infrared frequencies. In this paper, we present room temperature operation of a two dimensional photonic crystal distributed feedback quantum cascade laser emitting at 4.5 µm. peak power up to ~0.9 W per facet is obtained from a 2 mm long laser with 100 µm cavity width at room temperature. The observed spectrum is single mode with a very narrow linewidth. Far-field profile has nearly diffraction limited single lobe with full width at half maximum of 3.5 degree normal to the facet. The mode selection and power output relationships are experimentally established with respect to different cavity lengths for photonic crystal distributed feedback quantum cascade lasers. [reprint (PDF)]
18.	Status of III-V semiconductor thin films and their applications to future OEICs Manijeh Razeghi Proc. SPIE 10267, Integrated Optics and Optoelectronics, 102670T -- June 26, 2017 ...[Visit Journal] In the last decade, semiconductor technology has been advanced to a great extent in terms of electronic and photonic discrete devices. One of the main reasons for such a progress, is the result of advancement in the epitaxial growth techniques such as molecular beam epitaxy (MBE) and metalorganic chemical vapor deposition (MOCVD), where device quality films can be grown with great control over composition, uniformity and thickness. MOCVD has proven to be one of the best growth methods for many IH-V semiconductor thin films 1. Its flexibility and potential to yield a broad range of growth rates resulted in the layers featuring the thicknesses from tens of microns down to several nanometers. Planar structures containing quantum wells with atomically flat interfaces, superlattices, strained or graded-index layers were successfully grown by MOCVD. Furthermore, MOCVD proved its efficiency in producing a laser devices by overgrowth and epitaxy on patterned substrates. The importance of MOCVD is strongly enhanced by the possibility of large-scale production by simultaneous growth on several substrates in one process. Several III-V semiconductor films with bandgaps ranging from infrared to ultraviolet (15 to 0.2 μm) have been successfully grown by MOCVD. [reprint (PDF)]
18.	Type-II superlattice dual-band LWIR imager with M-barrier and Fabry-Perot resonance E.K. Huang, A. Haddadi, G. Chen, B.M. Nguyen, M.A. Hoang, R. McClintock, M. Stegall, and M. Razeghi OSA Optics Letters, Vol. 36, No. 13, p. 2560-2562-- July 1, 2011 ...[Visit Journal] We report a high performance long-wavelength IR dual-band imager based on type-II superlattices with 100% cutoff wavelengths at 9.5 μm (blue channel) and 13 μm (red channel). Test pixels reveal background-limited behavior with specific detectivities as high as ∼5×10¹¹ Jones at 7.9 μm in the blue channel and ∼1×10¹¹ Jones at 10.2 μm in the red channel at 77 K. These performances were attributed to low dark currents thanks to the M-barrier and Fabry–Perot enhanced quantum efficiencies despite using thin 2 μm absorbing regions. In the imager, the high signal-to-noise ratio contributed to median noise equivalent temperature differences of ∼20 mK for both channels with integration times on the order of 0.5 ms, making it suitable for high speed applications. [reprint (PDF)]
18.	Comparison of type-II superlattice and HgCdTe infrared detector technologies Jagmohan Bajaj; Gerry Sullivan; Don Lee; Ed Aifer; Manijeh Razeghi Proc. SPIE 6542, Infrared Technology and Applications XXXIII, 65420B (May 14, 2007)-- May 14, 2007 ...[Visit Journal] Performance of HgCdTe detector technology surpasses all others in the mid-wave and long-wave infrared spectrum. This technology is relatively mature with current effort focused on improving uniformity, and demonstrating increased focal plane array (FPA) functionality. Type-II superlattice (InAs-GaSb and related alloys) detector technology has seen rapid progress over the past few years. The merits of the superlattice material system rest on predictions of even higher performance than HgCdTe and of engineering advantages. While no one has demonstrated Type-II superlattice detectors with performance superior to HgCdTe detectors, the difference in performance between these two technologies is decreasing. In this paper, we review the status and highlight relative merits of both HgCdTe and Type-II superlattice based detector technologies. [reprint (PDF)]
18.	Dark current suppression in Type-II InAs/GaSb superlattice long wavelength infrared photodiodes with M-structure barrier B.M. Nguyen, D. Hoffman, P.Y. Delaunay, and M. Razeghi Applied Physics Letters, Vol. 91, No. 16, p. 163511-1-- October 15, 2007 ...[Visit Journal] We presented an alternative design of Type-II superlattice photodiodes with the insertion of a mid-wavelength infrared M-structure AlSb/GaSb/InAs/GaSb/AlSb superlattice for the reduction of dark current. The M-structure superlattice has a larger carrier effective mass and a greater band discontinuity as compared to the standard Type-II superlattices at the valence band. It acts as an effective medium that weakens the diffusion and tunneling transport at the depletion region. As a result, a 10.5 µm cutoff Type-II superlattice with 500 nm M-superlattice barrier exhibited a R₀A of 200 cm² at 77 K, approximately one order of magnitude higher than the design without the barrier. The quantum efficiency of such structures does not show dependence on either barrier thickness or applied bias. [reprint (PDF)]
18.	High Power Mid-Infrared Quantum Cascade Lasers Grown on Si Steven Slivken, Nirajman Shrestha, and Manijeh Razeghi Photonics, vol. 9, 626 ...[Visit Journal] This article details the demonstration of a strain-balanced, InP-based mid-infrared quantum cascade laser structure that is grown directly on a Si substrate. This is facilitated by the creation of a metamorphic buffer layer that is used to convert from the lattice constant of Si (0.543 nm) to that of InP (0.587 nm). The laser geometry utilizes two top contacts in order to be compatible with future large-scale integration. Unlike previous reports, this device is capable of room temperature operation with up to 1.6 W of peak power. The emission wavelength at 293 K is 4.82 um, and the device operates in the fundamental transverse mode. [reprint (PDF)]
18.	Optimized structure for InGaAsP/GaAs 808nm high power lasers H. Yi, J. Diaz, L.J. Wang, I. Eliashevich, S. Kim, R. Williams, M. Erdtmann, X. He, E. Kolev and M. Razeghi Applied Physics Letters 66 (24)-- June 12, 1995 ...[Visit Journal] The optimized structure for the InGaAsP/GaAs quaternary material lasers (λ=0.808 μm) is investigated for the most efficient high‐power operation through an experiment and theoretical study. A comparative study is performed of threshold current density J_th and differential efficiency η_d dependence on cavity length (L) for two different laser structures with different active layer thickness (150 and 300 Å) as well as for laser structures with different multiple quantum well structures. A theoretical model with a more accurate formulation for minority leakage phenomenon provides explanation for the experimental results and sets general optimization rules for other lasers with similar restrictions on the band gap and refractive index difference between the active layer and the cladding layers. [reprint (PDF)]
18.	Growth and characterization of InSbBi for long wavelength infrared photodetectors J.J. Lee, J.D. Kim, and M. Razeghi Applied Physics Letters 70 (24)-- June 16, 1997 ...[Visit Journal] The epitaxial growth of InSbBi ternary alloys by low-pressure metalorganic chemical vapor deposition is reported on. X-ray diffraction spectra showed well resolved peaks of InSbBi and InSb films. Bi incorporation was confirmed by energy dispersive x-ray analysis. Photoresponse spectrum up to 9.3 μm which corresponds to 0.13 eV energy band gap has been measured in a sample with Bi composition of 5.8 at.% at 77 K. Electron mobility at room temperature ranges from 44 100 to 4910 cm²/V·s as Bi composition increases. [reprint (PDF)]
18.	Crack-free AlGaN for solar-blind focal plane arrays through reduced area expitaxy E. Cicek, R. McClintock, Z. Vashaei, Y. Zhang, S. Gautier, C.Y. Cho and M. Razeghi Applied Physics Letters, Vol. 102, No. 05, p. 051102-1-- February 4, 2013 ...[Visit Journal] We report on crack reduction for solar-blind ultraviolet detectors via the use of a reduced area epitaxy (RAE) method to regrow on patterned AlN templates. With the RAE method, a pre-deposited AlN template is patterned into isolated mesas in order to reduce the formation of cracks in the subsequently grown high Al-content Al_xGa_1−xN structure. By restricting the lateral dimensions of the epitaxial growth area, the biaxial strain is relaxed by the edges of the patterned squares, which resulted in ∼97% of the pixels being crack-free. After successful implementation of RAE method, we studied the optical characteristics, the external quantum efficiency, and responsivity of average pixel-sized detectors of the patterned sample increased from 38% and 86.2 mA/W to 57% and 129.4 mA/W, respectively, as the reverse bias is increased from 0 V to 5 V. Finally, we discussed the possibility of extending this approach for focal plane array, where crack-free large area material is necessary for high quality imaging. [reprint (PDF)]
18.	Low Dark Current Deep UV AlGaN Photodetectors on AlN Substrate Lakshay Gautam, Junhee Lee, Gail Brown, Manijeh Razeghi IEEE Journal of Quantum Electronics, vol. 58, no. 3, pp. 1-5, June 2022, Art no. 4000205 ...[Visit Journal] We report high quality, low dark current, deep Ultraviolet AlGaN/AlN Photodetectors on AlN substrate. AlGaN based Photodetectors are grown and fabricated both on AlN and Sapphire substrates with the same epilayer structure. Subsequently, electrical characteristics of both photodetectors on AlN substrate and Sapphire are compared. A reduction of 4 orders of magnitude of dark current density is reported in UV detectors grown on AlN substrate with respect to Sapphire substrate. [reprint (PDF)]
18.	Pulse Autocorrelation Measurements Based on Two- and Three-Photon Conductivity in a GaN Photodiode A. Streltsov, K.D. Moll, A. Gaeta, P. Kung, D. Walker, and M. Razeghi Applied Physics Letters 75 (24)-- December 13, 1999 ...[Visit Journal] We characterize the performance of a GaN p-i-n photodiode as a nonlinear sensor for second- and third-order femtosecond pulse autocorrelation measurements in the visible and near-infrared regimes, respectively. The two- and three-photon absorption coefficients for GaN are also determined. [reprint (PDF)]

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