Center for Quantum Devices - Most Downloaded Journal Articles

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17.	High-performance short-wavelength infrared photodetectors based on type-II InAs/InAs1-xSbx/AlAs1-xSbx superlattices A. Haddadi, X.V. Suo, S. Adhikary, P. Dianat, R. Chevallier, A.M. Hoang, and M. Razeghi Applied Physics Letters 107 , 141104-- October 5, 2015 ...[Visit Journal] A high-performance short-wavelength infrared n-i-p photodiode based on InAs/InAs1-xSbx/AlAs1-xSbx type-II superlattices on GaSb substrate has been demonstrated. The device is designed to have a 50% cut-off wavelength of ~1.8μm at 300K. The photodetector exhibited a room-temperature (300 K) peak responsivity of 0.47 A/W at 1.6μm, corresponding to a quantum efficiency of 37% at zero bias under front-side illumination, without any anti-reflection coating. With an R×A of 285 Ω·cm² and a dark current density of 9.6×10^-5 A/cm² under −50mV applied bias at 300 K, the photodiode exhibited a specific detectivity of 6.45×10¹⁰ cm·Hz^½/W. At 200 K, the photodiode exhibited a dark current density of 1.3×10^-8 A/cm² and a quantum efficiency of 36%, resulting in a detectivity of 5.66×10¹² cm·Hz^½/W. [reprint (PDF)]
17.	Quantum cascade lasers that emit more light than heat Y. Bai, S. Slivken, S. Kuboya, S.R. Darvish and M. Razeghi Nature Photonics, February 2010, Vol. 4, p. 99-102-- February 1, 2010 ...[Visit Journal] For any semiconductor lasers, the wall plug efficiency, that is, the portion of the injected electrical energy that can be converted into output optical energy, is one of the most important figures of merit. A device with a higher wall plug efficiency has a lower power demand and prolonged device lifetime due to its reduced self-heating. Since its invention, the power performance of the quantum cascade laser has improved tremendously. However, although the internal quantum efficiency can be engineered to be greater than 80% at low temperatures, the wall plug efficiency of a quantum cascade laser has never been demonstrated above 50% at any temperature. The best wall plug efficiency reported to date is 36% at 120 K. Here, we overcome the limiting factors using a single-well injector design and demonstrate 53% wall plug efficiency at 40 K with an emitting wavelength of 5 µm. In other words, we demonstrate a quantum cascade laser that produces more light than heat. [reprint (PDF)]
17.	High power InAsSb/InPAsSb/InAs mid-infrared lasers A. Rybaltowski, Y. Xiao, D. Wu, B. Lane, H. Yi, H. Feng, J. Diaz, and M. Razeghi Applied Physics Letters 71 (17)-- October 27, 1997 ...[Visit Journal] We demonstrate high-power InAsSb/InPAsSb laser bars (λ ≈ 3.2 μm) consisting of three 100 μm-wide laser stripes of 700 μm cavity length, with peak output power up to 3 W at 90 K, and far-fields for the direction perpendicular to the junction as narrow as 12° full width half maximum. Spectra and far-field patterns of the laser bars are shown to have excellent characteristics for a wide range of operating conditions, suggesting the possibility of even higher light power emission with good beam quality. Joule heating is shown to be the major factor limiting higher power operation. [reprint (PDF)]
17.	Growth of InAsSb Alloys on GaAs and Si Substrates for Uncooled Infrared Photodetector Applications J.D. Kim, H. Mohseni, J.S. Wojkowski, J.J. Lee and M. Razeghi SPIE Conference, San Jose, CA, -- January 27, 1999 ...[Visit Journal] In this paper, we report on the growth and characterization of InAsSb alloys on GaAs and Si substrates for uncooled infrared photodetector applications. The fabrication and characterization of photodetectors from the grown layers are also reported. The photovoltaic and photoconductive devices were grown on (100) GaAs and Si substrates, respectively, using molecular beam epitaxy (MBE). The composition of InAs>sub>1-xSb_x layers was 0.95 in both cases and cut-off wavelength of 7-8 μm has been obtained. At 300 K, the photovoltaic detectors on GaAs substrates resulted in a sharp cut-off wavelength of 7.5 μm with a peak responsivity as high as 0.32 V/W at 6.5 micrometer. For the photoconductive detectors on Si substrates, cut-off wavelength of 8 μm has been observed with a responsivity of 6.3x10^-2 V/W at 7 μm under an electric field of 420 V/m. [reprint (PDF)]
17.	Focal plane arrays based on quantum dot infrared photodetectors Manijeh Razeghi; Wei Zhang; Ho-Chul Lim; Stanley Tsao; John Szafraniec; Maho Taguchi; Bijan Movaghar Proc. SPIE 5838, Nanotechnology II, 125 (June 28, 2005);-- June 28, 2005 ...[Visit Journal] Here we report the first demonstrations of infrared focal plane array (FPA) based on GaAs and InP based quantum dot infrared photodetectors (QDIPs). QDIPs are extension of quantum well infrared photodetectors (QWIPs) and are predicted to outperform QWIPs due to their potential advantages including normally incident absorption, higher responsivity and high temperature operation. Two material systems have been studied: InGaAs/InGaP QDIPs on GaAs substrates and InAs QDIP on InP substrates. An InGaAs/InGaP QDIP has been grown on GaAs substrate by LP-MOCVD. Photoresponse was observed at temperatures up to 200 K with a peak wavelength of 4.7 μm and cutoff wavelength of 5.2 μm. A detectivity of 1.2x10¹¹ cm·Hz^1/2/W was obtained at T=77 K and bias of -0.9 V, which is the highest for QDIPs grown by MOCVD. An InAs QDIP structure has also been grown on InP substrate by LP-MOCVD. Photoresponse of normal incidence was observed at temperature up to 160K with a peak wavelength of 6.4 μm and cutoff wavelength of 6.6 μm. A detectivity of 1.0x10¹⁰ cm·Hz^1/2/W was obtained at 77K at biases of -1.1 V, which is the first and highest detectivity reported for QDIP on InP substrate. 256×256 detector arrays were fabricated first time in the world for both the GaAs and InP based QDIPs. Dry etching and indium bump bonding were used to hybridize the arrays to a Litton readout integrated circuit. For the InGaAs/InGaP QDIP FPA, thermal imaging was achieved at temperatures up to 120 K. At T=77K, the noise equivalent temperature difference (NEDT) was measured as 0.509K with a 300K background and f/2.3 optics. For the InP based QDIPs, thermal imaging was achieved at 77 K. [reprint (PDF)]
17.	Growth and characterization of InP using metalorganic chemical vapor deposition at reduced pressure M. Razeghi, J.P. Duchemin M. Razeghi, J.P. Duchemin, Growth and characterization of InP using metalorganic chemical vapor deposition at reduced pressure, Journal of Crystal Growth, Volume 64, Issue 1, 1983, Pages 76-82,-- November 1, 1983 ...[Visit Journal] M. Razeghi, J.P. Duchemin, Growth and characterization of InP using metalorganic chemical vapor deposition at reduced pressure, Journal of Crystal Growth, Volume 64, Issue 1, 1983, Pages 76-82, [reprint (PDF)]
17.	Semiconductor ultraviolet detectors M. Razeghi and A. Rogalski SPIE Photonics West '96 Photodetectors: Materials and Devices; Proceedings 2685-- January 27, 1996 ...[Visit Journal] This paper presents an overview of semiconductor ultraviolet (UV) detectors that are currently available and associated technologies that are undergoing further development. At the beginning, the classification of UV detectors and general requirements imposed on these detectors are presented. Further consideration are restricted to modern semiconductor UV detectors, so the current state-of-the-art of different types of semiconductor UV detectors is presented. Hitherto, the semiconductor UV detectors have been mainly fabricated using Si. Industries such as the aerospace, automotive, petroleum, and others have continuously provided the impetus pushing the development of fringe technologies which are tolerant of increasingly high temperatures and hostile environments. As a result, the main effort are currently directed to a new generation of UV detectors fabricated from wide-band-gap semiconductors between them the most promising are diamond and AlGaN. The latest progress in development of AlGaN UV detectors is finally described in detail. [reprint (PDF)]
17.	A lifetime of contributions to the world of semiconductors using the Czochralski invention M. Razeghi Vacuum Vol. 9934, 993406-1-- February 8, 2017 ...[Visit Journal] Over the course of my career, I have made numerous contributions related to semiconductor crystal growth and high performance optoelectronics over a vast region of the electromagnetic spectrum (ultraviolet to terahertz). In 2016 this cumulated in my receiving the Jan Czochralski Gold Medal award from the European Materials Research Society. This article is designed to provide a historical perspective and general overview of these scientific achievements, on the occasion of being honored by this award. These achievements would not have been possible without high quality crystalline substrates, and this article is written in honor of Jan Czochralski on the 100th anniversary of his important discovery. [reprint (PDF)]
17.	Room-temperature continuous-wave operation of quantum-cascade lasers at λ ~ 4 µm J.S. Yu, S.R. Darvish, A. Evans, J. Nguyen, S. Slivken, and M. Razeghi Applied Physics Letters 88 (4)-- January 23, 2006 ...[Visit Journal] High-power cw λ~4 μm quantum-cascade lasers (QCLs) are demonstrated. The effect of different cavity length and laser die bonding is also investigated. For a high-reflectivity-coated 11-μm-wide and 4-mm-long epilayer-down bonded QCL, cw output powers as high as 1.6 W at 80 K and 160 mW at 298 K are obtained, and the cw operation is achieved up to 313 K with 12 mW. [reprint (PDF)]
17.	Low-threshold and high power (~9.0 μm) quantum cascade lasers operating at room temperature A. Matlis, S. Slivken, A. Tahraoui, K.J. Luo, J. Diaz, Z. Wu, A. Rybaltowski, C. Jelen, and M. Razeghi Applied Physics Letters 77 (12)-- September 18, 2000 ...[Visit Journal] We report a low threshold current density and high power for λ ∼ 9 μm AlInAs/GaInAs quantum cascade lasers operating at room temperature. The threshold current density is 1.95 kA/cm² at 300 K and 0.61 kA/cm² at 80 K for 5 μs pulses at 200 Hz repetition rate. The peak output power is 700 mW at room temperature and 1.3 W at 80 K per two facets for cavity length is 3 mm with a stripe width of 20 μm. The characteristic temperature T₀ is 185 °C. The slope efficiency is 450 and 800 mW/A at 300 and 80 K, respectively. In continuous wave operation, the output power is more than 150 mW at 80 K and 25 mW at 140 K. This high performance was achieved by improving the material growth and processing technology. [reprint (PDF)]
17.	Fabrication of GaN nanotubular material using MOCVD with aluminum oxide membrane W.G. Jung, S.H. Jung, P. Kung, and M. Razeghi SPIE Conference, San Jose, CA, Vol. 6127, pp. 61270K-- January 23, 2006 ...[Visit Journal] GaN nanotubular material is fabricated with aluminum oxide membrane in MOCVD. SEM, XRD, TEM and PL are employed to characterize the fabricated GaN nanotubular material. An aluminum oxide membrane with ordered nano holes is used as template. Gallium nitride is deposited at the inner wall of the nano holes in aluminum oxide template, and the nanotubular material with high aspect ratio is synthesized using the precursors of TMG and ammonia gas. Optimal synthesis condition in MOCVD is obtained successfully for the gallium nitride nanotubular material in this research. The diameter of GaN nanotube fabricated is approximately 200 ~ 250 nm and the wall thickness is about 40 ~ 50 nm. GaN nanotubular material consists of numerous fine GaN particulates with sizes ranging 15 to 30 nm. [reprint (PDF)]
17.	Material and design engineering of (Al)GaN for high-performance avalanche photodiodes and intersubband applications M. Razeghi and C. Bayram SPIE Proceedings, Dresden, Germany (May 4-6, 2009), Vol. 7366, p. 73661F-1-- May 20, 2009 ...[Visit Journal] Numerous applications in scientific, medical, and military areas demand robust, compact, sensitive, and fast ultraviolet (UV) detection. Our (Al)GaN photodiodes pose high avalanche gain and single-photon detection efficiency that can measure up to these requirements. Inherit advantage of back-illumination in our devices offers an easier integration and layout packaging via flip-chip hybridization for UV focal plane arrays that may find uses from space applications to hostile-agent detection. Thanks to the recent (Al)GaN material optimization, III-Nitrides, known to have fast carrier dynamics and short relaxation times, are employed in (Al)GaN based superlattices that absorb in near-infrared regime. In this work, we explain the origins of our high performance UV APDs, and employ our (Al)GaN material knowledge for intersubband applications. We also discuss the extension of this material engineering into the far infrared, and even the terahertz (THz) region. [reprint (PDF)]
17.	High performance antimony based type-II superlattice photodiodes on GaAs substrates B.M. Nguyen, D. Hoffman, E.K. Huang, P.Y. Delaunay, and M. Razeghi SPIE Porceedings, Vol. 7298, Orlando, FL 2009, p. 72981T-- April 13, 2009 ...[Visit Journal] In recent years, Type-II InAs/GaSb superlattices grown on GaSb substrate have achieved significant advances in both structural design and material growth, making Type-II superlattice infrared detector a rival competitor to the state-of-the-art MCT technology. However, the limited size and strong infrared absorption of GaSb substrates prevent large format type-II superlattice infrared imagers from being realized. In this work, we demonstrate type-II superlattices grown on GaAs substrates, which is a significant step toward third generation infrared imaging at low cost. The device performances of Type-II superalttice photodetectors grown on these two substrates are compared. [reprint (PDF)]
17.	Bias-selectable three-color short-, extended-short-, and mid-wavelength infrared photodetectors based on type-II InAs/GaSb/AlSb superlattices Abbas Haddadi, and Manijeh Razeghi Optics Letters Vol. 42, Iss. 21, pp. 4275-4278-- October 16, 2017 ...[Visit Journal] A bias-selectable, high operating temperature, three-color short-, extended-short-, and mid-wavelength infrared photodetector based on InAs/GaSb/AlSb type-II superlattices on GaSb substrate has been demonstrated. The short-, extended-short-, and mid-wavelength channels’ 50% cutoff wavelengths were 2.3, 2.9, and 4.4μm, respectively, at 150K. The mid-wavelength channel exhibited a saturated quantum efficiency of 34% at 4μm under +200 mV bias voltage in a front-side illumination configuration and without any antireflection coating. At 200mV, the device exhibited a dark current density of 8.7×10⁻⁵ A/cm² providing a specific detectivity of ∼2×10¹¹ cm·Hz^1/2/W at 150K. The short-wavelength channel achieved a saturated quantum efficiency of 20% at 1.8μm. At −10 mV, the device’s dark current density was 5.5×10⁻⁸ A/cm². At zero bias, its specific detectivity was 1×10¹¹ cm·Hz^1/2/W at 150K. The extended short-wavelength channel achieved a saturated quantum efficiency of 22% at 2.75 μm. Under −2 V bias voltage, the device exhibited a dark current density of 1.8×10⁻⁶ A/cm² providing a specific detectivity of 6.3×10¹¹ cm·Hz^1/2/W at 150K. [reprint (PDF)]
17.	Type-II superlattice dual-band LWIR imager with M-barrier and Fabry-Perot resonance E.K. Huang, A. Haddadi, G. Chen, B.M. Nguyen, M.A. Hoang, R. McClintock, M. Stegall, and M. Razeghi OSA Optics Letters, Vol. 36, No. 13, p. 2560-2562-- July 1, 2011 ...[Visit Journal] We report a high performance long-wavelength IR dual-band imager based on type-II superlattices with 100% cutoff wavelengths at 9.5 μm (blue channel) and 13 μm (red channel). Test pixels reveal background-limited behavior with specific detectivities as high as ∼5×10¹¹ Jones at 7.9 μm in the blue channel and ∼1×10¹¹ Jones at 10.2 μm in the red channel at 77 K. These performances were attributed to low dark currents thanks to the M-barrier and Fabry–Perot enhanced quantum efficiencies despite using thin 2 μm absorbing regions. In the imager, the high signal-to-noise ratio contributed to median noise equivalent temperature differences of ∼20 mK for both channels with integration times on the order of 0.5 ms, making it suitable for high speed applications. [reprint (PDF)]
17.	Investigation of Enhanced Heteroepitaxy and Electrical Properties in k-Ga2O3 due to Interfacing with β-Ga2O3 Template Layers Junhee Lee, Lakshay Gautam, Ferechteh H. Teherani, Eric V. Sandana, P. Bove, David J. Rogers and Manijeh Razeghi J. Lee, M. Razeghi, Physica Status Solidi A 2023,220, 2200559, https://doi.org/10.1002/pssa.202200559 ...[Visit Journal] Heteroepitaxial k-Ga2O3 films grown by metal-organic chemical vapor deposition (MOCVD) were found to have superior materials and electrical properties thanks to the interfacing with a b-Ga2O3 template layer. k-Ga2O3grown on sapphire has not been able to demonstrate its full potential due to materials imperfections created by strain induced by the lattice mismatch at the interface between the epilayer and the substrate. By adopting a b-Ga2O3 template on a c-sapphire substrate, higher quality k-Ga2O3thin films were obtained, as evidenced by a smoother surface morphology, narrower XRD peaks, and superior electrical performance. The implications of this phenomenon, caused by b-Ga2O3 buffer layer, are already very encouraging for both boosting current device performance and opening up the perspective of novel applications for Ga2O3. [reprint (PDF)]
17.	High-Average-Power, High-Duty-Cycle (~6 μm) Quantum Cascade Lasers S. Slivken, A. Evans, J. David, and M. Razeghi Applied Physics Letters, 81 (23)-- December 2, 2002 ...[Visit Journal] High-power quantum cascade lasers emitting at λ = 6.1 μm are demonstrated. Accurate control of growth parameters and strain balancing results in a near-perfect lattice match, which leads to excellent material quality. Excellent peak power for uncoated lasers, up to 1.5 W per facet for a 21 μm emitter width, is obtained at 300 K for 30 period structures. The threshold current density at 300 K is only 2.4 kA/cm². From 300 to 425 K, the laser exhibits a characteristic temperature T₀ of 167 K. Next, Y₂O₃/Ti/Au mirror coatings were deposited on 1.5 mm cavities and mounted epilayer down. These lasers show an average output power of up to 225 mW at 17% duty cycle, and still show 8 mW average power at 45% duty cycle. [reprint (PDF)]
17.	Substrate removal for high quantum efficiency back side illuminated type-II InAs/GaSb photodetectors P.Y. Delaunay, B.M. Nguyen, D. Hoffman and M. Razeghi Applied Physics Letters, Vol. 91, No. 23, p. 231106-- December 3, 2007 ...[Visit Journal] A substrate removal technique using an InAsSb etch stop layer improves by a factor of 2 the quantum efficiency of back side illuminated type-II InAs/GaSb superlattice photodetectors. After etching of the GaSb substrate with a CrO₃ based solution, the quantum efficiency of the diodes presents Fabry-Pérot oscillations averaging at 56%. Due to the confinement of the infrared light inside the devices, the quantum efficiency for certain devices reaches 75% at 8.5 µm. The implementation of this new technique to a focal plane array resulted in a decrease of the integration time from 0.23 to 0.08 ms. [reprint (PDF)]
17.	High Detectivity GaInAs/InP Quantum Well Infrared Photodetectors Grown on Si Substrates J. Jiang, C. Jelen, M. Razeghi and G.J. Brown IEEE Photonics Technology Letters 14 (3)-- March 1, 2002 ...[Visit Journal] In this letter, we report an improvement in the growth and the device performance of GaInAs-InP quantum well infrared photodetectors grown on Si substrates. Material growth techniques, like low-temperature nucleation layers and thick buffer layers were used to grow InP on Si. An in situ thermal cycle annealing technique was used to reduce the threading dislocation density in the InP-on-Si. Detector dark current was reduced 2 orders of magnitude by this method. Record high detectivity of 2.3 × 10⁹ cm·Hz^½·W^-1 was obtained for QWIP-on-Si detectors in the 7-9 μm range at 77 K [reprint (PDF)]
17.	Room temperature quantum cascade laser with ∼ 31% wall-plug efficiency F. Wang, S. Slivken, D. H. Wu, and M. Razeghi AIP Advances 10, 075012-- July 14, 2020 ...[Visit Journal] In this article, we report the demonstration of a quantum cascade laser emitting at λ ≈ 4.9 μm with a wall-plug efficiency of ∼31% and an output power of ∼23 W in pulsed operation at room temperature with 50 cascade stages (Ns). With proper fabrication and packaging, this buried ridge quantum cascade laser with a cavity length of 5 mm delivers more than ∼15 W output power, and its wall-plug efficiency exceeds ∼20% at 100 °C. The experimental results of the lasers are well in agreement with the numerical predictions. [reprint (PDF)]
17.	Engineering future light emitting diodes and photovoltaics with inexpensive materials: Integrating ZnO and Si into GaN-based devices C. Bayram ; K. T. Shiu ; Y. Zhu ; C. W. Cheng ; D. K. Sadana ; F. H. Teherani ; D. J. Rogers ; V. E. Sandana ; P. Bove ; Y. Zhang ; S. Gautier ; C.-Y. Cho ; E. Cicek ; Z. Vashaei ; R. McClintock ; M. Razeghi Proc. SPIE 8626, Oxide-based Materials and Devices IV, 86260L (March 18, 2013)-- March 18, 2013 ...[Visit Journal] Indium Gallium Nitride (InGaN) based PV have the best fit to the solar spectrum of any alloy system and emerging LED lighting based on InGaN technology and has the potential to reduce energy consumption by nearly one half while enabling significant carbon emission reduction. However, getting the maximum benefit from GaN diode -based PV and LEDs will require wide-scale adoption. A key bottleneck for this is the device cost, which is currently dominated by the substrate (i.e. sapphire) and the epitaxy (i.e. GaN). This work investigates two schemes for reducing such costs. First, we investigated the integration of Zinc Oxide (ZnO) in InGaN-based diodes. (Successful growth of GaN on ZnO template layers (on sapphire) was illustrated. These templates can then be used as sacrificial release layers for chemical lift-off. Such an approach provides an alternative to laser lift-off for the transfer of GaN to substrates with a superior cost-performance profile, plus an added advantage of reclaiming the expensive single-crystal sapphire. It was also illustrated that substitution of low temperature n-type ZnO for n-GaN layers can combat indium leakage from InGaN quantum well active layers in inverted p-n junction structures. The ZnO overlayers can also double as transparent contacts with a nanostructured surface which enhances light in/out coupling. Thus ZnO was confirmed to be an effective GaN substitute which offers added flexibility in device design and can be used in order to simultaneously reduce the epitaxial cost and boost the device performance. Second, we investigated the use of GaN templates on patterned Silicon (100) substrates for reduced substrate cost LED applications. Controlled local metal organic chemical vapor deposition epitaxy of cubic phase GaN with on-axis Si(100) substrates was illustrated. Scanning electron microscopy and transmission electron microscopy techniques were used to investigate uniformity and examine the defect structure in the GaN. Our results suggest that groove structures are very promising for controlled local epitaxy of cubic phase GaN. Overall, it is concluded that there are significant opportunities for cost reduction in novel hybrid diodes based on ZnO-InGaN-Si hybridization. [reprint (PDF)]
17.	GalnAs AND GaInAsP MATERIALS GROWN BY LOW PRESSURE MOCVD FOR MICROWAVE AND OPTOELECTRONIC APPLICATIONS J.P. Duchemin, J.P. Hirtz, M. Razeghi, M. Bonnet , S.D. Hersee J.P. Duchemin, J.P. Hirtz, M. Razeghi, GaInAs and GaInAsP materials grown by low pressure MOCVD for microwave and optoelectronic applications, Journal of Crystal Growth, 55, 1, 1981, Pages 64-73,-- August 1, 1981 ...[Visit Journal] The low pressure MOCVD technique has been successfully used to grow GaInAsP, lattice-matched to InP, for the complete compositional range between InP (λ=0.91 μm) and the ternary compound Ga0.47In0.53As (λ=1.67 μm). By contrast to LPE growth it has been found that during the MOCVD growth of double heterostructures InP can be grown directly onto the ternary or quaternary with no disturbance of the active layer, i.e. there is no effect equivalent to “melt back”. The compositional grading on both sides of the active layer was measured by scanning Auger spectroscopy on bevelled samples. It was found that the graded regions were typically less than 100 Å wide for GaInAsP active layers and less than 50 Å wide for GaInAs active layers. Single layers of undoped GaInAs exhibited a typical mobility of 6700 cm2 V-1s-1 at 1.5×1017 cm-3. The compositional uniformity of the ternary layers was characterised by measurement of the photoluminescence wavelength at various points on a large sample. The wavelength varied by <3 nm over 95% of the area, which was approximately 8 cm2. Our early MOCVD grown GaInAsP/InP DH lasers exhibited high thresholds due to a poor interface between the p-InP and the active layer. However, recently fabricated broad area lasers emitting at 1.27 μm show an average threshold current density of 1.5 kA cm-2 with a T0 of between 70 to 80 K. Stripe geometry lasers have being fabricated from this material and CW operation has been obtained. [reprint (PDF)]
17.	Low Dark Current Deep UV AlGaN Photodetectors on AlN Substrate Lakshay Gautam, Junhee Lee, Gail Brown, Manijeh Razeghi IEEE Journal of Quantum Electronics, vol. 58, no. 3, pp. 1-5, June 2022, Art no. 4000205 ...[Visit Journal] We report high quality, low dark current, deep Ultraviolet AlGaN/AlN Photodetectors on AlN substrate. AlGaN based Photodetectors are grown and fabricated both on AlN and Sapphire substrates with the same epilayer structure. Subsequently, electrical characteristics of both photodetectors on AlN substrate and Sapphire are compared. A reduction of 4 orders of magnitude of dark current density is reported in UV detectors grown on AlN substrate with respect to Sapphire substrate. [reprint (PDF)]
17.	High Power 280 nm AlGaN Light Emitting Diodes Based on an Asymmetric Single Quantum Well K. Mayes, A. Yasan, R. McClintock, D. Shiell, S.R. Darvish, P. Kung, and M. Razeghi Applied Physics Letters, 84 (7)-- February 16, 2004 ...[Visit Journal] We demonstrate high-power AlGaN-based ultraviolet light-emitting diodes grown on sapphire with an emission wavelength of 280 nm using an asymmetric single-quantum-well active layer configuration on top of a high-quality AlGaN/AlN template layer. An output power of 1.8 mW at a pulsed current of 400 mA was achieved for a single 300 µm×300 µm diode. This device reached a high peak external quantum efficiency of 0.24% at 40 mA. An array of four diodes produced 6.5 mW at 880 mA of pulsed current. [reprint (PDF)]
17.	High Frequency Extended Short-Wavelength Infrared Heterojunction Photodetectors Based on InAs/GaSb/AlSb Type-II Superlattices Romain Chevallier, Abbas Haddadi, Ryan McClintock, Arash Dehzangi , Victor Lopez-Dominguez, Pedram Khalili Amiri, Manijeh Razeghi IEEE JOURNAL OF QUANTUM ELECTRONICS, VOL. 54, NO. 6-- December 1, 2018 ...[Visit Journal] InAs/GaSb/AlSb type-II superlattice-based photodetectors, with 50% cut-off wavelength of 2.1 µm and a −3 dB cut-off frequency of 4.8 GHz, are demonstrated, for 10 µm diameter circular mesas under 15 V applied reverse bias. A study of the cut-off frequency with applied bias and mesa size was performed to evaluate some of the limiting factors of photodetectors high frequency performance. [reprint (PDF)]

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