Center for Quantum Devices - Most Downloaded Journal Articles

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15.	AlGaN ultraviolet detectors M. Razeghi and A. Rogalski, SPIE Conference, San Jose, CA, -- February 12, 1997 ...[Visit Journal] Hitherto, the semiconductor ultraviolet (UV) detectors have been mainly fabricated using Si. Industries such as the aerospace, automotive, petroleum, and others have continuously provided the impetus pushing the development of fringe technologies which are tolerant of increasingly high temperatures and hostile environments. As a result, the main efforts are currently directed to anew generation of UV detectors fabricated from wide-band-gap semiconductors between them the most promising are diamond and AlGaN. The latest progress in development of AlGaN UV detectors is described in detail. [reprint (PDF)]
15.	High Detectivity GaInAs/InP Quantum Well Infrared Photodetectors Grown on Si Substrates J. Jiang, C. Jelen, M. Razeghi and G.J. Brown IEEE Photonics Technology Letters 14 (3)-- March 1, 2002 ...[Visit Journal] In this letter, we report an improvement in the growth and the device performance of GaInAs-InP quantum well infrared photodetectors grown on Si substrates. Material growth techniques, like low-temperature nucleation layers and thick buffer layers were used to grow InP on Si. An in situ thermal cycle annealing technique was used to reduce the threading dislocation density in the InP-on-Si. Detector dark current was reduced 2 orders of magnitude by this method. Record high detectivity of 2.3 × 10⁹ cm·Hz^½·W^-1 was obtained for QWIP-on-Si detectors in the 7-9 μm range at 77 K [reprint (PDF)]
15.	Type-II InAs/GaSb superlattice photovoltaic detectors with cutoff wavelength approaching 32 μm Y. Wei, A. Gin, M. Razeghi and G.J. Brown Applied Physics Letters, 81 (19)-- November 4, 2002 ...[Visit Journal] We report the most recent advance in the area of type-II InAs/GaSb superlattice photovoltaic detectors that have cutoff wavelengths beyond 25 μm, with some at nearly 32 μm. The photodiodes with a heterosuperlattice junction showed Johnson noise limited peak detectivity of 1.05 x 10¹⁰ cm Hz^½/W at 15 μm under zero bias, and peak responsivity of 3 A/W under -40 mV reverse bias at 34 K illuminated by ~300 K background with a 2π field-of-view. The maximum operating temperature of these detectors ranges from 50 to 65 K. No detectable change in the blackbody response has been observed after 5-6 thermal cyclings, with temperature varying between 15 and 296 K in vacuum. [reprint (PDF)]
15.	High-Performance Focal Plane Arrays Based on InAs-GaSb Superlattices with a 10-micron Cutoff Wavelegth P.Y. Delaunay, B.M. Nguyen, D. Hoffman and M. Razeghi IEEE Journal of Quantum Electronics, Vol. 44, No. 5, p. 462-467-- May 1, 2008 ...[Visit Journal] We report on the demonstration of a focal plane array based on Type-II InAs/GaSb superlattices grown on N-type GaSb substrate with a 50%-cutoff wavelength at 10 μm. The surface leakage occurring after flip-chip bonding and underfill in the Type-II devices was suppressed using a double heterostructure design. The R₀A of diodes passivated with SiO₂ was 23 Ω·cm² after underfill. A focal plane array hybridized to an Indigo readout integrated circuit demonstrated a noise equivalent temperature difference of 33 mK at 81 K, with an integration time of 0.23 ms. [reprint (PDF)]
15.	Comparison of Gain and Threshold Current Density for InGaAsP/GaAs λ = 808 nm) Lasers with Different Quantum-Well Thickness H.J. Yi, J. Diaz, I. Eliashevich, G. Lukas, S. Kim, D. Wu, M. Erdtmann, C. Jelen, S. Slivken, L.J. Wang, and M. Razeghi Journal of Applied Physics 79 (11)-- July 1, 1996 ...[Visit Journal] We investigated the quantum‐size effects of quantum well (QW) on gain and threshold current density for InGaAsP/GaAs (λ=808 nm) laser diodes. In this work, a comparison is made of lasers with different QW thickness while keeping the optical confinement factors constant. We found that the threshold current density and differential efficiency were not affected by narrowing the QW thickness. The theoretical model taking into account the mixing of the valence bands and momentum relaxation for InGaAsP/GaAs lasers with spontaneous emission (optically pumped) measurement shows that the absence of difference between these structures can be attributed to the high relaxation rate. [reprint (PDF)]
15.	Negative and positive luminescence in mid-wavelength infrared InAs/GaSb superlattice photodiodes D. Hoffman, A. Gin, Y. Wei, A. Hood, F. Fuchs, and M. Razeghi IEEE Journal of Quantum Electronics, 41 (12)-- December 1, 2005 ...[Visit Journal] The quantum efficiency of negative and positive luminescence in binary type-II InAs-GaSb superlattice photodiodes has been investigated in the midinfrared spectral range around the 5-μm wavelength. The negative luminescence efficiency is nearly independent on temperature in the entire range from 220 to 325 K. For infrared diodes with a 2-μm absorbing layer, processed without anti-reflection coating, a negative luminescence efficiency of 45% is found, indicating very efficient minority carrier extraction. The temperature dependent measurements of the quantum efficiency of the positive luminescence enables for the determination of the capture cross section of the Shockley-Read-Hall centers involved in the competing nonradiative recombination. [reprint (PDF)]
15.	Growth and characterization of InP using metalorganic chemical vapor deposition at reduced pressure M. Razeghi, J.P. Duchemin M. Razeghi, J.P. Duchemin, Growth and characterization of InP using metalorganic chemical vapor deposition at reduced pressure, Journal of Crystal Growth, Volume 64, Issue 1, 1983, Pages 76-82,-- November 1, 1983 ...[Visit Journal] M. Razeghi, J.P. Duchemin, Growth and characterization of InP using metalorganic chemical vapor deposition at reduced pressure, Journal of Crystal Growth, Volume 64, Issue 1, 1983, Pages 76-82, [reprint (PDF)]
15.	High-performance short-wavelength infrared photodetectors based on type-II InAs/InAs1-xSbx/AlAs1-xSbx superlattices A. Haddadi, X.V. Suo, S. Adhikary, P. Dianat, R. Chevallier, A.M. Hoang, and M. Razeghi Applied Physics Letters 107 , 141104-- October 5, 2015 ...[Visit Journal] A high-performance short-wavelength infrared n-i-p photodiode based on InAs/InAs1-xSbx/AlAs1-xSbx type-II superlattices on GaSb substrate has been demonstrated. The device is designed to have a 50% cut-off wavelength of ~1.8μm at 300K. The photodetector exhibited a room-temperature (300 K) peak responsivity of 0.47 A/W at 1.6μm, corresponding to a quantum efficiency of 37% at zero bias under front-side illumination, without any anti-reflection coating. With an R×A of 285 Ω·cm² and a dark current density of 9.6×10^-5 A/cm² under −50mV applied bias at 300 K, the photodiode exhibited a specific detectivity of 6.45×10¹⁰ cm·Hz^½/W. At 200 K, the photodiode exhibited a dark current density of 1.3×10^-8 A/cm² and a quantum efficiency of 36%, resulting in a detectivity of 5.66×10¹² cm·Hz^½/W. [reprint (PDF)]
15.	Sampled grating, distributed feedback quantum cascade lasers with broad tunability and continuous operation at room temperature S. Slivken, N. Bandyopadhyay, S. Tsao, S. Nida, Y. Bai, Q.Y. Lu and M. Razeghi Applied Physics Letters, Vol. 100, No. 26, p. 261112-1-- June 25, 2012 ...[Visit Journal] A dual-section, single-mode quantum cascade laser is demonstrated in continuous wave at room temperature with up to 114 nm (50 cm⁻¹) of tuning near a wavelength of 4.8 μm. Power above 100 mW is demonstrated, with a mean side mode suppression ratio of 24 dB. By changing the grating period, 270 nm (120 cm⁻¹) of gap-free electrical tuning for a single gain medium has been realized. [reprint (PDF)]
15.	InAsSbP/InAsSb/InAs Laser Diodes λ = 3.2 μm) Grown by Low-Pressure Metalorganic Chemical Vapor Deposition J. Diaz, G. Lukas, D. Wu, S. Kim, M. Erdtmann, E. Kaas, and M. Razeghi Applied Physics Letters 70 (1)-- January 6, 1997 ...[Visit Journal] We report metal–organic chemical-vapor deposition-grown double heterostructure InAsSbP/InAsSb/InAs diode lasers emitting at 3.2 μm operating at temperatures up to 220 K with threshold current density of 40 A/cm² at 77 K and characteristic temperature up to 42 K. Output powers as high as 260 mW in pulse mode and 60 mW in continuous wave operation have been obtained from an uncoated 100 μm stripe-width broad-area laser at 77 K. Comparison with theory shows that there is no significant nonradiative recombination mechanism for these lasers at 77 K. [reprint (PDF)]
15.	High performance Zn-diffused planar mid-wavelength infrared type-II InAs/InAs_1-xSb_x superlattice photodetector by MOCVD Donghai Wu, Arash Dehzangi, Jiakai Li, and Manijeh Razeghi Appl. Phys. Lett. 116, 161108-- April 21, 2020 ...[Visit Journal] We report a Zn-diffused planar mid-wavelength infrared photodetector based on type-II InAs/InAs_1-xSb_x superlattices. Both the superlattice growth and Zn diffusion were performed in a metal-organic chemical vapor deposition system. At 77K, the photodetector exhibits a peak responsivity of 0.70A/W at 3.65λ, corresponding to a quantum efﬁciency of 24% at zero bias without anti-reﬂection coating, with a 50% cutoff wavelength of 4.28λ. With an R₀A value of 3.2x10⁵ Ω·cm² and a dark current density of 9.6x10^-8 A/cm² bias of -20mV at 77K, the photodetector exhibits a speciﬁc detectivity of 2.9x10¹²cm·Hz^½/W. At 150K, the photodetector exhibits a dark current density of 9.1x10^-6 A/cm² and a quantum efﬁciency of 25%, resulting in a detectivity of 3.4x10¹¹cm·Hz/W. [reprint (PDF)]
15.	High Power 3-12 μm Infrared Lasers: Recent Improvements and Future Trends M. Razeghi, S. Slivken, A. Tahraoui, A. Matlis, and Y.S. Park Advanced Research Workshop on Semiconductor Nanostructures, Queenstown, New Zealand; Proceedings -- February 5, 2003 ...[Visit Journal] In this paper, we discuss the progress of quantum cascade lasers (QCLs) grown by gas-source molecular beam epitaxy. Room temperature QCL operation has been reported for lasers emitting between 5-11 μm, with 9-11 μm lasers operating up to 425 K. Laser technology for the 3-5 μm range takes advantage of a strain-balanced active layer design. We also demonstrate record room temperature peak output powers at 9 and 11 μm (2.5 and 1 W, respectively) as well as record low 80K threshold current densities (250 A/cm²) for some laser designs. Preliminary distributed feedback (DFB) results are also presented and exhibit single mode operation for 9 μm lasers at room temperature. [reprint (PDF)]
15.	A lifetime of contributions to the world of semiconductors using the Czochralski invention M. Razeghi Vacuum Vol. 9934, 993406-1-- February 8, 2017 ...[Visit Journal] Over the course of my career, I have made numerous contributions related to semiconductor crystal growth and high performance optoelectronics over a vast region of the electromagnetic spectrum (ultraviolet to terahertz). In 2016 this cumulated in my receiving the Jan Czochralski Gold Medal award from the European Materials Research Society. This article is designed to provide a historical perspective and general overview of these scientific achievements, on the occasion of being honored by this award. These achievements would not have been possible without high quality crystalline substrates, and this article is written in honor of Jan Czochralski on the 100th anniversary of his important discovery. [reprint (PDF)]
15.	Engineering future light emitting diodes and photovoltaics with inexpensive materials: Integrating ZnO and Si into GaN-based devices C. Bayram ; K. T. Shiu ; Y. Zhu ; C. W. Cheng ; D. K. Sadana ; F. H. Teherani ; D. J. Rogers ; V. E. Sandana ; P. Bove ; Y. Zhang ; S. Gautier ; C.-Y. Cho ; E. Cicek ; Z. Vashaei ; R. McClintock ; M. Razeghi Proc. SPIE 8626, Oxide-based Materials and Devices IV, 86260L (March 18, 2013)-- March 18, 2013 ...[Visit Journal] Indium Gallium Nitride (InGaN) based PV have the best fit to the solar spectrum of any alloy system and emerging LED lighting based on InGaN technology and has the potential to reduce energy consumption by nearly one half while enabling significant carbon emission reduction. However, getting the maximum benefit from GaN diode -based PV and LEDs will require wide-scale adoption. A key bottleneck for this is the device cost, which is currently dominated by the substrate (i.e. sapphire) and the epitaxy (i.e. GaN). This work investigates two schemes for reducing such costs. First, we investigated the integration of Zinc Oxide (ZnO) in InGaN-based diodes. (Successful growth of GaN on ZnO template layers (on sapphire) was illustrated. These templates can then be used as sacrificial release layers for chemical lift-off. Such an approach provides an alternative to laser lift-off for the transfer of GaN to substrates with a superior cost-performance profile, plus an added advantage of reclaiming the expensive single-crystal sapphire. It was also illustrated that substitution of low temperature n-type ZnO for n-GaN layers can combat indium leakage from InGaN quantum well active layers in inverted p-n junction structures. The ZnO overlayers can also double as transparent contacts with a nanostructured surface which enhances light in/out coupling. Thus ZnO was confirmed to be an effective GaN substitute which offers added flexibility in device design and can be used in order to simultaneously reduce the epitaxial cost and boost the device performance. Second, we investigated the use of GaN templates on patterned Silicon (100) substrates for reduced substrate cost LED applications. Controlled local metal organic chemical vapor deposition epitaxy of cubic phase GaN with on-axis Si(100) substrates was illustrated. Scanning electron microscopy and transmission electron microscopy techniques were used to investigate uniformity and examine the defect structure in the GaN. Our results suggest that groove structures are very promising for controlled local epitaxy of cubic phase GaN. Overall, it is concluded that there are significant opportunities for cost reduction in novel hybrid diodes based on ZnO-InGaN-Si hybridization. [reprint (PDF)]
15.	Semiconductor ultraviolet detectors M. Razeghi and A. Rogalski Journal of Applied Physics Applied Physics Review 79 (10)-- May 15, 1996 ...[Visit Journal] In this review article a comprehensive analysis of the developments in ultraviolet (UV) detector technology is described. At the beginning, the classification of UV detectors and general requirements imposed on these detectors are presented. Further considerations are restricted to modern semiconductor UV detectors, so the basic theory of photoconductive and photovoltaic detectors is presented in a uniform way convenient for various detector materials. Next, the current state of the art of different types of semiconductor UV detectors is presented. Hitherto, the semiconductor UV detectors have been mainly fabricated using Si. Industries such as the aerospace, automotive, petroleum, and others have continuously provided the impetus pushing the development of fringe technologies which are tolerant of increasingly high temperatures and hostile environments. As a result, the main efforts are currently directed to a new generation of UV detectors fabricated from wide band-gap semiconductors the most promising of which are diamond and AlGaN. The latest progress in development of AlGaN UV detectors is finally described in detail. [reprint (PDF)]
15.	Recent Advances in LWIR Type-II InAs/GaSb Superlattice Photodetectors and Focal Plane Arrays at the Center for Quantum Devices M. Razeghi, D. Hoffman, B.M. Nguyen, P.Y. Delaunay, E.K. Huang, M.Z. Tidrow, and V. Nathan IEEE Proceedings, Vol. 97, No. 6, p. 1056-1066-- June 1, 2009 ...[Visit Journal] In recent years, Type-II InAs/GaSb superlattice photo-detectors have experienced significant improvements in material quality, structural designs, and imaging applications. They now appear to be a possible alternative to the state-of-the-art HgCdTe (MCT) technology in the long and very long wavelength infrared regimes. At the Center for Quantum Devices, we have successfully realized very high quantum efficiency, very high dynamic differential resistance R₀A - product LWIR Type – II InAs/GaSb superlattice photodiodes with efficient surface passivation techniques. The demonstration of high quality LWIR Focal Plane Arrays that were 100 % fabricated in - house reaffirms the pioneer position of this university-based laboratory. [reprint (PDF)]
15.	GaN avalanche photodiodes grown on m-plane freestanding GaN substrate Z. Vashaei, E. Cicek, C. Bayram, R. McClintock and M. Razeghi Applied Physics Letters, Vol. 96, No. 20, p. 201908-1-- May 17, 2010 ...[Visit Journal] M-plane GaN avalanche p-i-n photodiodes on low dislocation density freestanding m-plane GaN substrates were realized using metal-organic chemical vapor deposition. High quality homoepitaxial m-plane GaN layers were developed; the root-mean-square surface roughness was less than 1 Å and the full-width-at-half-maximum value of the x-ray rocking curve for (1010) diffraction of m-plane GaN epilayer was 32 arcsec. High quality material led to a low reverse-bias dark current of 8.11 pA for 225 μm² mesa photodetectors prior to avalanche breakdown, with the maximum multiplication gain reaching about 8000. [reprint (PDF)]
15.	Techniques for High-Quality SiO₂ Films J. Nguyen and M. Razeghi SPIE Conference, January 25-29, 2007, San Jose, CA Proceedings – Quantum Sensing and Nanophotonic Devices IV, Vol. 6479, p. 64791K-1-8-- January 29, 2007 ...[Visit Journal] We report on the comparison of optical, structural, and electrical properties of SiO₂ using plasma-enhanced chemical vapor deposition and ion-beam sputtering deposition. High-quality, low-temperature deposition of SiO₂ by ion-beam sputtering deposition is shown to have lower absorption, smoother and more densely packed films, a lower amount of fixed oxide charges, and a lower trapped-interface density than SiO₂ by plasma-enhanced chemical vapor deposition. This high-quality SiO₂ is then demonstrated as an excellent electrical and mechanical surface passivation layer on Type-II InAs/GaSb photodetectors [reprint (PDF)]
15.	Growth and characterization of InSbBi for long wavelength infrared photodetectors J.J. Lee, J.D. Kim, and M. Razeghi Applied Physics Letters 70 (24)-- June 16, 1997 ...[Visit Journal] The epitaxial growth of InSbBi ternary alloys by low-pressure metalorganic chemical vapor deposition is reported on. X-ray diffraction spectra showed well resolved peaks of InSbBi and InSb films. Bi incorporation was confirmed by energy dispersive x-ray analysis. Photoresponse spectrum up to 9.3 μm which corresponds to 0.13 eV energy band gap has been measured in a sample with Bi composition of 5.8 at.% at 77 K. Electron mobility at room temperature ranges from 44 100 to 4910 cm²/V·s as Bi composition increases. [reprint (PDF)]
15.	Recent advances in InAs/InAs1- xSbx/AlAs1-xSbx gap-engineered Type-II superlattice-based photodetectors Manijeh Razeghi, Abbas Haddadi, Arash Dehzangi, Romain Chevallier, Thomas Yang Proc. SPIE 10177, Infrared Technology and Applications XLIII, 1017705 -- May 9, 2017 ...[Visit Journal] InAs/InAs1-xSbx/AlAs1-xSbx type-II superlattices (T2SLs) is a system of multi-interacting quantum wells. Since its introduction, this material system has drawn a lot of attention especially for infrared detection. In recent years, InAs/InAs1- xSbx/AlAs1-xSbx T2SL material system has experienced incredible improvements in material quality, device structure designs and device fabrication process which elevated the performances of T2SL-based photodetectors to a comparable level to the state-of-the-art material systems for infrared detection such as Mercury Cadmium Telluride (MCT). In this paper, we will present the current status of InAs/InAs1-xSbx/AlAs1-xSbx T2SL-based photodetectors for detection in different infrared regions, from short-wavelength (SWIR) to long-wavelength (LWIR) infrared, and the future outlook of this material system. [reprint (PDF)]
15.	High operating temperature MWIR photon detectors based on Type-II InAs/GaSb superlattice M. Razeghi, B.M. Nguyen, P.Y. Delaunay, S. Abdollahi Pour, E.K.W. Huang, P. Manukar, S. Bogdanov, and G. Chen SPIE Proceedings, San Francisco, CA (January 22-28, 2010), Vol. 7608, p. 76081Q-1-- January 22, 2010 ...[Visit Journal] Recent efforts have been paid to elevate the operating temperature of Type-II InAs/GaSb superlattice Mid Infrared photon detectors. Optimized growth parameters and interface engineering technique enable high quality material with a quantum efficiency above 50%. Intensive study on device architecture and doping profile has resulted in almost one order of magnitude of improvement to the electrical performance and lifted up the 300 K-background BLIP operation temperature to 166 K. At 77 K, the ~4.2 µm cut-off devices exhibit a differential resistance area product in excess of the measurement system limit (10⁶ Ω·cm²) and a detectivity of 3x10¹³ cm·Hz^½·W⁻¹. High quality focal plane arrays were demonstrated with a noise equivalent temperature of 10 mK at 77 K. Uncooled camera is capable to capture hot objects such as soldering iron. [reprint (PDF)]
15.	Solar-Blind Deep UV Avalanche Photodetectors Using Reduced Area Epitaxy Lakshay Gautam , Junhee Lee, Michael Richards, and Manijeh Razeghi , Lakshay Gautam, Manijeh Razeghi, IEEE JOURNAL OF QUANTUM ELECTRONICS, VOL. 59, NO. 6, 10.1109/JQE.2023.3325254 ...[Visit Journal] We report high gain avalanche photodetectors operating in the deep UV wavelength regime. The high gain was leveraged through reduced area epitaxy by patterning AlN on Sapphire substrate. This helps in a substantial reduction of crack formation due to overgrowth on individually isolated AlN mesas. Reproducible gain on the order of 105 was reported for multiple diodes in different areas of 320 × 256 focal plane array. [reprint (PDF)]
15.	Comparison of type-II superlattice and HgCdTe infrared detector technologies Jagmohan Bajaj; Gerry Sullivan; Don Lee; Ed Aifer; Manijeh Razeghi Proc. SPIE 6542, Infrared Technology and Applications XXXIII, 65420B (May 14, 2007)-- May 14, 2007 ...[Visit Journal] Performance of HgCdTe detector technology surpasses all others in the mid-wave and long-wave infrared spectrum. This technology is relatively mature with current effort focused on improving uniformity, and demonstrating increased focal plane array (FPA) functionality. Type-II superlattice (InAs-GaSb and related alloys) detector technology has seen rapid progress over the past few years. The merits of the superlattice material system rest on predictions of even higher performance than HgCdTe and of engineering advantages. While no one has demonstrated Type-II superlattice detectors with performance superior to HgCdTe detectors, the difference in performance between these two technologies is decreasing. In this paper, we review the status and highlight relative merits of both HgCdTe and Type-II superlattice based detector technologies. [reprint (PDF)]
15.	Cubic Phase GaN on Nano-grooved Si (100) via Maskless Selective Area Epitaxy Bayram, C., Ott, J. A., Shiu, K.-T., Cheng, C.-W., Zhu, Y., Kim, J., Razeghi, M. and Sadana, D. K. Adv. Funct. Mater. 2014-- April 1, 2014 ...[Visit Journal] A method of forming cubic phase (zinc blende) GaN (referred as c-GaN) on a CMOS-compatible on-axis Si (100) substrate is reported. Conventional GaN materials are hexagonal phase (wurtzite) (referred as h-GaN) and possess very high polarization fields (∼MV/cm) along the common growth direction of <0001>. Such large polarization fields lead to undesired shifts (e.g., wavelength and current) in the performance of photonic and vertical transport electronic devices. The cubic phase of GaN materials is polarization-free along the common growth direction of <001>, however, this phase is thermodynamically unstable, requiring low-temperature deposition conditions and unconventional substrates (e.g., GaAs). Here, novel nano-groove patterning and maskless selective area epitaxy processes are employed to integrate thermodynamically stable, stress-free, and low-defectivity c-GaN on CMOS-compatible on-axis Si. These results suggest that epitaxial growth conditions and nano-groove pattern parameters are critical to obtain such high quality c-GaN. InGaN/GaN multi-quantum-well structures grown on c-GaN/Si (100) show strong room temperature luminescence in the visible spectrum, promising visible emitter applications for this technology. [reprint (PDF)]
15.	Comparison of chemical and laser lift-off for the transfer of InGaN-based p-i-n junctions from sapphire to glass substrates D. J. Rogers ; P. Bove ; F. Hosseini Teherani ; K. Pantzas ; T. Moudakir ; G. Orsal ; G. Patriarche ; S. Gautier ; A. Ougazzaden ; V. E. Sandana ; R. McClintock ; M. Razeghi Proc. SPIE 8626, Oxide-based Materials and Devices IV, 862611 (March 18, 2013)-- March 18, 2013 ...[Visit Journal] InGaN-based p-i-n structures were transferred from sapphire to soda-lime glass substrates using two approaches: (1) laser-lift-off (LLO) and thermo-metallic bonding and (2) chemical lift-off (LLO) by means sacrificial ZnO templates and direct wafer bonding. Both processes were found to function at RT and allow reclaim of the expensive single crystal substrate. Both approaches have also already been demonstrated to work for the wafer-scale transfer of III/V semiconductors. Compared with the industry-standard LLO, the CLO offers the added advantages of a lattice match to InGaN with higher indium contents, no need for an interfacial adhesive layer (which facilitates electrical, optical and thermal coupling), no damaged/contaminated GaN surface layer, simplified sapphire reclaim (GaN residue after LLO may complicate reclaim) and cost savings linked to elimination of the expensive LLO process. [reprint (PDF)]

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