Center for Quantum Devices - Most Downloaded Journal Articles

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15.	InAsSbP/InAsSb/InAs Laser Diodes λ = 3.2 μm) Grown by Low-Pressure Metalorganic Chemical Vapor Deposition J. Diaz, G. Lukas, D. Wu, S. Kim, M. Erdtmann, E. Kaas, and M. Razeghi Applied Physics Letters 70 (1)-- January 6, 1997 ...[Visit Journal] We report metal–organic chemical-vapor deposition-grown double heterostructure InAsSbP/InAsSb/InAs diode lasers emitting at 3.2 μm operating at temperatures up to 220 K with threshold current density of 40 A/cm² at 77 K and characteristic temperature up to 42 K. Output powers as high as 260 mW in pulse mode and 60 mW in continuous wave operation have been obtained from an uncoated 100 μm stripe-width broad-area laser at 77 K. Comparison with theory shows that there is no significant nonradiative recombination mechanism for these lasers at 77 K. [reprint (PDF)]
15.	Comparison of chemical and laser lift-off for the transfer of InGaN-based p-i-n junctions from sapphire to glass substrates D. J. Rogers ; P. Bove ; F. Hosseini Teherani ; K. Pantzas ; T. Moudakir ; G. Orsal ; G. Patriarche ; S. Gautier ; A. Ougazzaden ; V. E. Sandana ; R. McClintock ; M. Razeghi Proc. SPIE 8626, Oxide-based Materials and Devices IV, 862611 (March 18, 2013)-- March 18, 2013 ...[Visit Journal] InGaN-based p-i-n structures were transferred from sapphire to soda-lime glass substrates using two approaches: (1) laser-lift-off (LLO) and thermo-metallic bonding and (2) chemical lift-off (LLO) by means sacrificial ZnO templates and direct wafer bonding. Both processes were found to function at RT and allow reclaim of the expensive single crystal substrate. Both approaches have also already been demonstrated to work for the wafer-scale transfer of III/V semiconductors. Compared with the industry-standard LLO, the CLO offers the added advantages of a lattice match to InGaN with higher indium contents, no need for an interfacial adhesive layer (which facilitates electrical, optical and thermal coupling), no damaged/contaminated GaN surface layer, simplified sapphire reclaim (GaN residue after LLO may complicate reclaim) and cost savings linked to elimination of the expensive LLO process. [reprint (PDF)]
15.	Optoelectronic Devices Based on III-V Compound Semiconductors Which Have Made a Major Scientific and Technological Impact in the Past 20 Years M. Razeghi IEEE Journal of Selected Topics in Quantum Electronics 6 (6), pp.1344 - 1354 -- November 1, 2000 ...[Visit Journal] This paper reviews some of our pioneering contributions to the field of III–V compound semiconductor materials and low-dimensional optoelectronic devices. These contributions span from the ultraviolet (200 nm) up to the far-infrared (25 μm) portion of the electromagnetic spectrum and have had a major scientific and technological impact on the semiconductor world in the past 20 years. [reprint (PDF)]
15.	Background limited long wavelength infrared type-II InAs/GaSb superlattice photodiodes operating at 110 K B.M. Nguyen, D. Hoffman, E.K. Huang, P.Y. Delaunay, and M. Razeghi Applied Physics Letters, Vol. 93, No. 12, p. 123502-1-- September 22, 2008 ...[Visit Journal] The utilization of the P+-pi-M-N+ photodiode architecture in conjunction with a thick active region can significantly improve long wavelength infrared Type-II InAs/GaSb superlattice photodiodes. By studying the effect of the depletion region placement on the quantum efficiency in a thick structure, we achieved a topside illuminated quantum efficiency of 50% for an N-on-P diode at 8.0 µm at 77 K. Both the double heterostructure design and the application of polyimide passivation greatly reduce the surface leakage, giving an R₀A of 416 Ω·cm² for a 1% cutoff wavelength of 10.52 µm, a Shot–Johnson detectivity of 8.1×10¹¹ cm·Hz^½/W at 77 K, and a background limited operating temperature of 110 K with 300 K background. [reprint (PDF)]
15.	Sampled grating, distributed feedback quantum cascade lasers with broad tunability and continuous operation at room temperature S. Slivken, N. Bandyopadhyay, S. Tsao, S. Nida, Y. Bai, Q.Y. Lu and M. Razeghi Applied Physics Letters, Vol. 100, No. 26, p. 261112-1-- June 25, 2012 ...[Visit Journal] A dual-section, single-mode quantum cascade laser is demonstrated in continuous wave at room temperature with up to 114 nm (50 cm⁻¹) of tuning near a wavelength of 4.8 μm. Power above 100 mW is demonstrated, with a mean side mode suppression ratio of 24 dB. By changing the grating period, 270 nm (120 cm⁻¹) of gap-free electrical tuning for a single gain medium has been realized. [reprint (PDF)]
15.	Cubic Phase GaN on Nano-grooved Si (100) via Maskless Selective Area Epitaxy Bayram, C., Ott, J. A., Shiu, K.-T., Cheng, C.-W., Zhu, Y., Kim, J., Razeghi, M. and Sadana, D. K. Adv. Funct. Mater. 2014-- April 1, 2014 ...[Visit Journal] A method of forming cubic phase (zinc blende) GaN (referred as c-GaN) on a CMOS-compatible on-axis Si (100) substrate is reported. Conventional GaN materials are hexagonal phase (wurtzite) (referred as h-GaN) and possess very high polarization fields (∼MV/cm) along the common growth direction of <0001>. Such large polarization fields lead to undesired shifts (e.g., wavelength and current) in the performance of photonic and vertical transport electronic devices. The cubic phase of GaN materials is polarization-free along the common growth direction of <001>, however, this phase is thermodynamically unstable, requiring low-temperature deposition conditions and unconventional substrates (e.g., GaAs). Here, novel nano-groove patterning and maskless selective area epitaxy processes are employed to integrate thermodynamically stable, stress-free, and low-defectivity c-GaN on CMOS-compatible on-axis Si. These results suggest that epitaxial growth conditions and nano-groove pattern parameters are critical to obtain such high quality c-GaN. InGaN/GaN multi-quantum-well structures grown on c-GaN/Si (100) show strong room temperature luminescence in the visible spectrum, promising visible emitter applications for this technology. [reprint (PDF)]
15.	Recent Advances in Room Temperature, High-Power Terahertz Quantum Cascade Laser Sources Based on Difference-Frequency Generation Quanyong Lu and Manijeh Razeghi Photonics, 3, 42-- July 7, 2016 ...[Visit Journal] We present the current status of high-performance, compact, THz sources based on intracavity nonlinear frequency generation in mid-infrared quantum cascade lasers. Significant performance improvements of our THz sources in the power and wall plug efficiency are achieved by systematic optimizing the device’s active region, waveguide, and chip bonding strategy. High THz power up to 1.9 mW and 0.014 mW for pulsed mode and continuous wave operations at room temperature are demonstrated, respectively. Even higher power and efficiency are envisioned based on enhancements in outcoupling efficiency and mid-IR performance. Our compact THz device with high power and wide tuning range is highly suitable for imaging, sensing, spectroscopy, medical diagnosis, and many other applications. [reprint (PDF)]
15.	High-Average-Power, High-Duty-Cycle (~6 μm) Quantum Cascade Lasers S. Slivken, A. Evans, J. David, and M. Razeghi Virtual Journal of Nanoscience & Technology 9-- December 9, 2002 ...[Visit Journal][reprint (PDF)]
15.	Low irradiance background limited type-II superlattice MWIR M-barrier imager E.K. Huang, S. Abdollahi Pour, M.A. Hoang, A. Haddadi, M. Razeghi and M.Z. Tidrow OSA Optics Letters (OL), Vol. 37, No. 11, p. 2025-2027-- June 1, 2012 ...[Visit Journal] We report a type-II superlattice mid-wave infrared 320 × 256 imager at 81 K with the M-barrier design that achieved background limited performance (BLIP) and ∼99%operability. The 280 K blackbody’s photon irradiance was limited by an aperture and a band-pass filter from 3.6 μm to 3.8 μm resulting in a total flux of ∼5 × 10¹² ph·cm⁻²·s⁻¹. Under these low-light conditions, and consequently the use of a 13.5 ms integration time, the imager was observed to be BLIP thanks to a ∼5 pA dark current from the 27 μm wide pixels. The total noise was dominated by the photon flux and read-out circuit which gave the imager a noise equivalent input of ∼5 × 10¹⁰ ph·cm⁻²·s⁻¹ and temperature sensitivity of 9 mK with F∕2.3 optics. Excellent imagery obtained using a 1-point correction alludes to the array’s uniform responsivity. [reprint (PDF)]
15.	Techniques for High-Quality SiO₂ Films J. Nguyen and M. Razeghi SPIE Conference, January 25-29, 2007, San Jose, CA Proceedings – Quantum Sensing and Nanophotonic Devices IV, Vol. 6479, p. 64791K-1-8-- January 29, 2007 ...[Visit Journal] We report on the comparison of optical, structural, and electrical properties of SiO₂ using plasma-enhanced chemical vapor deposition and ion-beam sputtering deposition. High-quality, low-temperature deposition of SiO₂ by ion-beam sputtering deposition is shown to have lower absorption, smoother and more densely packed films, a lower amount of fixed oxide charges, and a lower trapped-interface density than SiO₂ by plasma-enhanced chemical vapor deposition. This high-quality SiO₂ is then demonstrated as an excellent electrical and mechanical surface passivation layer on Type-II InAs/GaSb photodetectors [reprint (PDF)]
15.	Gas Source Molecular Beam Epitaxy Growth and Characterization of Ga_0.51In_0.49P/In_xGa_1-xAs/GaAs Modulation-doped Field-effect Transistor Structures C. Besikci, Y. Civan, S. Ozder, O. Sen, C. Jelen, S. Slivken, and M. Razeghi Semiconductor Science Technology 12-- January 1, 1997 ...[Visit Journal] Lattice-matched Ga_0.51In_0.49P/GaAs and strained Ga_0.51In_0.49P/In_xGa_1−xAs/GaAs (0.1 ≤ x ≤ 0.25) modulation-doped field-effect transistor structures were grown by gas source molecular beam epitaxy by using Si as dopant. Detailed electrical characterization results are presented. The Ga_0.5In_0.49P/In_0.25Ga_0.75As/GaAs sample yielded dark two-dimensional electron gas densities of 3.75 x 10¹² cm^-2 (300 K) and 2.3 x 10¹² cm^-2 (77 K) which are comparable to the highest sheet electron densities reported in AlGaAs/InGaAs/GaAs and InAlAs/InGaAs/InP modulation-doped heterostructures. Persistent photoconductivity was observed in the strained samples only. A 0.797 eV deep level has been detected in the undoped GaInP layers of the structures. Another level, with DLTS peak height dependent on the filling pulse width, has been detected at the interface of the strained samples. Based on the DLTS and Hall effect measurement results, this level, which seems to be the origin of persistent photoconductivity, can be attributed to the strain relaxation related defects. [reprint (PDF)]
15.	Photonic crystal distributed feedback quantum cascade lasers with 12 W output power Y. Bai, B. Gokden, S.R. Darvish, S. Slivken, and M. Razeghi Applied Physics Letters, Vol. 95, No. 3-- July 20, 2009 ...[Visit Journal] We demonstrate room temperature, high power, and diffraction limited operation of photonic crystal distributed feedback (PCDFB) quantum cascade lasers emitting around 4.7 µm. PCDFB gratings with three distinctive periods are fabricated on the same wafer. Peak output power up to 12 W is demonstrated. Lasers with different periods show expected wavelength shifts according to the design. Dual mode spectra are attributed to a purer index coupling by putting the grating layer 100 nm away from the laser core. Single lobed diffraction limited far field profiles are observed. [reprint (PDF)]
15.	Growth and characterization of InSbBi for long wavelength infrared photodetectors J.J. Lee, J.D. Kim, and M. Razeghi Applied Physics Letters 70 (24)-- June 16, 1997 ...[Visit Journal] The epitaxial growth of InSbBi ternary alloys by low-pressure metalorganic chemical vapor deposition is reported on. X-ray diffraction spectra showed well resolved peaks of InSbBi and InSb films. Bi incorporation was confirmed by energy dispersive x-ray analysis. Photoresponse spectrum up to 9.3 μm which corresponds to 0.13 eV energy band gap has been measured in a sample with Bi composition of 5.8 at.% at 77 K. Electron mobility at room temperature ranges from 44 100 to 4910 cm²/V·s as Bi composition increases. [reprint (PDF)]
15.	High Performance InAs/GaSb Superlattice Photodiodes for the Very Long Wavelength Infrared Range H. Mohseni, M. Razeghi, G.J. Brown, Y.S. Park Applied Physics Letters 78 (15)-- April 9, 2001 ...[Visit Journal] We report on the demonstration of high-performance p-i-n photodiodes based on type-II InAs/GaSb superlattices with 50% cut-off wavelength λ_c = 16 μm operating at 80 K. Material is grown by molecular beam epitaxy on GaSb substrates with excellent crystal quality as evidenced by x-ray diffraction and atomic force microscopy. The processed devices show a current responsivity of 3.5 A/W at 80 K leading to a detectivity of ∼ 1.51×10¹⁰ cm·Hz^½/W. The quantum efficiency of these devices is about 35% which is comparable to HgCdTe detectors with a similar active layer thickness. [reprint (PDF)]
15.	GaN avalanche photodiodes grown on m-plane freestanding GaN substrate Z. Vashaei, E. Cicek, C. Bayram, R. McClintock and M. Razeghi Applied Physics Letters, Vol. 96, No. 20, p. 201908-1-- May 17, 2010 ...[Visit Journal] M-plane GaN avalanche p-i-n photodiodes on low dislocation density freestanding m-plane GaN substrates were realized using metal-organic chemical vapor deposition. High quality homoepitaxial m-plane GaN layers were developed; the root-mean-square surface roughness was less than 1 Å and the full-width-at-half-maximum value of the x-ray rocking curve for (1010) diffraction of m-plane GaN epilayer was 32 arcsec. High quality material led to a low reverse-bias dark current of 8.11 pA for 225 μm² mesa photodetectors prior to avalanche breakdown, with the maximum multiplication gain reaching about 8000. [reprint (PDF)]
15.	Characteristics of Self-Assembled InGaAs/InGaP Quantum Dot Mid-Infrared Photoconductive Detectors Grown by Low Pressure MOCVD S. Kim, M. Erdtmann, and M. Razeghi SPIE Conference, San Jose, CA, -- January 27, 1999 ...[Visit Journal] We report the first self-assembled InGaAs/InGaP quantum dot intersubband infrared photoconductive detectors (QDIPs) grown on semi-insulating GaAs substrate by low pressure metal organic chemical vapor deposition (MOCVD). The InGaAs quantum dots were constructed on an InGaP matrix as self assembling in Stranski-Krastanow growth mode in optimum growth conditions. The detector structure was prepared for single layer and multi-stacked quantum dots for active region. Normal incident photoconductive response was observed at a peak wavelength of 5.5 μm with a high responsivity of 130 mA/W, and a detectivity of 4.74 X 10⁷ cm·Hz^½/W at 77 K for multi-stack QDIP. Low temperature photoresponse of the single quantum dot photodetector was characterized. Peak response was obtained between 16 K and 60 K. The detailed dark current noise measurements were carried on single and multistack quantum dot infrared detectors. High photoconductive gain as 7.6 x 10³ biased at 0.5 V results in increasing the intersubband carrier relaxation time as two order of magnitude compared quantum well infrared photodetectors. [reprint (PDF)]
15.	High-responsivity GaInAs/InP Quantum Well Infrared Photodetectors Grown by Low-Pressure Metalorganic Chemical Vapor Deposition M. Erdtmann, A. Matlis, C. Jelen, M. Razeghi, and G. Brown SPIE Conference, San Jose, CA, -- January 26, 2000 ...[Visit Journal] We have studied the dependence of the well doping density in n-type GaInAs/InP quantum well IR photodetectors (QWIPs) grown by low-pressure metalorganic chemical vapor deposition. Three identical GaInAs/InP QWIP structures were grown with well sheet carrier densities of 1x10¹¹ cm^-2, 3x10¹¹ cm^-2, and 10x10¹¹ cm^-2; all three samples had very sharp spectral response at λ equals 9.0 μm. We find that there is a large sensitivity of responsivity, dark current, noise current, and detectivity with the well doping density. Measurements revealed that the lowest-doped samples had an extremely low responsivity relative to the doping concentration while the highest-doped sample had an excessively high dark current relative to doping. The middle-doped sample yielded the optimal results. This QWIP had a responsivity of 33.2 A/W and operated with a detectivity of 3.5x10¹⁰ cm·Hz^½·W^-1 at a bias of 0.75 V and temperature of 80 K. This responsivity is the highest value reported for any QWIP in the (lambda) equals 8-9 &mus;m range. Analysis is also presented explaining the dependence of the measured QWIP parameters to well doping density. [reprint (PDF)]
15.	High-Power CW Mid-IR Quantum Cascade Lasers J.R. Meyer, W.W. Bewley, J.R. Lindle, I. Vurgaftman, A.J. Evans, J.S. Yu, S. Slivken, and M. Razeghi SPIE Conference, Jose, CA, -- January 22, 2005 ...[Visit Journal] We report the cw operation of quantum cascade lasers that do not require cryogenic cooling and emit at λ = 4.7-6.2 µm. At 200 K, more than 1 W of output power is obtained from 12-µm-wide stripes, with a wall-plug efficiency (η_wall) near 10%. Room-temperature cw operation has also been demonstrated, with a maximum output power of 640 mW (η_wall = 4.5%) at 6 µm and 260 mW (η_wall = 2.3%) at 4.8 µm. Far-field characterization indicates that whereas the beam quality remains close to the diffraction limit in all of the tested lasers, in the devices emitting at 6.2 µm the beam tends to steer by as much as 5-10° degrees in either direction with varying temperature and pump current. [reprint (PDF)]
15.	The Molecular Beam Epitaxial Growth of InSb on (111) GaAs E. Michel, J. Kim, J. Xu, S. Javadpour, I. Ferguson, and M. Razeghi Applied Physics Letters 69 (2)-- July 8, 1996 ...[Visit Journal] The molecular beam epitaxial growth of InSb on (111)B GaAs has been investigated. It was found that for a given Sb/In ratio, a higher growth temperature was required for the growth of InSb on (111)B GaAs compared to that on (001) GaAs. This difference has been attributed to the bonding characteristics of the (111)B and (001) surface. Once growth had been optimized, it was found that the material characteristics of (111)B InSb were almost identical to that of (001) InSb, i.e., independent of orientation. For example, the x-ray full width at half-maximum and 300 K mobility had the same absolute values for (111) InSb and (001)InSb and followed the same dependence with the sample thickness. Te was found to be a well-behaved n-type dopant for (111)B InSb. [reprint (PDF)]
15.	Use of Yttria-Stabilised Zirconia Substrates for Zinc Oxide Mediated Epitaxial Lift-off of Superior Yttria-Stabilised Zirconia Thin Films D. J. Rogers, T. Maroutian, V. E. Sandana, P. Lecoeur, F. H. Teherani, P. Bove and M. Razeghi Proc. of SPIE Vol. 12887, Oxide-based Materials and Devices XV, 128870P 2024, San Francisco),doi: 10.1117/12.3023431 ...[Visit Journal] ZnO layers were grown on (100) and (111) oriented YSZ substrates by pulsed laser deposition (PLD). X-ray diffraction studies revealed growth of wurtzite ZnO with strong preferential (0002) orientation. The ZnO layer on YSZ (111) showed distinct Pendellosung fringes and a more pronounced c-axis orientation (rocking curve of 0.08°). Atomic force microscopy revealed RMS roughnesses of 0.7 and 2.2nm for the ZnO on the YSZ (111) and YSZ (100), respectively. YSZ was then grown on the ZnO buffered YSZ (111) substrate by PLD. XRD revealed that the YSZ overlayer grew with a strong preferential (111) orientation. The YSZ/ZnO/YSZ (111) top surface was temporary bonded to an Apiezon wax carrier and the sample was immersed in 0.1M HCl so as to preferentially etch/dissolve away the ZnO underlayer and release the YSZ from the substrate. XRD revealed only the characteristic (111) peak of YSZ after lift-off and thus confirmed both the dissolution of the ZnO and the preservation of the crystallographic integrity of the YSZ on the wax carrier. Optical and Atomic Force Microscopy revealed some buckling, roughening and cracking of the lifted YSZ, however. XRD suggested that this may have been due to compressive epitaxial strain release. [reprint (PDF)]
15.	Comparison of type-II superlattice and HgCdTe infrared detector technologies Jagmohan Bajaj; Gerry Sullivan; Don Lee; Ed Aifer; Manijeh Razeghi Proc. SPIE 6542, Infrared Technology and Applications XXXIII, 65420B (May 14, 2007)-- May 14, 2007 ...[Visit Journal] Performance of HgCdTe detector technology surpasses all others in the mid-wave and long-wave infrared spectrum. This technology is relatively mature with current effort focused on improving uniformity, and demonstrating increased focal plane array (FPA) functionality. Type-II superlattice (InAs-GaSb and related alloys) detector technology has seen rapid progress over the past few years. The merits of the superlattice material system rest on predictions of even higher performance than HgCdTe and of engineering advantages. While no one has demonstrated Type-II superlattice detectors with performance superior to HgCdTe detectors, the difference in performance between these two technologies is decreasing. In this paper, we review the status and highlight relative merits of both HgCdTe and Type-II superlattice based detector technologies. [reprint (PDF)]
15.	Recent Advances in LWIR Type-II InAs/GaSb Superlattice Photodetectors and Focal Plane Arrays at the Center for Quantum Devices M. Razeghi, D. Hoffman, B.M. Nguyen, P.Y. Delaunay, E.K. Huang, M.Z. Tidrow, and V. Nathan IEEE Proceedings, Vol. 97, No. 6, p. 1056-1066-- June 1, 2009 ...[Visit Journal] In recent years, Type-II InAs/GaSb superlattice photo-detectors have experienced significant improvements in material quality, structural designs, and imaging applications. They now appear to be a possible alternative to the state-of-the-art HgCdTe (MCT) technology in the long and very long wavelength infrared regimes. At the Center for Quantum Devices, we have successfully realized very high quantum efficiency, very high dynamic differential resistance R₀A - product LWIR Type – II InAs/GaSb superlattice photodiodes with efficient surface passivation techniques. The demonstration of high quality LWIR Focal Plane Arrays that were 100 % fabricated in - house reaffirms the pioneer position of this university-based laboratory. [reprint (PDF)]
15.	Resonant cavity enhanced heterojunction phototransistors based on type-II superlattices Jiakai Li, Arash Dehzangi, Donghai Wu, Ryan McClintock, Manijeh Razeghi Infrared Physics & Technology Available online 27 October 2020, 103552 https://doi.org/10.1016/j.infrared.2020.103552-- October 27, 2020 ...[Visit Journal] Resonant cavity enhanced heterojunction phototransistor based on InAs/GaSb/AlSb type-II superlattice grown by molecular beam epitaxy has been demonstrated. The resonant wavelength was designed to be at near 1.9 μm wavelength range at room temperature. An eleven-pair lattice matched GaSb-AlAsSb quarter-wavelength Bragg reflector was used in the RCE-HPT to enhance the photoresponse. The device showed the wavelength selectivity and a cavity enhancement of the responsivity at 1.9 μm at room temperature. [reprint (PDF)]
15.	Very high quality p-type Al_xGa_1-xN/GaN superlattice A. Yasan and M. Razeghi special ISDRS issue of Solid State Electronics Journal, 47-- January 1, 2003 ...[Visit Journal] Very high quality p-type Al_xGa_1−xN/GaN superlattice has been achieved through optimization of Mg flow and period of superlattice. Theoretical model was used to optimize the structure of superlattice by choosing suitable Al compositions and superlattice periods. The experiments show that for x=0.26, the resistivity is as low as 0.19 Ω cm and hole concentration is as high as 4.2×10¹⁸ cm⁻³, the highest values ever reported for p-type AlGaN/GaN superlattices. Hall effect measurement and admittance spectroscopy on the samples confirm the high quality of the superlattices. The activation energy calculated for p-type GaN and p-type A_0.1Ga_0.9N/GaN superlattice is estimated to be not, vert, similar 125 and 3 meV respectively. [reprint (PDF)]
15.	Band-gap narrowing and potential fluctuation in Si-doped GaN I.H. Lee, J.J. Lee, P. Kung, F.J. Sanchez, and M. Razeghi Applied Physics Letters 74 (1)-- January 4, 1999 ...[Visit Journal] We investigate the optical properties of two sets of Si-doped GaN epitaxial layers with different degree of compensation. The electron concentration dependence of the band-gap energy measured by photoluminescence is interpreted as band-gap narrowing effect and evaluated by a simple relation. The photoluminescence peak positions of heavily compensated samples are shifted downward with respect to those of moderately compensated samples, and the down shift becomes larger at higher electron density. Based on analysis of photoluminescence spectra, these prominent behaviors are accounted for by band-edge potential fluctuation associated with inhomogeneous residual impurities. [reprint (PDF)]

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