Publications by    
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51.  
Use of ZnO thin films as sacrifical templates for metal organic vapor phase epitaxy and chemical lift-off of GaN
Use of ZnO thin films as sacrifical templates for metal organic vapor phase epitaxy and chemical lift-off of GaN
D.J. Rogers, F. Hosseini Teherani, A. Ougazzaden, S. Gautier, L. Divay, A. Lusson, O. Durand, F. Wyczisk, G. Garry, T. Monteiro, M.R. Correira, M. Peres, A. Neves, D. McGrouther, J.N. Chapman, and M. Razeghi
Applied Physics Letters, Vol. 91, No. 7, p. 071120-1-- August 13, 2007
Continued development of GaN-based light emitting diodes is being hampered by constraints imposed by current non-native substrates. ZnO is a promising alternative substrate but it decomposes under the conditions used in conventional GaN metal organic vapor phase epitaxy (MOVPE). In this work, GaN was grown on ZnO/c-Al2O3 using low temperature/pressure MOVPE with N2 as a carrier and dimethylhydrazine as a N source. Characterization confirmed the epitaxial growth of GaN. The GaN was lifted-off the c-Al2O3 by chemically etching away the ZnO underlayer. This approach opens up the way for bonding of the GaN onto a support of choice. reprint
 
52.  
Materials characterization of n-ZnO/p-GaN:Mg/c-Al(2)O(3) UV LEDs grown by pulsed laser deposition and metal-organic chemical vapor deposition
Materials characterization of n-ZnO/p-GaN:Mg/c-Al(2)O(3) UV LEDs grown by pulsed laser deposition and metal-organic chemical vapor deposition
D. Rogers, F.H. Teherani, P. Kung, K. Minder, and M. Razeghi
Superlattices and Microstructures-- April 1, 2007
n-ZnO/p-GaN:Mg hybrid heterojunctions grown on c-Al2O3 substrates showed 375 nm room temperature electroluminescence. It was suggested that the high materials and interface quality obtained using pulsed laser deposition for the n-ZnO growth and metal–organic chemical vapor deposition for the p-GaN:Mg were key factors enabling the injection of holes and the radiative near band edge recombination in the ZnO. In this paper we present the materials characterization of this structure using x-ray diffraction, scanning electron microscopy and atomic force microscopy. reprint
 
53.  
Etching of ZnO Towards the Development of ZnO Homostructure LEDs
Etching of ZnO Towards the Development of ZnO Homostructure LEDs
K. Minder, F.H. Teherani, D. Rogers, C. Bayram, R. McClintock, P. Kung, and M. Razeghi
SPIE Conference, January 25-29, 2007, San Jose, CA Proceedings – Zinc Oxide Materials and Devices II, Vol. 6474, p. 64740Q-1-6-- January 29, 2007
Although ZnO has recently gained much interest as an alternative to the III-Nitride material system, the development of ZnO based optoelectonic devices is still in its infancy. Significant material breakthroughs in p-type doping of ZnO thin films and improvements in crystal growth techniques have recently been achieved, making the development of optoelectonic devices possible. First, a survey of current ZnO processing methods is presented, followed by the results of our processing research. reprint
 
54.  
Electroluminescence at 375 nm from a Zn0/GaN:Mg/c-Al<sub>2</sub>O<sub>3</sub> heterojunction light emitting diodes
Electroluminescence at 375 nm from a Zn0/GaN:Mg/c-Al2O3 heterojunction light emitting diodes
D.J. Rogers, F.Hosseini Teherani, A. Yasan, K. Minder, P. Kung, and M. Razeghi
Applied Physics Letters, 88 (14)-- April 13, 2006
n-ZnO/p-GaN:Mg heterojunction light emitting diode (LED) mesas were fabricated on c-Al2O3 substrates using pulsed laser deposition for the ZnO and metal organic chemical vapor deposition for the GaN:Mg. Room temperature (RT) photoluminescence (PL) showed an intense main peak at 375 nm and a negligibly low green emission indicative of a near band edge excitonic emission from a ZnO layer with low dislocation/defect density. The LEDs showed I-V characteristics confirming a rectifying diode behavior and a RT electroluminescence (EL) peaked at about 375 nm. reprint
 
55.  
Investigations of p-type signal for ZnO thin films grown on (100) GaAs substrates by pulsed laser deposition
Investigations of p-type signal for ZnO thin films grown on (100) GaAs substrates by pulsed laser deposition
D.J. Rogers, F. Hosseini Teherani, T. Monteiro, M. Soares, A. Neves, M. Carmo, S. Periera, M.R. Correia, A. Lusson, E. Alves, N.P. Barradas, J.K. Morrod, K.A. Prior, P. Kung, A. Yasan, and M. Razeghi
Phys. Stat. Sol. C, 3 (4)-- March 1, 2006
n this work we investigated ZnO films grown on semi-insulating (100) GaAs substrates by pulsed laser deposition. Samples were studied using techniques including X-ray diffraction (XRD), scanning electron microscopy, atomic force microscopy, Raman spectroscopy, temperature dependent photoluminescence, C-V profiling and temperature dependent Hall measurements. reprint
 
56.  ZnO Thin Film Templates for GaN-based Devices
D.J. Rogers, F. Hosseini Teherani, A. Yasan, R. McClintock, K. Mayes, S.R. Darvish, P. Kung, M. Razeghi and G. Garry
SPIE Conference, Jose, CA, Vol. 5732, pp. 412-- January 22, 2005
GaN-based optoelectronic devices are plagued by a tendency to non-radiative transitions linked to defects in the active layers. ZnO is promising as a substrate material for GaN because it has the same wurtzite structure and a relatively small lattice mismatch (~1.8%). In this paper, we discuss use of ZnO thin films as templates for GaN based LED. reprint
 

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