Center for Quantum Devices - Journal Articles and Conference Proceedings

Page 1 (23 Items)

1.	Intersubband hole absorption in GaAs-GaInP Quantum Wells grown by Gas Source Molecular Beam Epitaxy J. Hoff, C. Jelen, S. Slivken, E. Michel, O. Duchemin, E. Bigan, and M. Razeghi with G. Brown and S.M. Hegde (Wright Laboratory) Applied Physics Letters 65 (9)-- August 29, 1994 P-doped GaAs‐GaInP quantum wells have been grown on GaAs substrate by gas source molecular beam epitaxy. Structural quality has been evidenced by x-ray diffraction. A narrow low-temperature photoluminescence full width at half‐maximum has been measured. Strong hole intersubband absorption has been observed at 9 μm, and its dependence on light polarization has been investigated. reprint
2.	cw phase‐locked array Ga0.25In0.75As0.5P0.5‐InP high power semiconductor laser grown by low‐pressure metalorganic chemical vapor deposition M. Razeghi; R. Blondeau; M. Krakowski; B. de Cremoux; J. P. Duchemin; F. Lozes; M. Martinot; M. A. Bensoussan Appl. Phys. Lett. 50, 230–232 (1987)-- February 2, 1987 Continuous and pulsed phase-locked operation of a high power GalnAsP-InP semiconductor laser emi.tting at 1.3 f1m has been achieved. The laser consists ofa seven-striped array of ridgeisland lasers fabricated by a two-step low-pressure metalorgallic chemical vapor deposition growth technique. Linear output powers greater than 300 mW (pulsed) and 120 mW (cw) have been obtained with no facet coatings. The far-field full widths at half power, both paranel and perpendicular to the junction plane, were Y and 4Y, respectively, at 10 mW (at 20°C) which is evidence for strong stripe-to-stripe coupling.
3.	First observation of the quantum Hall effect in a Ga0.47In0.53As‐InP heterostructure with three electric subbands M. Razeghi; J. P. Duchemin; J. C. Portal; L. Dmowski; G. Remeni; R. J. Nicholas; A. Briggs M. Razeghi, J. P. Duchemin, J. C. Portal, L. Dmowski, G. Remeni, R. J. Nicholas, A. Briggs; First observation of the quantum Hall effect in a Ga0.47In0.53As‐InP heterostructure with three electric subbands. Appl. Phys. Lett. 17 March 1986; 48 (11)-- March 17, 1986 Shubnikov–de Haas and quantum Hall effects have been studied in GaInAs‐InP heterojunctions grown by modified low pressure metalorganic chemical vapor deposition. In contrast to the results reported up till now on GaInAs‐InP heterojunctions with nearly the same channel electron density, not one but three electric subbands, E0, E1, and E2, are occupied in zero magnetic field. Two electric subbands E0 and E1 contribute to the quantum Hall effect. Magnetic depopulation of the higher (E1 and E2) subbands is observed in both perpendicular and tilted magnetic field orientations. This enables a demonstration of the importance of intersubband scattering in resistivity and cyclotron resonance. reprint
4.	Low-threshold distributed feedback lasers fabricated on material grown completely by LP-MOCVD M. Razeghi; R. Blondeau; M. Krakowski; J.-C. Bouley; M. Papuchon; B. Cremoux; J. Duchemin IEEE Journal of Quantum Electronics ( Volume: 21, Issue: 6, June 1985)-- June 30, 1985 GaInAsP-InP distributed feedback (DFB) lasers emitting at 1.57 μm have been fabricated on material grown completely by low-pressure metalorganic chemical vapor deposition (LP-MOCVD). The CW threshold current of 60 mA and an output power of 6 mW per facet at room temperature have been obtained. The lasing wavelength λLunder CW operation showed a temperature coefficient (d_{\lambdaL}/dT) of 0.9 Å/°C for this DFB laser over the range of10-90\degC. A stable single longitudinal mode was maintained under high speed pulse modulation up to 500 ps, and sinusoidal modulation at 1 Ghz.
5.	Very low threshold buried ridge structure lasers emitting at 1.3 μm grown by low pressure metalorganic chemical vapor deposition M. Razeghi; R. Blondeau; K. Kazmierski; M. Krakowski; J. P. Duchemin M. Razeghi, R. Blondeau, K. Kazmierski, M. Krakowski, J. P. Duchemin; Very low threshold buried ridge structure lasers emitting at 1.3 μm grown by low pressure metalorganic chemical vapor deposition. Appl. Phys. Lett. 15 January 1985; 46 (2): 131–133.-- January 15, 1985 GaInAsP‐InP buried ridge structure lasers emitting at 1.3 μm have been fabricated on material grown completely by low pressure metalorganic chemical vapor deposition. These lasers have low threshold (11 mA), exhibit linear (kink‐free) light‐current characteristics up to high powers (10 mW/facets), and can be operated at high temperatures (70 °C). Excellent uniformity over 10 cm2 has been obtained, and an external quantum efficiency of 60% for two faces has been measured.
6.	Two‐dimensional electron gases in quantum well and superlattices of Ga0.25In0.75As0.50P0.50/InP heterostructures grown by low pressure metalorganic chemical vapor deposition M. Razeghi; J. P. Duchemin; J. C. Portal M. Razeghi, J. P. Duchemin, J. C. Portal; Two‐dimensional electron gases in quantum well and superlattices of Ga0.25In0.75As0.50P0.50/InP heterostructures grown by low pressure metalorganic chemical vapor deposition. Appl. Phys. Lett. 1 January 1985; 46 (1): 46–48.-- January 1, 1985 We report the first observation of a two‐dimensional electron gas from Shubnikov–de Haas experiments, in a Ga0.25In0.75As0.50P0.50‐InP heterojunction, multi‐quantum well, and superlattices grown by metalorganic chemical vapor deposition at reduced pressure.
7.	LOW PRESSURE METALORGANIC CHEMICAL VAPOR DEPOSITION OF InP AND REI~ATED COMPOUNDS M. Razeghi, M.A. Poisson, J.P. Larivain, J.P. Duchemin Manijeh Razeghi, Chapter 5 Low-Pressure Metallo-Organic Chemical Vapor Deposition of GaxIn1−xAsyP1−y Alloys, Editor(s): W.T. Tsang, Semiconductors and Semimetals, Elsevier, Volume 22, Part A, 1985, Pages 299-378, ISSN 0080-8784, ISBN 9780127521220-- January 1, 1985 This chapter discusses that metallo-organic chemical vapor deposition (MOCVD) has emerged as a valuable tool for the growth of device-quality epitaxial layers of InP, G0.47In0.53 As, and GaxIn1–xAsyP1–y. The GaInAsP/InP alloy system has many advantages and has been given considerable research attention for electro-optical device applications. However, there are still important unsolved problems for the growth of these materials with liquid-phase epitaxy (LPE), vapor-phase epitaxy (VPE), and molecular-beam epitaxy (MBE). One of these is the development of practical LPE techniques for reproducibly growing InP and GaInAsP alloys with a low carrier concentration level. This is especially important for the fabrication of p-i-n and avalanche photodiodes. A further problem with LPE is the growth of InP on longer-wavelength layers, such as GaInAs, without any interface compositional grading layers and anti-melt-back layers. With the VPE technique, it is difficult to obtain misfit dislocation-free InP-GaInAsP-InP heterostructures and very thin layers. A problem for the MBE technique is the growth of phosphorus-bearing alloys.
8.	Recent advances in MOCVD growth of InxGa1-xAsyP1-y alloys M. Razeghi, J.P. Duchemin M. Razeghi, J.P. Duchemin, Recent advances in MOCVD growth of InxGa1-xAsyP1-y alloys, Journal of Crystal Growth, Volume 70, Issues 1–2, 1984, Pages 145-149,-- December 1, 1984 The low pressure metalorganic chemical vapour deposition (LPMOCVD) growth of GaxIn1-xAsyP1-y-InP lattice matched system, with high mobilities, sharp interfaces, low background doping densities, and the formation of a two-dimensional electron gas (2DEG) at the interfaces, has recently made spectacular advances, as in evidenced by the availability of high quality DH lasers, PIN photodiodes, and Gunn diodes. We present here some new results obtained on the above-mentioned material and devices. reprint
9.	CW operation of GaInAsP buried ridge structure laser at 1.5 μm grown by LP-MOCVD R. Blondeau, M. Razeghi, M. Krakowski, G. Vilain, B. de Cremoux, J.-P. Duchemin Electronics Letters Volume 20, Issue 21-- October 1, 1984 A GaInAsP buried ridge structure laser (BRSL) emitting at 1.5 μm and fabricated on material grown entirely by LP-MOCVD is described for the first time in the letter. Threshold currents of 40 mA DC and an output power up to 15 mW have been obtained at room temperature. CW operation up to 60°C has been achieved.
10.	cw operation of 1.57‐μm GaxIn1−xAsyP1−yInP distributed feedback lasers grown by low‐pressure metalorganic chemical vapor deposition M. Razeghi; R. Blondeau; K. Kazmierski; M. Krakowski; B. de Cremoux; J. P. Duchemin; J. C. Bouley Appl. Phys. Lett. 45, 784–786 (1984)-- October 1, 1984 Continuous wave operation of 1. 57-Jim distributed feedback lasers fabricated on material grown by two-step low-pressure metalorganic chemical vapor deposition growth process is reported for the first time. Room-temperature continuous wave threshold currents as low as 60 rnA have been measured for devices with cavity length of 300 Jim and stripe width of 5 Jim. Single longitudinal mode operation at fixed mode was obtained under the continuous wave condition, in the temperature range 9-90 °C, with the wavelength shift of 0.9 A/C. A stop band of25 A in which no resonance mode emission existed, was observed in the output spectrum of the distributed feedback laser.
11.	1.2–1.6 μm GaxIn1−xAsyP1−y-InP DH lasers grown by LPMOCVD M. Razeghi, B. de Crémoux, J.P. Duchemin M. Razeghi, B. de Crémoux, J.P. Duchemin, 1.2–1.6 μm GaxIn1−xAsyP1−y-InP DH lasers grown by LPMOCVD, Journal of Crystal Growth, Volume 68, Issue 1, 1984, Pages 389-397,-- September 1, 1984 Room temperature pulse operation and continuous wave (CW) operation in the 1.2–1.6 μm region have been achieved in GaInAsP-InP DH lasers fabricated on material grown by LPMOCVD. Threshold currents density as low as 430 A/cm2 (cavity length of 950 μm) have been measured for devices emitting at 1.3 μm. Threshold current densities of 1060 A/cm2 (cavity length of 400 μm) have been obtained for devices emitting at 1.55 μm, with active layer thicknesses of 0.22 μm. Values of T0 between 60 and 70 K have been obtained. Fundamental transverse mode oscillation has been achieved (for CW operation) up to an output power of 10 mW. The preliminary results on the aging test are most encouraging and demonstrate that the LPMOCVD lasers emitting at 1.2–1.6 μm have comparable degradation rates to those of LPE lasers suggesting the LPMOCVD technique is promising for large scale production of laser diodes. reprint
12.	Metalorganic chemical vapor deposition of undoped In1−xAlxAs on InP M. A. di Forte‐Poisson; M. Razeghi; J. P. Duchemin M. A. di Forte‐Poisson, M. Razeghi, J. P. Duchemin; Metalorganic chemical vapor deposition of undoped In1−xAlxAs on InP. J. Appl. Phys. 1 December 1983; 54 (12): 7187–7189. https://doi.org/10.1063/1.331956-- December 1, 1983 In1−x Alx As epitaxial layers were grown on (100) InP substrates by the organometallic vapor phase epitaxy method. Undoped layers with mirror smooth surfaces were obtained for substrate temperatures of 600–650 °C. By adjusting the relative ratio of In and Al, lattice matched In0.52 Al0.48 As epilayers were reproducibly grown on InP substrates. X‐ray measurements, scanning Auger analyses, and electron mobilities are presented. These results show that the quality of the epilayers obtained here was comparable to the best reported layers grown by other methods. reprint
13.	Growth and characterization of InP using metalorganic chemical vapor deposition at reduced pressure M. Razeghi, J.P. Duchemin M. Razeghi, J.P. Duchemin, Growth and characterization of InP using metalorganic chemical vapor deposition at reduced pressure, Journal of Crystal Growth, Volume 64, Issue 1, 1983, Pages 76-82,-- November 1, 1983 M. Razeghi, J.P. Duchemin, Growth and characterization of InP using metalorganic chemical vapor deposition at reduced pressure, Journal of Crystal Growth, Volume 64, Issue 1, 1983, Pages 76-82, reprint
14.	Aging test of MOCVD shallow proton stripe GaInAsP/InP, DH laser diode emitting at 1.5 μm M. Razeghi, P. Hirtz, R. Blondeau, B. de Cremoux, J.-P. Duchemin Electronics Letters Volume 19, Issue 13-- June 1, 1983 We report on the aging of a continuous-wave (CW) GaInAsP/InP double-heterostructure laser emitting at 1.5 μm, grown for the first time by MOCVD. This device has been operated at room temperature for more than 104 h without significant degradation.
15.	Low pressure-MOCVD growth of Ga0.47In0.53As-InP heterojunction and superlattices M. Razeghi, J.-P. Duchemin @article{Razeghi1983LowPG, title={Low pressure‐MOCVD growth of Ga0.47In0.53As–InP heterojunction and Manijeh Razeghi and J. P. Duchemin, Journal of Vacuum Science & Technology B, 983, volume-1, pages=262-265 -- April 1, 1983 We report the latest results of a continuing study of low pressure‐metal–organic chemical vapor deposition (LP‐MOCVD) growth of InP and Ga0.47In0.53As–InP heterojunctions and superlattices, which describe the general growth of InP and GaInAs with specific application to quantum well heterostructure. A study of the sources and control of residual impurities in InP and Ga0.47In0.53As, the effects of source purity upon residual impurities, mobility, and 2 K PL intensity are detailed. Total impurity concentrations as low as 6×1014 cm−3 for InP and 3×1014 cm−3 for Ga0.47In0.53As have been obtained. Mobility as high as=μ (300)=5350, μ (77)=60 000 cm2 V−1 s−1 for InP, and μ (300)=12 000, μ (77)=60 000, μ (2)=100 000 cm2 V−1 s−1 for GaInAs layers have been measured.
16.	Very low threshold GaInAsP/InP double-heterostructure lasers grown by LP MOCVD M. Razeghi, S. Hersee, P. Hirtz, R. Blondeau, B. de Cremoux, J.- P. Duchemin Electronics Letters Volume 19, Issue 9-- April 1, 1983 Room-temperature GaInAsP/InP DH lasers emitting at 1.3 μm and having very low threshold current densities have been grown by LP MOCVD. Thresholds were lower than the best values reported for comparable devices grown by LPE, the lowest threshold being 430 A/cm2 for a cavity length of 950 μm (width 150 μm) with an active-layer thickness of d = 2200 A.
17.	Low pressure metalorganic chemical vapor deposition of InP and related compounds M. Razeghi, M. A. Poisson, J. P. Larivain & J. P. Duchemin Razeghi, M., Poisson, M.A., Larivain, J.P. et al. Low pressure metalorganic chemical vapor deposition of InP and related compounds. J. Electron. Mater. 12, 371–395 (1983). https://doi.org/10.1007/BF02651138-- March 1, 1983 The low pressure metalorganic chemical vapor deposition epitaxial growth and characterization of InP, Ga0.47In0.53 As and GaxIn1-xAsyP1-y, lattice-matched to InP substrate are described. The layers were found to have the same etch pit density (EPD) as the substrate. The best mobility obtained for InP was 5300 cm2 V−1S−1 at 300 K and 58 900 cm2 V−1 S−1 at 772K, and for GaInAs was 11900 cm2 V−1 S−1 at 300 K, 54 600 cm2 V−1 S−1 at 77 K and 90 000 cm V−1S−1 at 2°K. We report the first successful growth of a GaInAs-InP superlattice and the enhanced mobility of a two dimensional electron gas at a GaInAs -InP heterojunction grown by LP-MO CVD. LP MO CVD material has been used for GaInAsPInP, DH lasers emitting at 1.3 um and 1.5 um. These devices exhibit a low threshold current, a slightly higher than liquid phase epitaxy devices and a high differential quantum efficiency of 60%. Fundamental transverse mode oscillation has been achieved up to a power outpout of 10 mW. Threshold currents as low as 200 mA dc have been measured for devices with a stripe width of 9 um and a cavity length of 300 um for emission at 1.5 um. Values of T in the range 64–80 C have been obtained. Preliminary life testing has been carried out at room temperature on a few laser diodes (λ = 1.5μm). Operation at constant current for severalthousand hours has been achieved with no change in the threshold current. reprint
18.	TEG IN LP-MO CVD Ga 0 4 7 ln 0 S3 As-lnP SUPERLATTICE M. RAZEGHIM. A. POISSONJ. P. LARIVAINB. de CREMOUXJ. P. DUCHEMIN ELECTRONICS LETTERs, 1982 ,Vol. 18-- April 15, 1982 We report the first successful growth of Ga o .4. 7 In 0 . J3 As-InPsuperlattice by the low-pressure metalorganic chemicalvapour deposition technique, and evidence for TEG proper-ties in these structures. reprint
19.	Room temperature CW operation of GaInAsP/InP double heterostructure diode lasers emitting at 1.5 μm grown by low pressure metalorganic chemical vapour deposition (LP-MO CVD) M. Razeghi, P. Hirtz, R. Blondeau, J.-P. Larivain, L. Noel, B. de Cremoux, J.-P. Duchemin Electronics Letters Volume 18, Issue 3 https://doi.org/10.1049/el:19820088-- February 1, 1982 Room temperature continuous wave (CW) operation at 1.5 μm has been achieved in GaInAsP/InP DH lasers fabricated on material grown by low-pressure metalorganic chemical vapour deposition (LP-MO CVD). Threshold currents as low as 200 mA DC have been measured for devices with a stripe width of 9 μm and a cavity length of 300 μm. Values of To as high as 64 K have been obtained, where To is defined by the expression Jth(T) = Jth(0) exp (T/To). Fundamental transverse mode oscillation has been achieved up to an output power of 10 mW.
20.	GaInAs and GaInAsP materials grown by low pressure MOCVD for microwave and optoelectronic applications J.P. Duchemin, J.P. Hirtz, M. Razeghi, M. Bonnet , S.D. Hersee J.P. Duchemin, J.P. Hirtz, M. Razeghi, M. Bonnet, S.D. Hersee, GaInAs and GaInAsP materials grown by low pressure MOCVD for microwave and optoelectronic applications, Journal of Crystal Growth, Volume 55, Issue 1, 1981, Pages 64-73-- October 1, 1981 The low pressure MOCVD technique has been successfully used to grow GaInAsP, lattice-matched to InP, for the complete compositional range between InP (λ=0.91 μm) and the ternary compound Ga0.47In0.53As (λ=1.67 μm). By contrast to LPE growth it has been found that during the MOCVD growth of double heterostructures InP can be grown directly onto the ternary or quaternary with no disturbance of the active layer, i.e. there is no effect equivalent to “melt back”. The compositional grading on both sides of the active layer was measured by scanning Auger spectroscopy on bevelled samples. It was found that the graded regions were typically less than 100 Å wide for GaInAsP active layers and less than 50 Å wide for GaInAs active layers. Single layers of undoped GaInAs exhibited a typical mobility of 6700 cm2 V-1s-1 at 1.5×1017 cm-3. The compositional uniformity of the ternary layers was characterised by measurement of the photoluminescence wavelength at various points on a large sample. The wavelength varied by <3 nm over 95% of the area, which was approximately 8 cm2. Our early MOCVD grown GaInAsP/InP DH lasers exhibited high thresholds due to a poor interface between the p-InP and the active layer. However, recently fabricated broad area lasers emitting at 1.27 μm show an average threshold current density of 1.5 kA cm-2 with a T0 of between 70 to 80 K. Stripe geometry lasers have being fabricated from this material and CW operation has been obtained. reprint
21.	1-5 jim ROOM-TEMPERATURE PULSED OPERATION OF GalnAsP/lnP DOUBLE HETEROSTRUCTURE GROWN BY LP MOCVD Manijeh Razeghi, P. Hirtz, J.P. Larivain, R. Blondeau, B. de Crémoux, J.P. Duchemin, ELECTRONICS LETTERS, vol. 17, no.18-- September 3, 1981 The letter reports the first successful room-temperature pulsed operation of a broad-area contact laser of GaInAsP/InP double heterostructure, grown by LP MOCVD, emitting at 1.5 μm. Pulsed thresholds as low as 2.5 kA/cm2 have been obtained for 1.5 μm, for an active layer thickness of 0.48 μm. This is equal to a current density per micrometre of 5.2 kA cm−2 μm−1. InxGa1−xAsyP1−y, III, III, V, V alloys are of great interest for use in infra-red devices. They can be grown lattice matched on InP over a wide range of compositions. The resulting bandgap (1.35–0.75 eV) covers a spectral range which contains the region of lowest losses and lowest dispersion in modern optical fibres. This property makes In1−xGaxASyP1−y, very attractive as a semiconductor laser and detector material for future fibre communication systems. reprint
22.	GalnAs AND GaInAsP MATERIALS GROWN BY LOW PRESSURE MOCVD FOR MICROWAVE AND OPTOELECTRONIC APPLICATIONS J.P. Duchemin, J.P. Hirtz, M. Razeghi, M. Bonnet , S.D. Hersee J.P. Duchemin, J.P. Hirtz, M. Razeghi, GaInAs and GaInAsP materials grown by low pressure MOCVD for microwave and optoelectronic applications, Journal of Crystal Growth, 55, 1, 1981, Pages 64-73,-- August 1, 1981 The low pressure MOCVD technique has been successfully used to grow GaInAsP, lattice-matched to InP, for the complete compositional range between InP (λ=0.91 μm) and the ternary compound Ga0.47In0.53As (λ=1.67 μm). By contrast to LPE growth it has been found that during the MOCVD growth of double heterostructures InP can be grown directly onto the ternary or quaternary with no disturbance of the active layer, i.e. there is no effect equivalent to “melt back”. The compositional grading on both sides of the active layer was measured by scanning Auger spectroscopy on bevelled samples. It was found that the graded regions were typically less than 100 Å wide for GaInAsP active layers and less than 50 Å wide for GaInAs active layers. Single layers of undoped GaInAs exhibited a typical mobility of 6700 cm2 V-1s-1 at 1.5×1017 cm-3. The compositional uniformity of the ternary layers was characterised by measurement of the photoluminescence wavelength at various points on a large sample. The wavelength varied by <3 nm over 95% of the area, which was approximately 8 cm2. Our early MOCVD grown GaInAsP/InP DH lasers exhibited high thresholds due to a poor interface between the p-InP and the active layer. However, recently fabricated broad area lasers emitting at 1.27 μm show an average threshold current density of 1.5 kA cm-2 with a T0 of between 70 to 80 K. Stripe geometry lasers have being fabricated from this material and CW operation has been obtained. reprint
23.	Low threshold GaInAsP/InP lasers with good temperature dependence grown by low pressure MOVPE J.-P. Hirtz, M. Razeghi, J.-P. Larivain, S. Hersee, J.-P. Duchemin Electronics Letters Volume 17, Issue 3 https://doi.org/10.1049/el:19810081-- February 1, 1981 Room temperature pulsed operation has been achieved in the 1.2–1.3 μm region for GaInAsP/InP lasers grown by low pressure metalorganic vapour phase epitaxy. Thresholds as low as 1.2 kA/cm2 and threshold temperature dependences of exp T/T0, with T0 up to 80 K, have been obtained. reprint

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