Center for Quantum Devices - Journal Articles and Conference Proceedings

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1.	Resonant cavity enhanced heterojunction phototransistors based on type-II superlattices Jiakai Li, Arash Dehzangi, Donghai Wu, Ryan McClintock, Manijeh Razeghi Infrared Physics & Technology Available online 27 October 2020, 103552 https://doi.org/10.1016/j.infrared.2020.103552-- October 27, 2020 Resonant cavity enhanced heterojunction phototransistor based on InAs/GaSb/AlSb type-II superlattice grown by molecular beam epitaxy has been demonstrated. The resonant wavelength was designed to be at near 1.9 μm wavelength range at room temperature. An eleven-pair lattice matched GaSb-AlAsSb quarter-wavelength Bragg reflector was used in the RCE-HPT to enhance the photoresponse. The device showed the wavelength selectivity and a cavity enhancement of the responsivity at 1.9 μm at room temperature. reprint
2.	Demonstration of Planar Type-II Superlattice-Based Photodetectors Using Silicon Ion-Implantation Arash Dehzangi, Donghai Wu, Ryan McClintock, Jiakai Li, Alexander Jaud and Manijeh Razeghi Photonics 2020, 7(3), 68; https://doi.org/10.3390/photonics7030068-- September 3, 2020 In this letter, we report the demonstration of a pBn planar mid-wavelength infrared photodetectors based on type-II InAs/InAs1−xSbx superlattices, using silicon ion-implantation to isolate the devices. At 77 K the photodetectors exhibited peak responsivity of 0.76 A/W at 3.8 µm, corresponding to a quantum efficiency, without anti-reflection coating, of 21.5% under an applied bias of +40 mV with a 100% cut-off wavelength of 4.6 µm. With a dark current density of 5.21 × 10−6 A/cm2, under +40 mV applied bias and at 77 K, the photodetector exhibited a specific detectivity of 4.95 × 1011 cm·Hz1/2/W. reprint
3.	Planar nBn type-II superlattice mid-wavelength infrared photodetectors using zinc ion-implantation Arash Dehzangi, Donghai Wu, Ryan McClintock, Jiakai Li, and Manijeh Razeghi Appl. Phys. Lett. 116, 221103 https://doi.org/10.1063/5.0010273-- June 2, 2020 In this Letter, we report the demonstration of zinc ion-implantation to realize planar mid-wavelength infrared photodetectors based on type-II InAs/InAs1−xSbx superlattices. At 77 K, the photodetectors exhibit a peak responsivity of 0.68 A/W at 3.35 μm, corresponding to a quantum efficiency of 23.5% under Vb = −80 mV, without anti-reflection coating; these photodetectors have a 100% cutoff wavelength of 4.28 μm. With an R0 × A value of 1.53 × 104 Ω cm2 and a dark current density of 1.23 × 10−6 A/cm2 under an applied bias of −80 mV at 77 K, the photodetectors exhibit a specific detectivity of 9.12 × 1011 cm·Hz1/2/W. reprint
4.	Type-II superlattice-based heterojunction phototransistors for high speed applications Jiakai Li, Arash Dehzangi, Donghai Wu, Ryan McClintock, Manijeh Razeghi Infrared Physics and Technology 108, 1033502-- May 2, 2020 In this study, high speed performance of heterojunction phototransistors (HPTs) based on InAs/GaSb/AlSb type-II superlattice with 30 nm base thickness and 50% cut-off wavelength of 2.0 μm at room temperature are demonstrated. We studied the relationship between -3 dB cut-off frequency of these HPT versus mesa size, applied bias, and collector layer thickness. For 8 μm diameter circular mesas HPT devices with a 0.5 μm collector layer, under 20 V applied bias voltage, we achieved a -3 dB cut-off frequency of 2.8 GHz. reprint
5.	Solar-blind photodetectors based on Ga₂O₃ and III-nitrides Ryan McClintock; Alexandre Jaud; Lakshay Gautam; Manijeh Razeghi Proc. SPIE 11288, Quantum Sensing and Nano Electronics and Photonics XVII, 1128803-- January 31, 2020 Recently, there has been a surge of interest in the wide bandgap semiconductors for solar blind photo detectors (SBPD). This work presents our recent progress in the growth/doping of AlGaN and Ga₂O₃ thin films for solar blind detection applications. Both of these thin films grown are grown by metal organic chemical vapor deposition (MOCVD) in the same Aixtron MOCVD system. Solar-blind metal-semiconductor-metal photodetectors were fabricated with Ga₂O₃. Spectral responsivity studies of the MSM photodetectors revealed a peak at 261 nm and a maximum EQE of 41.7% for a −2.5 V bias. We have also demonstrated AlGaN based solar-blind avalanche photodiodes with a gain in excess of 57,000 at ~100 volts of reverse bias. This gain can be attributed to avalanche multiplication of the photogenerated carriers within the device. Both of these devices show the potential of wide bandgap semiconductors for solar blind photo detectors. reprint
6.	High speed type-II superlattice based photodetectors transferred on sapphire Arash Dehzangi, Ryan McClintock, Donghai Wu, Jiakai Li, Stephen Johnson, Emily Dial and Manijeh Razeghi Applied Physics Express, Volume 12, Number 11-- October 3, 2019 We report the substrate transfer of InAs/GaSb/AlSb based type-II superlattice (T2SL) e-SWIR photodetector from native GaSb substrates to low loss sapphire substrate in order to enhance the frequency response of the device. We have demonstrated the damage-free transfer of T2SL-based thin-films to sapphire substrate using top–down processing and a chemical epilayer release technique. After transfer the −3 dB cut-off frequency increased from 6.4 GHz to 17.2 GHz, for 8 μm diameter circular mesas under -15 V applied bias. We also investigated the cut-off frequency verses applied bias and lateral scaling to assess the limitations for even higher frequency performance. Direct Link reprint
7.	MOCVD grown β-Ga₂O₃ metal-oxide-semiconductor field effect transistors on sapphire Ji-Hyeon Park , Ryan McClintock, Alexandre Jaud, Arash Dehzangi , Manijeh Razeghi Applied Physics Express 12, 095503-- August 28, 2019 We fabricated β-Ga₂O₃:Si metal-oxide field-effect transistors (MOSFETs) on c-plane sapphire substrates which typically showed maximum drain current of 100 mA·mm⁻¹. β-Ga₂O₃:Si thin films were realized on c-plane sapphire substrates through a combination of metalorganic chemical vapor deposition and post-annealing. The MOSFET device presented excellent on/off drain current ratio of ∼10¹¹ with very low gate leakage current, sharp pinch off behavior, and a breakdown voltage of 400 V at VG = −40 V. The growth and fabrication of β-Ga₂O₃:Si MOSFETs on c-plane sapphire is valuable to its demonstration of the great potential for future high-power electronic devices. reprint
8.	Ga₂O₃ Metal-oxide-semiconductor Field Effect Transistors on Sapphire Substrate by MOCVD Ji-Hyeon Park, Ryan McClintock and Manijeh Razeghi Semiconductor Science and Technology, Volume 34, Number 8-- June 26, 2019 Si-doped gallium oxide (Ga₂O₃) thin films were grown on a c-plane sapphire substrate by metalorganic chemical vapor deposition (MOCVD) and fabricated into metal oxide semiconductor field effect transistors (MOSFETs). The Ga₂O₃ MOSFETs exhibited effective gate modulation of the drain current with a complete channel pinch-off for VG < −25 V, and the three-terminal off-state breakdown voltage was 390 V. The device shows a very low gate leakage current (~50 pA/mm), which led to a high on/off ratio of ~10⁸. These transistor characteristics were stable from room temperature to 250 °C reprint
9.	Investigation of surface leakage reduction for small pitch shortwave infrared photodetectors Arash Dehzangi, Quentin Durlin, Donghai Wu, Ryan McClintock, Manijeh Razeghi Semiconductor Science and Technology, 34(6), 06LT01-- May 25, 2019 Different passivation techniques are investigated for reducing leakage current in small pixel (down to 9 μm) heterostructure photodetectors designed for the short-wavelength infrared range. Process evaluation test chips were fabricated using the same process as for focal plane arrays. Arrays of small photodetectors were electrically characterized under dark conditions from 150 K to room temperature. In order to evaluate the leakage current, we studied the relation between the inverse of dynamic resistance at −20 mV and zero bias and perimeter over area P/A ratio as the pixel size is scaled down. At 150 K, leakage current arising from the perimeter dominates while bulk leakage dominates at room temperature. We find that in shortwave devices directly underfilling hybridized devices with a thermoset epoxy resin without first doing any additional passivation/protection after etching gives the lowest leakage with a surface resistance of 4.2 × 10⁹ and 8.9 × 10³ Ω· cm⁻¹ at 150 and 300 K, for −20 mV of bias voltage, respectively. reprint
10.	Extended short wavelength infrared heterojunction phototransistors based on type II superlattices Arash Dehzangi , Ryan McClintock, Donghai Wu , Abbas Haddadi, Romain Chevallier , and Manijeh Razeghi Applied Physics Letters 114, 191109-- May 17, 2019 A two terminal extended short wavelength infrared heterojunction phototransistor based on type-II InAs/AlSb/GaSb on a GaSb substrate is designed, fabricated, and investigated. With the base thickness of 40 nm, the device exhibited a 100% cut-off wavelength of 2.3 λ at 300 K. The saturated peak responsivity value is 320.5 A/W at 300 K, under front-side illumination without any antireflection coating. A saturated optical gain of 245 at 300K was measured. At the same temperature, the device exhibited a collector dark current density (at unity optical gain) and a DC current gain of 7.8 X 10³ A/cm² and 1100, respectively. The device exhibited a saturated dark current shot noise limited specific detectivity of 4.9 X 10¹¹ cm·Hz^½/W at 300 K which remains constant over a broad range of wavelengths and applied biases. reprint
11.	Antimonite-based gap-engineered type-II superlattice materials grown by MBE and MOCVD for the third generation of infrared imagers Manijeh Razeghi, Arash Dehzangi, Donghai Wu, Ryan McClintock, Yiyun Zhang, Quentin Durlin, Jiakai Li, Fanfei Meng Proc. SPIE Defense + Commercial Sensing,Infrared Technology and Applications XLV, 110020G -- May 7, 2019 Third generation of infrared imagers demand performances for higher detectivity, higher operating temperature, higher resolution, and multi-color detection all accomplished with better yield and lower manufacturing costs. Antimonidebased gap-engineered Type-II superlattices (T2SLs) material system is considered as a potential alternative for MercuryCadmium-Telluride (HgCdTe) technology in all different infrared detection regimes from short to very long wavelengths for the third generation of infrared imagers. This is due to the incredible growth in the understanding of its material properties and improvement of device processing which leads to design and fabrication of better devices. We will present the most recent research results on Antimonide-based gap-engineered Type-II superlattices, such as highperformance dual-band SWIR/MWIR photo-detectors and focal plane arrays for different infrared regimes, toward the third generation of infrared imaging systems at the Center for Zuantum Devices. Comparing metal-organic chemical vapor deposition (MOCVD), vs molecular beam epitaxy (MBE). reprint
12.	Type–II superlattices base visible/extended short–wavelength infrared photodetectors with a bandstructure–engineered photo–generated carrier extractor Arash Dehzangi, Ryan McClintock, Abbas Haddadi, Donghai Wu, Romain Chevallier, Manijeh Razeghi Scientific Reports volume 9, Article number: 5003 -- March 21, 2019 Visible/extended short–wavelength infrared photodetectors with a bandstructure–engineered photo–generated carrier extractor based on type–II InAs/AlSb/GaSb superlattices have been demonstrated. The photodetectors are designed to have a 100% cut-off wavelength of ~2.4 μm at 300K, with sensitivity down to visible wavelengths. The photodetectors exhibit room–temperature (300K) peak responsivity of 0.6 A/W at ~1.7 μm, corresponding to a quantum efficiency of 43% at zero bias under front–side illumination, without any anti–reflection coating where the visible cut−on wavelength of the devices is <0.5 µm. With a dark current density of 5.3 × 10⁻⁴ A/cm² under −20 mV applied bias at 300K, the photodetectors exhibit a specific detectivity of 4.72 × 10¹⁰ cm·Hz^½W^-1. At 150K, the photodetectors exhibit a dark current density of 1.8 × 10⁻¹⁰ A/cm² and a quantum efficiency of 40%, resulting in a detectivity of 5.56 × 10¹³ cm·Hz^½/W reprint
13.	p-Type thin film field effect transistors based on lithium-doped nickel oxide channels grown by pulsed laser deposition V. E. Sandana; D. J. Rogers; F. H. Teherani; P. Bove; R. McClintock; M. Razeghi SPIE Proceedings Volume 10919, Oxide-based Materials and Devices X; 109191H -- March 12, 2019 Staggered back-gated Field Effect Transistor (FET) structures were made by growing Li-doped NiO on Si₃N₄/SiO₂/Si (111) using room temperature pulsed laser deposition. Optical studies showed over 80% transmission for the NiO:Li channel at wavelengths > 500nm. The MISFET revealed rectifying transfer characteristics, with a V_ON close to zero, a channel mobility of ~ 1 cm²/V·s, a gate leakage current (at +5V) of 0.8 mA and an ION/IOFF ratio (at a Vgs of −15V) of ~ 10³. The transistors showed enhancement-mode output characteristics indicative of a p-type channel with sharp pinchoff, hard saturation, a comparatively high (milliampere range) Id and a relatively low on-resistance of ~11 kΩ. Hence the adoption of Li doping in NiO channels would appear to be a promising approach to obtain p-type TFTs with superior transparency, speed and energy efficiency. reprint
14.	High Frequency Extended Short-Wavelength Infrared Heterojunction Photodetectors Based on InAs/GaSb/AlSb Type-II Superlattices Romain Chevallier, Abbas Haddadi, Ryan McClintock, Arash Dehzangi , Victor Lopez-Dominguez, Pedram Khalili Amiri, Manijeh Razeghi IEEE JOURNAL OF QUANTUM ELECTRONICS, VOL. 54, NO. 6-- December 1, 2018 InAs/GaSb/AlSb type-II superlattice-based photodetectors, with 50% cut-off wavelength of 2.1 µm and a −3 dB cut-off frequency of 4.8 GHz, are demonstrated, for 10 µm diameter circular mesas under 15 V applied reverse bias. A study of the cut-off frequency with applied bias and mesa size was performed to evaluate some of the limiting factors of photodetectors high frequency performance. reprint
15.	High brightness ultraviolet light-emitting diodes grown on patterned silicon substrate Yoann Robin, Kai Ding, Ilkay Demir, Ryan McClintock, Sezai Elagoz, Manijeh Razeghi Materials Science in Semiconductor Processing 90, pp. 87–91-- November 5, 2018 We report on the fabrication of high brightness AlGaN-based ultraviolet light emitting diodes (UV-LED) on patterned silicon. Using the lateral epitaxial overgrowth approach, we demonstrate the growth of a 6 μm thick AlN layer of high crystalline quality. X-ray diffraction characterization showed a rocking curve with a full width at half maximum of 553 and 768″ for the (00.2) and (10.2) planes, respectively. The low dislocation density of the AlN template enabled the growth of bright AlGaN/ GaN quantum wells emitting at 336 nm. By appropriate flip-chip bonding and silicon substrate removal processing steps, the patterned AlN surface was exposed and efficient bottom-emission UV-LEDs were realized. Improvement of the AlN quality and the structure design allowed the optical output power to reach the milliwatt range under pulsed current, exceeding the previously reported maximum efficiency. Further investigations of the optical power at different pulsed currents and duty cycles show that thermal management in this device structure is still challenging, especially in continuous wave mode operation. The strategy presented here is of interest, since AlN crystalline quality improvement and optimization of the light extraction are the main issues inhibiting efficient UV emitter on silicon fabrication. reprint
16.	The new oxide paradigm for solid state ultraviolet photodetectors D. J. Rogers, P. Bove, X. Arrateig, V. E. Sandana, F. H. Teherani, M. Razeghi, R. McClintock, E. Frisch, S. Harel, Proceedings Volume 10533, Oxide-based Materials and Devices IX; 105331P-- March 22, 2018 The bandgap of wurzite ZnO layers grown on 2 inch diameter c-Al₂O₃ substrates by pulsed laser deposition was engineered from 3.7 to 4.8 eV by alloying with Mg. Above this Mg content the layers transformed from single phase hcp to mixed hcp/fcc phase before becoming single phase fcc above a bandgap of about 5.5 eV. Metal-Semiconductor-Metal (MSM) photodetectors based on gold Inter-Digitated-Transducer structures were fabricated from the single phase hcp layers by single step negative photolithography and then packaged in TO5 cans. The devices gave over 6 orders of magnitude of separation between dark and light signal with solar rejection ratios (I270 : I350) of over 3 x 10⁵ and dark signals of 300 pA (at a bias of −5V). Spectral responsivities were engineered to fit the “Deutscher Verein des Gas- und Wasserfaches” industry standard form and gave over two decade higher responsivities (14 A/W, peaked at 270 nm) than commercial SiC based devices. Homogeneous Ga₂O₃ layers were also grown on 2 inch diameter c-Al₂O₃ substrates by PLD. Optical transmission spectra were coherent with a bandgap that increased from 4.9 to 5.4 eV when film thickness was decreased from 825 to 145 nm. X-ray diffraction revealed that the films were of the β-Ga₂O₃ (monoclinic) polytype with strong (−201) orientation. β-Ga₂O₃ MSM photodetectors gave over 4 orders of magnitude of separation between dark and light signal (at −5V bias) with dark currents of 250 pA and spectral responsivities of up to 40 A/W (at -0.75V bias). It was found that the spectral responsivity peak position could be decreased from 250 to 230 nm by reducing film thickness from 825 to 145 nm. This shift in peak responsivity wavelength with film thickness (a) was coherent with the apparent bandgap shift that was observed in transmission spectroscopy for the same layers and (b) conveniently provides a coverage of the spectral region in which MgZnO layers show fcc/hcp phase mixing. reprint
17.	A review of the growth, doping, and applications of β-Ga₂O₃ thin films Manijeh Razeghi, Ji-Hyeon Park , Ryan McClintock, Dimitris Pavlidis, Ferechteh H. Teherani, David J. Rogers, Brenden A. Magill, Giti A. Khodaparast, Yaobin Xu, Jinsong Wu, Vinayak P. Dravid Proc. SPIE 10533, Oxide-based Materials and Devices IX, 105330R -- March 14, 2018 β-Ga₂O₃ is emerging as an interesting wide band gap semiconductor for solar blind photo detectors (SBPD) and high power field effect transistors (FET) because of its outstanding material properties including an extremely wide bandgap (Eg ~4.9eV) and a high breakdown field (8 MV/cm). This review summarizes recent trends and progress in the growth/doping of β-Ga₂O₃ thin films and then offers an overview of the state-of-the-art in SBPD and FET devices. The present challenges for β-Ga₂O₃ devices to penetrate the market in real-world applications are also considered, along with paths for future work. reprint
18.	Sandwich method to grow high quality AlN by MOCVD Demir , H Li, Y Robin, R McClintock, S Elagoz and M Razeghi Journal of Physics D: Applied Physics 51, pp. 085104-- February 7, 2018 We report pulsed atomic layer epitaxy growth of a very high crystalline quality, thick (~2 µm) and crack-free AlN material on c-plane sapphire substrates via a sandwich method using metal organic chemical vapor deposition. This sandwich method involves the introduction of a relatively low temperature (1050 °C) 1500 nm thick AlN layer between two 250 nm thick AlN layers which are grown at higher temperature (1170 °C). The surface morphology and crystalline quality remarkably improve using this sandwich method. A 2 µm thick AlN layer was realized with 33 arcsec and 136 arcsec full width at half maximum values for symmetric and asymmetric reflections of ω-scan, respectively, and it has an atomic force microscopy root-mean-square surface roughness of ~0.71 nm for a 5 × 5 µm² surface area. reprint
19.	Broadband monolithically-tunable quantum cascade lasers Wenjia Zhou, Ryan McClintock, Donghai Wu, Steven Slivken, Manijeh Razeghi Proc. SPIE 10540, Quantum Sensing and Nano Electronics and Photonics XV, 105400A-- January 26, 2018 Mid-infrared lasers, emitting in the spectral region of 3-12 μm that contain strong characteristic vibrational transitions of many important molecules, are highly desirable for spectroscopy sensing applications. High efficiency quantum cascade lasers have been demonstrated with up to watt-level output power in the mid-infrared region. However, the wide wavelength tuning, which is critical for spectroscopy applications, is still largely relying on incorporating external gratings, which have stability issues. Here, we demonstrate the development a monolithic, widely tunable quantum cascade laser source emitting between 6.1 and 9.2 μm through an on-chip integration of a sampled grating distributed feedback tunable laser array with a beam combiner. A compact tunable laser system was built to drive the individual lasers within the array and coordinate the driving of the laser array to produce desired wavelength. A broadband spectral measurement (520cm^-1) of methane shows excellent agreement with Fourier transform infrared spectrometer measurement. Further optimizations have led to high performance monolithic tunable QCLs with up to 65 mW output while delivering fundamental mode outputs. reprint
20.	Progress in monolithic, broadband, widely tunable midinfrared quantum cascade lasers Manijeh Razeghi Wenjia Zhou Ryan McClintock Donghai Wu Steven Slivken Optical Engineering 57(1), 011018-- December 1, 2017 We present recent progress on the development of monolithic, broadband, widely tunable midinfrared quantum cascade lasers. First, we show a broadband midinfrared laser gain realized by a heterogeneous quantum cascade laser based on a strain balanced composite well design of Al_0.63In_0.37As∕Ga_0.35In_0.65As∕ Ga_0.47In_0.53As. Single mode emission between 5.9 and 10.9 μm under pulsed mode operation was realized from a distributed feedback laser array, which exhibited a flat current threshold across the spectral range. Using the broadband wafer, a monolithic tuning between 6.2 and 9.1 μm was demonstrated from a beam combined sampled grating distributed feedback laser array. The tunable laser was utilized for a fast sensing of methane under pulsed operation. Transmission spectra were obtained without any moving parts, which showed excellent agreement to a standard measurement made by a Fourier transform infrared spectrometer. reprint
21.	High performance monolithic, broadly tunable mid-infrared quantum cascade lasers WENJIA Zhou, DONGHAI Wu, RYAN McCLINTOCK, STEVEN SLIVKEN, AND MANIJEH RAZEGH1 Optica 4(10), p. 1228-- October 10, 2017 Mid-infrared lasers, emitting in the spectral region of 3-12 µm that contains strong characteristic vibrational transitions of many important molecules, are highly desirable for spectroscopy sensing applications. High-efficiency quantum cascade lasers have been demonstrated with up to watt-level output power in the mid-infrared region. However, the wide wavelength tuning that is critical for spectroscopy applications still largely relies on incorporating external gratings, which have stability issues. Here, we demonstrate a monolithic, broadly tunable quantum cascade laser source emitting between 6.1 and 9.2 µm through an on-chip integration of a sampled grating distributed feedback tunable laser array and a beam combiner. High peak power up to 65 mW has been obtained through a balanced high-gain active region design, efficient waveguide layout, and the development of a broadband antireflection coating. Nearly fundamental transversemode operation is achieved for all emission wavelengths with a pointing stability better than 1.6 mrad (0.1 °). The demonstrated laser source opens new opportunities for mid-infrared spectroscopy. reprint
22.	Radiative recombination of confined electrons at the MgZnO/ ZnO heterojunction interface Sumin Choi, David J. Rogers, Eric V. Sandana, Philippe Bove, Ferechteh H. Teherani, Christian Nenstiel, Axel Hoffmann, Ryan McClintock, Manijeh Razeghi, David Look, Angus Gentle, Matthew R. Phillips & Cuong Ton-That Nature Scientific Reports 7, pp. 7457-- August 7, 2017 We investigate the optical signature of the interface in a single MgZnO/ZnO heterojunction, which exhibits two orders of magnitude lower resistivity and 10 times higher electron mobility compared with the MgZnO/Al₂O₃ film grown under the same conditions. These impressive transport properties are attributed to increased mobility of electrons at the MgZnO/ZnO heterojunction interface. Depthresolved cathodoluminescence and photoluminescence studies reveal a 3.2 eV H-band optical emission from the heterointerface, which exhibits excitonic properties and a localization energy of 19.6 meV. The emission is attributed to band-bending due to the polarization discontinuity at the interface, which leads to formation of a triangular quantum well and localized excitons by electrostatic coupling. reprint
23.	Nanoselective area growth of defect-free thick indium-rich InGaN nanostructures on sacriﬁcial ZnO templates Renaud Puybaret, David J Rogers, Youssef El Gmili, Suresh Sundaram, Matthew B Jordan, Xin Li, Gilles Patriarche, Ferechteh H Teherani, Eric V Sandana, Philippe Bove, Paul L Voss, Ryan McClintock, Manijeh Razeghi, Ian Ferguson, Jean-Paul Salvestrini, and Abdallah Ougazzade Nanotechnology 28 195304-- April 29, 2017 Nanoselective area growth (NSAG) by metal organic vapor phase epitaxy of high-quality InGaN nanopyramids on GaN-coated ZnO/c-sapphire is reported. Nanopyramids grown on epitaxial low-temperature GaN-on-ZnO are uniform and appear to be single crystalline, as well as free of dislocations and V-pits. They are also indium-rich (with homogeneous 22% indium incorporation) and relatively thick (100 nm). These properties make them comparable to nanostructures grown on GaN and AlN/Si templates, in terms of crystallinity, quality, morphology, chemical composition and thickness. Moreover, the ability to selectively etch away the ZnO allows for the potential lift-off and transfer of the InGaN/GaN nanopyramids onto alternative substrates, e.g. cheaper and/or ﬂexible. This technology offers an attractive alternative to NSAG on AlN/Si as a platform for the fabrication of high quality, thick and indium-rich InGaN monocrystals suitable for cheap, ﬂexible and tunable light-emitting diodes. reprint
24.	Direct growth of thick AlN layers on nanopatterned Si substrates by cantilever epitaxy Ilkay Demir, Yoann Robin, Ryan McClintock, Sezai Elagoz, Konstantinos Zekentes, and Manijeh Razeghi Physica Status Solidi 214 (4), pp. 1770120-- April 4, 2017 The growth of thick, high quality, and low stress AlN films on Si substrates is highly desired for a number of applications like the development of micro and nano electromechanical system (MEMS and NEMS) technologies [1] and particularly for fabricating AlGaNbased UV LEDs [2–5]. UV LEDs are attractive as they are applied in many areas, such as biomedical instrumentations and dermatology, curing of industrial resins and inks, air purification, water sterilization, and many others [2, 3]. UV LEDs have been generally fabricated on AlN, GaN, Al₂O₃, or SiC substrates because of better lattice mismatching to AlGaN material systems. reprint
25.	Imprinting of Nanoporosity in Lithium-Doped Nickel Oxide through the use of Sacrificial Zinc Oxide Nanotemplates Vinod E. Sandana, David J. Rogers, Ferechteh H. Teheran1, Philippe Bove, Ryan McClintock and Manijeh Razeghi Proc. SPIE 10105, Oxide-based Materials and Devices VIII, 101052C-- April 3, 2017 Methods for simultaneously increasing the conductivity and the porosity of NiO layers grown by pulsed laser deposition (PLD) were investigated in order to develop improved photocathodes for p-DSSC applications. NiO:Li (20at%) layers grown on c-Al₂O₃ by PLD showed a sharp drop in conductivity with increasing substrate temperature. Layers grown at room temperature were more than two orders of magnitude more conductive than undoped NiO layers but did not show evidence of any porosity in Scanning Electron Microscope (SEM) images. A new method for imposing a nanoporosity in NiO was developed based on a sacrificial template of nanostructured ZnO. SEM images and EDX spectroscopy showed that a nanoporous morphology had been imprinted in the NiO overlayer after preferential chemical etching away of the nanostructured ZnO underlayer. Beyond p-DSSC applications, this new process could represent a new paradigm for imprinting porosity in a whole range of materials. reprint

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